WO1997003236A3 - System and method for thermal processing of a semiconductor substrate - Google Patents

System and method for thermal processing of a semiconductor substrate Download PDF

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Publication number
WO1997003236A3
WO1997003236A3 PCT/US1996/011440 US9611440W WO9703236A3 WO 1997003236 A3 WO1997003236 A3 WO 1997003236A3 US 9611440 W US9611440 W US 9611440W WO 9703236 A3 WO9703236 A3 WO 9703236A3
Authority
WO
WIPO (PCT)
Prior art keywords
wafer
heat
insulating material
heating
heated block
Prior art date
Application number
PCT/US1996/011440
Other languages
French (fr)
Other versions
WO1997003236A2 (en
Inventor
Kristian E Johnsgard
Brad S Matson
James Mcdiarmid
Vladimir J Zeitlin
Original Assignee
Mattson Tech Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mattson Tech Inc filed Critical Mattson Tech Inc
Priority to JP9505941A priority Critical patent/JPH11508870A/en
Priority to EP96923710A priority patent/EP0840811B1/en
Priority to DE69623967T priority patent/DE69623967T2/en
Publication of WO1997003236A2 publication Critical patent/WO1997003236A2/en
Publication of WO1997003236A3 publication Critical patent/WO1997003236A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4411—Cooling of the reaction chamber walls
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • C23C16/463—Cooling of the substrate
    • C23C16/466—Cooling of the substrate using thermal contact gas
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/10—Heating of the reaction chamber or the substrate
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/12—Heating of the reaction chamber

Abstract

A semiconductor substrate processing system and method using a stable heating source with a large thermal mass relative to conventional lamp heated systems. The system dimensions and processing parameters are selected to provide a substantial heat flux to the wafer while minimizing heat loss to the surrounding environment (particularly from the edges of the heat source and wafer). The heat source provides a wafer temperature uniformity profile that has a low variance across temperature ranges at low pressures. A resistively heated block is substantially enclosed within an insulated vacuum cavity used to heat the wafer. A vacuum region is preferably provided between the heated block and the insulating material as well as between the insulating material and the chamber wall. Heat transfer across the vacuum regions is primarily achieved by radiation, while heat transfer through the insulating material is achieved by conduction. The wafer is placed on or near the heated block within the vacuum cavity for heating by conduction and radiation. The rate of heating may be controlled by varying pressure across a range of very low pressures.
PCT/US1996/011440 1995-07-10 1996-07-09 System and method for thermal processing of a semiconductor substrate WO1997003236A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP9505941A JPH11508870A (en) 1995-07-10 1996-07-09 System and method for heat treatment of a semiconductor substrate
EP96923710A EP0840811B1 (en) 1995-07-10 1996-07-09 System and method for thermal processing of a semiconductor substrate
DE69623967T DE69623967T2 (en) 1995-07-10 1996-07-09 METHOD AND DEVICE FOR THE THERMAL TREATMENT OF SEMICONDUCTOR SUBSTRATES

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/499,986 US6002109A (en) 1995-07-10 1995-07-10 System and method for thermal processing of a semiconductor substrate
US08/499,986 1995-07-10

Publications (2)

Publication Number Publication Date
WO1997003236A2 WO1997003236A2 (en) 1997-01-30
WO1997003236A3 true WO1997003236A3 (en) 1997-03-06

Family

ID=23987575

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1996/011440 WO1997003236A2 (en) 1995-07-10 1996-07-09 System and method for thermal processing of a semiconductor substrate

Country Status (5)

Country Link
US (4) US6002109A (en)
EP (1) EP0840811B1 (en)
JP (1) JPH11508870A (en)
DE (1) DE69623967T2 (en)
WO (1) WO1997003236A2 (en)

Families Citing this family (129)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6380751B2 (en) * 1992-06-11 2002-04-30 Cascade Microtech, Inc. Wafer probe station having environment control enclosure
US5345170A (en) * 1992-06-11 1994-09-06 Cascade Microtech, Inc. Wafer probe station having integrated guarding, Kelvin connection and shielding systems
US6232789B1 (en) * 1997-05-28 2001-05-15 Cascade Microtech, Inc. Probe holder for low current measurements
US5561377A (en) * 1995-04-14 1996-10-01 Cascade Microtech, Inc. System for evaluating probing networks
US6133550A (en) 1996-03-22 2000-10-17 Sandia Corporation Method and apparatus for thermal processing of semiconductor substrates
US5914613A (en) * 1996-08-08 1999-06-22 Cascade Microtech, Inc. Membrane probing system with local contact scrub
JP3336897B2 (en) * 1997-02-07 2002-10-21 三菱住友シリコン株式会社 Susceptor for vapor phase epitaxy
US6762396B2 (en) 1997-05-06 2004-07-13 Thermoceramix, Llc Deposited resistive coatings
US6002263A (en) * 1997-06-06 1999-12-14 Cascade Microtech, Inc. Probe station having inner and outer shielding
JP3147048B2 (en) * 1997-09-12 2001-03-19 日本電気株式会社 Semiconductor device
US6376815B1 (en) * 1998-01-12 2002-04-23 Furukawa Electric Co., Ltd. Highly gas tight substrate holder and method of manufacturing the same
WO1999049101A1 (en) * 1998-03-23 1999-09-30 Mattson Technology, Inc. Apparatus and method for cvd and thermal processing of semiconductor substrates
US6596086B1 (en) * 1998-04-28 2003-07-22 Shin-Etsu Handotai Co., Ltd. Apparatus for thin film growth
US6635501B1 (en) * 1998-06-25 2003-10-21 Advanced Micro Devices, Inc. Low temperature cobalt silicidation process monitor
US6167322A (en) * 1998-07-10 2000-12-26 Holbrooks; Orville Ray Intelligent wafer handling system and method
US6169271B1 (en) 1998-07-13 2001-01-02 Mattson Technology, Inc. Model based method for wafer temperature control in a thermal processing system for semiconductor manufacturing
US6256882B1 (en) 1998-07-14 2001-07-10 Cascade Microtech, Inc. Membrane probing system
WO2000029799A1 (en) * 1998-11-13 2000-05-25 Mattson Technology, Inc. Apparatus and method for thermal processing of semiconductor substrates
FR2786208B1 (en) * 1998-11-25 2001-02-09 Centre Nat Rech Scient METHOD OF CRYSTALLINE GROWTH ON SUBSTRATE AND REACTOR FOR ITS IMPLEMENTATION
JP2001007039A (en) * 1999-06-18 2001-01-12 Hitachi Ltd Method for manufacturing semiconductor integrated circuit device
US6307184B1 (en) 1999-07-12 2001-10-23 Fsi International, Inc. Thermal processing chamber for heating and cooling wafer-like objects
JP4057198B2 (en) * 1999-08-13 2008-03-05 東京エレクトロン株式会社 Processing apparatus and processing method
KR100700764B1 (en) * 1999-09-03 2007-03-27 동경 엘렉트론 주식회사 Substrate processing apparatus and substrate processing method
US6689222B2 (en) * 1999-11-03 2004-02-10 Applied Materials, Inc. Sealable surface method and device
US6414328B1 (en) * 1999-11-05 2002-07-02 Kair Nussupov Method and apparatus for the conveying and positioning of ion implantation targets
US6342691B1 (en) * 1999-11-12 2002-01-29 Mattson Technology, Inc. Apparatus and method for thermal processing of semiconductor substrates
US6345150B1 (en) 1999-11-30 2002-02-05 Wafermasters, Inc. Single wafer annealing oven
US6303906B1 (en) 1999-11-30 2001-10-16 Wafermasters, Inc. Resistively heated single wafer furnace
JP4028149B2 (en) * 2000-02-03 2007-12-26 日本碍子株式会社 Heating device
JP2001338878A (en) * 2000-03-21 2001-12-07 Sharp Corp Susceptor and surface treatment method
KR100509085B1 (en) * 2000-04-20 2005-08-18 동경 엘렉트론 주식회사 Thermal processing system
JP4470274B2 (en) * 2000-04-26 2010-06-02 東京エレクトロン株式会社 Heat treatment equipment
JP2001319886A (en) * 2000-05-08 2001-11-16 Tokyo Electron Ltd System and method for heat treatment
WO2001095379A1 (en) 2000-06-02 2001-12-13 Ibiden Co., Ltd. Hot plate unit
US6838115B2 (en) * 2000-07-12 2005-01-04 Fsi International, Inc. Thermal processing system and methods for forming low-k dielectric films suitable for incorporation into microelectronic devices
US6914423B2 (en) * 2000-09-05 2005-07-05 Cascade Microtech, Inc. Probe station
US6965226B2 (en) * 2000-09-05 2005-11-15 Cascade Microtech, Inc. Chuck for holding a device under test
JP3910791B2 (en) * 2000-09-19 2007-04-25 東京エレクトロン株式会社 Substrate heat treatment method and substrate heat treatment apparatus
CN100493267C (en) 2000-11-29 2009-05-27 萨莫希雷梅克斯公司 Resistive heaters and uses thereof
DE20114544U1 (en) * 2000-12-04 2002-02-21 Cascade Microtech Inc wafer probe
US6902622B2 (en) * 2001-04-12 2005-06-07 Mattson Technology, Inc. Systems and methods for epitaxially depositing films on a semiconductor substrate
US6970634B2 (en) * 2001-05-04 2005-11-29 Cascade Microtech, Inc. Fiber optic wafer probe
FR2824663B1 (en) * 2001-05-14 2004-10-01 Semco Sa METHOD AND DEVICE FOR DOPING, DIFFUSING AND PYROLITHIC OXIDATION OF REDUCED PRESSURE SILICON WAFERS
WO2003052435A1 (en) 2001-08-21 2003-06-26 Cascade Microtech, Inc. Membrane probing system
JP3616366B2 (en) * 2001-10-23 2005-02-02 東京エレクトロン株式会社 Substrate processing apparatus and substrate processing method
US6887803B2 (en) * 2001-11-08 2005-05-03 Wafermasters, Inc. Gas-assisted rapid thermal processing
KR20030048908A (en) * 2001-12-13 2003-06-25 권영종 Post exposure bake apparatus and post exposure bake method using the same
US6777964B2 (en) * 2002-01-25 2004-08-17 Cascade Microtech, Inc. Probe station
US7352258B2 (en) * 2002-03-28 2008-04-01 Cascade Microtech, Inc. Waveguide adapter for probe assembly having a detachable bias tee
JP2003338499A (en) * 2002-05-20 2003-11-28 Tokyo Electron Ltd Method and system for forming film
EP1509776A4 (en) * 2002-05-23 2010-08-18 Cascade Microtech Inc Probe for testing a device under test
US20040053514A1 (en) * 2002-08-27 2004-03-18 Ali Shajii Apparatus for cooling a substrate through thermal conduction in the viscous regime
US6783630B2 (en) * 2002-08-27 2004-08-31 Axcelis Technologies, Inc. Segmented cold plate for rapid thermal processing (RTP) tool for conduction cooling
CN1682084A (en) 2002-09-10 2005-10-12 Fsi国际公司 Thermal process station with heated lid
US20040060582A1 (en) * 2002-09-18 2004-04-01 Dainippon Screen Mfg.Co., Ltd. Substrate processing apparatus
US6768084B2 (en) 2002-09-30 2004-07-27 Axcelis Technologies, Inc. Advanced rapid thermal processing (RTP) using a linearly-moving heating assembly with an axisymmetric and radially-tunable thermal radiation profile
US6847219B1 (en) * 2002-11-08 2005-01-25 Cascade Microtech, Inc. Probe station with low noise characteristics
US6724205B1 (en) * 2002-11-13 2004-04-20 Cascade Microtech, Inc. Probe for combined signals
US6861856B2 (en) * 2002-12-13 2005-03-01 Cascade Microtech, Inc. Guarded tub enclosure
US7026714B2 (en) * 2003-03-18 2006-04-11 Cunningham James A Copper interconnect systems which use conductive, metal-based cap layers
EP1460739A1 (en) * 2003-03-19 2004-09-22 Agilent Technologies, Inc. - a Delaware corporation - Transmitter optical sub assembly
US7718930B2 (en) * 2003-04-07 2010-05-18 Tokyo Electron Limited Loading table and heat treating apparatus having the loading table
US7221172B2 (en) * 2003-05-06 2007-05-22 Cascade Microtech, Inc. Switched suspended conductor and connection
US7492172B2 (en) * 2003-05-23 2009-02-17 Cascade Microtech, Inc. Chuck for holding a device under test
US7057404B2 (en) * 2003-05-23 2006-06-06 Sharp Laboratories Of America, Inc. Shielded probe for testing a device under test
US6735378B1 (en) 2003-05-29 2004-05-11 Axcelis Technologies, Inc. Pressure controlled heat source and method for using such for RTP
US7250626B2 (en) * 2003-10-22 2007-07-31 Cascade Microtech, Inc. Probe testing structure
US7187188B2 (en) * 2003-12-24 2007-03-06 Cascade Microtech, Inc. Chuck with integrated wafer support
JP2007517231A (en) * 2003-12-24 2007-06-28 カスケード マイクロテック インコーポレイテッド Active wafer probe
US20090224356A1 (en) * 2004-01-28 2009-09-10 Rajit Chandra Method and apparatus for thermally aware design improvement
US20090077508A1 (en) * 2004-01-28 2009-03-19 Rubin Daniel I Accelerated life testing of semiconductor chips
US7472363B1 (en) 2004-01-28 2008-12-30 Gradient Design Automation Inc. Semiconductor chip design having thermal awareness across multiple sub-system domains
US20090048801A1 (en) * 2004-01-28 2009-02-19 Rajit Chandra Method and apparatus for generating thermal test vectors
US7458052B1 (en) * 2004-08-30 2008-11-25 Gradient Design Automation, Inc. Method and apparatus for normalizing thermal gradients over semiconductor chip designs
WO2007070879A1 (en) * 2005-12-17 2007-06-21 Gradient Design Automation, Inc. Simulation of ic temperature distributions using an adaptive 3d grid
US8286111B2 (en) * 2004-03-11 2012-10-09 Gradient Design Automation Inc. Thermal simulation using adaptive 3D and hierarchical grid mechanisms
US8019580B1 (en) 2007-04-12 2011-09-13 Gradient Design Automation Inc. Transient thermal analysis
US7304264B2 (en) * 2004-04-13 2007-12-04 Advantest Corporation Micro thermal chamber having proximity control temperature management for devices under test
US7176705B2 (en) * 2004-06-07 2007-02-13 Cascade Microtech, Inc. Thermal optical chuck
JP4980903B2 (en) * 2004-07-07 2012-07-18 カスケード マイクロテック インコーポレイテッド Probe head with membrane suspension probe
DE202005021435U1 (en) * 2004-09-13 2008-02-28 Cascade Microtech, Inc., Beaverton Double-sided test setups
JP4948417B2 (en) * 2004-11-02 2012-06-06 カスケード マイクロテック インコーポレイテッド Optically enhanced digital imaging system
US7771563B2 (en) * 2004-11-18 2010-08-10 Sumitomo Precision Products Co., Ltd. Systems and methods for achieving isothermal batch processing of substrates used for the production of micro-electro-mechanical-systems
US7656172B2 (en) * 2005-01-31 2010-02-02 Cascade Microtech, Inc. System for testing semiconductors
US20060169897A1 (en) * 2005-01-31 2006-08-03 Cascade Microtech, Inc. Microscope system for testing semiconductors
US7535247B2 (en) * 2005-01-31 2009-05-19 Cascade Microtech, Inc. Interface for testing semiconductors
JP4535499B2 (en) * 2005-04-19 2010-09-01 東京エレクトロン株式会社 Heating device, coating, developing device and heating method
US7449899B2 (en) * 2005-06-08 2008-11-11 Cascade Microtech, Inc. Probe for high frequency signals
JP5080459B2 (en) * 2005-06-13 2012-11-21 カスケード マイクロテック インコーポレイテッド Wideband active / passive differential signal probe
US20070042118A1 (en) * 2005-08-22 2007-02-22 Yoo Woo S Encapsulated thermal processing
US7184657B1 (en) * 2005-09-17 2007-02-27 Mattson Technology, Inc. Enhanced rapid thermal processing apparatus and method
FI121543B (en) * 2005-11-17 2010-12-31 Beneq Oy Arrangement in connection with the ALD reactor
JP4527670B2 (en) * 2006-01-25 2010-08-18 東京エレクトロン株式会社 Heat treatment apparatus, heat treatment method, control program, and computer-readable storage medium
US7723999B2 (en) * 2006-06-12 2010-05-25 Cascade Microtech, Inc. Calibration structures for differential signal probing
US7764072B2 (en) * 2006-06-12 2010-07-27 Cascade Microtech, Inc. Differential signal probing system
US7403028B2 (en) 2006-06-12 2008-07-22 Cascade Microtech, Inc. Test structure and probe for differential signals
US7443186B2 (en) * 2006-06-12 2008-10-28 Cascade Microtech, Inc. On-wafer test structures for differential signals
US20080076077A1 (en) * 2006-09-21 2008-03-27 Toshiba America Electronic Components, Inc. Apparatus and method for heating semiconductor wafers with improved temperature uniformity
US7378618B1 (en) 2006-12-14 2008-05-27 Applied Materials, Inc. Rapid conductive cooling using a secondary process plane
US8087821B2 (en) * 2007-06-06 2012-01-03 Waters Technologies Corporation Infrared heated differential scanning calorimeter
GB2462954B (en) * 2007-06-06 2011-08-17 Waters Investments Ltd System and method for thermal analysis using variable thermal resistance
US7876114B2 (en) * 2007-08-08 2011-01-25 Cascade Microtech, Inc. Differential waveguide probe
US8073316B2 (en) * 2008-01-31 2011-12-06 Kabushiki Kaisha Toshiba Oven for semiconductor wafer
DE102008016429A1 (en) * 2008-03-31 2009-10-01 Advanced Micro Devices, Inc., Sunnyvale A method of making thin films by a thermally activated process using a temperature gradient across the substrate
US7888957B2 (en) * 2008-10-06 2011-02-15 Cascade Microtech, Inc. Probing apparatus with impedance optimized interface
US8410806B2 (en) * 2008-11-21 2013-04-02 Cascade Microtech, Inc. Replaceable coupon for a probing apparatus
US8319503B2 (en) 2008-11-24 2012-11-27 Cascade Microtech, Inc. Test apparatus for measuring a characteristic of a device under test
US20110081137A1 (en) * 2009-10-06 2011-04-07 Advantest Corporation Manufacturing equipment and manufacturing method
TWM413957U (en) * 2010-10-27 2011-10-11 Tangteck Equipment Inc Diffusion furnace apparatus
US8950470B2 (en) 2010-12-30 2015-02-10 Poole Ventura, Inc. Thermal diffusion chamber control device and method
US8097085B2 (en) * 2011-01-28 2012-01-17 Poole Ventura, Inc. Thermal diffusion chamber
US20120318455A1 (en) * 2011-06-14 2012-12-20 Andreas Fischer Passive compensation for temperature-dependent wafer gap changes in plasma processing systems
US9713203B2 (en) * 2012-03-19 2017-07-18 Iii Holdings 1, Llc Tool for annealing of magnetic stacks
US9323870B2 (en) 2012-05-01 2016-04-26 Advanced Micro Devices, Inc. Method and apparatus for improved integrated circuit temperature evaluation and IC design
US9159597B2 (en) 2012-05-15 2015-10-13 Taiwan Semiconductor Manufacturing Company, Ltd. Real-time calibration for wafer processing chamber lamp modules
TWI624862B (en) * 2012-06-11 2018-05-21 應用材料股份有限公司 Melt depth determination using infrared interferometric technique in pulsed laser annealing
US9388494B2 (en) 2012-06-25 2016-07-12 Novellus Systems, Inc. Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region
JP6011191B2 (en) * 2012-09-20 2016-10-19 株式会社島津製作所 Semiconductor manufacturing equipment
KR102106969B1 (en) * 2013-02-26 2020-05-08 삼성디스플레이 주식회사 Apparatus and methods for heat-treating substrate
JP6457498B2 (en) * 2013-05-23 2019-01-23 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ Coated liner assembly for a semiconductor processing chamber
US9617638B2 (en) 2014-07-30 2017-04-11 Lam Research Corporation Methods and apparatuses for showerhead backside parasitic plasma suppression in a secondary purge enabled ALD system
JP6384414B2 (en) * 2014-08-08 2018-09-05 東京エレクトロン株式会社 Substrate heating apparatus, substrate heating method, storage medium
US9508547B1 (en) * 2015-08-17 2016-11-29 Lam Research Corporation Composition-matched curtain gas mixtures for edge uniformity modulation in large-volume ALD reactors
US9738977B1 (en) 2016-06-17 2017-08-22 Lam Research Corporation Showerhead curtain gas method and system for film profile modulation
KR102630782B1 (en) 2016-08-19 2024-01-31 삼성전자주식회사 Substrate treating apparatus
US10535538B2 (en) * 2017-01-26 2020-01-14 Gary Hillman System and method for heat treatment of substrates
US11149351B2 (en) * 2017-09-11 2021-10-19 Infineon Technologies Ag Apparatus and method for chemical vapor deposition process for semiconductor substrates
CN110791745B (en) * 2019-12-12 2024-02-13 上海超导科技股份有限公司 Orthogonal radiation auxiliary conduction heating equipment suitable for roll-to-roll continuous strip
CN114959659B (en) * 2022-03-31 2023-11-28 松山湖材料实验室 Heating device for heating sample

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0134716A1 (en) * 1983-08-29 1985-03-20 Varian Associates, Inc. Process for high temperature drive-in diffusion of dopants into semiconductor wafers
US4914276A (en) * 1988-05-12 1990-04-03 Princeton Scientific Enterprises, Inc. Efficient high temperature radiant furnace
WO1993026038A1 (en) * 1992-06-15 1993-12-23 Materials Research Corporation Semiconductor wafer processing method and apparatus with heat and gas flow control
US5343012A (en) * 1992-10-06 1994-08-30 Hardy Walter N Differentially pumped temperature controller for low pressure thin film fabrication process
US5429498A (en) * 1991-12-13 1995-07-04 Tokyo Electron Sagami Kabushiki Kaisha Heat treatment method and apparatus thereof

Family Cites Families (95)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1244733B (en) * 1963-11-05 1967-07-20 Siemens Ag Device for growing monocrystalline semiconductor material layers on monocrystalline base bodies
US4496609A (en) * 1969-10-15 1985-01-29 Applied Materials, Inc. Chemical vapor deposition coating process employing radiant heat and a susceptor
US3737282A (en) * 1971-10-01 1973-06-05 Ibm Method for reducing crystallographic defects in semiconductor structures
US3757733A (en) * 1971-10-27 1973-09-11 Texas Instruments Inc Radial flow reactor
US4010690A (en) * 1973-04-30 1977-03-08 Avco Corporation Means for and method of providing a fire protection for a caseless ammunition
US3836751A (en) * 1973-07-26 1974-09-17 Applied Materials Inc Temperature controlled profiling heater
US3916822A (en) * 1974-04-26 1975-11-04 Bell Telephone Labor Inc Chemical vapor deposition reactor
US4081313A (en) * 1975-01-24 1978-03-28 Applied Materials, Inc. Process for preparing semiconductor wafers with substantially no crystallographic slip
US4328258A (en) * 1977-12-05 1982-05-04 Plasma Physics Corp. Method of forming semiconducting materials and barriers
US4350537A (en) * 1979-10-17 1982-09-21 Itt Industries Inc. Semiconductor annealing by pulsed heating
US4909314A (en) * 1979-12-21 1990-03-20 Varian Associates, Inc. Apparatus for thermal treatment of a wafer in an evacuated environment
FR2499228B1 (en) * 1981-01-30 1985-10-25 Carreras Michelle METHOD FOR HEATING HIGH TEMPERATURE OBJECTS BY PRESSURIZED STEAM AND APPARATUS FOR IMPLEMENTING THE SAME
US4417347A (en) * 1981-05-12 1983-11-22 Varian Associates, Inc. Semiconductor processor incorporating blackbody radiation source with constant planar energy flux
JPS59928A (en) * 1982-06-25 1984-01-06 Ushio Inc Photo heating device
JPS6097622A (en) * 1983-11-01 1985-05-31 Toshiba Mach Co Ltd Epitaxial device
US4481406A (en) * 1983-01-21 1984-11-06 Varian Associates, Inc. Heater assembly for thermal processing of a semiconductor wafer in a vacuum chamber
GB2136937A (en) * 1983-03-18 1984-09-26 Philips Electronic Associated A furnace for rapidly heating semiconductor bodies
US4507078A (en) 1983-03-28 1985-03-26 Silicon Valley Group, Inc. Wafer handling apparatus and method
US4555273A (en) * 1984-02-27 1985-11-26 The United States Of America As Represented By The Secretary Of The Navy Furnace transient anneal process
US4649261A (en) * 1984-02-28 1987-03-10 Tamarack Scientific Co., Inc. Apparatus for heating semiconductor wafers in order to achieve annealing, silicide formation, reflow of glass passivation layers, etc.
US4698486A (en) * 1984-02-28 1987-10-06 Tamarack Scientific Co., Inc. Method of heating semiconductor wafers in order to achieve annealing, silicide formation, reflow of glass passivation layers, etc.
US4507087A (en) * 1984-08-23 1985-03-26 Inventions International Incorporated Closed finger painting device
US4777022A (en) * 1984-08-28 1988-10-11 Stephen I. Boldish Epitaxial heater apparatus and process
JPS61135114A (en) * 1984-12-06 1986-06-23 Toshiba Corp Vapor growth device
JPS61139024A (en) * 1984-12-11 1986-06-26 Toshiba Corp Vapor growth apparatus
JPS61159574A (en) * 1984-12-31 1986-07-19 Sony Corp Reactor for vapor phase reaction by high frequency induction heating
JPS61180438A (en) * 1985-02-06 1986-08-13 Toshiba Corp Treating device for resist
US4673799A (en) * 1985-03-01 1987-06-16 Focus Semiconductor Systems, Inc. Fluidized bed heater for semiconductor processing
US4794217A (en) * 1985-04-01 1988-12-27 Qing Hua University Induction system for rapid heat treatment of semiconductor wafers
US4789771A (en) * 1985-10-07 1988-12-06 Epsilon Limited Partnership Method and apparatus for substrate heating in an axially symmetric epitaxial deposition apparatus
JPH066791B2 (en) * 1985-11-20 1994-01-26 日電アネルバ株式会社 Low pressure vapor phase growth equipment
JPS63153388A (en) * 1986-08-23 1988-06-25 東レ株式会社 Heat treating furnace
US4891335A (en) * 1986-10-15 1990-01-02 Advantage Production Technology Inc. Semiconductor substrate heater and reactor process and apparatus
JPS63229716A (en) * 1987-03-19 1988-09-26 Fujitsu Ltd Dry etching
JP2650908B2 (en) * 1987-04-17 1997-09-10 株式会社日立製作所 Heat treatment method
US4823735A (en) * 1987-05-12 1989-04-25 Gemini Research, Inc. Reflector apparatus for chemical vapor deposition reactors
DE3851120T2 (en) 1987-05-13 1995-03-23 Whitaker Corp ELECTRIC CONNECTOR WITH SHUNT.
JPH0333058Y2 (en) * 1987-06-26 1991-07-12
JPS6412524A (en) * 1987-07-06 1989-01-17 Kokusai Electric Co Ltd Vertical type diffusion cvd device
US4818327A (en) * 1987-07-16 1989-04-04 Texas Instruments Incorporated Wafer processing apparatus
US5062386A (en) * 1987-07-27 1991-11-05 Epitaxy Systems, Inc. Induction heated pancake epitaxial reactor
EP0306967B1 (en) * 1987-09-11 1997-04-16 Hitachi, Ltd. Apparatus for performing heat treatment on semiconductor wafers
US5034199A (en) * 1987-11-13 1991-07-23 Kopin Corporation Zone melt recrystallization apparatus
DE8801785U1 (en) * 1988-02-11 1988-11-10 Soehlbrand, Heinrich, Dr. Dipl.-Chem., 8027 Neuried, De
US4857689A (en) * 1988-03-23 1989-08-15 High Temperature Engineering Corporation Rapid thermal furnace for semiconductor processing
US4898834A (en) * 1988-06-27 1990-02-06 Amber Engineering, Inc. Open-tube, benign-environment annealing method for compound semiconductors
US4891499A (en) * 1988-09-09 1990-01-02 Texas Instruments Incorporated Method and apparatus for real-time wafer temperature uniformity control and slip-free heating in lamp heated single-wafer rapid thermal processing systems
US5048800A (en) * 1988-12-27 1991-09-17 Kabushiki Kaisha Toshiba Vertical heat treatment apparatus
JP2764038B2 (en) * 1989-03-10 1998-06-11 東京エレクトロン株式会社 HMDS processor
US5011794A (en) * 1989-05-01 1991-04-30 At&T Bell Laboratories Procedure for rapid thermal annealing of implanted semiconductors
US4993358A (en) * 1989-07-28 1991-02-19 Watkins-Johnson Company Chemical vapor deposition reactor and method of operation
US5059770A (en) * 1989-09-19 1991-10-22 Watkins-Johnson Company Multi-zone planar heater assembly and method of operation
JPH0693441B2 (en) * 1989-09-22 1994-11-16 株式会社東芝 Heat treatment method for semiconductor integrated circuit device
JPH03206613A (en) * 1990-01-09 1991-09-10 Fujitsu Ltd Low temperature dry etching apparatus
US5155336A (en) * 1990-01-19 1992-10-13 Applied Materials, Inc. Rapid thermal heating apparatus and method
JP2927857B2 (en) * 1990-01-19 1999-07-28 株式会社東芝 Substrate heating device
JPH03235325A (en) * 1990-02-13 1991-10-21 Toshiba Corp Semiconductor vapor growth device
US5154512A (en) * 1990-04-10 1992-10-13 Luxtron Corporation Non-contact techniques for measuring temperature or radiation-heated objects
US5043300A (en) * 1990-04-16 1991-08-27 Applied Materials, Inc. Single anneal step process for forming titanium silicide on semiconductor wafer
JP2704309B2 (en) * 1990-06-12 1998-01-26 大日本スクリーン製造株式会社 Substrate processing apparatus and substrate heat treatment method
JPH0461117A (en) * 1990-06-22 1992-02-27 Kokusai Electric Co Ltd Single-wafer cvd device
US5252807A (en) * 1990-07-02 1993-10-12 George Chizinsky Heated plate rapid thermal processor
US5060354A (en) * 1990-07-02 1991-10-29 George Chizinsky Heated plate rapid thermal processor
JP2725081B2 (en) * 1990-07-05 1998-03-09 富士通株式会社 Heat treatment equipment for semiconductor device manufacturing
US5167716A (en) * 1990-09-28 1992-12-01 Gasonics, Inc. Method and apparatus for batch processing a semiconductor wafer
JP3007432B2 (en) * 1991-02-19 2000-02-07 東京エレクトロン株式会社 Heat treatment equipment
US5536918A (en) * 1991-08-16 1996-07-16 Tokyo Electron Sagami Kabushiki Kaisha Heat treatment apparatus utilizing flat heating elements for treating semiconductor wafers
US5387557A (en) * 1991-10-23 1995-02-07 F. T. L. Co., Ltd. Method for manufacturing semiconductor devices using heat-treatment vertical reactor with temperature zones
US5296385A (en) * 1991-12-31 1994-03-22 Texas Instruments Incorporated Conditioning of semiconductor wafers for uniform and repeatable rapid thermal processing
JPH0811718B2 (en) * 1992-02-27 1996-02-07 大同ほくさん株式会社 Gas source molecular beam epitaxy system
JP3230836B2 (en) * 1992-04-09 2001-11-19 東京エレクトロン株式会社 Heat treatment equipment
US5268989A (en) * 1992-04-16 1993-12-07 Texas Instruments Incorporated Multi zone illuminator with embeded process control sensors and light interference elimination circuit
JP3164248B2 (en) * 1992-06-11 2001-05-08 東京エレクトロン株式会社 Heat treatment equipment
JP2766433B2 (en) * 1992-07-23 1998-06-18 株式会社東芝 Semiconductor vapor deposition equipment
KR940004732A (en) * 1992-08-07 1994-03-15 가나이 쯔또무 Pattern formation method and thin film formation method used for pattern formation
US5589224A (en) * 1992-09-30 1996-12-31 Applied Materials, Inc. Apparatus for full wafer deposition
US5271963A (en) * 1992-11-16 1993-12-21 Materials Research Corporation Elimination of low temperature ammonia salt in TiCl4 NH3 CVD reaction
US5444217A (en) * 1993-01-21 1995-08-22 Moore Epitaxial Inc. Rapid thermal processing apparatus for processing semiconductor wafers
JP3292540B2 (en) * 1993-03-03 2002-06-17 東京エレクトロン株式会社 Heat treatment equipment
JP3206613B2 (en) 1993-03-24 2001-09-10 関西日本電気株式会社 IC socket
US5305416A (en) * 1993-04-02 1994-04-19 At&T Bell Laboratories Semiconductor processing technique, including pyrometric measurement of radiantly heated bodies
US5624590A (en) * 1993-04-02 1997-04-29 Lucent Technologies, Inc. Semiconductor processing technique, including pyrometric measurement of radiantly heated bodies and an apparatus for practicing this technique
JP3165938B2 (en) * 1993-06-24 2001-05-14 東京エレクトロン株式会社 Gas treatment equipment
US5676205A (en) * 1993-10-29 1997-10-14 Applied Materials, Inc. Quasi-infinite heat source/sink
JP3235325B2 (en) 1994-02-22 2001-12-04 株式会社明電舎 Product inspection equipment by image processing
US5440132A (en) * 1994-03-30 1995-08-08 Texas Instruments Incorporated Systems and methods for controlling the temperature and uniformity of a wafer during a SIMOX implantation process
US5518593A (en) * 1994-04-29 1996-05-21 Applied Komatsu Technology, Inc. Shield configuration for vacuum chamber
JP2884556B2 (en) * 1994-06-10 1999-04-19 信越石英株式会社 Single wafer processing equipment
TW295677B (en) * 1994-08-19 1997-01-11 Tokyo Electron Co Ltd
US5680502A (en) * 1995-04-03 1997-10-21 Varian Associates, Inc. Thin film heat treatment apparatus with conductively heated table and surrounding radiation shield
JPH08302474A (en) * 1995-04-28 1996-11-19 Anelva Corp Heater for cvd apparatus
JP3983831B2 (en) * 1995-05-30 2007-09-26 シグマメルテック株式会社 Substrate baking apparatus and substrate baking method
US5651827A (en) * 1996-01-11 1997-07-29 Heraeus Quarzglas Gmbh Single-wafer heat-treatment apparatus and method of manufacturing reactor vessel used for same
US5891251A (en) * 1996-08-07 1999-04-06 Macleish; Joseph H. CVD reactor having heated process chamber within isolation chamber
US5653808A (en) * 1996-08-07 1997-08-05 Macleish; Joseph H. Gas injection system for CVD reactors

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0134716A1 (en) * 1983-08-29 1985-03-20 Varian Associates, Inc. Process for high temperature drive-in diffusion of dopants into semiconductor wafers
US4914276A (en) * 1988-05-12 1990-04-03 Princeton Scientific Enterprises, Inc. Efficient high temperature radiant furnace
US5429498A (en) * 1991-12-13 1995-07-04 Tokyo Electron Sagami Kabushiki Kaisha Heat treatment method and apparatus thereof
WO1993026038A1 (en) * 1992-06-15 1993-12-23 Materials Research Corporation Semiconductor wafer processing method and apparatus with heat and gas flow control
US5343012A (en) * 1992-10-06 1994-08-30 Hardy Walter N Differentially pumped temperature controller for low pressure thin film fabrication process

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