WO1997004478A3 - Plasma treatment apparatus for large area substrates - Google Patents

Plasma treatment apparatus for large area substrates Download PDF

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Publication number
WO1997004478A3
WO1997004478A3 PCT/US1996/011213 US9611213W WO9704478A3 WO 1997004478 A3 WO1997004478 A3 WO 1997004478A3 US 9611213 W US9611213 W US 9611213W WO 9704478 A3 WO9704478 A3 WO 9704478A3
Authority
WO
WIPO (PCT)
Prior art keywords
plasma
sources
large area
area substrates
treatment apparatus
Prior art date
Application number
PCT/US1996/011213
Other languages
French (fr)
Other versions
WO1997004478B1 (en
WO1997004478A2 (en
Inventor
Chung Chan
Original Assignee
Chung Chan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chung Chan filed Critical Chung Chan
Priority to EP96922642A priority Critical patent/EP0842307B1/en
Priority to JP50669797A priority patent/JP4128217B2/en
Priority to DE69625068T priority patent/DE69625068D1/en
Priority to CA002227233A priority patent/CA2227233C/en
Priority to AU63449/96A priority patent/AU718941B2/en
Publication of WO1997004478A2 publication Critical patent/WO1997004478A2/en
Publication of WO1997004478A3 publication Critical patent/WO1997004478A3/en
Publication of WO1997004478B1 publication Critical patent/WO1997004478B1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge

Abstract

A plasma system (10) for processing large area substrates. In one embodiment the system includes a plurality of radiofrequency (rf) plasma sources (40) removably attached to the rf transparent windows (26) of a processing chamber (14). The number and distribution of sources is varied to provide the size and uniformity of the plasma field required to treat the substrate. A plurality of plasma probes (74), such as Langmuir probes, Faraday cups and optical sensor are positioned within the chamber and in electrical communication with the plasma sources adjust the rf field produced by the individual sources to maintain the desired degree of field uniformity.
PCT/US1996/011213 1995-07-19 1996-07-02 Plasma treatment apparatus for large area substrates WO1997004478A2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
EP96922642A EP0842307B1 (en) 1995-07-19 1996-07-02 System for the plasma treatment of large area substrates
JP50669797A JP4128217B2 (en) 1995-07-19 1996-07-02 System for plasma processing of large area substrates
DE69625068T DE69625068D1 (en) 1995-07-19 1996-07-02 SYSTEM FOR PLASMA TREATMENT OF LARGE AREA SUBSTRATES
CA002227233A CA2227233C (en) 1995-07-19 1996-07-02 Plasma treatment apparatus for large area substrates
AU63449/96A AU718941B2 (en) 1995-07-19 1996-07-02 System for the plasma treatment of large area substrates

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/503,973 1995-07-19
US08/503,973 US5653811A (en) 1995-07-19 1995-07-19 System for the plasma treatment of large area substrates

Publications (3)

Publication Number Publication Date
WO1997004478A2 WO1997004478A2 (en) 1997-02-06
WO1997004478A3 true WO1997004478A3 (en) 1997-03-20
WO1997004478B1 WO1997004478B1 (en) 1997-05-15

Family

ID=24004315

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1996/011213 WO1997004478A2 (en) 1995-07-19 1996-07-02 Plasma treatment apparatus for large area substrates

Country Status (9)

Country Link
US (3) US5653811A (en)
EP (1) EP0842307B1 (en)
JP (1) JP4128217B2 (en)
KR (1) KR19990029069A (en)
CN (1) CN1192788A (en)
AU (1) AU718941B2 (en)
CA (1) CA2227233C (en)
DE (1) DE69625068D1 (en)
WO (1) WO1997004478A2 (en)

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