WO1997015066A3 - Verfahren zur herstellung eines coriolis-drehratensensors - Google Patents

Verfahren zur herstellung eines coriolis-drehratensensors Download PDF

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Publication number
WO1997015066A3
WO1997015066A3 PCT/DE1996/001969 DE9601969W WO9715066A3 WO 1997015066 A3 WO1997015066 A3 WO 1997015066A3 DE 9601969 W DE9601969 W DE 9601969W WO 9715066 A3 WO9715066 A3 WO 9715066A3
Authority
WO
WIPO (PCT)
Prior art keywords
producing
speed
supporting masses
coriolis sensor
rotation
Prior art date
Application number
PCT/DE1996/001969
Other languages
English (en)
French (fr)
Other versions
WO1997015066A2 (de
Inventor
Horst Muenzel
Franz Laermer
Michael Offenberg
Andrea Schilp
Markus Lutz
Original Assignee
Bosch Gmbh Robert
Horst Muenzel
Franz Laermer
Michael Offenberg
Andrea Schilp
Markus Lutz
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bosch Gmbh Robert, Horst Muenzel, Franz Laermer, Michael Offenberg, Andrea Schilp, Markus Lutz filed Critical Bosch Gmbh Robert
Priority to EP96945505A priority Critical patent/EP0856143B1/de
Priority to JP9515420A priority patent/JPH11513844A/ja
Priority to DE59605992T priority patent/DE59605992D1/de
Priority to KR1019980702860A priority patent/KR19990066938A/ko
Priority to US09/051,878 priority patent/US6214243B1/en
Publication of WO1997015066A2 publication Critical patent/WO1997015066A2/de
Publication of WO1997015066A3 publication Critical patent/WO1997015066A3/de

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
    • G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
    • G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
    • G01C19/5719—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using planar vibrating masses driven in a translation vibration along an axis
    • G01C19/5733—Structural details or topology
    • G01C19/574—Structural details or topology the devices having two sensing masses in anti-phase motion
    • G01C19/5747—Structural details or topology the devices having two sensing masses in anti-phase motion each sensing mass being connected to a driving mass, e.g. driving frames
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0035—Constitution or structural means for controlling the movement of the flexible or deformable elements
    • B81B3/0051—For defining the movement, i.e. structures that guide or limit the movement of an element
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
    • G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
    • G01C19/5719—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using planar vibrating masses driven in a translation vibration along an axis
    • G01C19/5769—Manufacturing; Mounting; Housings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/02—Sensors
    • B81B2201/0228—Inertial sensors
    • B81B2201/0242—Gyroscopes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/05—Type of movement
    • B81B2203/058—Rotation out of a plane parallel to the substrate

Abstract

Die Erfindung betrifft ein Verfahren zur Herstellung eines Coriolis-Drehratensensors, nit federnd an einem Substrat aufgehängten, schwingenden Trägermassen sowie Antriebsmitteln zur Anregung einer planaren Schwingung der Trägermassen und Auswertemitteln zum Erfassen einer Coriolis-Beschleunigung. Es ist vorgesehen, daß die schwingenden Trägermassen (12, 14), sowie die Antriebsmittel (20) und integrierte Anschläge (36, 38) in einem gemeinsamen Arbeitsgang mittels Plasmaätzens aus einem Silicon-on-Insulater (SOI)-Wafer strukturiert werden.
PCT/DE1996/001969 1995-10-20 1996-10-17 Verfahren zur herstellung eines coriolis-drehratensensors WO1997015066A2 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
EP96945505A EP0856143B1 (de) 1995-10-20 1996-10-17 Verfahren zur herstellung eines coriolis-drehratensensors
JP9515420A JPH11513844A (ja) 1995-10-20 1996-10-17 コリオリ回転速度センサの製造方法
DE59605992T DE59605992D1 (de) 1995-10-20 1996-10-17 Verfahren zur herstellung eines coriolis-drehratensensors
KR1019980702860A KR19990066938A (ko) 1995-10-20 1996-10-17 코리올리 회전속도 센서의 제조 방법
US09/051,878 US6214243B1 (en) 1995-10-20 1996-10-17 Process for producing a speed of rotation coriolis sensor

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19539049.0 1995-10-20
DE19539049A DE19539049A1 (de) 1995-10-20 1995-10-20 Verfahren zur Herstellung eines Coriolis-Drehratensensors

Publications (2)

Publication Number Publication Date
WO1997015066A2 WO1997015066A2 (de) 1997-04-24
WO1997015066A3 true WO1997015066A3 (de) 1997-06-12

Family

ID=7775319

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE1996/001969 WO1997015066A2 (de) 1995-10-20 1996-10-17 Verfahren zur herstellung eines coriolis-drehratensensors

Country Status (6)

Country Link
US (1) US6214243B1 (de)
EP (1) EP0856143B1 (de)
JP (1) JPH11513844A (de)
KR (1) KR19990066938A (de)
DE (2) DE19539049A1 (de)
WO (1) WO1997015066A2 (de)

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DE19652002C2 (de) * 1995-12-15 2003-03-27 Flowtec Ag Schwingungs-Meßgerät
US5945599A (en) * 1996-12-13 1999-08-31 Kabushiki Kaisha Toyota Chuo Kenkyusho Resonance type angular velocity sensor
US6122961A (en) 1997-09-02 2000-09-26 Analog Devices, Inc. Micromachined gyros
DE19844686A1 (de) 1998-09-29 2000-04-06 Fraunhofer Ges Forschung Mikromechanischer Drehratensensor und Verfahren zur Herstellung
DE19847305B4 (de) * 1998-10-14 2011-02-03 Robert Bosch Gmbh Herstellungsverfahren für eine mikromechanische Vorrichtung
DE19847455A1 (de) * 1998-10-15 2000-04-27 Bosch Gmbh Robert Verfahren zur Bearbeitung von Silizium mittels Ätzprozessen
DE19939318A1 (de) 1999-08-19 2001-02-22 Bosch Gmbh Robert Verfahren zur Herstellung eines mikromechanischen Bauelements
DE19949605A1 (de) * 1999-10-15 2001-04-19 Bosch Gmbh Robert Beschleunigungssensor
KR100374812B1 (ko) * 1999-11-04 2003-03-03 삼성전자주식회사 두개의 공진판을 가진 마이크로 자이로스코프
US6742389B2 (en) 2001-01-24 2004-06-01 The Regents Of The University Of Michigan Filter-based method and system for measuring angular speed of an object
US6928872B2 (en) 2001-04-27 2005-08-16 Stmicroelectronics S.R.L. Integrated gyroscope of semiconductor material with at least one sensitive axis in the sensor plane
EP1253399B1 (de) 2001-04-27 2006-06-21 STMicroelectronics S.r.l. Aus Halbleitermaterial hergestellter integrierter Kreisel
FR2834055B1 (fr) * 2001-12-20 2004-02-13 Thales Sa Capteur inertiel micro-usine pour la mesure de mouvements de rotation
DE10235371A1 (de) * 2002-08-02 2004-02-12 Robert Bosch Gmbh Verfahren zur Herstellung einer mikromechanischen Vorrichtung, insbesondere einer mikromechanischen Schwingspiegelvorrichtung
US6865944B2 (en) * 2002-12-16 2005-03-15 Honeywell International Inc. Methods and systems for decelerating proof mass movements within MEMS structures
US7514283B2 (en) * 2003-03-20 2009-04-07 Robert Bosch Gmbh Method of fabricating electromechanical device having a controlled atmosphere
JP2004294332A (ja) * 2003-03-27 2004-10-21 Denso Corp 半導体力学量センサ
US8912174B2 (en) * 2003-04-16 2014-12-16 Mylan Pharmaceuticals Inc. Formulations and methods for treating rhinosinusitis
US6936491B2 (en) 2003-06-04 2005-08-30 Robert Bosch Gmbh Method of fabricating microelectromechanical systems and devices having trench isolated contacts
US7075160B2 (en) * 2003-06-04 2006-07-11 Robert Bosch Gmbh Microelectromechanical systems and devices having thin film encapsulated mechanical structures
US6952041B2 (en) * 2003-07-25 2005-10-04 Robert Bosch Gmbh Anchors for microelectromechanical systems having an SOI substrate, and method of fabricating same
FR2860865B1 (fr) * 2003-10-10 2006-01-20 Thales Sa Gyrometre micromecanique infertiel a diapason
US7068125B2 (en) * 2004-03-04 2006-06-27 Robert Bosch Gmbh Temperature controlled MEMS resonator and method for controlling resonator frequency
JP2005283393A (ja) * 2004-03-30 2005-10-13 Fujitsu Media Device Kk 慣性センサ
US7102467B2 (en) * 2004-04-28 2006-09-05 Robert Bosch Gmbh Method for adjusting the frequency of a MEMS resonator
EP1617178B1 (de) * 2004-07-12 2017-04-12 STMicroelectronics Srl Mikroelektromechanische Struktur mit elektrisch isolierten Gebieten und Verfahren zu ihrer Herstellung
KR100652952B1 (ko) * 2004-07-19 2006-12-06 삼성전자주식회사 커플링 스프링을 구비한 멤스 자이로스코프
US7232701B2 (en) * 2005-01-04 2007-06-19 Freescale Semiconductor, Inc. Microelectromechanical (MEM) device with a protective cap that functions as a motion stop
US7140250B2 (en) * 2005-02-18 2006-11-28 Honeywell International Inc. MEMS teeter-totter accelerometer having reduced non-linearty
US20070170528A1 (en) * 2006-01-20 2007-07-26 Aaron Partridge Wafer encapsulated microelectromechanical structure and method of manufacturing same
KR100868759B1 (ko) * 2007-01-25 2008-11-17 삼성전기주식회사 멤스 디바이스 및 이의 제조방법
JP2009074979A (ja) * 2007-09-21 2009-04-09 Toshiba Corp 半導体装置
US8011247B2 (en) * 2008-06-26 2011-09-06 Honeywell International Inc. Multistage proof-mass movement deceleration within MEMS structures
DE102009000429B4 (de) * 2009-01-27 2021-01-28 Robert Bosch Gmbh Mikromechanische Vorrichtung und Herstellungsverfahren hierfür
JP2014076527A (ja) * 2012-10-12 2014-05-01 Seiko Epson Corp Ｍｅｍｓセンサー、および電子機器、ロボット、移動体
JP6195051B2 (ja) * 2013-03-04 2017-09-13 セイコーエプソン株式会社 ジャイロセンサー、電子機器、及び移動体
JP6175868B2 (ja) * 2013-04-03 2017-08-09 株式会社豊田中央研究所 Ｍｅｍｓ装置
WO2018135211A1 (ja) 2017-01-17 2018-07-26 パナソニックＩｐマネジメント株式会社 センサ
DE102020205616A1 (de) 2020-05-04 2021-11-04 Robert Bosch Gesellschaft mit beschränkter Haftung Mikromechanische Sensoranordnung, Verfahren zur Verwendung einer mikromechanischen Sensoranordnung

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Publication number Priority date Publication date Assignee Title
EP0618450A1 (de) * 1993-03-30 1994-10-05 Siemens Aktiengesellschaft Beschleunigungssensor
EP0664438A1 (de) * 1994-01-25 1995-07-26 The Charles Stark Draper Laboratory, Inc. Mikromechanischer Stimmgabelumdrehungsmesser mit kammförmigen Antriebselemente

Also Published As

Publication number Publication date
WO1997015066A2 (de) 1997-04-24
DE59605992D1 (de) 2000-11-16
EP0856143A2 (de) 1998-08-05
KR19990066938A (ko) 1999-08-16
DE19539049A1 (de) 1997-04-24
US6214243B1 (en) 2001-04-10
EP0856143B1 (de) 2000-10-11
JPH11513844A (ja) 1999-11-24

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