WO1997028555A1 - Elektromagnetisches hochfrequenz- oder mikrowellengerät - Google Patents
Elektromagnetisches hochfrequenz- oder mikrowellengerät Download PDFInfo
- Publication number
- WO1997028555A1 WO1997028555A1 PCT/DE1997/000185 DE9700185W WO9728555A1 WO 1997028555 A1 WO1997028555 A1 WO 1997028555A1 DE 9700185 W DE9700185 W DE 9700185W WO 9728555 A1 WO9728555 A1 WO 9728555A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- microwave device
- chamber
- antenna elements
- transmission
- frequency
- Prior art date
Links
- 239000004020 conductor Substances 0.000 claims abstract description 25
- 230000005540 biological transmission Effects 0.000 claims description 67
- 230000008878 coupling Effects 0.000 claims description 20
- 238000010168 coupling process Methods 0.000 claims description 20
- 238000005859 coupling reaction Methods 0.000 claims description 20
- 238000010893 electron trap Methods 0.000 claims description 3
- 238000005192 partition Methods 0.000 claims description 3
- 230000005284 excitation Effects 0.000 description 9
- 238000007789 sealing Methods 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32211—Means for coupling power to the plasma
- H01J37/3222—Antennas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32743—Means for moving the material to be treated for introducing the material into processing chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32211—Means for coupling power to the plasma
- H01J37/32247—Resonators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32266—Means for controlling power transmitted to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
- H01J37/3211—Antennas, e.g. particular shapes of coils
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9527241A JP2000504146A (ja) | 1996-02-02 | 1997-01-31 | 電磁式の高周波又はマイクロ波装置 |
DE59705185T DE59705185D1 (de) | 1996-02-02 | 1997-01-31 | Elektromagnetisches hochfrequenz- oder mikrowellengerät |
US09/117,428 US6114811A (en) | 1996-02-02 | 1997-01-31 | Electromagnetic high-frequency apparatus with a transmission wall having antennas |
EP97908130A EP0878020B1 (de) | 1996-02-02 | 1997-01-31 | Elektromagnetisches hochfrequenz- oder mikrowellengerät |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19603685.2 | 1996-02-02 | ||
DE19603685A DE19603685C1 (de) | 1996-02-02 | 1996-02-02 | Mikrowellengerät |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1997028555A1 true WO1997028555A1 (de) | 1997-08-07 |
Family
ID=7784299
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/DE1997/000185 WO1997028555A1 (de) | 1996-02-02 | 1997-01-31 | Elektromagnetisches hochfrequenz- oder mikrowellengerät |
Country Status (7)
Country | Link |
---|---|
US (1) | US6114811A (de) |
EP (1) | EP0878020B1 (de) |
JP (1) | JP2000504146A (de) |
KR (1) | KR19990082209A (de) |
CA (1) | CA2244956A1 (de) |
DE (2) | DE19603685C1 (de) |
WO (1) | WO1997028555A1 (de) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6502328B1 (en) * | 2000-05-17 | 2003-01-07 | Arrow Pneumatics, Inc. | Seal for holding a microwave antenna at a pressurized tank of a gas drying system and method |
FR2840451B1 (fr) * | 2002-06-04 | 2004-08-13 | Centre Nat Rech Scient | Dispositif de production d'une nappe de plasma |
TW200415726A (en) * | 2002-12-05 | 2004-08-16 | Adv Lcd Tech Dev Ct Co Ltd | Plasma processing apparatus and plasma processing method |
DE10341239B4 (de) * | 2003-09-08 | 2006-05-24 | Roth & Rau Ag | ECR-Plasmaquelle mit linearer Plasmaaustrittsöffnung |
JP5213150B2 (ja) * | 2005-08-12 | 2013-06-19 | 国立大学法人東北大学 | プラズマ処理装置及びプラズマ処理装置を用いた製品の製造方法 |
EP2135098A4 (de) * | 2007-04-11 | 2016-11-02 | Ericsson Telefon Ab L M | Anordnung und verfahren zur simulation eines funkzugangsnetzes |
DE102007035359B4 (de) * | 2007-07-27 | 2012-09-20 | Rational Ag | Kopplungsvorrichtung zur Mikrowellenübertragung in einem Nahrungsmittelbehandlungsgerät |
JP5011139B2 (ja) * | 2008-01-28 | 2012-08-29 | 株式会社アルバック | 真空装置 |
US8800483B2 (en) | 2009-05-08 | 2014-08-12 | Peter F. Vandermeulen | Methods and systems for plasma deposition and treatment |
US9111727B2 (en) * | 2011-09-30 | 2015-08-18 | Tokyo Electron Limited | Plasma tuning rods in microwave resonator plasma sources |
US9396955B2 (en) * | 2011-09-30 | 2016-07-19 | Tokyo Electron Limited | Plasma tuning rods in microwave resonator processing systems |
US9728416B2 (en) | 2011-09-30 | 2017-08-08 | Tokyo Electron Limited | Plasma tuning rods in microwave resonator plasma sources |
US20130084706A1 (en) * | 2011-09-30 | 2013-04-04 | Tokyo Electron Limited | Plasma-Tuning Rods in Surface Wave Antenna (SWA) Sources |
US8808496B2 (en) * | 2011-09-30 | 2014-08-19 | Tokyo Electron Limited | Plasma tuning rods in microwave processing systems |
KR101730755B1 (ko) * | 2013-03-15 | 2017-04-26 | 도쿄엘렉트론가부시키가이샤 | 마이크로파 공진기 플라즈마 소스에서의 플라즈마 튜닝 로드 |
US20140262040A1 (en) * | 2013-03-15 | 2014-09-18 | Tokyo Electron Limited | Method and system using plasma tuning rods for plasma processing |
WO2015069905A1 (en) * | 2013-11-06 | 2015-05-14 | Tokyo Electron Limited | Multi-cell resonator microwave surface-wave plasma apparatus |
US9531167B2 (en) * | 2014-06-02 | 2016-12-27 | Nxp Usa, Inc. | Device and method for connecting an RF generator to a coaxial conductor |
US9518555B2 (en) | 2014-12-04 | 2016-12-13 | Freescale Semiconductor, Inc. | Radiation devices |
US10861667B2 (en) | 2017-06-27 | 2020-12-08 | Peter F. Vandermeulen | Methods and systems for plasma deposition and treatment |
WO2019005288A1 (en) | 2017-06-27 | 2019-01-03 | Vandermeulen Peter F | METHODS AND SYSTEMS FOR PLASMA DEPOSITION AND TREATMENT |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0459177A2 (de) * | 1990-06-01 | 1991-12-04 | International Business Machines Corporation | Festkörper-mikrowellenerzeugendes Material matrixförmig gestaltet, von welchem jedes Element phasensteuerbar ist und Plasmabearbeitungssystem |
EP0501466A1 (de) * | 1991-03-01 | 1992-09-02 | Röhm Gmbh | Niederdruck-Plasmagenerator |
JPH06104188A (ja) * | 1992-09-22 | 1994-04-15 | Hitachi Ltd | マイクロ波プラズマ処理装置 |
DE4431785A1 (de) * | 1994-04-11 | 1995-10-12 | Wu Jeng Ming | Plasmagerät |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3923390A1 (de) * | 1988-07-14 | 1990-01-25 | Canon Kk | Vorrichtung zur bildung eines grossflaechigen aufgedampften films unter verwendung von wenigstens zwei getrennt gebildeten aktivierten gasen |
JPH05144785A (ja) * | 1991-11-22 | 1993-06-11 | Mitsubishi Electric Corp | プラズマ処理装置及び方法 |
US5700326A (en) * | 1992-02-27 | 1997-12-23 | Canon Kabushiki Kaisha | Microwave plasma processing apparatus |
FR2711035B1 (fr) * | 1993-10-04 | 1995-12-29 | Plasmion | Dispositif et procédé pour former un plasma par application de micro-ondes. |
-
1996
- 1996-02-02 DE DE19603685A patent/DE19603685C1/de not_active Expired - Fee Related
-
1997
- 1997-01-31 DE DE59705185T patent/DE59705185D1/de not_active Expired - Lifetime
- 1997-01-31 JP JP9527241A patent/JP2000504146A/ja active Pending
- 1997-01-31 CA CA002244956A patent/CA2244956A1/en not_active Abandoned
- 1997-01-31 WO PCT/DE1997/000185 patent/WO1997028555A1/de not_active Application Discontinuation
- 1997-01-31 US US09/117,428 patent/US6114811A/en not_active Expired - Fee Related
- 1997-01-31 KR KR1019980705937A patent/KR19990082209A/ko not_active Application Discontinuation
- 1997-01-31 EP EP97908130A patent/EP0878020B1/de not_active Expired - Lifetime
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0459177A2 (de) * | 1990-06-01 | 1991-12-04 | International Business Machines Corporation | Festkörper-mikrowellenerzeugendes Material matrixförmig gestaltet, von welchem jedes Element phasensteuerbar ist und Plasmabearbeitungssystem |
EP0501466A1 (de) * | 1991-03-01 | 1992-09-02 | Röhm Gmbh | Niederdruck-Plasmagenerator |
JPH06104188A (ja) * | 1992-09-22 | 1994-04-15 | Hitachi Ltd | マイクロ波プラズマ処理装置 |
DE4431785A1 (de) * | 1994-04-11 | 1995-10-12 | Wu Jeng Ming | Plasmagerät |
Non-Patent Citations (1)
Title |
---|
PATENT ABSTRACTS OF JAPAN vol. 018, no. 372 (E - 1577) 13 July 1994 (1994-07-13) * |
Also Published As
Publication number | Publication date |
---|---|
DE19603685C1 (de) | 1997-08-21 |
DE59705185D1 (de) | 2001-12-06 |
KR19990082209A (ko) | 1999-11-25 |
EP0878020A1 (de) | 1998-11-18 |
CA2244956A1 (en) | 1997-08-07 |
US6114811A (en) | 2000-09-05 |
EP0878020B1 (de) | 2001-10-31 |
JP2000504146A (ja) | 2000-04-04 |
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