WO1998005066A3 - Methods and apparatus for the in-process detection and measurement of thin film layers - Google Patents
Methods and apparatus for the in-process detection and measurement of thin film layers Download PDFInfo
- Publication number
- WO1998005066A3 WO1998005066A3 PCT/US1997/013373 US9713373W WO9805066A3 WO 1998005066 A3 WO1998005066 A3 WO 1998005066A3 US 9713373 W US9713373 W US 9713373W WO 9805066 A3 WO9805066 A3 WO 9805066A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- fiber optic
- optic cable
- wafer
- reflected
- probe
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
- B24B37/013—Devices or means for detecting lapping completion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
- H01L22/26—Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
Abstract
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US68771096A | 1996-07-26 | 1996-07-26 | |
US08/687,710 | 1996-07-26 | ||
US08/798,803 US5872633A (en) | 1996-07-26 | 1997-02-12 | Methods and apparatus for detecting removal of thin film layers during planarization |
US08/798,803 | 1997-07-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO1998005066A2 WO1998005066A2 (en) | 1998-02-05 |
WO1998005066A3 true WO1998005066A3 (en) | 1998-03-05 |
Family
ID=24761512
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US1997/013373 WO1998005066A2 (en) | 1996-07-26 | 1997-07-23 | Methods and apparatus for the in-process detection and measurement of thin film layers |
Country Status (2)
Country | Link |
---|---|
TW (1) | TW386276B (en) |
WO (1) | WO1998005066A2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8694145B2 (en) | 2001-06-19 | 2014-04-08 | Applied Materials, Inc. | Feedback control of a chemical mechanical polishing device providing manipulation of removal rate profiles |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6106662A (en) * | 1998-06-08 | 2000-08-22 | Speedfam-Ipec Corporation | Method and apparatus for endpoint detection for chemical mechanical polishing |
US6352466B1 (en) | 1998-08-31 | 2002-03-05 | Micron Technology, Inc. | Method and apparatus for wireless transfer of chemical-mechanical planarization measurements |
US6714300B1 (en) * | 1998-09-28 | 2004-03-30 | Therma-Wave, Inc. | Optical inspection equipment for semiconductor wafers with precleaning |
US6628397B1 (en) | 1999-09-15 | 2003-09-30 | Kla-Tencor | Apparatus and methods for performing self-clearing optical measurements |
US6671051B1 (en) | 1999-09-15 | 2003-12-30 | Kla-Tencor | Apparatus and methods for detecting killer particles during chemical mechanical polishing |
US6861619B1 (en) | 2000-02-07 | 2005-03-01 | Therma-Wave, Inc. | Method and apparatus for preparing semiconductor wafers for measurement |
US6261853B1 (en) | 2000-02-07 | 2001-07-17 | Therma-Wave, Inc. | Method and apparatus for preparing semiconductor wafers for measurement |
US6491569B2 (en) | 2001-04-19 | 2002-12-10 | Speedfam-Ipec Corporation | Method and apparatus for using optical reflection data to obtain a continuous predictive signal during CMP |
US6676482B2 (en) | 2001-04-20 | 2004-01-13 | Speedfam-Ipec Corporation | Learning method and apparatus for predictive determination of endpoint during chemical mechanical planarization using sparse sampling |
US6514775B2 (en) | 2001-06-29 | 2003-02-04 | Kla-Tencor Technologies Corporation | In-situ end point detection for semiconductor wafer polishing |
KR100434189B1 (en) | 2002-03-21 | 2004-06-04 | 삼성전자주식회사 | Apparatus and method for chemically and mechanically polishing semiconductor wafer |
JP2005203729A (en) | 2003-12-19 | 2005-07-28 | Ebara Corp | Substrate polishing apparatus |
US20060079007A1 (en) | 2004-10-08 | 2006-04-13 | Applied Materials, Inc. | System, method, and medium for an endpoint detection scheme for copper low-dielectric damascene structures for improved dielectric and copper loss |
US8917398B2 (en) | 2011-08-28 | 2014-12-23 | G & D Innovative Analysis Ltd. | Method and apparatus for supervision of optical material production |
US9573243B2 (en) | 2014-11-04 | 2017-02-21 | Headway Technologies, Inc. | Method for adaptive feedback controlled polishing |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5240552A (en) * | 1991-12-11 | 1993-08-31 | Micron Technology, Inc. | Chemical mechanical planarization (CMP) of a semiconductor wafer using acoustical waves for in-situ end point detection |
EP0663265A1 (en) * | 1993-12-22 | 1995-07-19 | International Business Machines Corporation | In-situ endpoint detection and process monitoring method and apparatus for chemical-mechanical polishing |
US5486129A (en) * | 1993-08-25 | 1996-01-23 | Micron Technology, Inc. | System and method for real-time control of semiconductor a wafer polishing, and a polishing head |
WO1996016436A1 (en) * | 1994-11-18 | 1996-05-30 | Advanced Micro Devices, Inc. | Method of making a chemical-mechanical polishing slurry and the polishing slurry |
EP0718595A2 (en) * | 1994-12-21 | 1996-06-26 | Hughes Aircraft Company | Automatic rejection of diffraction effects in thin film metrology |
EP0738561A1 (en) * | 1995-03-28 | 1996-10-23 | Applied Materials, Inc. | Apparatus and method for in-situ endpoint detection and monitoring for chemical mechanical polishing operations |
US5609511A (en) * | 1994-04-14 | 1997-03-11 | Hitachi, Ltd. | Polishing method |
-
1997
- 1997-07-23 WO PCT/US1997/013373 patent/WO1998005066A2/en active Application Filing
- 1997-07-25 TW TW86110571A patent/TW386276B/en not_active IP Right Cessation
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5240552A (en) * | 1991-12-11 | 1993-08-31 | Micron Technology, Inc. | Chemical mechanical planarization (CMP) of a semiconductor wafer using acoustical waves for in-situ end point detection |
US5486129A (en) * | 1993-08-25 | 1996-01-23 | Micron Technology, Inc. | System and method for real-time control of semiconductor a wafer polishing, and a polishing head |
EP0663265A1 (en) * | 1993-12-22 | 1995-07-19 | International Business Machines Corporation | In-situ endpoint detection and process monitoring method and apparatus for chemical-mechanical polishing |
US5609511A (en) * | 1994-04-14 | 1997-03-11 | Hitachi, Ltd. | Polishing method |
WO1996016436A1 (en) * | 1994-11-18 | 1996-05-30 | Advanced Micro Devices, Inc. | Method of making a chemical-mechanical polishing slurry and the polishing slurry |
EP0718595A2 (en) * | 1994-12-21 | 1996-06-26 | Hughes Aircraft Company | Automatic rejection of diffraction effects in thin film metrology |
EP0738561A1 (en) * | 1995-03-28 | 1996-10-23 | Applied Materials, Inc. | Apparatus and method for in-situ endpoint detection and monitoring for chemical mechanical polishing operations |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8694145B2 (en) | 2001-06-19 | 2014-04-08 | Applied Materials, Inc. | Feedback control of a chemical mechanical polishing device providing manipulation of removal rate profiles |
Also Published As
Publication number | Publication date |
---|---|
WO1998005066A2 (en) | 1998-02-05 |
TW386276B (en) | 2000-04-01 |
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