WO1998024296A3 - Multilaminate piezoelectric high voltage stack - Google Patents
Multilaminate piezoelectric high voltage stack Download PDFInfo
- Publication number
- WO1998024296A3 WO1998024296A3 PCT/US1997/021302 US9721302W WO9824296A3 WO 1998024296 A3 WO1998024296 A3 WO 1998024296A3 US 9721302 W US9721302 W US 9721302W WO 9824296 A3 WO9824296 A3 WO 9824296A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- piezoelectric
- stack
- layers
- cavity
- shock
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/50—Piezoelectric or electrostrictive devices having a stacked or multilayer structure
- H10N30/501—Piezoelectric or electrostrictive devices having a stacked or multilayer structure with non-rectangular cross-section in stacking direction, e.g. polygonal, trapezoidal
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/05—Manufacture of multilayered piezoelectric or electrostrictive devices, or parts thereof, e.g. by stacking piezoelectric bodies and electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/30—Piezoelectric or electrostrictive devices with mechanical input and electrical output, e.g. functioning as generators or sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/85—Piezoelectric or electrostrictive active materials
- H10N30/853—Ceramic compositions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/85—Piezoelectric or electrostrictive active materials
- H10N30/853—Ceramic compositions
- H10N30/8548—Lead based oxides
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/87—Electrodes or interconnections, e.g. leads or terminals
- H10N30/871—Single-layered electrodes of multilayer piezoelectric or electrostrictive devices, e.g. internal electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/87—Electrodes or interconnections, e.g. leads or terminals
- H10N30/877—Conductive materials
- H10N30/878—Conductive materials the principal material being non-metallic, e.g. oxide or carbon based
Abstract
A shock or strain driven multilaminate piezoelectric high voltage stack (10) and fabrication process. The nanostructure includes alternating layers of piezoelectric (12) and conductor materials (11) forming a cylinder or similarly shaped stack of piezoelectric layers (12). For accelerator application the piezoelectric layers (12) have a coaxial cavity (14). Very high voltages can be generated when the piezoelectric stack (10) is subjected to mechanical shock. As shock propagates through piezoelectric stack (10) each layer of piezoelectric material (12) generates a voltage potential between its two adjacent conductor layers (11). For accelerator applications, charged particles at one end (15) of cavity in stack (10) are accelerated through cavity (14) to target (16). The piezoelectric stack (10) can be fabricated with discrete layers of piezoelectric (12) and conductor materials (11) stacked and mechanically bound within packaging (17). Alternatively, integrated solid state piezoelectric stacks (10) can be fabricated by successive masked deposition of piezoelectric (12) and conductor materials (11). Deposition of materials can be by physical or chemical vapor deposition, including RF sputtering and similar techniques.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US3146596P | 1996-11-20 | 1996-11-20 | |
US60/031,465 | 1996-11-20 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO1998024296A2 WO1998024296A2 (en) | 1998-06-11 |
WO1998024296A3 true WO1998024296A3 (en) | 1998-10-01 |
Family
ID=21859601
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US1997/021302 WO1998024296A2 (en) | 1996-11-20 | 1997-11-20 | Multilaminate piezoelectric high voltage stack |
Country Status (1)
Country | Link |
---|---|
WO (1) | WO1998024296A2 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6478412B1 (en) | 1999-01-22 | 2002-11-12 | Kansai Research Institute | Piezoelectric thin film device, its production method, and ink-jet recording head |
EP2224507B1 (en) * | 2007-11-27 | 2014-10-08 | Kyocera Corporation | Multi-layer piezoelectric element, method for manufacturing the same |
CN102522493B (en) * | 2011-12-07 | 2013-10-02 | 中国科学院微电子研究所 | Laminated structure of piezoelectric nanowire and manufacturing method thereof |
CN113140668A (en) * | 2020-01-19 | 2021-07-20 | 北京小米移动软件有限公司 | Piezoelectric assembly, manufacturing method, screen component and mobile terminal |
Citations (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2479926A (en) * | 1947-10-11 | 1949-08-23 | Brush Dev Co | Electrotransducer and method of making same |
US3111741A (en) * | 1958-05-23 | 1963-11-26 | Corning Glass Works | Solid delay line improvements |
US3281612A (en) * | 1962-09-12 | 1966-10-25 | List Hans | Piezoelectric device, particularly a force measuring instrument and the process of manufacturing same |
US3390287A (en) * | 1964-12-10 | 1968-06-25 | Kistler Instrumente Ag | Piezo-electric building units |
US3824352A (en) * | 1973-04-30 | 1974-07-16 | Zenith Radio Corp | Stacked piezoelectric transducer acting as quarter-wave resonator for recording video information |
US4570098A (en) * | 1983-06-20 | 1986-02-11 | Nippon Soken, Inc. | Temperature compensated stack of piezoelectric elements |
US4632856A (en) * | 1985-02-06 | 1986-12-30 | Marcus Michael A | Multilayer thin film electrical devices free of adhesive |
US4752712A (en) * | 1985-06-10 | 1988-06-21 | Nippon Soken, Inc. | Piezoelectric laminate stack |
US4812698A (en) * | 1986-09-29 | 1989-03-14 | Mitsubishi Chemical Industries Limited | Piezoelectric bending actuator |
US4835436A (en) * | 1988-03-21 | 1989-05-30 | Lew Hyok S | Piezoelectric impulse sensor |
US4978881A (en) * | 1988-07-20 | 1990-12-18 | Ngk Spark Plug Co., Ltd. | Piezoelectric actuator of lamination type |
US5036240A (en) * | 1988-07-18 | 1991-07-30 | Lew Hyok S | Impulse sensor with mechanical preamplification and noise cancellation |
US5163209A (en) * | 1989-04-26 | 1992-11-17 | Hitachi, Ltd. | Method of manufacturing a stack-type piezoelectric element |
US5191687A (en) * | 1990-09-28 | 1993-03-09 | Caterpillar Inc. | Process for making piezoelectric stacks |
US5196756A (en) * | 1988-07-15 | 1993-03-23 | Hitachi Ltd. | Stack-type piezoelectric element, process for producing the same, and stack-type piezoelectric device |
US5325012A (en) * | 1989-09-19 | 1994-06-28 | Hitachi, Ltd | Bonded type piezoelectric apparatus, method for manufacturing the same and bonded type piezoelectric element |
US5410208A (en) * | 1993-04-12 | 1995-04-25 | Acuson Corporation | Ultrasound transducers with reduced sidelobes and method for manufacture thereof |
US5568679A (en) * | 1993-12-20 | 1996-10-29 | Nec Corporation | Method of manufacturing laminated piezoelectric actuator having cavity |
US5631463A (en) * | 1992-09-01 | 1997-05-20 | Canon Kabushiki Kaisha | Displacement element, probe employing the element, and apparatus employing the probe |
-
1997
- 1997-11-20 WO PCT/US1997/021302 patent/WO1998024296A2/en active Application Filing
Patent Citations (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2479926A (en) * | 1947-10-11 | 1949-08-23 | Brush Dev Co | Electrotransducer and method of making same |
US3111741A (en) * | 1958-05-23 | 1963-11-26 | Corning Glass Works | Solid delay line improvements |
US3281612A (en) * | 1962-09-12 | 1966-10-25 | List Hans | Piezoelectric device, particularly a force measuring instrument and the process of manufacturing same |
US3390287A (en) * | 1964-12-10 | 1968-06-25 | Kistler Instrumente Ag | Piezo-electric building units |
US3824352A (en) * | 1973-04-30 | 1974-07-16 | Zenith Radio Corp | Stacked piezoelectric transducer acting as quarter-wave resonator for recording video information |
US4570098A (en) * | 1983-06-20 | 1986-02-11 | Nippon Soken, Inc. | Temperature compensated stack of piezoelectric elements |
US4632856A (en) * | 1985-02-06 | 1986-12-30 | Marcus Michael A | Multilayer thin film electrical devices free of adhesive |
US4752712A (en) * | 1985-06-10 | 1988-06-21 | Nippon Soken, Inc. | Piezoelectric laminate stack |
US4812698A (en) * | 1986-09-29 | 1989-03-14 | Mitsubishi Chemical Industries Limited | Piezoelectric bending actuator |
US4835436A (en) * | 1988-03-21 | 1989-05-30 | Lew Hyok S | Piezoelectric impulse sensor |
US5196756A (en) * | 1988-07-15 | 1993-03-23 | Hitachi Ltd. | Stack-type piezoelectric element, process for producing the same, and stack-type piezoelectric device |
US5036240A (en) * | 1988-07-18 | 1991-07-30 | Lew Hyok S | Impulse sensor with mechanical preamplification and noise cancellation |
US4978881A (en) * | 1988-07-20 | 1990-12-18 | Ngk Spark Plug Co., Ltd. | Piezoelectric actuator of lamination type |
US5163209A (en) * | 1989-04-26 | 1992-11-17 | Hitachi, Ltd. | Method of manufacturing a stack-type piezoelectric element |
US5325012A (en) * | 1989-09-19 | 1994-06-28 | Hitachi, Ltd | Bonded type piezoelectric apparatus, method for manufacturing the same and bonded type piezoelectric element |
US5191687A (en) * | 1990-09-28 | 1993-03-09 | Caterpillar Inc. | Process for making piezoelectric stacks |
US5631463A (en) * | 1992-09-01 | 1997-05-20 | Canon Kabushiki Kaisha | Displacement element, probe employing the element, and apparatus employing the probe |
US5410208A (en) * | 1993-04-12 | 1995-04-25 | Acuson Corporation | Ultrasound transducers with reduced sidelobes and method for manufacture thereof |
US5568679A (en) * | 1993-12-20 | 1996-10-29 | Nec Corporation | Method of manufacturing laminated piezoelectric actuator having cavity |
Also Published As
Publication number | Publication date |
---|---|
WO1998024296A2 (en) | 1998-06-11 |
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