WO1998048461A1 - Integrated circuit package - Google Patents
Integrated circuit package Download PDFInfo
- Publication number
- WO1998048461A1 WO1998048461A1 PCT/US1998/006873 US9806873W WO9848461A1 WO 1998048461 A1 WO1998048461 A1 WO 1998048461A1 US 9806873 W US9806873 W US 9806873W WO 9848461 A1 WO9848461 A1 WO 9848461A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- lid
- bead
- package
- integrated circuit
- substrate
- Prior art date
Links
- 239000011324 bead Substances 0.000 claims abstract description 164
- 239000000758 substrate Substances 0.000 claims abstract description 96
- 239000000463 material Substances 0.000 claims abstract description 59
- 239000004593 Epoxy Substances 0.000 claims abstract description 20
- 239000000853 adhesive Substances 0.000 claims abstract description 18
- 230000001070 adhesive effect Effects 0.000 claims abstract description 18
- 239000000919 ceramic Substances 0.000 claims abstract description 11
- 230000005670 electromagnetic radiation Effects 0.000 claims abstract description 9
- 238000004519 manufacturing process Methods 0.000 claims abstract description 8
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- 239000011521 glass Substances 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 claims description 14
- 230000002093 peripheral effect Effects 0.000 claims description 11
- 239000011261 inert gas Substances 0.000 claims description 5
- 238000010276 construction Methods 0.000 claims 1
- 238000003825 pressing Methods 0.000 description 13
- 239000005388 borosilicate glass Substances 0.000 description 12
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
- 238000001465 metallisation Methods 0.000 description 10
- 239000007789 gas Substances 0.000 description 8
- 229910052786 argon Inorganic materials 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 230000009969 flowable effect Effects 0.000 description 4
- 239000004020 conductor Substances 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000011345 viscous material Substances 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000012300 argon atmosphere Substances 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000004320 controlled atmosphere Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
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- 239000011810 insulating material Substances 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- WOIGZSBYKGQJGL-UHFFFAOYSA-N phenallymal Chemical compound C=1C=CC=CC=1C1(CC=C)C(=O)NC(=O)NC1=O WOIGZSBYKGQJGL-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
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- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0203—Containers; Encapsulations, e.g. encapsulation of photodiodes
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/10—Programming or data input circuits
- G11C16/18—Circuits for erasing optically
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- H01L23/053—Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls the container being a hollow construction and having an insulating or insulated base as a mounting for the semiconductor body
- H01L23/055—Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls the container being a hollow construction and having an insulating or insulated base as a mounting for the semiconductor body the leads having a passage through the base
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- H01L24/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L24/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
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- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/45138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/45144—Gold (Au) as principal constituent
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- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
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- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
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- H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
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- H01L2224/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L2224/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
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- H01L24/42—Wire connectors; Manufacturing methods related thereto
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- H01L24/42—Wire connectors; Manufacturing methods related thereto
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- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
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Definitions
- the present invention relates to integrated circuit packages, and in particular to a low cost, integrated circuit package.
- a goal in packaging integrated circuits is to reduce the cost and difficulty of manufacturing reliable packages. This goal is particularly present in packaging erasable programmable read-only memory devices (“EPROM”), charge coupled devices (“CCD”), and the like. Each such device requires a transparent package surface above the die, such as a quartz window, which increases manufacturing cost and difficulty.
- EPROM erasable programmable read-only memory devices
- CCD charge coupled devices
- a conventional package for an EPROM device has a ceramic base and an opposing ceramic lid.
- the base and/or lid have central depressions. When the base and lid are opposed, the depression (s) define a cavity for the die.
- the ceramic portions of the base and lid form the sides of the package.
- the lid has an aperture into which a glass or quartz window is fitted.
- a conductive metal lead frame is sandwiched between the base and lid. The leads of the lead frame perforate the sides of the package, extending laterally into and away from the cavity. Inside the cavity, the leads are connected to the die by bond wires . Thin layers of frit seal glass bond the base and lid to the lead frame and thus to each other.
- the present invention includes a package enclosing one or more integrated circuit die, and a method for making such a package.
- the package is useful, for example, in SAW, EPROM and CCD applications.
- a package in accordance with one embodiment of the invention has an insulating substrate as a base upon which a die is placed; an imperforate adhesive bead surrounding the die as the package sidewalls; and a lid, centered over and spaced above the substrate and die, in press-fitted interconnection with the bead.
- the substrate has a substantially planar first surface upon which at least one integrated circuit die is placed, and an opposing second surface. Conductive structures on the substrate, and conductive vias through the substrate, provide electrical connectivity between the die and external circuitry.
- the imperforate adhesive bead is applied onto the first surface of the substrate.
- the bead surrounds the integrated circuit die.
- the bead is initially viscous, but is hardenable into a solid. Epoxy material or an equivalent such as silicone or a blend of such materials is used for the bead.
- the lid is plastic or ceramic for surface acoustical wave ("SAW") package applications.
- the lid is transparent, at least in part, to a selected electromagnetic radiation, such as ultraviolet, visible, or infrared light. Boro-silicate glass is suitable.
- the lid has a first surface that faces and is spaced above the first surface of the substrate and the integrated circuit die. A peripheral portion of the first surface of the lid is in a press-fitted interconnection with the bead.
- the lid has an edge at its perimeter which is also in press-fitted interconnection with the bead.
- the lid's edge has perpendicular, or alternatively, a sloped orientation, relative to the first and/or second surfaces of the lid. All or part of the edge portions are in press-fitted interconnection with the bead.
- One embodiment of a method of making such a package involves a first step of providing a substrate, such as described above, having a substantially planar first surface and at least one conductive structure on that first surface, and placing at least one integrated circuit die on the first surface of the substrate.
- the integrated circuit die is electrically connected -to one or more of the conductive structures on the first surface of the substrate.
- a viscous, hardenable, adhesive material such as epoxy, is applied on the first surface of the substrate to form an imperforate bead around the integrated circuit die(s).
- the bead extends to a height above the first surface of the substrate which is greater than the height of the integrated circuit die above the substrate.
- a lid is also provided.
- at least part of the lid is transparent to electromagnetic radiation, for example, infra red, ultraviolet, or visible light.
- a flat, one piece boro-silicate glass lid is us-ed. The lid is placed onto the bead while the bead is still viscous, so that the first surface of the lid is facing, centered over, and spaced above the first surface of the substrate and the integrated circuit die.
- a peripheral portion of the first surface of the lid makes contact with the top surface of the bead.
- the lid is then press-fit into the bead, such as by mechanical pressing. All or part of the edge of the lid is also press fit into the bead, so that the bead material contacts all or part of the edge of the lid.
- the bead is then hardened, such as by heating the package .
- a viscous material is applied to the first surface of the substrate to form an imperforate bead substantially around the integrated circuit, leaving at least one discontinuity, e.g. , a gap. Additional viscous adhesive material is then applied to the package, after the lid is placed onto and press-fitted into the bead and after the bead partially hardens, to fill any gaps in the bead.
- the adhesive bead is an epoxy material or equivalent
- the lid is a flat, one-piece boro- silicate glass plate.
- An advantage of the packages and methods of the present invention includes a significant reduction in manufacturing cost compared to conventional EPROM, CCD, or similar packages. Another advantage is a reduction in manufacturing difficulties.
- Figure 1 is a cross sectional view of a package.
- Figures 2A and 2B are top views of an incomplete package prior to placing the lid on the bead.
- Figure 3 is a cross sectional view of a lid showing the lid's edge.
- Figure 4 shows a saw blade cutting a sheet of boro-silicate glass.
- Figure 1 shows a cross section of an embodiment of a package in accordance with the present invention.
- package 10 Within package 10 is a package cavity 11.
- cavity 11 Within cavity 11 is an integrated circuit die 100.
- a plurality of die are contained in one package .
- Die 100 has an upper surface 101 and a lower surface 102. Die 100 has a height between upper surface 101 and lower surface 102, a width, and a length. An exemplary size for an integrated circuit die is (0.012 ⁇ 0.003) x (0.200 to 0.500) x (0.200 to 0.500) (H,W,L) inches, but the sizes of dies vary. Die 100 has a plurality of bonding pads 103 on its upper surface 101. These pads are electrically connected to the internal electronic components (not shown) of die 100. Among other things, package 10 provides a protective enclosure or housing for die 100, and conductors for electrically connecting die 100 to external circuitry.
- die 100 is placed on and attached to substrate 200, which forms a base for package 10.
- substrate 200 has an upper surface 201 and a lower surface 202. Both upper surface 201 and lower surface 202 of substrate 200 have an area and a perimeter.
- Substrate 200 may have various perimeter shapes, such as a square, rectangle, or circle.
- substrate 200 is square.
- Both upper -surface 201 and lower surface 202 of substrate 200 are substantially planar.
- both upper surface 201 and lower surface 202 of substrate 200 are flat.
- the size of substrate 200 may vary depending on the application. For example, a larger die typically requires a larger base than a smaller die.
- Substrate 200 is comprised of an insulating material, such as a laminate. Alternatively, substrate 200 is of ceramic or insulated metal. Examples of suitable laminate substrates from widely-known vendors include Mitsubishi-BT, Arlon 45N, and Nellco BT. Die 100 is placed on upper surface 201 of substrate 200 with, for example, a conventional die attach machine, such as the Alpha Sem 9006 from the Alpha-Sem Corporation of Switzerland, or an equivalent. Hand placement may also be used. Die 100 is attached to upper surface 201 with a conventional adhesive epoxy, such as QMI-595 from Quantum Materials, Inc. of San Diego, California.
- a conventional adhesive epoxy such as QMI-595 from Quantum Materials, Inc. of San Diego, California.
- Package 10 includes electrical conductors for electrically connecting die 100 to external circuitry.
- substrate 200 includes electrically conductive vias 203 through substrate 200, between upper surface 201 and lower surface 202.
- Such vias may be formed, for example, by drilling holes in substrate 200, and plating the drilled holes with metal, such as copper.
- additional conductors are formed on upper surface 201 and lower surface 202 of substrate 200.
- one or more electrically conductive metalizations 204 may be formed on upper surface 201.
- metalizations are formable of copper where a laminate substrate is used. Alternatively, if a ceramic substrate is used, such metalizations may be formed of tungsten.
- each metalization 204 is electrically connected on a first end 205 to a conductive via 203, and on a second end 206 to a conductive contact 207.
- Contact 207 is, in one embodiment, of layered gold, or alternatively, of nickel and gold.
- Contact 207 is electrically connected by a conductive metal bond wire 208 to one of the bonding pads 103 on die 100.
- bond wire 208 is formed of gold.
- die 100 is electrically connected to conductive structures on substrate 200 using tape automated bonding .
- Lower surface 202 of substrate 200 also has one or more conductive features for electrically connecting die 100 to external circuitry.
- a plurality of electrically conductive traces or metalizations 209 are shown on lower surface 202 of substrate 200. For clarity, only two such metalizations are shown in Figure 1, but there may be as many as required. Copper is usable for these metalizations.
- Metalization 209 is electrically connected on a first end 210 to a via 203, and on a second end 211 to a contact 212, which is similar to contact 207.
- the conductive features on lower surface 202 of substrate 200 are arranged in a pattern to match up with and connect to external circuitry (not shown) .
- solder balls 213 are formed on contacts 212 on lower surface 202 of substrate 200.
- This arrangement forms a ball grid array ("BGA") package.
- contacts 212 are the electrical connection points for external circuitry, as in a leadless chip carrier ("LCC").
- wire leads together with eutectic solder or metal clips may be used in place of interconnection balls.
- Metalizations 204 and 209 may be formed in a conventional manner, for example, by masking and etching copper or other conductive layers formed on substrate 200.
- Contacts 207 and 212 may be formed using conventional processes such as electroplating or electrodeless chemical plating.
- Bead 300 adjacent to and around die 100 on upper surface 201 of substrate 200 is an imperforate bead 300.
- Bead 300 has a lower portion 301 adhesively contacting upper surface 201 of substrate 200; an upper portion 302 in press-fitted interconnection with a peripheral portion and edge of lid 400; an inner portion 303 facing die 100; and an outer portion 304 facing away from die 100.
- Bead 300 is formed of a material that is adhesive.
- the material of bead 300 should be somewhat viscous and flowable when initially applied to substrate 200 and when lid 400 is placed on and press fitted into bead 300.
- the material of bead 300 must be hardenable, however, such as by self-curing, heating, or application of ultraviolet light, so that bead 300 may ultimately form a solid package sidewall around die
- bead 300 is comprised of an epoxy material, such as Hysol 4451, 4323, or 4328 from the Dexter/Hysol Corp. of City of Industry, California.
- an equivalent material such as silicone from the Dow Corning Company may be utilized for bead 300.
- blends of such materials may also be utilized for bead 300.
- Figure 2A is a top view of die 100 on upper surface 201 of substrate 200, before the placement of lid 400 onto bead 300.
- Bead 300 is shown in the form of a continuous, square, imperforate dam surrounding die 100.
- An inner portion 214 of upper surface 201 of substrate 200 is shown within bead 300, and an outer portion 215 of upper surface 201 of substrate 200 is shown without bead 300.
- outer portion 215 of substrate 200 may be formed (such as by trimming or molding) so that the perimeter of substrate 200 is more flush with outer portion 303 of bead 300.
- Figure 2B shows an alternative embodiment where bead 300 is shown in the form of a square, imperforate dam substantially, but not fully, around integrated circuit die 100.
- Bead 300 has a discontinuity, exemplified by gap 305, which is discussed further below.
- the term "gap" is used generically. For example, there could be an equivalent dip in the bead.
- a function of gap 305 is to allow gases to escape the package cavity during hardening. Bead 300 surrounds a majority of the perimeter of die 100.
- the path of imperforate bead 300 about die 100 may be varied.
- the path of bead 300 about die 100 may be rectangular or circular.
- the lateral distance between bead 300 and die 100 may also be varied, depending on the size of die 100 and the desired size of package 10.
- An epoxy or equivalent bead may be applied onto upper surface 201 of substrate 200 using a syringe or a conventional epoxy dam writer, such as is available from the Camelot Company or the Asymtek Company.
- the cross section shape of the epoxy is approximately circular as it comes out of the dam writing machine.
- An example diameter is approximately 0.030 to 0.045 inches, but the size of the diameter and/or other cross sectional shape of the bead will vary depending on the application.
- the epoxy Being viscous and flowable, the epoxy settles into an imperforate domed-shaped dam, as As depicted for bead 300 in Figure 1.
- the height of bead 300 above upper surface 201 of substrate 200, when bead 300 is initially applied to upper surface 201 and before lid 400 is placed onto bead 300, should exceed the height of die 100 and bond wires 208 above upper surface 201 of substrate 200. This may be accomplished, for example, by appropriate selection of the amount of bead material and/or the cross section size of the bead material as it comes out of the syringe or dam writing machine.
- Lid 400 forms the top of package 10.
- lid 400 has an upper surface 401, which forms the topmost outer surface of package 10, and a lower surface 402, which is spaced above, centered over, and facing upper surface 401 and die 100. Both upper surface 401 and lower surface 402 of lid 400 have an area and a perimeter. Lid 400 also has an edge 403 at its perimeter, that is, between the perimeter of upper surface 401 and the perimeter of lower surface 402 of lid 400.
- lid 400 may be varied depending on the application. Lid 400 is substantially planar. In the embodiment of Figure 1, upper surface 401 and lower surface 402 of lid 400 are flat.
- one or both of these lid surfaces may be concave .
- the perimeter shape of lid 400 may be, for example, square, rectangular, or circular.
- the thickness of lid 400 varies, depending on the integrated circuit application and the material selected for lid 400.
- a typical thickness for lid 400, as exemplified in Figure 1, is between about 0.02 to 0.04 inches.
- the perimeter size of lid 400 may be varied, for example, to reflect the size of the die or dies packaged in package 10.
- a typical size for a square lid may be 0.300 x 0.300 inches.
- the lid is sized so that, at the time of placement of lid 400 onto bead 300, the perimeter of the lid coincides with the lateral mid-point of the upper surface of bead 300.
- Lid 400 may be formed of a variety of conventional materials, depending on the device being packaged.
- the material of lid 400 is sufficiently light in weight that lid 400 rests atop bead 300 after placement thereon without sinking into the still- viscous material of bead 300.
- the material of lid 400 is selected in part by the desired application of package 10.
- the lid is ceramic, plastic, or another suitable material.
- EPROM, CCD or similar devices the functioning of the device requires a selected or continuous application of a selected electromagnetic radiation through the package to a surface of the die.
- lid 400 is comprised, in whole or part, of a material that is transparent to the particular type, frequency, and/or amount of electromagnetic radiation needed by the packaged device.
- lid 400 In an EPROM, as one example, light is used to erase data stored in an erasable memory. In typical EPROM or CCD applications, all or part of lid 400 would be transparent to light, such as infrared, visible, or ultraviolet light, but when light was not desired to strike the die, the lid 400 would be covered with an opaque material such as opaque tape .
- lid 400 is a one- piece structure, formed entirely of a material transparent to such light, such as glass.
- a flat, one-piece plate of boro-silicate glass having a thickness of 0.02 inches is useable for lid 400.
- other optically pure materials such as quartz, diamond, or sapphire, may also be used to form all or part of lid 400.
- Lid 400 may also be a lens .
- lower surface 402 of lid 400 is placed squarely onto upper portion 302 of bead 300, centered opposite and above upper surface 201 of substrate 200 and die 100, while the epoxy or other material comprising bead 300 is still flowable and before the bead is hardened into a solid sidewall.
- the amount of time before bead 300 hardens, and the steps involved in hardening the bead, vary with the material selected for the bead.
- a peripheral portion 404 of lower surface 402 of lid 400 evenly contacts upper portion 302 of bead 300 about the entire path of bead 300 around integrated circuit die 100.
- Example paths are shown in Figures 2A and 2B.
- a method of placing lid 400 onto upper portion 302 of bead 300 is to use a die attach machine, such as the Alpha Sem 9006 or equivalent. Alternatively, hand placement may be used.
- lid 400 is press fitted into bead 300.
- this press fitting step is accomplished by mechanical pressing.
- a partially assembled package 10, with lid 400 atop bead 300, is placed between two parallel plates of a pressing machine.
- the lower plate of the pressing machine is fixed, and the upper plate moves in a direction perpendicular to the plates .
- Lower surface 202 of substrate 200 rests on the lower plate.
- the upper plate moves downward toward the lower plate and contacts upper surface 401 of lid 400.
- the upper plate may be, for example, approximately the size of lid 400, or a different size.
- the upper plate of the pressing machine presses lid 400 into dam 300 with a light downward force, for example, a 50 gram force. Because the upper and lower plates of the pressing machine are parallel, this pressing causes lid 400 to move into dam 300 while at the same time aligning upper surface 401 of lid 400 parallel to lower surface 202 of substrate 200.
- the downward pressing of the upper plate of the pressing machine stops at a selected distance that is equal to the desired height of the package.
- a sensor detects when the space between the plates reaches the targeted spacing, and stops the downward travel of the upper plate of the pressing machine.
- the downward travel of the upper plate, after contacting the lid may be, for example, 0.004 inches, but that distance varies depending on the package application.
- the action of the pressing machine described above is similar to the action of conventional tools used to perform trim and form steps during the manufacture of plastic quad flatpack packages or other lead frame packages .
- a suitable press machine may be created by modifying such a trim and form machine with parallel plates having the pressing motion described herein.
- the still-flowable material of bead 300 moves up and contacts all or part of edge 403 of lid 400.
- the material chosen for bead 300 should be sufficiently viscous at this point to flow up edge 403, but sufficiently thick to support and space lid 400 a distance above upper surface 201 of substrate 200 and die 100 and/or bond wires 208 until bead 300 is completely hardened.
- upper portion 302 of bead 300, along the entire path of bead 300 contacts and adheres to a peripheral portion 404 of lower surface 402 of lid 400. This contacting and adherence is along the entire path of bead 300 about die 100. Example paths are shown in Figures 2A and 2B.
- the lid will not contact bead material in the area of the gap due to the lack of bead material .
- bead 300 contact and adhere to at least a lower portion of edge 403, beginning at the perimeter of lower surface 402 of lid 400 and extending up edge 403 in the direction of the perimeter of upper surface 401 of lid 400.
- bead 300 may contact and adhere to all of edge 403 of lid 400, up to and including the perimeter of upper surface 401 of lid 400. It is preferred that, when the material of bead 300 is hardened and the package is completed, bead 300 is in a press fitted interconnection with both peripheral portion 404 of lid 400 about the entire perimeter of lid 400 and all or part of edge 403 of lid 400. This enhances the attachment of lid 400 to bead 300. After placement of lid 400 onto bead 300 and the press fitting of lid 300 into bead 300, the material of bead 300 is hardened to a solid. This hardening step may be performed in a variety of ways, depending on the material selected for bead 300.
- lid 400 is fixed in a press fitted interconnection with bead 300.
- bead 300 surrounds die 100 and forms imperforate sidewalls of package 10.
- Bead 300 contacts, spaces, and secures lid 400 a distance above upper surface 201 of substrate 200.
- bead 300 also spaces lid 400 a distance above die 100 and bond wires 208.
- the spacing between substrate 200 and lid 400, or more particularly, between lower surface 402 of lid 400 and upper surface 201 of substrate 200, may be varied for particular device applications and package height requirements. This may be done, for example, by regulating the cross section size or shape of bead 300, the material of bead 300, the amount of press fitting of lid 400 into bead 300 before the step of hardening bead 300, or the amount of time before the hardening step.
- the final distance between lower surface 402 of lid 400 and upper surface 201 of substrate 200 may be in the range of about 0.02 to 0.04 inches, but the distance varies depending on the package application. If lid 400 is a lens, an alternative embodiment, then the spacing is more likely to be a critical dimension than in other applications.
- bead 300 between inner portion 303 and outer portion 304 will vary along its height, particularly if -an epoxy material is used, because the initially viscous dam material will settle somewhat both inward and outward along upper surface 201 of substrate 200 after being applied to substrate 200 and before hardening.
- the press- fitting step will also cause dam 300 to spread.
- die 100 is fully enclosed in a closed three-dimensional cavity 11 defined by the intersections of substrate 200, bead 300, and lid 400.
- Substrate 200 forms the base of package 10; lid 400 opposite, centered, and spaced above substrate 200 and die 100 forms the top of package 10; and bead 300 forms the imperforate sidewalls of package 10 around die 100.
- Bead 300 is between and connected to substrate 200 and lid 400, and preferably is also in press-fitted interconnection with all or part of the edge of lid 400.
- lid 400 be precisely parallel to upper surface 101 of die 100, and not appreciably tilted or cocked.
- a process employing a bead as shown in Figure 2B may be utilized.
- gap 305 in bead 300 provides a vent for the expanding air or gas to escape cavity 11, thus avoiding or reducing the possibility of any tilting of lid 400 which may be caused by the air or other gas in cavity 11 attempting to escape under or through bead 300 as bead 300 is hardened.
- Gap 305 is subsequently filled to enclose the die.
- gap 305 could serve as a port for introducing a selected inert gas or other fluid into cavity 11.
- bead 300 is applied to upper surface 201 of substrate 200 as described above, except that bead 300 is applied only partially around die 100.
- bead 300 substantially surrounds die 100, except for a discontinuity, exemplified by gap 305, where the material of bead 300 is not present.
- An equivalent discontinuity could be formed, in an embodiment along the lines Figure 2A, by providing a dip in upper portion 302 of bead 300. While the size and location of such discontinuities in bead 300 may be varied, bead 300 must surround enough of die 100 (e.g. , a majority) to provide some support for lid 400 after lid 400 is placed onto bead 300 and before the hardening of bead 300.
- bead 300 is partially or fully hardened.
- gap 305 (or equivalent dips or other discontinuities) of bead 300 is filled by an application of a viscous adhesive material between substrate 200 and lid 400, where bead material is lacking. If epoxy is used for bead 300, an epoxy such as Hysol 4323, which can stick to itself, is used to form bead 300. If bead 300 was only partially hardened before gap 305 was filled, any remaining gases escaping from cavity 11 of package 10 will bubble through the still-viscous material used to fill gap 305 until the entire bead is fully hardened.
- This second application of adhesive material in the area of gap 305 may be performed with a dam writing machine or syringe. Alternatively, it may be done by hand. Afterwards, the additional adhesive material and/or the entire bead should be hardened into a solid, as discussed above.
- die 100 Upon the filling of gap 305 of bead 300 in Figure 2B, die 100 will be fully enclosed in a closed three-dimensional cavity 11 defined by the intersections of substrate 200 (as the base) , bead 300 (as the imperforate sidewall around die 100) , and lid 400 (as the package top facing and above substrate 200 and die 100) .
- Employing the embodiment of Figure 2B also provides a port for a selected inert gas or other substance to be introduced into package 10 prior to the final enclosure of die 100 by the filling or closing of gap 305.
- a selected inert gas or other substance such as argon may be introduced into the package through the gap, so that cavity 11 would contain argon after gap 305 is closed.
- This step of introducing a selected gas may be done, for example, by placing the package of Figure 2B in an argon atmosphere, allowing the argon gas to enter the cavity, and then applying a second application of bead material to the area of the gap, closing cavity 11 of package 10 and thus sealing in the argon.
- an inert gas or other selected substance may be introduced into package 10 by placing lid 400 onto bead 300 in a controlled atmosphere, such as in a hermetic chamber filled with argon gas.
- edge 403 of lid 400 may be varied.
- edge 403 of lid 400 is flat and its orientation is substantially perpendicular to the upper and lower surfaces of lid 400.
- edge 403 of lid 400 may be provided with a lip or protrusion onto which the material of bead 300 can flow during the step of press fitting lid 400 into bead 300, to facilitate or enhance the locking and securing of lid 400 to bead 300.
- FIG. 3 shows an example edge for lid 400.
- Edge 403 of lid 400 is shown with an upper portion 407 and* a protruding sloped or diagonal lower portion 406.
- Upper portion 407 of edge 403 extends from the perimeter of upper surface 401 of lid 400 to a point 408 located a distance, here shown as midway, between upper surface 401 and lower surface 402 of lid 400.
- Lower portion 406 of edge 403 extends from point 408 to the perimeter of lower surface 40-2 of lid 400, and has a laterally outward and downward diagonal orientation with respect to upper surface 401 and lower surface 402 of lid 400, and cavity 11.
- the diagonal angle ⁇ of lower edge portion 406 of edge 403 is in the range of about 30 to 60 degrees, but may be varied.
- the still- flowable epoxy or other material comprising bead 300 will move up and cover all or part of the protrusion exemplified by diagonal lower portion 406 of edge 403.
- the material of bead 300 may cover all of lower portion 406 of edge 403 and contact all or part of upper portion 407 of edge 403.
- the portion of the material of bead 300 in such a press-fitted interconnection with edge 403 aids the attachment between lid 400 and bead 300.
- edge 403 of lid 400 may be varied, while still accomplishing the enhanced attachment exemplified by the embodiment of Figure 3.
- edge 403 may alternatively have an "L" shape.
- the entire edge 403 may be diagonal.
- lid 400 has the edge shown in Figure 3.
- all four sides would have the edge profile shown in Figure 3.
- lid 400 were circular, then the entire circumference would have the edge profile shown in Figure 3.
- two sides of a square lid 400 could have the edge profile of Figure 3, and two sides could have a perpendicular edge, as in Figure 1.
- lid 400 can be a flat, one- piece plate of boro-silicate glass for applications such as EPROM, CCD, or similar devices.
- Boro-silicate glass may be commercially purchased in sheets of various sizes, such as four inches by four inches. Depending on the desired size of the package 10, the sheet of boro-silicate glass may need to be cut to size.
- a flat sheet of boro-silicate glass is placed on a sheet of sticky paper, as is conventionally used when wafers are cut into individual dies.
- the glass sheet is then cut, using a wafer saw, to form the desired shape of lid.
- the boro-silicate glass sheet may be sawed in a bath of deionized water to assist in maintaining the cleanliness of the boro-silicate glass lids.
- a conventional die attach machine is used to pick up each now-formed lid 400 from the sticky paper for placing the lid 400 onto upper portion 302 of bead 300.
- FIG. 4 shows a tapered saw blade 500 cutting a sheet 501 of the preferred boro- silicate glass. The portions of the blade that form the upper portion 407 and lower portion 406 of edge 403 of a lid 400 are shown. The lengths of upper portion 407 and lower edge 406 may be adjusted by raising or lowering the position of sheet 501 against blade 500. The diagonal angle of lower portion 406 of edge 403 may be adjusted by varying the taper of saw blade 501.
- the above structures and methods may be used to create packages of varying sizes and shapes. Where a two inch by two inch square package is desired, for example, it may be most economical to construct the packages one at a time. If a smaller package is desired, for example, a 0.5 inch by 0.5 inch square package, it may be most economical to complete several packages on a single sheet of substrate material, as discussed above, and then cut the substrate sheet to separate the individual packages. In an alternative embodiment, a plurality of integrated circuit dies are placed on a single substrate base for assembly, according to the steps described above, in a single package .
Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
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EP98915337A EP0976160A1 (en) | 1997-04-18 | 1998-04-09 | Integrated circuit package |
JP54608498A JP2001524264A (en) | 1997-04-18 | 1998-04-09 | Integrated circuit package |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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US08/844,536 | 1997-04-18 | ||
US08/844,536 US6034429A (en) | 1997-04-18 | 1997-04-18 | Integrated circuit package |
Publications (1)
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WO1998048461A1 true WO1998048461A1 (en) | 1998-10-29 |
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ID=25292987
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PCT/US1998/006873 WO1998048461A1 (en) | 1997-04-18 | 1998-04-09 | Integrated circuit package |
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US (2) | US6034429A (en) |
EP (1) | EP0976160A1 (en) |
JP (1) | JP2001524264A (en) |
WO (1) | WO1998048461A1 (en) |
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Also Published As
Publication number | Publication date |
---|---|
EP0976160A1 (en) | 2000-02-02 |
US6034429A (en) | 2000-03-07 |
US5950074A (en) | 1999-09-07 |
JP2001524264A (en) | 2001-11-27 |
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