WO1998055665A1 - Method and apparatus for making high refractive index (hri) film - Google Patents
Method and apparatus for making high refractive index (hri) film Download PDFInfo
- Publication number
- WO1998055665A1 WO1998055665A1 PCT/US1998/011139 US9811139W WO9855665A1 WO 1998055665 A1 WO1998055665 A1 WO 1998055665A1 US 9811139 W US9811139 W US 9811139W WO 9855665 A1 WO9855665 A1 WO 9855665A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- vaporizer
- film
- vapor
- aperture
- deposition material
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0623—Sulfides, selenides or tellurides
- C23C14/0629—Sulfides, selenides or tellurides of zinc, cadmium or mercury
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP98923878A EP1007755B1 (en) | 1997-06-04 | 1998-06-02 | Method and apparatus for making high refractive index (hri) film |
AU76064/98A AU7606498A (en) | 1997-06-04 | 1998-06-02 | Method and apparatus for making high refractive index (hri) film |
DE69828411T DE69828411D1 (en) | 1997-06-04 | 1998-06-02 | METHOD AND DEVICE FOR PREPARING HRI FILMS |
AT98923878T ATE286154T1 (en) | 1997-06-04 | 1998-06-02 | METHOD AND DEVICE FOR PRODUCING HRI FILMS |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/869,076 | 1997-06-04 | ||
US08/869,076 US5951769A (en) | 1997-06-04 | 1997-06-04 | Method and apparatus for making high refractive index (HRI) film |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1998055665A1 true WO1998055665A1 (en) | 1998-12-10 |
Family
ID=25352879
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US1998/011139 WO1998055665A1 (en) | 1997-06-04 | 1998-06-02 | Method and apparatus for making high refractive index (hri) film |
Country Status (6)
Country | Link |
---|---|
US (2) | US5951769A (en) |
EP (1) | EP1007755B1 (en) |
AT (1) | ATE286154T1 (en) |
AU (1) | AU7606498A (en) |
DE (1) | DE69828411D1 (en) |
WO (1) | WO1998055665A1 (en) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6447632B1 (en) * | 1998-03-18 | 2002-09-10 | Ebara Corporation | Apparatus and nozzle device for gaseous polishing |
AU2430601A (en) * | 1999-12-13 | 2001-06-18 | Semequip, Inc. | Ion implantation ion source, system and method |
JP2005029895A (en) * | 2003-07-04 | 2005-02-03 | Agfa Gevaert Nv | Vapor deposition apparatus |
US7951421B2 (en) * | 2006-04-20 | 2011-05-31 | Global Oled Technology Llc | Vapor deposition of a layer |
US20120052189A1 (en) * | 2010-08-30 | 2012-03-01 | Litian Liu | Vapor deposition system |
JP5709588B2 (en) * | 2011-03-03 | 2015-04-30 | ホーヤ レンズ マニュファクチャリング フィリピン インク | Vapor deposition equipment |
US20130037251A1 (en) * | 2011-08-11 | 2013-02-14 | General Electric Company | Liquid cooled thermal control system and method for cooling an imaging detector |
CN102978572A (en) * | 2011-09-07 | 2013-03-20 | 无锡尚德太阳能电力有限公司 | Method for preparing CdTe film and thermal evaporation device |
KR102054477B1 (en) * | 2013-04-05 | 2019-12-11 | 삼성디스플레이 주식회사 | Apparatus for depositing thin film |
US10184168B2 (en) | 2015-01-20 | 2019-01-22 | Kennametal Inc. | IMC evaporator boat-thermal insulation cartridge assembly |
US20160208373A1 (en) * | 2015-01-20 | 2016-07-21 | Kennametal Inc. | Imc evaporator boat assembly |
JP5938155B1 (en) * | 2015-04-24 | 2016-06-22 | 大塚電子株式会社 | Optical measuring apparatus and optical measuring method |
DE102019110950A1 (en) | 2019-04-29 | 2020-10-29 | Kennametal Inc. | Hard metal compositions and their applications |
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-
1997
- 1997-06-04 US US08/869,076 patent/US5951769A/en not_active Expired - Lifetime
-
1998
- 1998-06-02 AU AU76064/98A patent/AU7606498A/en not_active Abandoned
- 1998-06-02 AT AT98923878T patent/ATE286154T1/en not_active IP Right Cessation
- 1998-06-02 DE DE69828411T patent/DE69828411D1/en not_active Expired - Lifetime
- 1998-06-02 EP EP98923878A patent/EP1007755B1/en not_active Expired - Lifetime
- 1998-06-02 WO PCT/US1998/011139 patent/WO1998055665A1/en active IP Right Grant
-
1999
- 1999-04-21 US US09/295,859 patent/US6194031B1/en not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4403002A (en) * | 1979-12-10 | 1983-09-06 | Fuji Photo Film Co., Ltd. | Vacuum evaporating apparatus |
US4416217A (en) * | 1981-07-31 | 1983-11-22 | Ulvac Seimaku Kabushiki Kaisha | Apparatus for forming an inhomogeneous optical layer |
US4526132A (en) * | 1982-11-24 | 1985-07-02 | Konishiroku Photo Industry Co., Ltd. | Evaporator |
US4743467A (en) * | 1983-02-14 | 1988-05-10 | Fuji Photo Film Co., Ltd. | Method for preparing magnetic recording medium |
US4565158A (en) * | 1983-09-05 | 1986-01-21 | Balzers Ag | Evaporator cell for vacuum deposition on substrates |
US5230923A (en) * | 1987-12-17 | 1993-07-27 | Toyo Ink Manufacturing Co., Ltd. | Process and apparatus for the substantially continuous manufacture of a silicon oxide deposition film on a flexible plastic film |
Also Published As
Publication number | Publication date |
---|---|
AU7606498A (en) | 1998-12-21 |
US5951769A (en) | 1999-09-14 |
ATE286154T1 (en) | 2005-01-15 |
EP1007755A4 (en) | 2000-10-04 |
EP1007755A1 (en) | 2000-06-14 |
DE69828411D1 (en) | 2005-02-03 |
US6194031B1 (en) | 2001-02-27 |
EP1007755B1 (en) | 2004-12-29 |
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