WO1999013689A1 - Tubular microwave applicator - Google Patents
Tubular microwave applicator Download PDFInfo
- Publication number
- WO1999013689A1 WO1999013689A1 PCT/US1998/018716 US9818716W WO9913689A1 WO 1999013689 A1 WO1999013689 A1 WO 1999013689A1 US 9818716 W US9818716 W US 9818716W WO 9913689 A1 WO9913689 A1 WO 9913689A1
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- WO
- WIPO (PCT)
- Prior art keywords
- load
- assembly
- applicator
- cavity
- microwave
- Prior art date
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Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/64—Heating using microwaves
- H05B6/70—Feed lines
- H05B6/704—Feed lines using microwave polarisers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/64—Heating using microwaves
- H05B6/66—Circuits
- H05B6/68—Circuits for monitoring or control
- H05B6/681—Circuits comprising an inverter, a boost transformer and a magnetron
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/64—Heating using microwaves
- H05B6/70—Feed lines
- H05B6/707—Feed lines using waveguides
- H05B6/708—Feed lines using waveguides in particular slotted waveguides
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
- Y02B40/00—Technologies aiming at improving the efficiency of home appliances, e.g. induction cooking or efficient technologies for refrigerators, freezers or dish washers
Definitions
- the present invention relates to the field of microwave applicators, including those types of applicators having a load transiting the heating chamber of the applicator in a continuous fashion.
- the present invention is an improvement in the field of applicators having axially oriented loads, (which may be a liquid) positioned in or moving through a cavity of the applicator along a central axis of the applicator.
- Figure 1 is a schematic top plan view of a microwave applicator useful in the practice of the present invention.
- FIG. 1 is a schematic side elevation view of the microwave applicator of Figure 1.
- Figure 3 is a perspective view of a pair of microwave applicators of the type shown in Figures 1 and 2, positioned together to form an assembly useful in the practice of the present invention.
- Figure 4 is a computer- generated image of the E field intensity in the space normally occupied by a load in an empty applicator of the type shown in Figures 1 and 2, illustrating a TM 120 mode.
- Figure 5 is a computer- generated image of the power density in a first load using an applicator of the type shown in Figures 1 and 2.
- Figure 6 is a computer- generated image of the power density in a second load using an applicator of the type shown in Figures 1 and 2.
- Figure 7 is a computer- generated image of the heating pattern in a third load using the assembly of Figure 3 in the practice of the present invention.
- Figure 8 is a computer- generated image of the heating pattern in a fourth load using the assembly of Figure 3 in the practice of the present invention.
- FIG. 9 is a fragmentary view of an alternative embodiment for load containment and transport useful in the practice of the present invention.
- Figure 10 is a simplified perspective view of a single cavity, octagonal cross section alternative embodiment useful in the practice of the present invention when used with the feed systems of Figures 11-14.
- Figure 1 1 is a perspective view of a first microwave feed system for the octagonal cross section cavity of Figure 10.
- Figure 12 is a top plan view of the microwave feed system of Figure 1 1.
- Figure 13 is a top plan view of a second microwave feed system for the cavity of Figure 10.
- Figure 14 is a side elevation view of the second microwave feed system of Figure 13.
- Figure 15 is a plot of relative power densities as a function of radial position for a circularly cylindrical load in a cavity to illustrate certain aspects of the present invention.
- Figure 16 is a plot of resonant frequency behavior of a load of 27 mm diameter in a 159 mm internal diameter circular applicator, with real permittivity as the variable and the dielectric loss tangent as a parameter.
- the present invention relates to an assembly 10 for applying microwave irradiation to a generally circular cross section load positioned in a cavity 18 by a microwave transparent tube 12.
- a microwave transparent tube 12 As used herein, "cylindrical" means “having a constant cross-section in one direction.”
- the load may be stationary in the cavity 18 or may be transported through one or more cavities forming the applicator of the present invention. If desired, other means for statically positioning the load other than tube 12 may be used, and other means for dynamically positioning and conveying the load through the assembly 10 may be provided, one example being a conveyor 13 as shown in Figure 9.
- the assembly 10 of the first embodiment preferably includes a pair of microwave applicators 14, 14' each of which are shown to be hexagonal in cross section in the top plan view of Figure 1. It is to be understood, however, that a single applicator may be used with two pairs of feed systems, if desired, in which case it is preferable to use an octagonal cross section cavity as is shown in Figure 10.
- circular cross-section applicators are also to be understood to be within the scope of the present invention, as are other polygonal prisms having parallel, opposed sides, such as, for example, those having a square or octagonal cross-section.
- the configuration and dimensions must be such as to permit opposed feed apertures capable of delivering 180 degree phase shifted magnetic fields to the interior of the cavity formed by the polygonal prism.
- each applicator 14 is sized to support only one dominant mode, preferably a TM 12 o type, (transverse magnetic type with indexing using the nomenclature for circularly polarized cylindrical resonators, TM mnp where m is the circumferential direction, indicated by the greek character phi: ⁇ , n is the radial direction, indicated by the greek character rho: p, and p is the axial direction of propagation indicated by "z”) and the prismatic cavity and feed system of the second applicator 14' is positioned at 90 degrees with respect to the first applicator 14, indicated by the dashed line 16 in Figure 3.
- TM 12 o type transverse magnetic type with indexing using the nomenclature for circularly polarized cylindrical resonators, TM mnp where m is the circumferential direction, indicated by the greek character phi: ⁇ , n is the radial direction, indicated by the greek character rho: p, and p is the axial direction of
- Each applicator has a microwave cavity 18 fed by a pair of slot apertures 20, coupling microwave energy from a waveguide feed system 22.
- Feed system 22 has a waveguide 24 connected to a source of microwave energy (not shown, but typically a magnetron) operating at a predetermined frequency, typically 2450 MHz.
- Waveguide 24 supplies a symmetrical rectangular TE ]0 split waveguide arms 26, 28 with slot apertures 20 sized and positioned to only excite the TM 120 mode in the cavity 18 of each applicator 14, 14'.
- each applicator With two applicators, each is to be positioned with respect to the other at 90 degrees about the axis of travel 30 of the load. With a single applicator a means of positioning the load along a central axis 30 will be necessary. With multiple applicators, a means of moving the load through the applicators as well as positioning the load in each applicator will be desirable. Liquid and other "flowable" (or pumpable) loads can be both positioned in and moved through the applicator using the tube 12. As an alternative to the dual applicator system where each applicator has a single pair of feed apertures, a single applicator with two feed systems (four apertures in a single cavity) may be used.
- the two feed systems (each having two opposed, parallel feed apertures) operate alternately (i.e., with each fed by a halfwave power supply, each of which is 180 degrees shifted at the frequency of the power supply, typically 60 Hz) to avoid interference between the modes created by each feed system.
- an individual feed system 22 must permit only the excitation of single dominant mode, preferably a TM 120 type mode, (as shown in Figure 4) in the applicator.
- a TM 120 type mode as shown in Figure 4
- the field in an empty applicator becomes, in accordance with the literature (for example Time-harmonic Electromagnetic Fields by Harrington, McGraw-Hill, 1961, page 205) and after some reductions:
- H r J ⁇ (x ⁇ n p/b)/p sinwp (Eq. lb)
- ⁇ ln is the nth zero of J[(x) [the first order Bessel function] and b is the radius of the cavity.
- the scaling factor for determining cavity dimensions is (in the general case):
- the second zero x 12 7.016 and corresponds to a diameter 2b of 272.2 mm at 2460 MHz of an empty TM 120 resonant applicator.
- the E z field intensity in the load space of an empty TM 120 applicator with the dimensions given above is illustrated in Figure 4.
- the power density in the load becomes proportional to ⁇ "
- the axially directed electric field pattern in a load with circular cross section axially centrally positioned in an applicator of the present invention can be described as a sum of modal patterns based on a set of cylindrical Bessel functions, J m , of the first kind and mth order, as J m (kp)cos(m ⁇ ), where k is a wavenumber 2 ⁇ (V ⁇ ) ⁇ 0 , p is the radial distance from the axis 30, and ⁇ is the circumferential angle.
- J m (kp)cos(m ⁇ ) J m (kp)cos(m ⁇ )
- each curve 25, 27 shows a separate case, with the amplitudes of the curves 25, 27 independent of each other.
- the minima of the curves will go down to zero relative intensity.
- the TM ln0 load mode there will be a minimum at the center and at the periphery of a 9 mm radius load.
- an internal resonance for a TM ln0 mode means that the oscillating capacitive and inductive field component energies in the load are equal. If the load has reasonably low losses, this occurs when the E z field has a maximum in the radial direction.
- the Bessel functions correspond to an E field maximum at about 14 mm radius. There is no generally accepted mode designation for this.
- the second index is the number of minima (or zeroes) along the radius, excluding one at the axis 30. In the case presented, there is one minimum in the load and another at the cavity periphery. One may therefore call the internal resonance TM h j 1 2 0 since there is a maximum E at the load periphery, between the (second) index 1 and index 2 minima.
- a plot of resonant frequency as a function of ⁇ ' with tan ⁇ as a parameter may be seen for a load diameter of 27 mm in a cavity having an internal diameter of 159 mm.
- the system i.e., irradiate the load
- the slope of the curve for the load of interest is increasing with increasing ⁇ ' and at or near its maximum.
- the resonant frequency is 2450 MHz.
- a "reflection factor method” may be used to calculate resonant frequencies and other data on the behavior of the applicator cavity 18.
- This approach employs radially propagating inward and outward waves, where the excitation is with a perfect field matching at a radius "b" in the applicator.
- the amplitude and phase of the returning wave at the position b provide load reflection factors.
- polar plotting of impedance behavior as a function of frequency can be performed.
- H (1) m and H (2) m are the Hankel functions of the first and second kinds, respectively.
- H (1) m represents an inwards going wave and has a normalized amplitude factor 1.
- a J,(k 0 V ⁇ a) B H (2 ⁇ (k o a) + 1 H (1) ,(k 0 a) (for E z ) (Eq. 4b)
- Equation 4a and 4b the sign on the B H (2) j '(k 0 a) term should not be negative in Equation 4a and 4b (as is the case for plane wave scenarios using trigonometric functions) because of the way Hankel functions are defined.
- the quotient C g 7C ⁇ T is the transmission line reflection factor T; it may be represented as a complex number I T
- Different notation is used for transmission line impedances and reflection factors (Z and T) and for the corresponding wave quantities ( ⁇ and r).
- the proper integration is done in a plane of aperture 20. The boundary conditions for voltage and current in the plane then give:
- the field patterns in the load are a function of only the frequency and dielectric properties and not a function of the load diameter, i.e., the field pattern as such in a region inside the load is independent of how large the diameter of the load is.
- the heating pattern with two 90 degree displaced applicators 14, 14' as arranged in Figure 3 is given in Figure 7 for a load of 25 mm diameter and permittivity 50-j 15, and in Figure 8 for a load of 35 mm diameter with permittivity 50-J25, both at 2460 MHz operating frequency (2460 MHz is used here as more representative of the operating frequency of presently available magnetrons). It is to be understood that the representation in Figure 8 is ordinarily unsatisfactory in that (circumferential) edge overheating will occur along boundary 66.
- the patterns have two "hot spots” or more properly “hot cylinders” 54, 56 aligned with the axis 30, because these figures represent the heating pattern for one applicator with only one feed system.
- the load has a permittivity of 25-J12.5; in Figure 6, the load permittivity is 60-J30, and in each case the load diameter is 26.8 mm.
- the "hot cylinders" 54, 56 are displaced dependent on load permittivity, and the load shown in Figure 6 further has maxima 58, 60 at the periphery for the high ⁇ ' in the resonant load due to the so-called "magnetic wall” effect.
- the load becomes resonant when operated at the largest slope of frequency increase with increasing ⁇ .
- the slope will be maximized at ⁇ ' « 48.
- the argument(2 ⁇ 0 ) V ⁇ ' a then becomes about 5.34.
- a maximum of the J.(x) function is at 5.33.
- the load has a lower impedance than the surrounding space, (the "magnetic wall” effect) which results in parallel E field maximum at its surface.
- the combination of the cavity and load create an inductive and capacitive compensation when the frequency is varied, due to the varying coupling factor of the load to the surrounding space. As has been mentioned, this compensation maintains the total system resonant frequency.
- Equation 8 gives
- the axial heating pattern of a resonant TM mnp cavity of length / with a load extending throughout the cavity along the axis will be of a cos 2 (p ⁇ //) character, where p is the axial (last) mode index.
- the heating pattern becomes constant in the axial direction.
- the feed slots 20 are placed diametrically opposite each other, perpendicular to the z (axis) direction and located at half the cavity length V2I.
- the two slots provide 180 degree phase difference of the H ⁇ fields (circumferential direction) in the applicator.
- the feed system is to provide symmetrical anti-phase between the two slots 20.
- each slot can be made straight, since each polygon face is sufficiently wide to accommodate a slot length of about ! 2 ⁇ 0 .
- the hexagonal and octagonal embodiments are preferred because of their accommodation of opposed feed apertures 20 in respective individual parallel faces of such polygonal prisms.
- each face is preferably 90 mm wide, with a distance of 157 mm between opposed parallel sides.
- Using a Y junction provides better matching than a T junction.
- a matching plate or flag 32 is used to stabilize performance and match impedance.
- Flag 32 is used to split the field with minimum disturbance and to provide a mismatch for reflected energy coming from one slot 20 in the cavity 18 and which would possibly otherwise go to the other slot in the same cavity.
- the flag 32 preferably extends away from the cavity into the throat of the Y junction and extends across the full width of the waveguide. With the 180 degree phase shift between the slots, only modes having an odd first index will be excited. Furthermore TE modes will not be excited since the H field is perpendicular to the slot direction.
- Equation 2 Equation 2:
- non-circular cylindrical geometries e.g., hexagonal or octagonal cross sections
- Using an octagonal cross section allows ease of alignment when one applicator is positioned adjacent another, because such a geometry has sides or faces at 90 degrees to each other which can be used for alignment between applicators when a pair of applicators are positioned at 90 degrees to each other about the axis 30.
- Equation 10 gives the relationship for a circle that traverses each polygon side twice, symmetrically at V ⁇ of the angle as seen from the center. The error in Equation 10 is less than about 0.3% for typical practical systems.
- a preferred load diameter of 27 mm, applicator length / (and heated load length) of 127 mm, (giving a load volume of about 73 cm 3 ), a 1KW microwave power generator can be used for heating conventional food loads.
- halfwave rectifying power supplies may be used with 180 or 120 degrees phase difference in the power supplies between the respective feed systems, whether in the same or adjacent applicators.
- the waveguide 24 and arms 26, 28 of the present system are preferably conventional TE 10 type, with a 90 mm width and height of 22 mm in the arms and 50 mm in the waveguide 24.
- the feed slots 20 are each preferably 10.5 mm wide and 60 mm long (for the octagonal embodiment, this is equal to the width of one face of the applicator).
- the flag stabilizer 32 is preferably 20 mm long by 90 mm wide, extending across the full width of the waveguide 24 and galvanically bonded to the walls of the waveguide/applicator structure where it contacts such structure.
- the slots 20 are each located in the broadside of each arm 26, 28 and with the centerline of the aperture or slot 20 spaced about 1/4 of a guide wavelength or 43 mm away from the shorted end 40 thereof. As is conventional, the slot length itself is preferably about 1/2 of the free space wavelength. Leakage from the applicator at the entrance aperture 34 and exit aperture
- 36 of the load tube 12 is low because the apertures 34, 36 do not interrupt any strong current (the current density is lowest where the axial E field is maximum—typically near the load circumferential periphery). Nevertheless, it is preferable to surround the microwave transparent load tube with a metal tube 38 extending for at least 25 mm beyond the adjacent end wall of the applicator.
- the load field outside the applicator will decay axially at a rate related to the power penetration depth d p of the load material, defined with a plane wave pe ⁇ endicularly impinging on an infinitely extending halfspace of the load material.
- d p is about 10 mm (at 2450 MHz) resulting in about 5% remaining power density at a distance of 3d p away from the apertures 34.
- the present invention provides a heating apparatus having at least two (but may have up to 20 or 30 or more) applicators 14 per system, each with a 1KW power supply (for 2450 MHz systems) and with adjacent applicators spaced 90 degrees about the axis 30.
- the preferred material for the load tube 12 is polycarbonate with or without a non-stick internal coating, such as polytetrafluoroethylene; alternatively, the material for the load tube may be borosilicate glass or other suitable microwave transparent material.
- a conveyor system may replace or be included within tube 12.
- a belt 42 may be deflected into a "trough-like" configuration 44 by one or more ring-like supports 46 to transport a load 48 made up, for example of particles 50 delivered by nozzle 52.
- the shaped load is then transported along the axis of travel 30 through the assembly 10.
- load cross sections such as elliptical
- FIG. 10 It is to be understood that other load cross sections (such as elliptical) are within the meaning of "circular cross section" herein, provided that such loads behave generally like a circular cross section load.
- the mass flow rate of the load 48 may be controlled as desired.
- the mass flow rate of a load material passing through the tube embodiment 12 may be controlled by a pump or auger moving the load material through tube 12.
- a flow restriction downstream of the assembly 10 may be used to control the mass flow rate of a load material moving vertically downward through assembly 10 via gravity.
- an alternative embodiment of the present invention is shown in the form of an octagonal cross section cavity 70. While the predicted length / for the axial length of an octagonal cavity is 121 mm, it has been found in practice that longer lengths are possible, and desirable from a practical standpoint, provided that no spurious modes are enabled. In practice, it has been found satisfactory to make the axial length / of cavity 70 130 mm (as measured along axis 30). It is believed that the axial length may possibly be extended further in practice, to reduce the power density along the axis 30.
- Cavity 70 being octagonal in cross section has 8 walls or faces, with each having a width of 64.6 mm, and wherein opposing parallel faces are spaced apart a distance of 156 mm.
- Cavity 70 has a first pair of opposed feed apertures 20 and a second pair of opposed feed apertures 21 located at 90 degrees about the axis 30 with respect to the first pair of feed apertures.
- Each of the feed apertures 20, 21 is preferably 64.6 mm long by 10.2 mm wide.
- Feed apertures 20 are fed by a first microwave feed system 72 and feed apertures 21 are fed by a second microwave feed system 74 which is preferably identical to feed system 72, except inverted and rotated 90 degrees.
- Each of feed systems 72 and 74 has a main waveguide 76 supplying waveguide arms 78, 80.
- Each main waveguide preferably is powered by a magnetron 82, shown in phantom, and which has an antenna 84 projecting into an aperture 86, in a manner well- known.
- Each waveguide arm 78, 80 has a coupling slot 88 sized and positioned to match with its respective feed aperture 20 or 21. It is to be understood that feed systems 72, 74 may use the exterior of the walls of cavity 70 as part thereof for microwave containment, as is well-known in the art.
- Each of waveguide arms 78 and 80 has a mitered corner 94 and an offset 90 forming an H knee, modified to be chamfered at surface 92 sufficient to permit the first and second microwave feed systems 72 and 74 to nest together to couple to their respective feed apertures 20 and 21 without mechanical interference with each other. It is further to be understood that feed systems 72, 74 each preferably have flag 32 as a part thereof for the pu ⁇ ose described previously.
- the present invention has the advantages of providing good matching and efficiency to loads having ⁇ >20 and tan ⁇ > 0.3.
- the single mode present gives a highly predictable heating pattern, allowing precise temperature control, when mass flow rate of the load is taken into consideration.
- the practice of the present invention permits elimination of circumferential variations in the heating pattern of the load through the use of the paired, 90 degree displaced applicators.
- ISM frequency of 2450 MHz has been used herein, it is to be understood that other frequencies, such as 915 MHz may be used, as well, with a scale factor of about 2.5 for linear dimensions.
- d p at 915 MHz is typically less than 2.5 times larger than at 2450 MHz, depending upon the larger influence of ionic conduction. Therefore scaling may need to be modified to take this effect into account.
- Equation 8 Determine the desired load diameter for load resonance using Equation 8 as a starting point for a first approximation and then using Equations 1 - 3 to finalize the desired load diameter.
- Equation 10 To extend the result to a polygonal cross section applicator, use Equation 10.
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CA002302668A CA2302668A1 (en) | 1997-09-08 | 1998-09-08 | Tubular microwave applicator |
EP98945960A EP1013150B1 (en) | 1997-09-08 | 1998-09-08 | Tubular microwave applicator |
AU93090/98A AU750559B2 (en) | 1997-09-08 | 1998-09-08 | Tubular microwave applicator |
DE69811691T DE69811691D1 (en) | 1997-09-08 | 1998-09-08 | TUBULAR MICROWAVE APPLICATOR |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/925,233 | 1997-09-08 | ||
US08/925,233 US5834744A (en) | 1997-09-08 | 1997-09-08 | Tubular microwave applicator |
Publications (1)
Publication Number | Publication Date |
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WO1999013689A1 true WO1999013689A1 (en) | 1999-03-18 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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PCT/US1998/018716 WO1999013689A1 (en) | 1997-09-08 | 1998-09-08 | Tubular microwave applicator |
Country Status (6)
Country | Link |
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US (1) | US5834744A (en) |
EP (1) | EP1013150B1 (en) |
AU (1) | AU750559B2 (en) |
CA (1) | CA2302668A1 (en) |
DE (1) | DE69811691D1 (en) |
WO (1) | WO1999013689A1 (en) |
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Also Published As
Publication number | Publication date |
---|---|
AU750559B2 (en) | 2002-07-25 |
CA2302668A1 (en) | 1999-03-18 |
AU9309098A (en) | 1999-03-29 |
US5834744A (en) | 1998-11-10 |
DE69811691D1 (en) | 2003-04-03 |
EP1013150A1 (en) | 2000-06-28 |
EP1013150B1 (en) | 2003-02-26 |
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