WO1999020087A3 - System for plasma ignition by fast voltage rise - Google Patents

System for plasma ignition by fast voltage rise Download PDF

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Publication number
WO1999020087A3
WO1999020087A3 PCT/US1998/021534 US9821534W WO9920087A3 WO 1999020087 A3 WO1999020087 A3 WO 1999020087A3 US 9821534 W US9821534 W US 9821534W WO 9920087 A3 WO9920087 A3 WO 9920087A3
Authority
WO
WIPO (PCT)
Prior art keywords
voltage rise
plasma
less
plasma ignition
electrons
Prior art date
Application number
PCT/US1998/021534
Other languages
French (fr)
Other versions
WO1999020087A2 (en
Inventor
Geoffrey D Drummond
George Mcdonough
Richard A Scholl
Tim Kerr
John G Harpold
Original Assignee
Advanced Energy Ind Inc
Geoffrey D Drummond
George Mcdonough
Richard A Scholl
Tim Kerr
John G Harpold
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Energy Ind Inc, Geoffrey D Drummond, George Mcdonough, Richard A Scholl, Tim Kerr, John G Harpold filed Critical Advanced Energy Ind Inc
Priority to JP2000516513A priority Critical patent/JP2002533868A/en
Priority to KR1020007003959A priority patent/KR20010031093A/en
Priority to EP98953418A priority patent/EP1023819A4/en
Priority to US09/529,431 priority patent/US6633017B1/en
Publication of WO1999020087A2 publication Critical patent/WO1999020087A2/en
Publication of WO1999020087A3 publication Critical patent/WO1999020087A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H01J2237/3321—CVD [Chemical Vapor Deposition]
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03K—PULSE TECHNIQUE
    • H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
    • H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
    • H03K3/53—Generators characterised by the type of circuit or by the means used for producing pulses by the use of an energy-accumulating element discharged through the load by a switching device controlled by an external signal and not incorporating positive feedback

Abstract

An improved system of igniting a plasma (3) can act by using a rapid voltage rise and thus cause ions (12) which may be pre-existing to create secondary electron emission or the like. In one embodiment, the voltage rise can be timed to be comparable to the transit time of the electrons across the plasma. It can also be arranged to achieve a voltage rise in less than 1000 microseconds, to result in a transition time which is less than one hundred times the transit time, to maximize the emission of secondary electrons, or even to merely result in collision energies ranging from 5 to 500 electron volts. The transition time can be controlled through an ignition control (9) which may be programmable, may involve charging output storage devices, or may involve delayed switching to supply the increased voltage to the plasma after the storage elements have been more fully charged.
PCT/US1998/021534 1997-10-14 1998-10-13 System for plasma ignition by fast voltage rise WO1999020087A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2000516513A JP2002533868A (en) 1997-10-14 1998-10-13 System for plasma ignition with fast voltage increase
KR1020007003959A KR20010031093A (en) 1997-10-14 1998-10-13 System for plasma ignition by fast voltage rise
EP98953418A EP1023819A4 (en) 1997-10-14 1998-10-13 System for plasma ignition by fast voltage rise
US09/529,431 US6633017B1 (en) 1997-10-14 1998-10-13 System for plasma ignition by fast voltage rise

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US6194197P 1997-10-14 1997-10-14
US60/061,941 1997-10-14

Publications (2)

Publication Number Publication Date
WO1999020087A2 WO1999020087A2 (en) 1999-04-22
WO1999020087A3 true WO1999020087A3 (en) 1999-07-08

Family

ID=22039152

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1998/021534 WO1999020087A2 (en) 1997-10-14 1998-10-13 System for plasma ignition by fast voltage rise

Country Status (5)

Country Link
US (1) US6633017B1 (en)
EP (1) EP1023819A4 (en)
JP (1) JP2002533868A (en)
KR (1) KR20010031093A (en)
WO (1) WO1999020087A2 (en)

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US7375035B2 (en) * 2003-04-29 2008-05-20 Ronal Systems Corporation Host and ancillary tool interface methodology for distributed processing
US7429714B2 (en) * 2003-06-20 2008-09-30 Ronal Systems Corporation Modular ICP torch assembly
US7095179B2 (en) * 2004-02-22 2006-08-22 Zond, Inc. Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities
US7663319B2 (en) * 2004-02-22 2010-02-16 Zond, Inc. Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities
US9123508B2 (en) * 2004-02-22 2015-09-01 Zond, Llc Apparatus and method for sputtering hard coatings
DE102004015090A1 (en) 2004-03-25 2005-11-03 Hüttinger Elektronik Gmbh + Co. Kg Arc discharge detection device
DE102004039406A1 (en) 2004-08-13 2006-02-23 Siemens Ag Plasma ignition method and apparatus for igniting fuel / air mixtures in internal combustion engines
US7081598B2 (en) * 2004-08-24 2006-07-25 Advanced Energy Industries, Inc. DC-DC converter with over-voltage protection circuit
EP2477207A3 (en) * 2004-09-24 2014-09-03 Zond, Inc. Apparatus for generating high-current electrical discharges
US7422664B2 (en) * 2006-02-03 2008-09-09 Applied Materials, Inc. Method for plasma ignition
JP4983087B2 (en) * 2006-04-27 2012-07-25 富士通セミコンダクター株式会社 Film-forming method, semiconductor device manufacturing method, computer-readable recording medium, sputtering apparatus
ATE448562T1 (en) * 2006-11-23 2009-11-15 Huettinger Elektronik Gmbh METHOD FOR DETECTING AN ARC DISCHARGE IN A PLASMA PROCESS AND ARC DISCHARGE DETECTION DEVICE
US7795817B2 (en) * 2006-11-24 2010-09-14 Huettinger Elektronik Gmbh + Co. Kg Controlled plasma power supply
EP1928009B1 (en) * 2006-11-28 2013-04-10 HÜTTINGER Elektronik GmbH + Co. KG Arc detection system, plasma power supply and arc detection method
EP1933362B1 (en) * 2006-12-14 2011-04-13 HÜTTINGER Elektronik GmbH + Co. KG Arc detection system, plasma power supply and arc detection method
US8217299B2 (en) * 2007-02-22 2012-07-10 Advanced Energy Industries, Inc. Arc recovery without over-voltage for plasma chamber power supplies using a shunt switch
US8133359B2 (en) 2007-11-16 2012-03-13 Advanced Energy Industries, Inc. Methods and apparatus for sputtering deposition using direct current
US9039871B2 (en) 2007-11-16 2015-05-26 Advanced Energy Industries, Inc. Methods and apparatus for applying periodic voltage using direct current
US9617965B2 (en) 2013-12-16 2017-04-11 Transient Plasma Systems, Inc. Repetitive ignition system for enhanced combustion
KR102504624B1 (en) * 2017-07-07 2023-02-27 어드밴스드 에너지 인더스트리즈 인코포레이티드 Inter-period control system for plasma power delivery system and method of operating the same
US11651939B2 (en) * 2017-07-07 2023-05-16 Advanced Energy Industries, Inc. Inter-period control system for plasma power delivery system and method of operating same
US11615943B2 (en) * 2017-07-07 2023-03-28 Advanced Energy Industries, Inc. Inter-period control for passive power distribution of multiple electrode inductive plasma source
WO2019144037A1 (en) 2018-01-22 2019-07-25 Transient Plasma Systems, Inc. Resonant pulsed voltage multiplier and capacitor charger
WO2019143992A1 (en) 2018-01-22 2019-07-25 Transient Plasma Systems, Inc. Inductively coupled pulsed rf voltage multiplier
US11629860B2 (en) 2018-07-17 2023-04-18 Transient Plasma Systems, Inc. Method and system for treating emissions using a transient pulsed plasma
EP3824223B1 (en) 2018-07-17 2024-03-06 Transient Plasma Systems, Inc. Method and system for treating cooking smoke emissions using a transient pulsed plasma
US11696388B2 (en) 2019-05-07 2023-07-04 Transient Plasma Systems, Inc. Pulsed non-thermal atmospheric pressure plasma processing system
US10886104B2 (en) 2019-06-10 2021-01-05 Advanced Energy Industries, Inc. Adaptive plasma ignition
JP7236954B2 (en) * 2019-08-06 2023-03-10 東京エレクトロン株式会社 Plasma processing equipment
CN113543446A (en) * 2020-04-13 2021-10-22 台达电子工业股份有限公司 Ignition method of power generator
US11688584B2 (en) 2020-04-29 2023-06-27 Advanced Energy Industries, Inc. Programmable ignition profiles for enhanced plasma ignition
US11811199B2 (en) 2021-03-03 2023-11-07 Transient Plasma Systems, Inc. Apparatus and methods of detecting transient discharge modes and/or closed loop control of pulsed systems and method employing same

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US5535906A (en) * 1995-01-30 1996-07-16 Advanced Energy Industries, Inc. Multi-phase DC plasma processing system
US5561350A (en) * 1988-11-15 1996-10-01 Unison Industries Ignition System for a turbine engine
US5645698A (en) * 1992-09-30 1997-07-08 Advanced Energy Industries, Inc. Topographically precise thin film coating system

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US5561350A (en) * 1988-11-15 1996-10-01 Unison Industries Ignition System for a turbine engine
US5645698A (en) * 1992-09-30 1997-07-08 Advanced Energy Industries, Inc. Topographically precise thin film coating system
US5535906A (en) * 1995-01-30 1996-07-16 Advanced Energy Industries, Inc. Multi-phase DC plasma processing system

Also Published As

Publication number Publication date
JP2002533868A (en) 2002-10-08
KR20010031093A (en) 2001-04-16
WO1999020087A2 (en) 1999-04-22
US6633017B1 (en) 2003-10-14
EP1023819A4 (en) 2007-10-17
EP1023819A2 (en) 2000-08-02

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