WO2000028580A3 - Method and apparatus for cleaning the edge of a thin disc - Google Patents

Method and apparatus for cleaning the edge of a thin disc Download PDF

Info

Publication number
WO2000028580A3
WO2000028580A3 PCT/US1999/026067 US9926067W WO0028580A3 WO 2000028580 A3 WO2000028580 A3 WO 2000028580A3 US 9926067 W US9926067 W US 9926067W WO 0028580 A3 WO0028580 A3 WO 0028580A3
Authority
WO
WIPO (PCT)
Prior art keywords
wafer
transducer
edge
cleaning
approximately
Prior art date
Application number
PCT/US1999/026067
Other languages
French (fr)
Other versions
WO2000028580A2 (en
Inventor
Boris Fishkin
Brian J Brown
Jianshe Tang
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of WO2000028580A2 publication Critical patent/WO2000028580A2/en
Publication of WO2000028580A3 publication Critical patent/WO2000028580A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

Abstract

A method and apparatus for cleaning wafer edges is provided. The inventive wafer cleaner employs a transducer equal in length to the diameter of a wafer to be cleaned, and positioned to direct sonic energy in line with the wafer's edge. Supporting and rotating mechanisms are positioned along the wafer's edge, outside of the transducer's high energy field, and preferably such that approximately 50 percent of the wafer is positioned between the wafer supports and the transducer. Therefore, minimal sonic energy is blocked from reaching the wafer's surface. The transducer dimensions relative to the wafer, and the positioning of the wafer supports relative to the transducer enable the system to achieve an approximately 50 percent edge cleaning duty cycle as the wafer is rotated.
PCT/US1999/026067 1998-11-11 1999-11-04 Method and apparatus for cleaning the edge of a thin disc WO2000028580A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/191,057 US6119708A (en) 1998-11-11 1998-11-11 Method and apparatus for cleaning the edge of a thin disc
US09/191,057 1998-11-11

Publications (2)

Publication Number Publication Date
WO2000028580A2 WO2000028580A2 (en) 2000-05-18
WO2000028580A3 true WO2000028580A3 (en) 2000-07-27

Family

ID=22703965

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1999/026067 WO2000028580A2 (en) 1998-11-11 1999-11-04 Method and apparatus for cleaning the edge of a thin disc

Country Status (3)

Country Link
US (2) US6119708A (en)
TW (1) TW460926B (en)
WO (1) WO2000028580A2 (en)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5957754A (en) * 1997-08-29 1999-09-28 Applied Materials, Inc. Cavitational polishing pad conditioner
US6575177B1 (en) * 1999-04-27 2003-06-10 Applied Materials Inc. Semiconductor substrate cleaning system
US6412503B1 (en) * 1999-06-01 2002-07-02 Applied Materials, Inc. Magnetically coupled substrate roller
US6460551B1 (en) * 1999-10-29 2002-10-08 Applied Materials, Inc. Megasonic resonator for disk cleaning and method for use thereof
EP1168422B1 (en) * 2000-06-27 2009-12-16 Imec Method and apparatus for liquid-treating and drying a substrate
JP2002093765A (en) * 2000-09-20 2002-03-29 Kaijo Corp Method and equipment for cleaning substrate
US6725869B2 (en) * 2001-03-23 2004-04-27 Applied Materials Inc. Protective barrier for cleaning chamber
US20030015494A1 (en) * 2001-07-20 2003-01-23 Seagate Technology Llc Single layer resist lift-off process and apparatus for submicron structures
US20040050408A1 (en) * 2002-09-13 2004-03-18 Christenson Kurt K. Treatment systems and methods
US20070095367A1 (en) * 2005-10-28 2007-05-03 Yaxin Wang Apparatus and method for atomic layer cleaning and polishing
US20080156360A1 (en) * 2006-12-26 2008-07-03 Applied Materials, Inc. Horizontal megasonic module for cleaning substrates
US7980000B2 (en) 2006-12-29 2011-07-19 Applied Materials, Inc. Vapor dryer having hydrophilic end effector
US20080155852A1 (en) * 2006-12-29 2008-07-03 Olgado Donald J K Multiple substrate vapor drying systems and methods
US20090242126A1 (en) * 2008-03-31 2009-10-01 Memc Electronic Materials, Inc. Edge etching apparatus for etching the edge of a silicon wafer
US20090320875A1 (en) * 2008-06-25 2009-12-31 Applied Materials, Inc. Dual chamber megasonic cleaner
US8844546B2 (en) * 2008-10-01 2014-09-30 Applied Materials, Inc. Apparatus and method for cleaning semiconductor substrate using pressurized fluid
US7962990B2 (en) * 2008-10-01 2011-06-21 Applied Materials, Inc. Brush box cleaner module with force control
US8181302B2 (en) * 2009-09-22 2012-05-22 Applied Materials, Inc. Brush alignment control mechanism
US9646859B2 (en) 2010-04-30 2017-05-09 Applied Materials, Inc. Disk-brush cleaner module with fluid jet

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0449619A (en) * 1990-06-18 1992-02-19 Shimada Phys & Chem Ind Co Ltd Ultrasonic washing tank
US5090432A (en) * 1990-10-16 1992-02-25 Verteq, Inc. Single wafer megasonic semiconductor wafer processing system
US5379785A (en) * 1991-10-09 1995-01-10 Mitsubishi Denki Kabushiki Kaisha Cleaning apparatus
US5383484A (en) * 1993-07-16 1995-01-24 Cfmt, Inc. Static megasonic cleaning system for cleaning objects
JPH0975874A (en) * 1995-09-19 1997-03-25 Mitsubishi Materials Shilicon Corp Method and device for cleaning single-crystal block

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4869278A (en) * 1987-04-29 1989-09-26 Bran Mario E Megasonic cleaning apparatus
US5672212A (en) * 1994-07-01 1997-09-30 Texas Instruments Incorporated Rotational megasonic cleaner/etcher for wafers
TW504041U (en) * 1997-02-21 2002-09-21 Canon Kk Wafer processing apparatus

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0449619A (en) * 1990-06-18 1992-02-19 Shimada Phys & Chem Ind Co Ltd Ultrasonic washing tank
US5090432A (en) * 1990-10-16 1992-02-25 Verteq, Inc. Single wafer megasonic semiconductor wafer processing system
US5379785A (en) * 1991-10-09 1995-01-10 Mitsubishi Denki Kabushiki Kaisha Cleaning apparatus
US5383484A (en) * 1993-07-16 1995-01-24 Cfmt, Inc. Static megasonic cleaning system for cleaning objects
JPH0975874A (en) * 1995-09-19 1997-03-25 Mitsubishi Materials Shilicon Corp Method and device for cleaning single-crystal block

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 016, no. 240 (E - 1211) 3 June 1992 (1992-06-03) *
PATENT ABSTRACTS OF JAPAN vol. 1997, no. 07 31 July 1997 (1997-07-31) *

Also Published As

Publication number Publication date
TW460926B (en) 2001-10-21
US6119708A (en) 2000-09-19
US6276371B1 (en) 2001-08-21
WO2000028580A2 (en) 2000-05-18

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