WO2000036525A3 - Mechanisms for making and inspecting reticles - Google Patents

Mechanisms for making and inspecting reticles Download PDF

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Publication number
WO2000036525A3
WO2000036525A3 PCT/US1999/030240 US9930240W WO0036525A3 WO 2000036525 A3 WO2000036525 A3 WO 2000036525A3 US 9930240 W US9930240 W US 9930240W WO 0036525 A3 WO0036525 A3 WO 0036525A3
Authority
WO
WIPO (PCT)
Prior art keywords
reticle
inspection
circuit design
reusable
integrated circuit
Prior art date
Application number
PCT/US1999/030240
Other languages
French (fr)
Other versions
WO2000036525A2 (en
Inventor
Lance A Glasser
Jun Ye
Shauh-Teh Juang
David S Alles
James N Wiley
Original Assignee
Kla Tencor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kla Tencor Corp filed Critical Kla Tencor Corp
Priority to JP2000588700A priority Critical patent/JP4739527B2/en
Priority to EP99966428A priority patent/EP1141868A2/en
Publication of WO2000036525A2 publication Critical patent/WO2000036525A2/en
Publication of WO2000036525A3 publication Critical patent/WO2000036525A3/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Abstract

A reusable circuit design (250, 300) for use with electronic design automation EDA tools in designing integrated circuits is disclosed, as well as reticle inspection and fabrication methods that are based on such reusable circuit design. The reusable circuit design (250, 300) is stored on a computer readable medium and contains an electronic representation of a layout pattern (260, 258, 302) for at least one layer of the circuit design on an integrated circuit. The layout pattern includes a flagged critical region which corresponds to a critical region (256, 304) on a reticle or integrated circuit that is susceptible to special inspection or fabrication procedures. In one aspect of the reusable circuit design, the special analysis is performed during one from a group consisting of reticle inspection, reticle production, integrated circuit fabrication, and fabricated integrated circuit inspection.
PCT/US1999/030240 1998-12-17 1999-12-17 Mechanisms for making and inspecting reticles WO2000036525A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2000588700A JP4739527B2 (en) 1998-12-17 1999-12-17 Mechanisms for manufacturing and inspecting reticles
EP99966428A EP1141868A2 (en) 1998-12-17 1999-12-17 Mechanisms for making and inspecting reticles

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/213,744 1998-12-17
US09/213,744 US6529621B1 (en) 1998-12-17 1998-12-17 Mechanisms for making and inspecting reticles

Publications (2)

Publication Number Publication Date
WO2000036525A2 WO2000036525A2 (en) 2000-06-22
WO2000036525A3 true WO2000036525A3 (en) 2000-10-19

Family

ID=22796329

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1999/030240 WO2000036525A2 (en) 1998-12-17 1999-12-17 Mechanisms for making and inspecting reticles

Country Status (4)

Country Link
US (2) US6529621B1 (en)
EP (2) EP1752897A1 (en)
JP (2) JP4739527B2 (en)
WO (1) WO2000036525A2 (en)

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US8923600B2 (en) 2005-11-18 2014-12-30 Kla-Tencor Technologies Corp. Methods and systems for utilizing design data in combination with inspection data
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Cited By (7)

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JP2002532760A (en) 2002-10-02
JP5075904B2 (en) 2012-11-21
EP1141868A2 (en) 2001-10-10
JP4739527B2 (en) 2011-08-03
WO2000036525A2 (en) 2000-06-22
US6529621B1 (en) 2003-03-04
EP1752897A1 (en) 2007-02-14
US20030142860A1 (en) 2003-07-31
US6748103B2 (en) 2004-06-08
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