WO2000058188B1 - Wafer handling robot having x-y stage for wafer handling and positioning - Google Patents

Wafer handling robot having x-y stage for wafer handling and positioning

Info

Publication number
WO2000058188B1
WO2000058188B1 PCT/US2000/006661 US0006661W WO0058188B1 WO 2000058188 B1 WO2000058188 B1 WO 2000058188B1 US 0006661 W US0006661 W US 0006661W WO 0058188 B1 WO0058188 B1 WO 0058188B1
Authority
WO
WIPO (PCT)
Prior art keywords
effector
stage
chuck
bed
wafer handling
Prior art date
Application number
PCT/US2000/006661
Other languages
French (fr)
Other versions
WO2000058188A1 (en
Inventor
Dale H Buermann
Original Assignee
N & K Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by N & K Technology Inc filed Critical N & K Technology Inc
Publication of WO2000058188A1 publication Critical patent/WO2000058188A1/en
Publication of WO2000058188B1 publication Critical patent/WO2000058188B1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67766—Mechanical parts of transfer devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/137—Associated with semiconductor wafer handling including means for charging or discharging wafer cassette

Abstract

An apparatus for handling and positioning wafers (34) or other flat objects. The apparatus has an XY stage (24) with an X-drive (26) and a Y-drive (28), and a bed (30) attached to the XY stage. A chuck (37) is disposed on the bed and an effector (38) is attached to the bed. The effector can rotate about an axis of rotation extending in the Z-direction. The effector can pick up objects and place the objects onto the chuck. The effector can also pick up objects from the chuck. Preferably, the chuck has a recessed region (50) for accommodating the effector so that the effector can be inserted under a flat object on the chuck. The X-drive or the Y-drive of the XY stage provides linear motion for the effector so that the effector can pull wafers from a cassette (32) such as used in the semiconductor industry.

Claims

AMENDED CLAIMS
[received by the International Bureau on 10 October 2000 (10.10.00); original claims 21-40 cancelled; remaining claims unchanged (1 page)]
disposed such that the effector may place the flat object onto the chuc .
12. The XY stage of claim 11 further comprising a second effector attached to the bed, wherein the second effector is capable of rotation about a second Z-axis with respect to the bed.
13. The XY stage of claim 12 wherein the second effector is capable of moving in a Z-direction with respect to the bed.
14. The XY stage of claim 13 further comprising a means for moving the second effector between two discrete Z- positions .
15. The XY stage of claim 11 wherein the chuck is a vacuum chuck for receiving flat objects.
16. The XY stage of claim 11 wherein the effector is capable of moving in the Z-direction with respect to the bed.
17. The XY stage of claim 16 further comprising a means for moving the effector between two discrete Z-positions.
18. The XY stage of claim 11 wherein the effector has holes for engaging the flat objects with a vacuum.
19. The XY stage of claim 11 wherein the chuck is capable of moving in the Z-direction.
20. The XY stage of claim 11 wherein the chuck has a recessed region for accommodating the effector .
18
PCT/US2000/006661 1999-03-25 2000-03-14 Wafer handling robot having x-y stage for wafer handling and positioning WO2000058188A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US27613899A 1999-03-25 1999-03-25
US09/276,138 1999-03-25

Publications (2)

Publication Number Publication Date
WO2000058188A1 WO2000058188A1 (en) 2000-10-05
WO2000058188B1 true WO2000058188B1 (en) 2001-01-11

Family

ID=23055346

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2000/006661 WO2000058188A1 (en) 1999-03-25 2000-03-14 Wafer handling robot having x-y stage for wafer handling and positioning

Country Status (2)

Country Link
US (1) US6811370B2 (en)
WO (1) WO2000058188A1 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2380602B (en) * 2001-05-19 2005-03-02 Wentworth Lab Ltd Wafer alignment device
JPWO2003091741A1 (en) * 2002-04-25 2005-09-02 株式会社アドバンテスト Electronic component testing equipment
US20060154388A1 (en) * 2005-01-08 2006-07-13 Richard Lewington Integrated metrology chamber for transparent substrates
US7601272B2 (en) * 2005-01-08 2009-10-13 Applied Materials, Inc. Method and apparatus for integrating metrology with etch processing
US20060213537A1 (en) * 2005-03-23 2006-09-28 Thu Anh To Vertical wafer platform systems and methods for fast wafer cleaning and measurement
US7717661B1 (en) * 2006-05-25 2010-05-18 N&K Technology, Inc. Compact multiple diameters wafer handling system with on-chuck wafer calibration and integrated cassette-chuck transfer
US7764366B2 (en) * 2006-07-11 2010-07-27 Besi North America, Inc. Robotic die sorter with optical inspection system
US7962242B1 (en) * 2008-03-18 2011-06-14 N&K Technology Inc. Automated spatial flipping apparatus and system for photomasks and photomasks with pellicles
DE102009018977A1 (en) * 2009-04-25 2010-11-04 Ev Group Gmbh Device for aligning and prefixing a wafer
US20110172952A1 (en) * 2009-10-05 2011-07-14 Upendra Ummethala Apparatus and Method for Measuring Position and/or Motion Using Surface Micro-Structure
CN101898683B (en) * 2010-03-05 2012-07-04 东莞宏威数码机械有限公司 Movable rotary loading mechanism
JP2013165241A (en) * 2012-02-13 2013-08-22 Yaskawa Electric Corp Transporting apparatus
US11199562B2 (en) 2019-08-08 2021-12-14 Western Digital Technologies, Inc. Wafer testing system including a wafer-flattening multi-zone vacuum chuck and method for operating the same

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3902615A (en) * 1973-03-12 1975-09-02 Computervision Corp Automatic wafer loading and pre-alignment system
US4402613A (en) * 1979-03-29 1983-09-06 Advanced Semiconductor Materials America Surface inspection system
DE3219502C2 (en) * 1982-05-25 1990-04-19 Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar Device for the automatic transport of disc-shaped objects
US4818169A (en) * 1985-05-17 1989-04-04 Schram Richard R Automated wafer inspection system
US4886412A (en) * 1986-10-28 1989-12-12 Tetron, Inc. Method and system for loading wafers
US4907931A (en) * 1988-05-18 1990-03-13 Prometrix Corporation Apparatus for handling semiconductor wafers
IL86514A0 (en) * 1988-05-26 1988-11-15
US4901011A (en) * 1988-11-04 1990-02-13 Tokyo Electron Limited Carrier for transferring plate-like objects one by one, a handling apparatus for loading or unloading the carrier, and a wafer probing machine fitted with the handling apparatus for the wafer carrier
US5479108A (en) * 1992-11-25 1995-12-26 David Cheng Method and apparatus for handling wafers
JPH09107013A (en) * 1995-10-09 1997-04-22 Dainippon Screen Mfg Co Ltd Substrate transferer
US6164894A (en) * 1997-11-04 2000-12-26 Cheng; David Method and apparatus for integrated wafer handling and testing
US6130490A (en) * 1999-04-06 2000-10-10 Nikon Corporation X-Y stage with movable magnet plate

Also Published As

Publication number Publication date
US6811370B2 (en) 2004-11-02
US20010000721A1 (en) 2001-05-03
WO2000058188A1 (en) 2000-10-05

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