WO2000065331A3 - System for analyzing surface characteristics with self-calibrating capability - Google Patents

System for analyzing surface characteristics with self-calibrating capability Download PDF

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Publication number
WO2000065331A3
WO2000065331A3 PCT/US2000/010875 US0010875W WO0065331A3 WO 2000065331 A3 WO2000065331 A3 WO 2000065331A3 US 0010875 W US0010875 W US 0010875W WO 0065331 A3 WO0065331 A3 WO 0065331A3
Authority
WO
WIPO (PCT)
Prior art keywords
sample
self
ellipsometer
radiation
calibrating
Prior art date
Application number
PCT/US2000/010875
Other languages
French (fr)
Other versions
WO2000065331A2 (en
WO2000065331A9 (en
Inventor
Haiming Wang
Patrick M Maxton
Kenneth C Johnson
Mehrdad Nikoonahad
Original Assignee
Kla Tencor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/298,007 external-priority patent/US6734968B1/en
Application filed by Kla Tencor Corp filed Critical Kla Tencor Corp
Priority to JP2000614020A priority Critical patent/JP5248722B2/en
Publication of WO2000065331A2 publication Critical patent/WO2000065331A2/en
Publication of WO2000065331A3 publication Critical patent/WO2000065331A3/en
Publication of WO2000065331A9 publication Critical patent/WO2000065331A9/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0641—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization

Abstract

Two phase modulators or polarizing elements are employed to modulate the polarization of an interrogating radiation beam before and after the beam has been modified by a sample to be measured. The detected signal may be used to derive ellipsometric and system parameters, such as parameters related to the angle of fixed polarizing elements and retardances of phase modulators. A portion of the radiation may be diverted for detecting sample tilt or a change in sample height. A cylindrical objective may be used for focusing the beam onto the sample to illuminate a circular spot on the sample. The above-described self-calibrating ellipsometer may be combined with another optical measurement instrument such as a polarimeter, a spectroreflectometer or another ellipsometer to improve the accuracy of measurement and/or to provide calibration standards for the optical measurement instrument. The self-calibrating ellipsometer as well as the combined system may be used for measuring sample characteristics such as film thickness and depolarization of radiation caused by the sample.
PCT/US2000/010875 1999-04-22 2000-04-21 System for analyzing surface characteristics with self-calibrating capability WO2000065331A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000614020A JP5248722B2 (en) 1999-04-22 2000-04-21 Surface characteristic analysis system with self-calibration function

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/298,007 1999-04-22
US09/298,007 US6734968B1 (en) 1999-02-09 1999-04-22 System for analyzing surface characteristics with self-calibrating capability

Publications (3)

Publication Number Publication Date
WO2000065331A2 WO2000065331A2 (en) 2000-11-02
WO2000065331A3 true WO2000065331A3 (en) 2001-02-15
WO2000065331A9 WO2000065331A9 (en) 2002-06-13

Family

ID=23148603

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2000/010875 WO2000065331A2 (en) 1999-04-22 2000-04-21 System for analyzing surface characteristics with self-calibrating capability

Country Status (2)

Country Link
JP (2) JP5248722B2 (en)
WO (1) WO2000065331A2 (en)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0118981D0 (en) * 2001-08-03 2001-09-26 Renishaw Plc Electron microscope and spectroscopy system
US6515744B2 (en) 2001-02-08 2003-02-04 Therma-Wave, Inc. Small spot ellipsometer
EP1376100B1 (en) * 2002-06-17 2006-04-05 Horiba Jobin Yvon S.A.S. Achromatic spectroscopic ellipsometer with high spatial resolution
US7369233B2 (en) 2002-11-26 2008-05-06 Kla-Tencor Technologies Corporation Optical system for measuring samples using short wavelength radiation
US7577076B2 (en) 2003-03-14 2009-08-18 Ricoh Company, Ltd. Tilt sensor using diffraction grating
JP2008275632A (en) * 2003-05-20 2008-11-13 Dainippon Screen Mfg Co Ltd Spectroscopic ellipsometer
US7349079B2 (en) 2004-05-14 2008-03-25 Kla-Tencor Technologies Corp. Methods for measurement or analysis of a nitrogen concentration of a specimen
US7564552B2 (en) 2004-05-14 2009-07-21 Kla-Tencor Technologies Corp. Systems and methods for measurement of a specimen with vacuum ultraviolet light
US7067819B2 (en) 2004-05-14 2006-06-27 Kla-Tencor Technologies Corp. Systems and methods for measurement or analysis of a specimen using separated spectral peaks in light
US7359052B2 (en) 2004-05-14 2008-04-15 Kla-Tencor Technologies Corp. Systems and methods for measurement of a specimen with vacuum ultraviolet light
US7408641B1 (en) 2005-02-14 2008-08-05 Kla-Tencor Technologies Corp. Measurement systems configured to perform measurements of a specimen and illumination subsystems configured to provide illumination for a measurement system
JP4779124B2 (en) * 2005-03-28 2011-09-28 国立大学法人東京農工大学 Optical characteristic measuring apparatus and optical characteristic measuring method
US7277172B2 (en) * 2005-06-06 2007-10-02 Kla-Tencor Technologies, Corporation Measuring overlay and profile asymmetry using symmetric and anti-symmetric scatterometry signals
US20090033936A1 (en) * 2005-06-13 2009-02-05 National University Corporation Tokyo University Agriculture And Technology Optical characteristic measuring apparatus and optical characteristic measuring method
US7298480B2 (en) * 2005-12-23 2007-11-20 Ecole Polytechnique Broadband ellipsometer / polarimeter system
EP2044404A4 (en) * 2006-07-11 2012-10-24 J A Woollam Co Inc Discrete polarization state rotatable compensator spectroscopic ellipsometer system, and method of calibration
WO2008081374A2 (en) * 2006-12-28 2008-07-10 Koninklijke Philips Electronics N.V. Reflection or single scattering spectroscopy and imaging
JP5156306B2 (en) * 2007-09-14 2013-03-06 大塚電子株式会社 Optical anisotropy measuring apparatus and optical anisotropy measuring method
JP2009103598A (en) * 2007-10-24 2009-05-14 Dainippon Screen Mfg Co Ltd Spectroscopic ellipsometer and polarization analysis method
WO2009136901A1 (en) * 2008-05-09 2009-11-12 J.A. Woollam Co., Inc. Fast sample height, aoi and poi alignment in mapping ellipsometer or the like
US8446584B2 (en) * 2011-05-13 2013-05-21 Kla-Tencor Corporation Reconfigurable spectroscopic ellipsometer
KR101942388B1 (en) 2012-02-21 2019-01-25 에이에스엠엘 네델란즈 비.브이. Inspection apparatus and method
CN102878940B (en) * 2012-09-29 2015-08-19 中国科学院微电子研究所 A kind of calibration steps comprising the ellipsometer test of phase compensator
CN102879337B (en) * 2012-09-29 2015-08-19 中国科学院微电子研究所 A kind of calibration steps of ellipsometer test
JP7136958B1 (en) * 2021-03-24 2022-09-13 アンリツ株式会社 Light source device for optical measuring instrument and optical spectrum analyzer
CN113514400B (en) * 2021-04-23 2022-10-11 长春理工大学 Polarization measurement method of smoke particle Mueller matrix
KR20230030346A (en) * 2021-08-25 2023-03-06 삼성전자주식회사 Polarization Measuring Device and method for fabricating semiconductor device using thereof

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4306809A (en) * 1979-03-26 1981-12-22 The Board Of Regents Of The University Of Nebraska Polarimeter
US4893932A (en) * 1986-05-02 1990-01-16 Particle Measuring Systems, Inc. Surface analysis system and method
US5581350A (en) * 1995-06-06 1996-12-03 Tencor Instruments Method and system for calibrating an ellipsometer
US5608526A (en) * 1995-01-19 1997-03-04 Tencor Instruments Focused beam spectroscopic ellipsometry method and system
WO1998039633A1 (en) * 1997-03-03 1998-09-11 J.A. Woollam Company Incorporated Regression calibrated spectroscopic rotating compensator ellipsometer system with photo array detector
WO2000047961A1 (en) * 1999-02-09 2000-08-17 Kla-Tencor Corporation System for measuring polarimetric spectrum and other properties of a sample

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2661913B2 (en) * 1986-05-02 1997-10-08 パ−テイクル、メジユアリング、システムズ インコ−ポレ−テツド Surface analysis method and surface analysis device
JPH07151674A (en) * 1993-11-30 1995-06-16 Shimadzu Corp Quenching polarization measuring apparatus

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4306809A (en) * 1979-03-26 1981-12-22 The Board Of Regents Of The University Of Nebraska Polarimeter
US4893932A (en) * 1986-05-02 1990-01-16 Particle Measuring Systems, Inc. Surface analysis system and method
US4893932B1 (en) * 1986-05-02 1992-10-20 Particle Measuring Syst
US5608526A (en) * 1995-01-19 1997-03-04 Tencor Instruments Focused beam spectroscopic ellipsometry method and system
US5581350A (en) * 1995-06-06 1996-12-03 Tencor Instruments Method and system for calibrating an ellipsometer
WO1998039633A1 (en) * 1997-03-03 1998-09-11 J.A. Woollam Company Incorporated Regression calibrated spectroscopic rotating compensator ellipsometer system with photo array detector
WO2000047961A1 (en) * 1999-02-09 2000-08-17 Kla-Tencor Corporation System for measuring polarimetric spectrum and other properties of a sample

Non-Patent Citations (5)

* Cited by examiner, † Cited by third party
Title
ASPNES D E ET AL: "ROTATING-COMPENSATOR/ANALYZER FIXED-ANALYZER ELLIPSOMETER: ANALYSIS AND COMPARISON TO OTHER AUTOMATIC ELLIPSOMETERS", JOURNAL OF THE OPTICAL SOCIETY OF AMERICA,US,AMERICAN INSTITUTE OF PHYSICS. NEW YORK, vol. 66, no. 9, 1 September 1976 (1976-09-01), pages 949 - 954, XP002046559 *
AZZAM R M A: "A SIMPLE FOURIER PHOTOPOLARIMETER WITH ROTATING POLARIZER AND ANALYZER FOR MEASURING JONES AND MUELLER MATRICES", OPTICS COMMUNICATIONS, vol. 25, no. 2, 1978, pages 137 - 140, XP002148902 *
CHEN L-Y ET AL: "DESIGN OF A SCANNING ELLIPSOMETER BY SYNCHRONOUS ROTATION OF THE POLARIZER AND ANALYZER", APPLIED OPTICS,US,OPTICAL SOCIETY OF AMERICA,WASHINGTON, vol. 33, no. 7, 1 March 1994 (1994-03-01), pages 1299 - 1305, XP000434834, ISSN: 0003-6935 *
COLLINS R W: "AUTOMATIC ROTATING ELEMENT ELLIPSOMETERS: CALIBRATION, OPERATION, AND REAL-TIME APPLICATIONS", REVIEW OF SCIENTIFIC INSTRUMENTS,US,AMERICAN INSTITUTE OF PHYSICS. NEW YORK, vol. 61, no. 8, 1 August 1990 (1990-08-01), pages 2029 - 2062, XP000149453, ISSN: 0034-6748 *
STRAAIJER A ET AL: "THE INFLUENCE OF CELL WINDOW IMPERFECTIONS ON THE CALIBRATION AND MEASURED DATA OF TWO TYPES OF ROTATING-ANALYZER ELLIPSOMETERS", SURFACE SCIENCE, vol. 96, 1980, pages 217 - 231, XP000951601 *

Also Published As

Publication number Publication date
WO2000065331A2 (en) 2000-11-02
JP5368507B2 (en) 2013-12-18
JP2002543381A (en) 2002-12-17
JP2011191311A (en) 2011-09-29
WO2000065331A9 (en) 2002-06-13
JP5248722B2 (en) 2013-07-31

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