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Patentes

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Número de publicaciónWO2000077575 A1
Tipo de publicaciónSolicitud
Número de solicitudPCT/US2000/015772
Fecha de publicación21 Dic 2000
Fecha de presentación8 Jun 2000
Fecha de prioridad10 Jun 1999
También publicado comoCA2374944A1, EP1190277A1, EP1190277B1, US6956097, US6969753, US7678462, US20020128388, US20030120018, US20050245717
Número de publicaciónPCT/2000/15772, PCT/US/0/015772, PCT/US/0/15772, PCT/US/2000/015772, PCT/US/2000/15772, PCT/US0/015772, PCT/US0/15772, PCT/US0015772, PCT/US015772, PCT/US2000/015772, PCT/US2000/15772, PCT/US2000015772, PCT/US200015772, WO 0077575 A1, WO 0077575A1, WO 2000/077575 A1, WO 2000077575 A1, WO 2000077575A1, WO-A1-0077575, WO-A1-2000077575, WO0077575 A1, WO0077575A1, WO2000/077575A1, WO2000077575 A1, WO2000077575A1
InventoresRichard Spear, Nigel P. Hacker, Teresa Baldwin, Joseph Kennedy
SolicitanteAlliedsignal Inc.
Exportar citaBiBTeX, EndNote, RefMan
Enlaces externos:  Patentscope, Espacenet
Spin-on-glass anti-reflective coatings for photolithography
WO 2000077575 A1
Descripción  disponible en inglés
Reclamaciones  disponible en inglés
Citas de patentes
Patente citada Fecha de presentación Fecha de publicación Solicitante Título
EP0851300A1 *23 Dic 19971 Jul 1998Fuji Photo Film Co., Ltd.Bottom anti-reflective coating material composition and method of forming resist pattern using the same
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JPH05125187A * Título no disponible
SU1712374A1 * Título no disponible
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US5034189 *27 Ago 198523 Jul 1991The Regents Of The University Of CaliforniaFluorescent probe for rapid measurement of analyte concentration
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US5414069 *1 Feb 19939 May 1995Polaroid CorporationElectroluminescent polymers, processes for their use, and electroluminescent devices containing these polymers
US5455208 *14 Feb 19943 Oct 1995Alliedsignal Inc.Carbon-containing black glass monoliths
US5583195 *29 Sep 199510 Dic 1996General Electric CompanyPhotocurable epoxy silicones functionalized with fluorescent or photosensitizing marker dyes
US5677112 *29 Jul 199614 Oct 1997Wako Pure Chemical Industries, Ltd.Process for forming a pattern on a semiconductor substrate using a deep ultraviolet absorbent composition
US5693691 *21 Ago 19952 Dic 1997Brewer Science, Inc.Thermosetting anti-reflective coatings compositions
Otras citas
Referencia
1 *DATABASE WPI Section Ch Week 199302, Derwent Publications Ltd., London, GB; Class A26, AN 1993-015995, XP002147397
2 *DATABASE WPI Section Ch Week 199325, Derwent Publications Ltd., London, GB; Class A26, AN 1993-200578, XP002147398
Citada por
Patente citante Fecha de presentación Fecha de publicación Solicitante Título
WO2004000853A1 *20 Jun 200331 Dic 2003Honeywell Specialty Chemicals Seelze GmbhSilyl alkyl esters of anthracene- and phenanthrene carboxylic acids
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WO2006065320A129 Sep 200522 Jun 2006Dow Corning CorporationMethod for forming anti-reflective coating
WO2007148221A1 *20 Jun 200727 Dic 2007Az Electronic Materials Usa Corp.High silicon-content thin film thermosets
WO2009111121A3 *3 Feb 200912 Nov 2009Dow Corning CorporationSilsesquioxane resins
CN1991581B27 Oct 200626 May 2010第一毛织株式会社抗蚀底膜的硬掩模层组合物及半导体集成电路装置的制造方法
DE10227807A1 *21 Jun 200222 Ene 2004Honeywell Specialty Chemicals Seelze GmbhSilylalkylester von Anthracen- und Phenanthrencarbonsäuren
EP1061560A2 *6 Jun 200020 Dic 2000Shipley Company, L.L.C.Antireflective hard mask compositions
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EP1197511A1 *9 Oct 200117 Abr 2002Shipley Company, L.L.C.Antireflective composition
EP1472574A1 *15 Nov 20013 Nov 2004Honeywell International Inc.Spin-on anti-reflective coatings for photolithography
EP1472574A4 *15 Nov 20018 Jun 2005Honeywell Int IncSpin-on anti-reflective coatings for photolithography
EP1478681A1 *16 Nov 200124 Nov 2004Honeywell International, Inc.Spin-on-glass anti-reflective coatings for photolithography
EP1478681A4 *16 Nov 200111 Oct 2006Honeywell Int IncSpin-on-glass anti-reflective coatings for photolithography
EP1478682A1 *12 Nov 200224 Nov 2004Honeywell International Inc.Anti-reflective coatings for photolithography and methods of preparation thereof
EP1478682A4 *12 Nov 200215 Jun 2005Honeywell Int IncAnti-reflective coatings for photolithography and methods of preparation thereof
EP1478683A1 *31 Oct 200224 Nov 2004Honeywell International Inc.Spin-on-glass anti-reflective coatings for photolithography
EP1478683A4 *31 Oct 200215 Jun 2005Honeywell Int IncSpin-on-glass anti-reflective coatings for photolithography
EP1495365A1 *1 Abr 200312 Ene 2005International Business Machines CorporationAntireflective sio-containing compositions for hardmask layer
EP1495365A4 *1 Abr 20033 Jun 2009IbmAntireflective sio-containing compositions for hardmask layer
EP1516226A1 *18 Jun 200323 Mar 2005Brewer Science, Inc.Developer-soluble metal alkoxide coatings for microelectronic applications
EP1516226A4 *18 Jun 200317 Feb 2010Brewer Science IncDeveloper-soluble metal alkoxide coatings for microelectronic applications
EP1521797A1 *11 Jul 200213 Abr 2005International Business Machines CorporationAntireflective silicon-containing compositions as hardmask layer
EP1521797A4 *11 Jul 200220 Dic 2006IbmAntireflective silicon-containing compositions as hardmask layer
EP2375288A3 *18 Jun 20035 Sep 2012Brewer Science, Inc.developer-soluble metal alkoxide coatings for microelectronic applications
US657668111 Oct 200110 Jun 2003Shipley Company, L.L.C.Antireflective porogens
US673045416 Abr 20024 May 2004International Business Machines CorporationAntireflective SiO-containing compositions for hardmask layer
US689044811 Jun 199910 May 2005Shipley Company, L.L.C.Antireflective hard mask compositions
US70187179 Jun 200328 Mar 2006Shipley Company, L.L.C.Antireflective hard mask compositions
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US73037852 Jun 20044 Dic 2007Shin-Etsu Chemical Co., Ltd.Antireflective film material, and antireflective film and pattern formation method using the same
US736817320 May 20046 May 2008Dow Corning CorporationSiloxane resin-based anti-reflective coating composition having high wet etch rate
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US755024910 Mar 200623 Jun 2009Az Electronic Materials Usa Corp.Base soluble polymers for photoresist compositions
US760543929 Ago 200620 Oct 2009Rohm And Haas Electronic Materials LlcAntireflective hard mask compositions
US775904620 Dic 200620 Jul 2010Az Electronic Materials Usa Corp.Antireflective coating compositions
US783369629 Sep 200516 Nov 2010Dow Corning CorporationMethod for forming anti-reflective coating
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US802604020 Feb 200727 Sep 2011Az Electronic Materials Usa Corp.Silicone coating composition
US805315918 Nov 20038 Nov 2011Honeywell International Inc.Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
US812949113 Oct 20106 Mar 2012Dow Corning CorporationSiloxane resin coating
US82417073 Feb 200914 Ago 2012Dow Corning CorporationSilsesquioxane resins
US82633127 Dic 200611 Sep 2012Dow Corning CorporationAntireflective coating material
US83041613 Feb 20096 Nov 2012Dow Corning CorporationSilsesquioxane resins
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US849696723 Dic 200930 Jul 2013Ariad Pharmaceuticals, Inc.Oral formulations
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US89012686 Feb 20082 Dic 2014Ahila KrishnamoorthyCompositions, layers and films for optoelectronic devices, methods of production and uses thereof
US899280625 Ago 201131 Mar 2015Honeywell International Inc.Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
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US902401414 Nov 20115 May 2015Ariad Pharmaceuticals, Inc.Phosphorus-containing compounds and uses thereof
Clasificaciones
Clasificación internacionalG03F7/09, G03C1/492, C09D183/06, C07F7/18, C08K5/00, G03F7/004, H01L21/027, C03C17/30, C09D183/04, C03C17/00, G03F7/11, C09D7/12, C09D183/08, G03F7/075
Clasificación cooperativaG03F7/091, C08K5/0008, C09D183/04, C03C17/008, Y10T428/31663, H01L21/0276, G03F7/0752, C09D183/08, C03C17/30, C09D183/06
Clasificación europeaC08K5/00P, C09D183/04, G03F7/075D, C03C17/00D4, C09D183/06, C09D183/08, C03C17/30, G03F7/09A
Eventos legales
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