WO2001011431A3 - Method and apparatus of holding semiconductor wafers for lithography and other wafer processes - Google Patents
Method and apparatus of holding semiconductor wafers for lithography and other wafer processes Download PDFInfo
- Publication number
- WO2001011431A3 WO2001011431A3 PCT/US2000/021377 US0021377W WO0111431A3 WO 2001011431 A3 WO2001011431 A3 WO 2001011431A3 US 0021377 W US0021377 W US 0021377W WO 0111431 A3 WO0111431 A3 WO 0111431A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- wafer
- lithography
- compliant layer
- semiconductor wafers
- wafer processes
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68757—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a coating or a hardness or a material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/705,182 US6909588B2 (en) | 1999-08-06 | 2003-11-10 | Substrate holder for retaining a substrate within a processing chamber |
US11/056,787 US7372690B2 (en) | 1999-08-06 | 2005-02-10 | Substrate holder which is self-adjusting for substrate deformation |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14768499P | 1999-08-06 | 1999-08-06 | |
US60/147,684 | 1999-08-06 |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10049755 A-371-Of-International | 2000-08-04 | ||
US10/705,182 Continuation US6909588B2 (en) | 1999-08-06 | 2003-11-10 | Substrate holder for retaining a substrate within a processing chamber |
Publications (3)
Publication Number | Publication Date |
---|---|
WO2001011431A2 WO2001011431A2 (en) | 2001-02-15 |
WO2001011431A3 true WO2001011431A3 (en) | 2001-11-15 |
WO2001011431B1 WO2001011431B1 (en) | 2001-12-20 |
Family
ID=22522496
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2000/021377 WO2001011431A2 (en) | 1999-08-06 | 2000-08-04 | Method and apparatus of holding semiconductor wafers for lithography and other wafer processes |
Country Status (3)
Country | Link |
---|---|
US (2) | US6909588B2 (en) |
TW (1) | TW469487B (en) |
WO (1) | WO2001011431A2 (en) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001011431A2 (en) * | 1999-08-06 | 2001-02-15 | Applied Materials, Inc. | Method and apparatus of holding semiconductor wafers for lithography and other wafer processes |
US6747845B1 (en) * | 2000-10-11 | 2004-06-08 | International Business Machines Corporation | Modified strain region of strain reactive slider with implanted ions, electrons or neutral atoms |
US6623563B2 (en) | 2001-01-02 | 2003-09-23 | Applied Materials, Inc. | Susceptor with bi-metal effect |
US6554907B2 (en) * | 2001-01-02 | 2003-04-29 | Applied Materials, Inc. | Susceptor with internal support |
US6836316B2 (en) | 2001-07-26 | 2004-12-28 | Canon Kabushiki Kaisha | Substrate holding apparatus and exposure apparatus using the same |
US6734117B2 (en) * | 2002-03-12 | 2004-05-11 | Nikon Corporation | Periodic clamping method and apparatus to reduce thermal stress in a wafer |
US7164466B2 (en) | 2002-08-27 | 2007-01-16 | Nikon Corporation | Detachable heat sink |
US6794662B1 (en) * | 2003-10-07 | 2004-09-21 | Ibis Technology Corporation | Thermosetting resin wafer-holding pin |
US7119884B2 (en) | 2003-12-24 | 2006-10-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
EP1737564B1 (en) * | 2004-03-12 | 2019-09-11 | SRI International | Mechanical meta-materials |
US7727581B2 (en) * | 2004-03-17 | 2010-06-01 | Essilor International Compagnie Generale D' Optique | Process for applying a coating on an optical lens face and implementation system |
US6972914B2 (en) * | 2004-03-17 | 2005-12-06 | Essilor International Compagnie Generale D'optique | Optical lens holder |
US7561251B2 (en) * | 2004-03-29 | 2009-07-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US20070164476A1 (en) * | 2004-09-01 | 2007-07-19 | Wei Wu | Contact lithography apparatus and method employing substrate deformation |
US7636999B2 (en) * | 2005-01-31 | 2009-12-29 | Molecular Imprints, Inc. | Method of retaining a substrate to a wafer chuck |
US7798801B2 (en) * | 2005-01-31 | 2010-09-21 | Molecular Imprints, Inc. | Chucking system for nano-manufacturing |
US7830493B2 (en) * | 2005-10-04 | 2010-11-09 | Asml Netherlands B.V. | System and method for compensating for radiation induced thermal distortions in a substrate or projection system |
TWI275118B (en) * | 2005-12-09 | 2007-03-01 | Li Bing Huan | Sample box of electron microscope for observing a general sample/live cell |
US7554787B2 (en) * | 2006-06-05 | 2009-06-30 | Sri International | Wall crawling devices |
US7551419B2 (en) | 2006-06-05 | 2009-06-23 | Sri International | Electroadhesion |
US9275887B2 (en) | 2006-07-20 | 2016-03-01 | Applied Materials, Inc. | Substrate processing with rapid temperature gradient control |
US20080190364A1 (en) * | 2007-02-13 | 2008-08-14 | Applied Materials, Inc. | Substrate support assembly |
NL1036544A1 (en) * | 2008-02-21 | 2009-08-24 | Asml Netherlands Bv | A lithographic apparatus having a chuck with a visco-elastic damping layer. |
US8329260B2 (en) * | 2008-03-11 | 2012-12-11 | Varian Semiconductor Equipment Associates, Inc. | Cooled cleaving implant |
US9110685B2 (en) * | 2008-03-25 | 2015-08-18 | Qualcomm, Incorporated | Apparatus and methods for managing widgets in a wireless communication environment |
KR20100043478A (en) * | 2008-10-20 | 2010-04-29 | 삼성전기주식회사 | Electrostatic chuck and apparatus for attaching substrate using the same |
US8400804B2 (en) * | 2010-08-30 | 2013-03-19 | Taiwan Semiconductor Manufacturing Co., Ltd. | Memory devices having break cells |
JP5686779B2 (en) | 2011-10-14 | 2015-03-18 | キヤノン株式会社 | Imprint apparatus and article manufacturing method using the same |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4480284A (en) * | 1982-02-03 | 1984-10-30 | Tokyo Shibaura Denki Kabushiki Kaisha | Electrostatic chuck plate |
US4665463A (en) * | 1983-09-30 | 1987-05-12 | U.S. Philips Corporation | Electrostatic chuck |
US5310453A (en) * | 1992-02-13 | 1994-05-10 | Tokyo Electron Yamanashi Limited | Plasma process method using an electrostatic chuck |
US5452177A (en) * | 1990-06-08 | 1995-09-19 | Varian Associates, Inc. | Electrostatic wafer clamp |
EP0692814A1 (en) * | 1994-07-15 | 1996-01-17 | Applied Materials, Inc. | Multi-electrode electrostatic chuck |
US5729423A (en) * | 1994-01-31 | 1998-03-17 | Applied Materials, Inc. | Puncture resistant electrostatic chuck |
EP0856882A2 (en) * | 1997-01-31 | 1998-08-05 | Applied Materials, Inc. | Stand-off pad for supporting a wafer on a substrate support chuck and method of fabricating same |
US5883778A (en) * | 1994-02-28 | 1999-03-16 | Applied Materials, Inc. | Electrostatic chuck with fluid flow regulator |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0712012B2 (en) | 1985-12-11 | 1995-02-08 | 株式会社ニコン | Projection exposure device |
US5581324A (en) * | 1993-06-10 | 1996-12-03 | Nikon Corporation | Thermal distortion compensated projection exposure method and apparatus for manufacturing semiconductors |
FR2758916B1 (en) | 1997-01-30 | 1999-04-02 | Gec Alsthom T & D Sa | FIREPLACE HOOD |
WO2001011431A2 (en) * | 1999-08-06 | 2001-02-15 | Applied Materials, Inc. | Method and apparatus of holding semiconductor wafers for lithography and other wafer processes |
-
2000
- 2000-08-04 WO PCT/US2000/021377 patent/WO2001011431A2/en active Application Filing
- 2000-11-03 TW TW089115968A patent/TW469487B/en active
-
2003
- 2003-11-10 US US10/705,182 patent/US6909588B2/en not_active Expired - Fee Related
-
2005
- 2005-02-10 US US11/056,787 patent/US7372690B2/en not_active Expired - Fee Related
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4480284A (en) * | 1982-02-03 | 1984-10-30 | Tokyo Shibaura Denki Kabushiki Kaisha | Electrostatic chuck plate |
US4665463A (en) * | 1983-09-30 | 1987-05-12 | U.S. Philips Corporation | Electrostatic chuck |
US5452177A (en) * | 1990-06-08 | 1995-09-19 | Varian Associates, Inc. | Electrostatic wafer clamp |
US5310453A (en) * | 1992-02-13 | 1994-05-10 | Tokyo Electron Yamanashi Limited | Plasma process method using an electrostatic chuck |
US5729423A (en) * | 1994-01-31 | 1998-03-17 | Applied Materials, Inc. | Puncture resistant electrostatic chuck |
US5883778A (en) * | 1994-02-28 | 1999-03-16 | Applied Materials, Inc. | Electrostatic chuck with fluid flow regulator |
EP0692814A1 (en) * | 1994-07-15 | 1996-01-17 | Applied Materials, Inc. | Multi-electrode electrostatic chuck |
EP0856882A2 (en) * | 1997-01-31 | 1998-08-05 | Applied Materials, Inc. | Stand-off pad for supporting a wafer on a substrate support chuck and method of fabricating same |
Also Published As
Publication number | Publication date |
---|---|
WO2001011431A2 (en) | 2001-02-15 |
TW469487B (en) | 2001-12-21 |
US20040084633A1 (en) | 2004-05-06 |
US20050199825A1 (en) | 2005-09-15 |
WO2001011431B1 (en) | 2001-12-20 |
US7372690B2 (en) | 2008-05-13 |
US6909588B2 (en) | 2005-06-21 |
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