WO2001072377A3 - Treatment of hazardous gases in effluent - Google Patents

Treatment of hazardous gases in effluent Download PDF

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Publication number
WO2001072377A3
WO2001072377A3 PCT/US2001/008178 US0108178W WO0172377A3 WO 2001072377 A3 WO2001072377 A3 WO 2001072377A3 US 0108178 W US0108178 W US 0108178W WO 0172377 A3 WO0172377 A3 WO 0172377A3
Authority
WO
WIPO (PCT)
Prior art keywords
effluent
gas
treatment
hazardous gases
process chamber
Prior art date
Application number
PCT/US2001/008178
Other languages
French (fr)
Other versions
WO2001072377A2 (en
Inventor
Ashish Bhatnagar
Kartik Ramaswamy
Tony S Kaushal
Kwok Manus Wong
Shamouil Shamouilian
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/535,461 external-priority patent/US6673323B1/en
Priority claimed from US09/547,423 external-priority patent/US6391146B1/en
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to JP2001570334A priority Critical patent/JP2003534112A/en
Publication of WO2001072377A2 publication Critical patent/WO2001072377A2/en
Publication of WO2001072377A3 publication Critical patent/WO2001072377A3/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B01D53/70—Organic halogen compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

Abstract

An apparatus and method for reducing hazardous gases exhausted from a process chamber includes an effluent gas treatment system with a gas energizing reactor and an additive gas source. Additive gas comprising reactive gas is introduced into the effluent from the process chamber in a volumetric flow rate in relation to the hazardous gas content in the effluent.
PCT/US2001/008178 2000-03-24 2001-03-13 Treatment of hazardous gases in effluent WO2001072377A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001570334A JP2003534112A (en) 2000-03-24 2001-03-13 Hazardous gas treatment in emissions

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US09/535,461 US6673323B1 (en) 2000-03-24 2000-03-24 Treatment of hazardous gases in effluent
US09/535,461 2000-03-24
US09/547,423 US6391146B1 (en) 2000-04-11 2000-04-11 Erosion resistant gas energizer
US09/547,423 2000-04-11

Publications (2)

Publication Number Publication Date
WO2001072377A2 WO2001072377A2 (en) 2001-10-04
WO2001072377A3 true WO2001072377A3 (en) 2002-01-31

Family

ID=27064816

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2001/008178 WO2001072377A2 (en) 2000-03-24 2001-03-13 Treatment of hazardous gases in effluent

Country Status (2)

Country Link
JP (1) JP2003534112A (en)
WO (1) WO2001072377A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8580076B2 (en) * 2003-05-22 2013-11-12 Lam Research Corporation Plasma apparatus, gas distribution assembly for a plasma apparatus and processes therewith
US8932430B2 (en) * 2011-05-06 2015-01-13 Axcelis Technologies, Inc. RF coupled plasma abatement system comprising an integrated power oscillator
GB2587393A (en) * 2019-09-26 2021-03-31 Edwards Ltd Optimising operating conditions in an abatement apparatus

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5280012A (en) * 1990-07-06 1994-01-18 Advanced Technology Materials Inc. Method of forming a superconducting oxide layer by MOCVD
DE4319118A1 (en) * 1993-06-09 1994-12-15 Breitbarth Friedrich Wilhelm D Process and apparatus for disposing of fluorocarbons and other fluorine-containing compounds
US5663476A (en) * 1994-04-29 1997-09-02 Motorola, Inc. Apparatus and method for decomposition of chemical compounds by increasing residence time of a chemical compound in a reaction chamber
WO1999026726A1 (en) * 1997-11-25 1999-06-03 State Of Israel - Ministry Of Defense Rafael - Armament Development Authority Modular dielectric barrier discharge device for pollution abatement

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5280012A (en) * 1990-07-06 1994-01-18 Advanced Technology Materials Inc. Method of forming a superconducting oxide layer by MOCVD
DE4319118A1 (en) * 1993-06-09 1994-12-15 Breitbarth Friedrich Wilhelm D Process and apparatus for disposing of fluorocarbons and other fluorine-containing compounds
US5663476A (en) * 1994-04-29 1997-09-02 Motorola, Inc. Apparatus and method for decomposition of chemical compounds by increasing residence time of a chemical compound in a reaction chamber
WO1999026726A1 (en) * 1997-11-25 1999-06-03 State Of Israel - Ministry Of Defense Rafael - Armament Development Authority Modular dielectric barrier discharge device for pollution abatement

Also Published As

Publication number Publication date
WO2001072377A2 (en) 2001-10-04
JP2003534112A (en) 2003-11-18

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