WO2001083845A2 - Magnetic sensor having diamond-like carbon thin film - Google Patents
Magnetic sensor having diamond-like carbon thin film Download PDFInfo
- Publication number
- WO2001083845A2 WO2001083845A2 PCT/JP2001/003595 JP0103595W WO0183845A2 WO 2001083845 A2 WO2001083845 A2 WO 2001083845A2 JP 0103595 W JP0103595 W JP 0103595W WO 0183845 A2 WO0183845 A2 WO 0183845A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- coating
- mrms
- dlc
- carbon
- diamond
- Prior art date
Links
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 27
- 229910052799 carbon Inorganic materials 0.000 title claims abstract description 26
- 239000010409 thin film Substances 0.000 title description 7
- 238000000576 coating method Methods 0.000 claims abstract description 32
- 239000011248 coating agent Substances 0.000 claims abstract description 27
- 239000000758 substrate Substances 0.000 claims description 25
- 238000000034 method Methods 0.000 claims description 9
- 238000010884 ion-beam technique Methods 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 6
- 230000005484 gravity Effects 0.000 claims description 5
- 238000004544 sputter deposition Methods 0.000 claims description 4
- 229910003481 amorphous carbon Inorganic materials 0.000 claims description 3
- 238000005137 deposition process Methods 0.000 claims description 2
- 230000003068 static effect Effects 0.000 abstract description 9
- 150000002500 ions Chemical class 0.000 description 12
- 238000005530 etching Methods 0.000 description 10
- 238000011282 treatment Methods 0.000 description 10
- 238000000151 deposition Methods 0.000 description 9
- 230000008021 deposition Effects 0.000 description 9
- 230000005611 electricity Effects 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 8
- 238000010586 diagram Methods 0.000 description 8
- 239000007789 gas Substances 0.000 description 7
- 239000010408 film Substances 0.000 description 6
- 238000009501 film coating Methods 0.000 description 6
- 230000001276 controlling effect Effects 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- 230000003746 surface roughness Effects 0.000 description 5
- 239000002245 particle Substances 0.000 description 4
- -1 carbon ion Chemical class 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 238000006748 scratching Methods 0.000 description 2
- 230000002393 scratching effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 235000007627 Caesalpinia Nutrition 0.000 description 1
- 241000522234 Caesalpinia Species 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5873—Removal of material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
- C23C14/025—Metallic sublayers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/221—Ion beam deposition
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/187—Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features
- G11B5/255—Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features comprising means for protection against wear
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3103—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3103—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
- G11B5/3106—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing where the integrated or assembled structure comprises means for conditioning against physical detrimental influence, e.g. wear, contamination
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/40—Protective measures on heads, e.g. against excessive temperature
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8408—Processes or apparatus specially adapted for manufacturing record carriers protecting the magnetic layer
Definitions
- the present invention relates to a wear -resistant coating which exhibits properties of low-friction, low-clogging and resistance against static electricity.
- the invention relates further to a process for forming the coating and products utilizing same.
- MRMS Magnetic recording media sensors
- Coatings which have been recently developed are suitable for use in hard disc and floppy-disc reading/writing heads, video and audio heads, magnetic discs and magnetic tapes, magnetic counters, etc. As an MRMS operates in close and/or direct contact with other MRMS surfaces, debris and abrasive particles move relative thereto.
- the MRMS and its surface are coated by a protective film which includes at least two layers having different hardness and electrical conductivity.
- a protective film which includes at least two layers having different hardness and electrical conductivity.
- such film is coated by means of chemical vapor deposition (CVD) with heating assistance. Due to such heating assistance, deformation of substrate and creation of inner stress is unavoidable, and the performance of the particular MRMS is consequently decreased.
- the external surface of the coating has a higher degree of hardness for providing an abrasion-proof surface, and the inner layer has comparatively low resistivity in order to abate the influence of static electricity.
- the use of multilayered film increases the coating thickness and/or decreases its wear resistance, and increases the production cost.
- an MRMS is coated directly with hard amorphous carbon (also referred to herein by the term “diamond-like carbon” or DLC) films having a high degree of hardness, smooth surface and low friction coefficient, to provide an abrasion-proof surface, which significantly abates the influence of static electricity and which collects a minimum amount of debris.
- hard amorphous carbon also referred to herein by the term “diamond-like carbon” or DLC
- DLC diamond-like carbon
- the content of s ⁇ 3 -bonded carbon (hereinafter sometimes referred to as "sp 3 ") in the coating is within the range of about 30 to about 85 percent.
- the Vickers hardness is in the range of about 3000 to about 9000 kg/mm 2 .
- the deposition process advantageously employs ion beams, and the coating process may be done with repetition of deposition and etching using such ion beams. Further, the beams may be scanned.
- One or more substrate holders are advantageously provided in a location in the deposition chamber out of projections of the ion and carbon sources in the direction of gravity, an electrical resistance of the substrate holder or holders to earth junction being set in a range of about 1 M ⁇ to about 10 M ⁇ .
- Fig. 1A is a schematic representation of an MRMS in the form of a floppy disc head employing a coating formed by the process in accordance with the invention
- Fig. IB is a schematic representation MRMS in the form of a magnetic tape employing a coating formed by the process in accordance with the invention
- Fig. 2 is a schematic diagram showing an apparatus for deposition of the hard amorphous (diamond-like) carbon in accordance with the present invention
- Fig. 3A is a schematic diagram showing crack propagation in the coating depending on sp 3 proportion
- Fig. 3B is a schematic diagram showing another form of crack propagation in the coating depending on sp 3 proportion;
- Figs. 4A and 4B are schematic diagrams showing anti-body damage and the MRMS clogging respectively due to the coating failure;
- Fig. 5 is a schematic diagram of an MRMS holder, and sources and gravity direction relative a position thereof in the deposition chamber;
- Fig. 6 is a schematic diagram of an ion beam controlling field intensity vs.on treatment time;
- Fig. 7 is a schematic diagram of the MRMS holder.
- Fig. 8 is a schematic diagram of the coating thickness vs. der ⁇ )sition-etching process time.
- the MRMS floppy disc
- the MRMS floppy disc
- the external surface of MRMS (floppy disc head) 100 is coated with an amorphous, diamond-like carbon film 11 having a high degree of hardness, low friction coefficient and moderate electric resistivity providing abrasion-proof low-clogging, anti-static electricity properties thereby providing resistance against the tendency to wear, scratching, collecting of debris and static electricity due to an externally applied rubbing action.
- Fig. 1 A the MRMS (floppy disc) is comprised of a substrate 1, a magnetic media layer 2, and a protective layer 3.
- the external surface of MRMS (floppy disc head) 100 is coated with an amorphous, diamond-like carbon film 11 having a high degree of hardness, low friction coefficient and moderate electric resistivity providing abrasion-proof low-clogging, anti-static electricity properties thereby providing resistance against the tendency to wear, scratching, collecting of debris and static electricity due to an externally applied rubbing action.
- IB shows a tape head 12 and a tape comprising a tape layer 13, a magnetic media layer 14 and an amorphous, diamond-like carbon film 11'.
- Fig. 2 a typical apparatus for deposition of a hard amorphous (diamond-like) carbon by pulse arc vacuum sputtering of graphite on a surface, in accordance with the present invention is depicted schematically.
- the surface to be coated may be made, for example, of semiconductor, glass, metal ceramics, organic resins, magnetic substance, etc.
- the apparatus comprises a vacuum chamber 4, carbon pulse arc source (or sources) 5, gas ion source (or sources) 6, metal arc source (or sources) 7, a gas feeding system 8, substrate (MRMS) holder (or holders) 9 and a pumping system 10 including a pressure control, an oil diffusion pump and mechanical pump (not shown).
- Gas ion source 6, carbon pulse arc source 5 and metal arc source 7 are supplied with magnetic deviating coils (not shown) for controlling gas ion, carbon ion and metal ion beams, respectively.
- Gas ion source 6 may be employed for preliminary cleaning and/or etching of the surface of the substrate (MRMS) and/or for intermediate and/or final etching of the coating.
- Gas ion energy of, for example, about 1 KeV to about 6 KeV is advantageously employed.
- gases include, for example, hydrogen, neon, argon, xenon, krypton, oxygen, nitrogen, hydrocarbons, fiuorocarbons and mixtures thereof.
- the substrate temperature is maintained in a range of about +20° to about +300 °C by means of a temperature control unit (not shown).
- the diamond-like properties of the coatings deposited thereby namely hardness, wear resistance, low friction coefficient and chemical inertness, are observed in this temperature range and, if necessary, in a range of about +100° to about +400°C.
- Ion beams are employed to clean and etch the substrate surface and deposit coatings conventionally. Disadvantages are: i) nonhomogeneity of the beam restricts the treated surface size; ii) in many cases power of the beam is limited by possible overheating of the substrates. However beam(s) scanning permits enlargement of the treated/deposited surface and cleaning/etching/deposition time less than the pumping time about 30 times, so as to result in a substantial increase of treated substrates area at the same quality.
- Arc metal source(s) 7 may be used to deposit an adhesive sublayer and/or to modify the coating properties, such as hardness and electric conductivity.
- EXAMPLE 1 Hard amorphous (diamond-like) carbon is deposited onto MRMS, the latter provided in the form of floppy disc heads, as shown in Fig. 3A.
- the sp 3 proportion is 75%
- the Nickers hardness is 8000 kg/mm 2
- the resistivity is lxlO 5 ⁇ cm
- the coating thickness is 10 nanometers. Due to optimal coating structure, the coating is shown to be stable and wear resistant.
- the resultant MRMS demonstrates no noise, and output signal range in the 90-100% level 'for the designed receiving signal for over 400 hours.
- Hard amorphous (diamond-like) carbon is deposited onto MRMS, in the form of floppy disc heads.
- the sp 3 proportion 19 is lower than 30%, the hardness is lower than 3000 kg/mm 2 and the sensor life is the same as for the non-coated sensor.
- noise is detected and receiving output signal decreases to lower than 85% of the designed receiving signal.
- Hard amorphous (diamond-like) carbon (also referred to by the term "DLC") is deposited onto MRMS, in the form of floppy disc heads.
- the sp 3 proportion 19 is higher than 85% and the hardness is higher than 9000 kg/mm 2 .
- internal stresses inside the DLC 11 rise and self-peeling of the coating sections is experienced.
- cracks 20 induced by external action easily reach the DLC-substrate surface and propagate therealong, as shown in Fig. 3B, such that the DLC 11 peels off the substrate.
- One or more substrate holders each suitable for accommodating one or more substrates 9 are located out of the projection (region within dotted lines) in the gravity direction (as indicated by the downwardly pointing arrow) of the source(s) and parts associated therewith, as shown in Fig. 5.
- the beam is designated 26, the electrode 27 and the source 5.
- the MRMS yield is 99.99%.
- One or more substrate holders each suitable for accommodating one or more substrates are positioned at least partially inside of projection in the gravity direction of sources and associated parts.
- the MRMS yield drops from 99.99% (Example 5) to 90% due to falling dust particles deposited onto the substrates.
- the ion source maximum power is 1 kVA, with a treated surface diameter of 100 mm. About 500 MRMS, in the form of floppy disc heads are beatable in this area. If the ion source power is 1 KVA, all the sensors would be overheated and adversely affected during treatment (>80°C), so the power is 0.5 kVA, and treatment duration, 1 minute.
- the same ion source (Example 7), with linearly scanned beam, and the treated surface has dimensions of 100 to 250 mm, scanning frequency of 0.1 to 1 Hz and controlling field intensity which is sine -like. About 1500 sensors may be located at this area. If the ion source power is 1 KVA, none of the sensors are overheated during treatment ( ⁇ 50°C), so the treatment duration is 1.5 minute.
- Example 8 The same ion source (Example 8) with linearly scanned beam is used.
- the roughness of the treated surface is reduced through ion beam radiation.
- Table 1 shows the DLC surface roughness R in micrometers and R (DLC) of the same unit without etching.
- the rated thickness is 3 microns in Table 1 and 2 microns in Table 2. Both in Tables 1 and 2, DLC surface roughness is lower than initial substrate roughness.
- the same ion source with linearly scanned beam is used.
- the treated surface has dimensions of 100 to 250 mm at a scanning frequency of 1 Hz and in which a controlling field intensity is saw-like, as shown in FIG. 6.
- the etched depth is the same as at margins thereof.
- the controlling field intensity is sine like, at the middle part of the treated surface the etched depth is 10% more than at the margins.
- the pulse arc carbon source maximum frequency is 30 Hz and a uniformly deposited surface has a diameter of 100 mm. About 500 sensors may be located at this area. If the carbon source frequency is 2 Hz, all of the sensors will be overheated (adversely affected) during treatment (>80°C), so the frequency must be 1 Hz, and treatment duration, 1 minute.
- a uniformly treated surface has dimensions of 100 to 250 mm. About 1500 sensors , may be located at this area. If the carbon source frequency is 2 Hz, none of the sensors are overheated during treatment ( ⁇ 50°C), so the treatment duration is 1 minute. Scanning is step-like (two fixed positions, synchronically with source pulses).
- the beam is scanned randomly and/or has some rotation when applied for treatment of an MRMS having a complicated shape, or when the MRMS or their holder dimensions are larger than the beam size. This achieves a homogeneous coating layer.
- the MRMS is a video head.
- the percentage number of heads spoiled due to electric discharge near the gap during DLC deposition vs. holder-to-earth insulation is shown in Table 3.
- the substrate (sensor) holder 9 is made of a suitable plastic, in these examples, nylon. To fix the substrates (sensors) 11 and release static electricity, metal wires 17 held in frames 18 are adopted as shown in Fig. 7.
- a DLC coating 10 nm thick is deposited directly (without intermediate and final etching) onto an MRMS, namely a floppy disc head.
- Surface roughness is 3 nm and friction coefficient is 0.2.
- Working life of the sensor coated is within 50 hours and receiving output signal decreased lower than 85% of designed receiving signal.
- a DLC coating 13 nm thick is deposited without intermediate etching and final etched with oxygen ions to 10 nm. Surface roughness is 1.8 nm and friction coefficient is 0.08. Working life of the sensor coated is al least 400 hours and receiving output signal is within 90-100% of designed receiving signal.
- a DLC coating 12 nm thick is deposited with intermediate etching with oxygen ions in the following way: five steps consisting of 3 nm DLC deposition and 1 nm etching each as shown in Fig 8. Surface roughness is 0.8 nm and friction coefficient is 0.04. Working life of the sensor coated is over 400 hours and receiving output signal is over 95% of designed receiving signal.
- This present invention is suitable as an effective abrasion-proof, low-friction, low -clogging, static electricity erasing, thin film coating method.
- This invention is further suitable as an apparatus for forming such thin film coating which inhibits damage of the MRMS even when operating in close or direct contact with other MRMS surfaces, and in the presence of debris and abrasive particles moving relative thereto, even at low temperatures.
Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU2001252584A AU2001252584A1 (en) | 2000-05-02 | 2001-04-26 | Magnetic sensor having diamond-like carbon thin film |
JP2001580451A JP2003532251A (en) | 2000-05-02 | 2001-04-26 | Diamond-like carbon thin film coating method, product produced thereby, and its application to magnetic recording media sensitive elements |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/563,807 | 2000-05-02 | ||
US09/563,807 US6753042B1 (en) | 2000-05-02 | 2000-05-02 | Diamond-like carbon thin film coating process |
Publications (2)
Publication Number | Publication Date |
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WO2001083845A2 true WO2001083845A2 (en) | 2001-11-08 |
WO2001083845A3 WO2001083845A3 (en) | 2002-08-29 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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PCT/JP2001/003595 WO2001083845A2 (en) | 2000-05-02 | 2001-04-26 | Magnetic sensor having diamond-like carbon thin film |
Country Status (4)
Country | Link |
---|---|
US (1) | US6753042B1 (en) |
JP (1) | JP2003532251A (en) |
AU (1) | AU2001252584A1 (en) |
WO (1) | WO2001083845A2 (en) |
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CN100354700C (en) * | 2001-12-20 | 2007-12-12 | 住友电气工业株式会社 | Faraday rotator, optical isolator, polarizer, and diamond-like carbon thin film |
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JP4973971B2 (en) | 2003-08-08 | 2012-07-11 | 日産自動車株式会社 | Sliding member |
US7771821B2 (en) | 2003-08-21 | 2010-08-10 | Nissan Motor Co., Ltd. | Low-friction sliding member and low-friction sliding mechanism using same |
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EP1326127A3 (en) * | 2001-12-20 | 2003-10-01 | Sumitomo Electric Industries, Ltd. | Faraday rotator using a diamond-like carbon thin film |
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Also Published As
Publication number | Publication date |
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WO2001083845A3 (en) | 2002-08-29 |
AU2001252584A1 (en) | 2001-11-12 |
JP2003532251A (en) | 2003-10-28 |
US6753042B1 (en) | 2004-06-22 |
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