WO2001096917A3 - Multiphoton curing to provide encapsulated optical elements - Google Patents

Multiphoton curing to provide encapsulated optical elements Download PDF

Info

Publication number
WO2001096917A3
WO2001096917A3 PCT/US2001/019243 US0119243W WO0196917A3 WO 2001096917 A3 WO2001096917 A3 WO 2001096917A3 US 0119243 W US0119243 W US 0119243W WO 0196917 A3 WO0196917 A3 WO 0196917A3
Authority
WO
WIPO (PCT)
Prior art keywords
optical element
encapsulated
optical elements
multiphoton
encapsulated optical
Prior art date
Application number
PCT/US2001/019243
Other languages
French (fr)
Other versions
WO2001096917A2 (en
Inventor
Robert J Devoe
Catherine Anne Leatherdale
Jeffrey M Florczak
Patrick R Fleming
John E Potts
Original Assignee
3M Innovative Properties Co
Robert J Devoe
Catherine Anne Leatherdale
Jeffrey M Florczak
Patrick R Fleming
John E Potts
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co, Robert J Devoe, Catherine Anne Leatherdale, Jeffrey M Florczak, Patrick R Fleming, John E Potts filed Critical 3M Innovative Properties Co
Priority to AU2001268465A priority Critical patent/AU2001268465A1/en
Priority to KR1020027017108A priority patent/KR100810547B1/en
Priority to US10/311,040 priority patent/US7014988B2/en
Priority to EP01946409.8A priority patent/EP1295179B1/en
Priority to JP2002510986A priority patent/JP4786858B2/en
Publication of WO2001096917A2 publication Critical patent/WO2001096917A2/en
Publication of WO2001096917A3 publication Critical patent/WO2001096917A3/en
Priority to US11/282,927 priority patent/US7601484B2/en
Priority to US12/545,183 priority patent/US8530118B2/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/1221—Basic optical elements, e.g. light-guiding paths made from organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/26—Optical coupling means
    • G02B6/30—Optical coupling means for use between fibre and thin-film device
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y80/00—Products made by additive manufacturing
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12083—Constructional arrangements
    • G02B2006/121—Channel; buried or the like
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12083—Constructional arrangements
    • G02B2006/12102—Lens
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12083—Constructional arrangements
    • G02B2006/12107—Grating
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12133—Functions
    • G02B2006/12147—Coupler
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12133—Functions
    • G02B2006/1215—Splitter
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0476—Holographic printer
    • G03H2001/0484—Arranged to produce three-dimensional fringe pattern
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31667—Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product

Abstract

Methods of fabricating optical elements that are encapsulated in monolithic matrices. The present invention is based, at least in one aspect, upon the concept of using multiphoton, multi-step photocuring to fabricate encapsulated optical element(s) within a body of a photopolymerizable composition. Imagewise, multi-photon polymerization techniques are used to form the optical element. The body surrounding the optical element is also photohardened by blanket irradiation and/or thermal curing to help form an encapsulating structure. In addition, the composition also incorporates one or more other, non-diffusing binder components that may be thermosetting or thermoplastic. The end result is an encapsulated structure with good hardness, durability, dimensional stability, resilience, and toughness.
PCT/US2001/019243 2000-06-15 2001-06-14 Multiphoton curing to provide encapsulated optical elements WO2001096917A2 (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
AU2001268465A AU2001268465A1 (en) 2000-06-15 2001-06-14 Multiphoton curing to provide encapsulated optical elements
KR1020027017108A KR100810547B1 (en) 2000-06-15 2001-06-14 A method of fabricating an encapsulated optical elements, an optical device and a method of coupling thereof
US10/311,040 US7014988B2 (en) 2000-06-15 2001-06-14 Multiphoton curing to provide encapsulated optical elements
EP01946409.8A EP1295179B1 (en) 2000-06-15 2001-06-14 Multiphoton curing to provide encapsulated optical elements
JP2002510986A JP4786858B2 (en) 2000-06-15 2001-06-14 Multiphoton curing to provide encapsulated optics
US11/282,927 US7601484B2 (en) 2000-06-15 2005-11-18 Multiphoton curing to provide encapsulated optical elements
US12/545,183 US8530118B2 (en) 2000-06-15 2009-08-21 Multiphoton curing to provide encapsulated optical elements

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US21170900P 2000-06-15 2000-06-15
US60/211,709 2000-06-15

Related Child Applications (2)

Application Number Title Priority Date Filing Date
US10311040 A-371-Of-International 2001-06-14
US11/282,927 Division US7601484B2 (en) 2000-06-15 2005-11-18 Multiphoton curing to provide encapsulated optical elements

Publications (2)

Publication Number Publication Date
WO2001096917A2 WO2001096917A2 (en) 2001-12-20
WO2001096917A3 true WO2001096917A3 (en) 2002-05-10

Family

ID=22788034

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2001/019243 WO2001096917A2 (en) 2000-06-15 2001-06-14 Multiphoton curing to provide encapsulated optical elements

Country Status (6)

Country Link
US (3) US7014988B2 (en)
EP (1) EP1295179B1 (en)
JP (3) JP4786858B2 (en)
KR (1) KR100810547B1 (en)
AU (1) AU2001268465A1 (en)
WO (1) WO2001096917A2 (en)

Families Citing this family (68)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7265161B2 (en) 2002-10-02 2007-09-04 3M Innovative Properties Company Multi-photon reactive compositions with inorganic particles and method for fabricating structures
EP1295179B1 (en) * 2000-06-15 2013-05-22 3M Innovative Properties Company Multiphoton curing to provide encapsulated optical elements
US7118845B2 (en) 2000-06-15 2006-10-10 3M Innovative Properties Company Multiphoton photochemical process and articles preparable thereby
US7005229B2 (en) 2002-10-02 2006-02-28 3M Innovative Properties Company Multiphoton photosensitization method
US7381516B2 (en) 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
JP2004503831A (en) * 2000-06-15 2004-02-05 スリーエム　イノベイティブ　プロパティズ　カンパニー Multipath multiphoton absorption method and apparatus
AU2001266918A1 (en) * 2000-06-15 2001-12-24 3M Innovative Properties Company Multidirectional photoreactive absorption method
US7217375B2 (en) 2001-06-04 2007-05-15 Ophthonix, Inc. Apparatus and method of fabricating a compensating element for wavefront correction using spatially localized curing of resin mixtures
US20040012872A1 (en) * 2001-06-14 2004-01-22 Fleming Patrick R Multiphoton absorption method using patterned light
US8119041B2 (en) * 2001-09-05 2012-02-21 Fujifilm Corporation Non-resonant two-photon absorption induction method and process for emitting light thereby
US7001708B1 (en) * 2001-11-28 2006-02-21 University Of Central Florida Research Foundation, Inc. Photosensitive polymeric material for worm optical data storage with two-photon fluorescent readout
US6750266B2 (en) 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system
US7232650B2 (en) 2002-10-02 2007-06-19 3M Innovative Properties Company Planar inorganic device
US20030155667A1 (en) * 2002-12-12 2003-08-21 Devoe Robert J Method for making or adding structures to an article
US7582390B2 (en) * 2003-05-23 2009-09-01 Fujifilm Corporation Two-photon absorbing polymerization method, two-photon absorbing optical recording material and two-photon absorbing optical recording method
US7771915B2 (en) * 2003-06-27 2010-08-10 Fujifilm Corporation Two-photon absorbing optical recording material and two-photon absorbing optical recording and reproducing method
JP2005092177A (en) * 2003-09-12 2005-04-07 Rohm & Haas Electronic Materials Llc Optical component formation method
AU2003304694A1 (en) * 2003-12-05 2005-08-12 3M Innovative Properties Company Process for producing photonic crystals and controlled defects therein
US20050124712A1 (en) * 2003-12-05 2005-06-09 3M Innovative Properties Company Process for producing photonic crystals
AT413891B (en) 2003-12-29 2006-07-15 Austria Tech & System Tech CIRCUIT BOARD ELEMENT WITH AT LEAST ONE LIGHT WAVEGUIDE, AND METHOD FOR PRODUCING SUCH A LADDER PLATE ELEMENT
US8071260B1 (en) * 2004-06-15 2011-12-06 Inphase Technologies, Inc. Thermoplastic holographic media
DE102004034975A1 (en) * 2004-07-16 2006-02-16 Carl Zeiss Jena Gmbh Method for acquiring images of a sample with a microscope
US8597871B2 (en) * 2005-06-18 2013-12-03 The Regents Of The University Of Colorado Three-dimensional direct-write lithography
US7583444B1 (en) 2005-12-21 2009-09-01 3M Innovative Properties Company Process for making microlens arrays and masterforms
JP4622878B2 (en) * 2006-02-09 2011-02-02 株式会社豊田中央研究所 Manufacturing method of optical waveguide
AT503585B1 (en) 2006-05-08 2007-11-15 Austria Tech & System Tech PCB ELEMENT ELEMENT AND METHOD FOR THE PRODUCTION THEREOF
CN101448632B (en) * 2006-05-18 2012-12-12 3M创新有限公司 Process for making light guides with extraction structures and light guides produced thereby
EP2020656B1 (en) * 2006-05-24 2012-11-21 DIC Corporation Optical disk and ultraviolet-curable composition for optical disk
US7551359B2 (en) * 2006-09-14 2009-06-23 3M Innovative Properties Company Beam splitter apparatus and system
US7960092B2 (en) * 2006-10-23 2011-06-14 Sony Corporation Method of recording in an optical information recording medium
US8376013B2 (en) 2008-03-11 2013-02-19 Duke University Plasmonic assisted systems and methods for interior energy-activation from an exterior source
JP4803609B2 (en) * 2007-06-29 2011-10-26 株式会社豊田中央研究所 Manufacturing method of self-forming optical waveguide
AT505834B1 (en) * 2007-09-21 2009-09-15 Austria Tech & System Tech CIRCUIT BOARD ELEMENT
KR100968490B1 (en) 2008-07-31 2010-07-07 재단법인서울대학교산학협력재단 method and system for transporting fine structure
JP2011505052A (en) * 2007-11-27 2011-02-17 サウスボーン インヴェストメンツ エル ティ ディー Holographic recording medium
IL196690A0 (en) * 2008-05-29 2011-08-01 Plasan Sasa Ltd Interchangeable door
WO2010049813A1 (en) * 2008-10-29 2010-05-06 Uti Limited Partnership Integrated encapsulation for mems devices
JP5162511B2 (en) * 2009-03-25 2013-03-13 富士フイルム株式会社 Non-resonant two-photon absorption polymerization composition and three-dimensional optical recording medium using the same
EP2243622A3 (en) * 2009-04-22 2015-06-03 Canon Kabushiki Kaisha Method for producing optical part
US20110021653A1 (en) * 2009-07-22 2011-01-27 Lixin Zheng Hydrogel compatible two-photon initiation system
ES2381808T3 (en) * 2009-11-03 2012-05-31 Bayer Materialscience Ag Photopolymer formulations with Guv adjustable mechanical module
JP5308398B2 (en) * 2010-05-11 2013-10-09 日東電工株式会社 Optical waveguide forming resin composition and optical waveguide using the same
DE102010020158A1 (en) 2010-05-11 2011-11-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Device and method for producing three-dimensional structures
US8882956B2 (en) * 2010-09-01 2014-11-11 The Boeing Company Composite structures using interpenetrating polymer network adhesives
WO2013002013A1 (en) * 2011-06-27 2013-01-03 学校法人 慶應義塾 Optical waveguide and method for manufacturing same
DE102012018635A1 (en) * 2012-09-21 2014-03-27 BIAS - Bremer Institut für angewandte Strahltechnik GmbH Method for producing three dimensional structure of integrated circuit, involves introducing coarse structure of three dimensional structure by unit of two dimensional surface in lithography of lithography sensitive material
EP2943830A1 (en) 2013-01-11 2015-11-18 Multiphoton Optics Gmbh Optical package and a process for its preparation
DE102013005565A1 (en) * 2013-03-28 2014-10-02 Karlsruher Institut für Technologie Production of 3D free-form waveguide structures
US9052597B2 (en) * 2013-04-04 2015-06-09 Humboldt-Universität Zu Berlin Methods and fabrication tools for fabricating optical devices
DE102013015933A1 (en) * 2013-09-19 2015-03-19 Carl Zeiss Microscopy Gmbh High-resolution scanning microscopy
CN105917275B (en) 2013-12-06 2018-01-16 3M创新有限公司 Liquid photoreactive composition and the method for manufacturing structure
DE102014215061A1 (en) * 2014-07-31 2016-02-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Micromechanical component and process for its preparation
US9488789B1 (en) 2015-05-27 2016-11-08 Stmicroelectronics S.R.L. Electro-optic device with dichroic mirror and related methods
MX2017016583A (en) 2015-06-30 2018-05-02 Gillette Co Llc Polymeric cutting edge structures and method of manufacturing thereof.
HK1220859A2 (en) * 2016-02-29 2017-05-12 Master Dynamic Ltd Liga fabrication process liga
US10780599B2 (en) 2016-06-28 2020-09-22 The Gillette Company Llc Polymeric cutting edge structures and method of manufacturing polymeric cutting edge structures
US10562200B2 (en) 2016-06-28 2020-02-18 The Gillette Company Llc Polymeric cutting edge structures and method of manufacturing polymeric cutting edge structures
JP6833431B2 (en) * 2016-09-29 2021-02-24 キヤノン株式会社 Stereolithography equipment, stereolithography method and stereolithography program
JP6849365B2 (en) * 2016-09-29 2021-03-24 キヤノン株式会社 Stereolithography equipment, stereolithography method and stereolithography program
JP6786332B2 (en) 2016-09-29 2020-11-18 キヤノン株式会社 Stereolithography equipment, stereolithography method and stereolithography program
US10933579B2 (en) * 2017-03-10 2021-03-02 Prellis Biologics, Inc. Methods and systems for printing biological material
US11085018B2 (en) 2017-03-10 2021-08-10 Prellis Biologics, Inc. Three-dimensional printed organs, devices, and matrices
JP2020524483A (en) 2017-05-25 2020-08-20 プレリス バイオロジクス，インク． Three-dimensional printed organs, devices, and matrices
US10914901B2 (en) * 2017-10-17 2021-02-09 International Business Machines Corporation Lateral mounting of optoelectronic chips on organic substrate
CN108176570B (en) * 2018-03-07 2022-12-06 浙江同梦通讯科技有限公司 Curing machine for optical fiber connector
KR102644098B1 (en) * 2019-03-12 2024-03-07 한국전자통신연구원 Optical connection apparatus and method using the same
FR3099479B1 (en) * 2019-07-30 2021-07-02 Centre Nat Rech Scient A method of manufacturing a three-dimensional object, or modifying the surface condition of a preformed object, by photopolymerization
CN112764159B (en) * 2019-10-21 2023-06-16 杭州光粒科技有限公司 Optical waveguide element, method of manufacturing the same, and holographic optical waveguide display device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4588664A (en) * 1983-08-24 1986-05-13 Polaroid Corporation Photopolymerizable compositions used in holograms
US4666236A (en) * 1982-08-10 1987-05-19 Omron Tateisi Electronics Co. Optical coupling device and method of producing same

Family Cites Families (137)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2007A (en) * 1841-03-16 Improvement in the mode of harvesting grain
US2003A (en) * 1841-03-12 Improvement in horizontal windivhlls
US2004A (en) * 1841-03-12 Improvement in the manner of constructing and propelling steam-vessels
US3018262A (en) * 1957-05-01 1962-01-23 Shell Oil Co Curing polyepoxides with certain metal salts of inorganic acids
NL298323A (en) * 1959-12-24
US3758186A (en) * 1966-11-30 1973-09-11 Battelle Development Corp Method of copying holograms
US3635545A (en) * 1967-04-14 1972-01-18 Eastman Kodak Co Multiple beam generation
US4238840A (en) * 1967-07-12 1980-12-09 Formigraphic Engine Corporation Method, medium and apparatus for producing three dimensional figure product
US4041476A (en) * 1971-07-23 1977-08-09 Wyn Kelly Swainson Method, medium and apparatus for producing three-dimensional figure product
US3677634A (en) 1968-12-23 1972-07-18 Ibm Contactless mask pattern exposure process and apparatus system having virtual extended depth of focus
US3806221A (en) * 1969-11-26 1974-04-23 Siemens Ag Holographic method of recording and reproducing etching masks
US3720921A (en) * 1970-07-14 1973-03-13 Ibm Recording in reversible, photochromic medium
US3954475A (en) * 1971-09-03 1976-05-04 Minnesota Mining And Manufacturing Company Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines
US3987037A (en) * 1971-09-03 1976-10-19 Minnesota Mining And Manufacturing Company Chromophore-substituted vinyl-halomethyl-s-triazines
US3808006A (en) * 1971-12-06 1974-04-30 Minnesota Mining & Mfg Photosensitive material containing a diaryliodium compound, a sensitizer and a color former
US3729313A (en) * 1971-12-06 1973-04-24 Minnesota Mining & Mfg Novel photosensitive systems comprising diaryliodonium compounds and their use
US3779778A (en) * 1972-02-09 1973-12-18 Minnesota Mining & Mfg Photosolubilizable compositions and elements
US3741769A (en) * 1972-10-24 1973-06-26 Minnesota Mining & Mfg Novel photosensitive polymerizable systems and their use
AU497960B2 (en) * 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
US4466080A (en) * 1975-01-27 1984-08-14 Formigraphic Engine Corporation Three-dimensional patterned media
US4078229A (en) * 1975-01-27 1978-03-07 Swanson Wyn K Three dimensional systems
US4333165A (en) * 1975-01-27 1982-06-01 Formigraphic Engine Corporation Three-dimensional pattern making methods
DE2546079A1 (en) 1975-10-15 1977-05-05 Leitz Ernst Gmbh Mirror condenser for top illumination fluorescence microscopy - increases illumination by reflecting transmitted rays back through preparation from metallised surface
US4471470A (en) * 1977-12-01 1984-09-11 Formigraphic Engine Corporation Method and media for accessing data in three dimensions
US4288861A (en) * 1977-12-01 1981-09-08 Formigraphic Engine Corporation Three-dimensional systems
US4250053A (en) * 1979-05-21 1981-02-10 Minnesota Mining And Manufacturing Company Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems
US4228861A (en) * 1979-08-02 1980-10-21 Hart Thomas E Folding track removing implement
US4279717A (en) * 1979-08-03 1981-07-21 General Electric Company Ultraviolet curable epoxy silicone coating compositions
US4394433A (en) * 1979-12-07 1983-07-19 Minnesota Mining And Manufacturing Company Diazonium imaging system
US4547037A (en) * 1980-10-16 1985-10-15 Regents Of The University Of Minnesota Holographic method for producing desired wavefront transformations
DE3204686A1 (en) 1982-02-11 1983-08-18 Fa. Carl Zeiss, 7920 Heidenheim OPTICAL SYSTEM FOR TRANSMITTED MICROSCOPY IN RESIDUAL ILLUMINATION
US4458345A (en) * 1982-03-31 1984-07-03 International Business Machines Corporation Process for optical information storage
JPS5929210A (en) * 1982-08-10 1984-02-16 Omron Tateisi Electronics Co Production of optical transmission coupler
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
US4496216A (en) * 1982-12-30 1985-01-29 Polaroid Corporation Method and apparatus for exposing photosensitive material
JPS60502125A (en) * 1983-08-24 1985-12-05 ポラロイド　コ−ポレ−シヨン Photopolymerizable composition
JPS60247515A (en) * 1984-05-23 1985-12-07 Oosakafu Optical shaping method
US4642126A (en) * 1985-02-11 1987-02-10 Norton Company Coated abrasives with rapidly curable adhesives and controllable curvature
US4652274A (en) * 1985-08-07 1987-03-24 Minnesota Mining And Manufacturing Company Coated abrasive product having radiation curable binder
JPS6297791A (en) 1985-10-25 1987-05-07 Nec Corp Laser marking device
CA1294470C (en) * 1986-07-26 1992-01-21 Toshihiro Suzuki Process for the production of optical elements
CA1323949C (en) * 1987-04-02 1993-11-02 Michael C. Palazzotto Ternary photoinitiator system for addition polymerization
US4775754A (en) * 1987-10-07 1988-10-04 Minnesota Mining And Manufacturing Company Preparation of leuco dyes
CN1035213A (en) * 1987-12-29 1989-08-30 精工电子工业株式会社 Travelling wave motor
US5434196A (en) * 1988-02-19 1995-07-18 Asahi Denka Kogyo K.K. Resin composition for optical molding
US4859572A (en) * 1988-05-02 1989-08-22 Eastman Kodak Company Dye sensitized photographic imaging system
US5098804A (en) * 1989-01-13 1992-03-24 E. I. Du Pont De Nemours And Company Multiplexer-demultiplexer for integrated optic circuit
GB8911454D0 (en) * 1989-05-18 1989-07-05 Pilkington Plc Hologram construction
US5037917A (en) * 1989-06-09 1991-08-06 The Dow Chemical Company Perfluorocyclobutane ring-containing polymers
US5159037A (en) * 1989-06-09 1992-10-27 The Dow Chemical Company Perfluorocyclobutane ring-containing polymers
US5159038A (en) * 1989-06-09 1992-10-27 Dow Chemical Company Perfluorocyclobutane ring-containing polymers
US4963471A (en) * 1989-07-14 1990-10-16 E. I. Du Pont De Nemours And Company Holographic photopolymer compositions and elements for refractive index imaging
US5034613A (en) * 1989-11-14 1991-07-23 Cornell Research Foundation, Inc. Two-photon laser microscopy
JPH03265804A (en) * 1990-03-16 1991-11-26 Nippon Telegr & Teleph Corp <Ntt> Method for connecting optical waveguide and optical fiber
CA2034400A1 (en) * 1990-04-30 1991-10-31 James Vincent Crivello Method for making triarylsulfonium hexafluorometal or metalloid salts
US5035476A (en) 1990-06-15 1991-07-30 Hamamatsu Photonics K.K. Confocal laser scanning transmission microscope
WO1992000185A1 (en) 1990-06-22 1992-01-09 Martin Russell Harris Optical waveguides
GB2249192B (en) * 1990-07-18 1994-10-12 Sony Magnescale Inc Hologram scales
US5145942A (en) * 1990-09-28 1992-09-08 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Methyl substituted polyimides containing carbonyl and ether connecting groups
US5633735A (en) 1990-11-09 1997-05-27 Litel Instruments Use of fresnel zone plates for material processing
US5235015A (en) * 1991-02-21 1993-08-10 Minnesota Mining And Manufacturing Company High speed aqueous solvent developable photopolymer compositions
JP2769393B2 (en) * 1991-04-26 1998-06-25 直弘 丹野 3D optical recording device
US5289407A (en) * 1991-07-22 1994-02-22 Cornell Research Foundation, Inc. Method for three dimensional optical data storage and retrieval
JPH05113517A (en) * 1991-10-22 1993-05-07 Nippon Telegr & Teleph Corp <Ntt> Structure for connecting optical waveguide and optical fiber
DE69213647T2 (en) * 1991-10-24 1997-02-06 Tosoh Corp Protective covering material
DE4142327A1 (en) 1991-12-20 1993-06-24 Wacker Chemie Gmbh Iodonium salts and process for their preparation
US5377043A (en) 1992-05-11 1994-12-27 Cornell Research Foundation, Inc. Ti:sapphire-pumped high repetition rate femtosecond optical parametric oscillator
US5405733A (en) * 1992-05-12 1995-04-11 Apple Computer, Inc. Multiple beam laser exposure system for liquid crystal shutters
US5466845A (en) 1992-06-12 1995-11-14 Wacker-Chemie Gmbh Sulfonium salts and process for their preparation
WO1994004744A1 (en) * 1992-08-20 1994-03-03 E.I. Du Pont De Nemours And Company Process for microstructuring surfaces of oriented polymeric substrates using laser radiation
US5415835A (en) * 1992-09-16 1995-05-16 University Of New Mexico Method for fine-line interferometric lithography
TW268969B (en) * 1992-10-02 1996-01-21 Minnesota Mining & Mfg
JPH06337320A (en) * 1993-05-27 1994-12-06 Agency Of Ind Science & Technol Process and apparatus for production of optical waveguide
DE4326473C2 (en) 1993-08-06 1997-05-15 European Molecular Biology Lab Embl Confocal microscope
US5422753A (en) * 1993-12-23 1995-06-06 Xerox Corporation Binary diffraction optical element for controlling scanning beam intensity in a raster output scanning (ROS) optical system
US5850300A (en) * 1994-02-28 1998-12-15 Digital Optics Corporation Diffractive beam homogenizer having free-form fringes
JP3265804B2 (en) 1994-03-18 2002-03-18 富士通株式会社 Barcode reader
DE4418645C1 (en) * 1994-05-27 1995-12-14 Sun Chemical Corp Photosensitive mixture and recording material which can be produced therefrom
US5854868A (en) * 1994-06-22 1998-12-29 Fujitsu Limited Optical device and light waveguide integrated circuit
JPH08320422A (en) * 1994-06-22 1996-12-03 Fujitsu Ltd Production of optical waveguide system and optical device using the system
US5856373A (en) * 1994-10-31 1999-01-05 Minnesota Mining And Manufacturing Company Dental visible light curable epoxy system with enhanced depth of cure
JPH08184718A (en) 1994-12-28 1996-07-16 Hoechst Japan Ltd Optical waveguide element and manufacture thereof
JP3498869B2 (en) * 1995-01-30 2004-02-23 富士写真フイルム株式会社 Image forming material having photopolymerizable composition
US5759744A (en) * 1995-02-24 1998-06-02 University Of New Mexico Methods and apparatus for lithography of sparse arrays of sub-micrometer features
US5665522A (en) * 1995-05-02 1997-09-09 Minnesota Mining And Manufacturing Company Visible image dyes for positive-acting no-process printing plates
US5747550A (en) * 1995-06-05 1998-05-05 Kimberly-Clark Worldwide, Inc. Method of generating a reactive species and polymerizing an unsaturated polymerizable material
JP2001520637A (en) 1995-09-06 2001-10-30 ザ・リサーチ・ファンデーション・オブ・ステート・ユニバーシティ・オブ・ニューヨーク Two-photon upconverting dyes and applications
US5699175A (en) * 1995-09-08 1997-12-16 Quinta Corporation Multiphoton photorefractive holographic recording media
WO1997013183A1 (en) * 1995-10-06 1997-04-10 Polaroid Corporation Holographic medium and process
AU717137B2 (en) * 1995-11-24 2000-03-16 Ciba Specialty Chemicals Holding Inc. Borate coinitiators for photopolymerization
WO1997027519A1 (en) 1996-01-29 1997-07-31 Foster-Miller, Inc. Optical components containing complex diffraction gratings and methods for the fabrication thereof
US5750641A (en) * 1996-05-23 1998-05-12 Minnesota Mining And Manufacturing Company Polyimide angularity enhancement layer
US5847812A (en) * 1996-06-14 1998-12-08 Nikon Corporation Projection exposure system and method
FR2751785A1 (en) * 1996-07-29 1998-01-30 Commissariat Energie Atomique METHOD AND DEVICE FOR FORMING PATTERNS IN A PHOTOSENSITIVE RESIN LAYER BY CONTINUOUS LASER INSOLATION, APPLICATION TO THE MANUFACTURE OF EMISSIVE MICROPOINT CATHODE ELECTRON SOURCES AND FLAT SCREENS
US5832931A (en) 1996-10-30 1998-11-10 Photogen, Inc. Method for improved selectivity in photo-activation and detection of molecular diagnostic agents
US6608228B1 (en) * 1997-11-07 2003-08-19 California Institute Of Technology Two-photon or higher-order absorbing optical materials for generation of reactive species
US6267913B1 (en) * 1996-11-12 2001-07-31 California Institute Of Technology Two-photon or higher-order absorbing optical materials and methods of use
US6618174B2 (en) * 1996-11-15 2003-09-09 Diffraction, Ltd In-line holographic mask for micromachining
DE19653413C2 (en) 1996-12-22 2002-02-07 Stefan Hell Scanning microscope, in which a sample is simultaneously optically excited in several sample points
US6025406A (en) * 1997-04-11 2000-02-15 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy resins
US5998495A (en) * 1997-04-11 1999-12-07 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy/polyol resin compositions
US6001297A (en) * 1997-04-28 1999-12-14 3D Systems, Inc. Method for controlling exposure of a solidfiable medium using a pulsed radiation source in building a three-dimensional object using stereolithography
US6005137A (en) * 1997-06-10 1999-12-21 3M Innovative Properties Company Halogenated acrylates and polymers derived therefrom
CN1053118C (en) * 1997-07-09 2000-06-07 天津市元亨医药保健品公司 Cardiotonic card and manufacture method thereof
US6020591A (en) 1997-07-11 2000-02-01 Imra America, Inc. Two-photon microscopy with plane wave illumination
US5859251A (en) * 1997-09-18 1999-01-12 The United States Of America As Represented By The Secretary Of The Air Force Symmetrical dyes with large two-photon absorption cross-sections
US5770737A (en) * 1997-09-18 1998-06-23 The United States Of America As Represented By The Secretary Of The Air Force Asymmetrical dyes with large two-photon absorption cross-sections
US6048911A (en) * 1997-12-12 2000-04-11 Borden Chemical, Inc. Coated optical fibers
US6103454A (en) * 1998-03-24 2000-08-15 Lucent Technologies Inc. Recording medium and process for forming medium
EP2133725B1 (en) * 1998-04-21 2018-06-06 University of Connecticut Fabrication method for nanofabrication using multi-photon excitation
US6169631B1 (en) * 1998-05-19 2001-01-02 Seagate Technology Llc Laser-texturing data zone on a magnetic disk surface by using degenerative two wave mixing
US6115339A (en) 1998-06-17 2000-09-05 International Business Machines Corporation Method and system in an optical storage disc drive for conserving laser power
KR100450542B1 (en) 1998-10-29 2004-10-01 가부시키가이샤 히타치세이사쿠쇼 Illuminating apparatus and liquid crystal display using the same
US6327074B1 (en) 1998-11-25 2001-12-04 University Of Central Florida Display medium using emitting particles dispersed in a transparent host
US6107011A (en) * 1999-01-06 2000-08-22 Creo Srl Method of high resolution optical scanning utilizing primary and secondary masks
US6322933B1 (en) * 1999-01-12 2001-11-27 Siros Technologies, Inc. Volumetric track definition for data storage media used to record data by selective alteration of a format hologram
US6749814B1 (en) 1999-03-03 2004-06-15 Symyx Technologies, Inc. Chemical processing microsystems comprising parallel flow microreactors and methods for using same
US6703188B1 (en) * 1999-03-29 2004-03-09 Kabushiki Kaisha Toyota Chuo Kenkyusho Method of fabricating optical waveguide structure
US6100405A (en) * 1999-06-15 2000-08-08 The United States Of America As Represented By The Secretary Of The Air Force Benzothiazole-containing two-photon chromophores exhibiting strong frequency upconversion
US6312876B1 (en) * 1999-07-08 2001-11-06 Taiwan Semiconductor Manufacturing Company Method for placing identifying mark on semiconductor wafer
US6322931B1 (en) * 1999-07-29 2001-11-27 Siros Technologies, Inc. Method and apparatus for optical data storage using non-linear heating by excited state absorption for the alteration of pre-formatted holographic gratings
US6624915B1 (en) * 2000-03-16 2003-09-23 Science Applications International Corporation Holographic recording and micro/nanofabrication via ultrafast holographic two-photon induced photopolymerization (H-TPIP)
JP2004503392A (en) * 2000-06-15 2004-02-05 スリーエム　イノベイティブ　プロパティズ　カンパニー Process for manufacturing microfluidic products
EP1295179B1 (en) * 2000-06-15 2013-05-22 3M Innovative Properties Company Multiphoton curing to provide encapsulated optical elements
US7026103B2 (en) * 2000-06-15 2006-04-11 3M Innovative Properties Company Multicolor imaging using multiphoton photochemical processes
US7381516B2 (en) * 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
AU2001266918A1 (en) 2000-06-15 2001-12-24 3M Innovative Properties Company Multidirectional photoreactive absorption method
AU2001266905A1 (en) * 2000-06-15 2001-12-24 3M Innovative Properties Company Microfabrication of organic optical elements
JP2004503831A (en) * 2000-06-15 2004-02-05 スリーエム　イノベイティブ　プロパティズ　カンパニー Multipath multiphoton absorption method and apparatus
US6852766B1 (en) * 2000-06-15 2005-02-08 3M Innovative Properties Company Multiphoton photosensitization system
US6441356B1 (en) * 2000-07-28 2002-08-27 Optical Biopsy Technologies Fiber-coupled, high-speed, angled-dual-axis optical coherence scanning microscopes
JP3876281B2 (en) * 2000-08-31 2007-01-31 独立行政法人産業技術総合研究所 Information recording method
US6541591B2 (en) * 2000-12-21 2003-04-01 3M Innovative Properties Company High refractive index microreplication resin from naphthyloxyalkylmethacrylates or naphthyloxyacrylates polymers
US20040012872A1 (en) * 2001-06-14 2004-01-22 Fleming Patrick R Multiphoton absorption method using patterned light
US6750266B2 (en) * 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system
US20030155667A1 (en) * 2002-12-12 2003-08-21 Devoe Robert J Method for making or adding structures to an article
US7378176B2 (en) 2004-05-04 2008-05-27 Angstrom Power Inc. Membranes and electrochemical cells incorporating such membranes

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4666236A (en) * 1982-08-10 1987-05-19 Omron Tateisi Electronics Co. Optical coupling device and method of producing same
US4588664A (en) * 1983-08-24 1986-05-13 Polaroid Corporation Photopolymerizable compositions used in holograms

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
DIAMOND C ET AL: "TWO-PHOTON HOLOGRAPHY IN 3-D PHOTOPOLYMER HOST-GUEST MATRIX", OPTICS EXPRESS, OPTICAL SOCIETY OF AMERICA, WASHINGTON, DC,, US, vol. 6, no. 3, 31 January 2000 (2000-01-31), pages 64 - 68, XP001051871, ISSN: 1094-4087 *
JOSHI M P ET AL: "Three-dimensional optical circuitry using two-photon-assisted polymerization", APPLIED PHYSICS LETTERS, 11 JAN. 1999, AIP, USA, vol. 74, no. 2, pages 170 - 172, XP002189064, ISSN: 0003-6951 *
MISAWA H ET AL: "Multibeam laser manipulation and fixation of microparticles", APPLIED PHYSICS LETTERS, 20 JAN. 1992, USA, vol. 60, no. 3, pages 310 - 312, XP002189602, ISSN: 0003-6951 *

Also Published As

Publication number Publication date
JP2013109379A (en) 2013-06-06
KR20030017995A (en) 2003-03-04
JP5491651B2 (en) 2014-05-14
WO2001096917A2 (en) 2001-12-20
US8530118B2 (en) 2013-09-10
JP2004503813A (en) 2004-02-05
AU2001268465A1 (en) 2001-12-24
EP1295179A2 (en) 2003-03-26
US20060078831A1 (en) 2006-04-13
US20050208431A1 (en) 2005-09-22
JP2011186493A (en) 2011-09-22
US7601484B2 (en) 2009-10-13
KR100810547B1 (en) 2008-03-18
US20100027956A1 (en) 2010-02-04
JP5400090B2 (en) 2014-01-29
JP4786858B2 (en) 2011-10-05
US7014988B2 (en) 2006-03-21
EP1295179B1 (en) 2013-05-22

Similar Documents

Publication Publication Date Title
WO2001096917A3 (en) Multiphoton curing to provide encapsulated optical elements
WO2004078461A8 (en) Connection between composites with non-compatible properties and method for preparation
DE60228251D1 (en) PREPREG, COMPOSITE MATERIAL AND ITS APPLICATIONS
DK1188442T3 (en) Cinnamomi and Poria composition, method of making the same, and uses thereof
DE602004021144D1 (en) Process for producing the ceramic structure
DE60136147D1 (en) Heater, steering wheel with integrated heater, as well as methods of making such steering wheel
DE69910133D1 (en) METHOD FOR PRODUCING PRE-FABRICATED COMPONENTS AND PRESERVED CONSTRUCTION CONSTRUCTED FROM SUCH ELEMENTS
ATE476293T1 (en) POLYURETHANE COMPOSITE FOAM AND METHOD FOR THE PRODUCTION THEREOF
NO20025228L (en) Self-derivative resin system for sand consolidation
ATE528355T1 (en) REINFORCED SILICONE RESIN FILM AND PRODUCTION METHOD THEREOF
CA2276659A1 (en) Ceramic-based composite member and its manufacturing method
DE50304628D1 (en) Composite with carbon reinforcing fibers
PT1390438E (en) CONCENTRATED ANTIFREEZE CONTAINING THE CORE C.I. REACTIVE VIOLET
DE60204390D1 (en) Mold for making an elastic crawler
ATE409712T1 (en) EPOXY RESIN COMPOSITION
DK1381641T3 (en) Improvements at or with connection to molding materials
FI20021445A (en) Hydraulically curing binder mixture
DE50103988D1 (en) METHOD FOR PRODUCING HOLLOW BODY ELEMENTS, HOLLOW BODY ELEMENT, ASSEMBLY COMPONENT AND MATRIX
DE69919221D1 (en) HARDENABLE RESIN COMPOSITION
DE60139970D1 (en) Woody thermoplastic resin composition
JP2002088226A5 (en)
AU2001247482A1 (en) Improved mvtr resin produced with post-titanated cr/si/ti catalyst
DK1122268T3 (en) Polymer Composition for Curing Novolak Resins
ATE345426T1 (en) COMPONENT AND METHOD FOR PRODUCING IT
DE60117891D1 (en) Manufacturing method of composite with ceramic matrix

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ PL PT RO RU SD SE SG SI SK SL TJ TM TR TT TZ UA UG US UZ VN YU ZA ZW

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR BF BJ CF CG CI CM GA GN GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
ENP Entry into the national phase

Ref country code: JP

Ref document number: 2002 510986

Kind code of ref document: A

Format of ref document f/p: F

WWE Wipo information: entry into national phase

Ref document number: 10311040

Country of ref document: US

WWE Wipo information: entry into national phase

Ref document number: 1020027017108

Country of ref document: KR

WWE Wipo information: entry into national phase

Ref document number: 2001946409

Country of ref document: EP

WWP Wipo information: published in national office

Ref document number: 1020027017108

Country of ref document: KR

WWP Wipo information: published in national office

Ref document number: 2001946409

Country of ref document: EP

REG Reference to national code

Ref country code: DE

Ref legal event code: 8642