WO2002005969A3 - Apparatus and method for synthesizing films and coatings by focused particle beam deposition - Google Patents
Apparatus and method for synthesizing films and coatings by focused particle beam deposition Download PDFInfo
- Publication number
- WO2002005969A3 WO2002005969A3 PCT/US2001/022766 US0122766W WO0205969A3 WO 2002005969 A3 WO2002005969 A3 WO 2002005969A3 US 0122766 W US0122766 W US 0122766W WO 0205969 A3 WO0205969 A3 WO 0205969A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- particles
- particle beam
- coatings
- beam deposition
- substrate
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/56—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides
- C04B35/565—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides based on silicon carbide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/452—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/02—Coating starting from inorganic powder by application of pressure only
- C23C24/04—Impact or kinetic deposition of particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/134—Plasma spraying
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H3/00—Production or acceleration of neutral particle beams, e.g. molecular or atomic beams
- H05H3/02—Molecular or atomic beam generation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/0318—Processes
- Y10T137/0324—With control of flow by a condition or characteristic of a fluid
- Y10T137/0379—By fluid pressure
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/7722—Line condition change responsive valves
- Y10T137/7754—Line flow effect assisted
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU2001277007A AU2001277007A1 (en) | 2000-07-19 | 2001-07-19 | Apparatus and method for synthesizing films and coatings by focused particle beam deposition |
US10/333,273 US6924004B2 (en) | 2000-07-19 | 2001-07-19 | Apparatus and method for synthesizing films and coatings by focused particle beam deposition |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US21972800P | 2000-07-19 | 2000-07-19 | |
US60/219,728 | 2000-07-19 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2002005969A2 WO2002005969A2 (en) | 2002-01-24 |
WO2002005969A3 true WO2002005969A3 (en) | 2002-04-11 |
Family
ID=22820529
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2001/022766 WO2002005969A2 (en) | 2000-07-19 | 2001-07-19 | Apparatus and method for synthesizing films and coatings by focused particle beam deposition |
Country Status (3)
Country | Link |
---|---|
US (1) | US6924004B2 (en) |
AU (1) | AU2001277007A1 (en) |
WO (1) | WO2002005969A2 (en) |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6952504B2 (en) * | 2001-12-21 | 2005-10-04 | Neophotonics Corporation | Three dimensional engineering of planar optical structures |
US7713297B2 (en) | 1998-04-11 | 2010-05-11 | Boston Scientific Scimed, Inc. | Drug-releasing stent with ceramic-containing layer |
US7476422B2 (en) * | 2002-05-23 | 2009-01-13 | Delphi Technologies, Inc. | Copper circuit formed by kinetic spray |
US20050000438A1 (en) * | 2003-07-03 | 2005-01-06 | Lim Brian Y. | Apparatus and method for fabrication of nanostructures using multiple prongs of radiating energy |
DE10331664B4 (en) * | 2003-07-12 | 2006-11-02 | Forschungszentrum Jülich GmbH | Plasma spraying process and device suitable for this purpose |
US20050258149A1 (en) * | 2004-05-24 | 2005-11-24 | Yuri Glukhoy | Method and apparatus for manufacture of nanoparticles |
US7476851B2 (en) * | 2004-11-12 | 2009-01-13 | Regents Of The University Of Minnesota | Aerodynamic focusing of nanoparticle or cluster beams |
JP4442558B2 (en) * | 2005-01-06 | 2010-03-31 | 三星モバイルディスプレイ株式會社 | Evaporation source heating control method, evaporation source cooling control method, and evaporation source control method |
KR101371979B1 (en) * | 2005-04-19 | 2014-03-07 | 하이퍼썸, 인크. | Plasma arc torch providing angular shield flow injection |
US7585721B2 (en) * | 2005-05-09 | 2009-09-08 | The Hong Kong Polytechnic University | Process and apparatus for fabricating nano-floating gate memories and memory made thereby |
CN101176387B (en) * | 2005-05-11 | 2012-11-21 | 人工发热机有限公司 | Generating discrete gas jets in plasma arc torch applications |
US7256396B2 (en) * | 2005-06-30 | 2007-08-14 | Ut-Battelle, Llc | Sensitive glow discharge ion source for aerosol and gas analysis |
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US7927948B2 (en) | 2005-07-20 | 2011-04-19 | Micron Technology, Inc. | Devices with nanocrystals and methods of formation |
US7989290B2 (en) | 2005-08-04 | 2011-08-02 | Micron Technology, Inc. | Methods for forming rhodium-based charge traps and apparatus including rhodium-based charge traps |
US7575978B2 (en) * | 2005-08-04 | 2009-08-18 | Micron Technology, Inc. | Method for making conductive nanoparticle charge storage element |
US20070224235A1 (en) | 2006-03-24 | 2007-09-27 | Barron Tenney | Medical devices having nanoporous coatings for controlled therapeutic agent delivery |
US8187620B2 (en) | 2006-03-27 | 2012-05-29 | Boston Scientific Scimed, Inc. | Medical devices comprising a porous metal oxide or metal material and a polymer coating for delivering therapeutic agents |
US20070243315A1 (en) | 2006-04-12 | 2007-10-18 | Buckley Daniel T | Methods for manufacturing electrochemical cell parts comprising material deposition processes |
US8097828B2 (en) * | 2006-05-11 | 2012-01-17 | Hypertherm, Inc. | Dielectric devices for a plasma arc torch |
DE102006027754A1 (en) * | 2006-06-09 | 2007-12-13 | Siemens Ag | Arrangement and method for accelerating particles |
US8815275B2 (en) | 2006-06-28 | 2014-08-26 | Boston Scientific Scimed, Inc. | Coatings for medical devices comprising a therapeutic agent and a metallic material |
EP2032091A2 (en) | 2006-06-29 | 2009-03-11 | Boston Scientific Limited | Medical devices with selective coating |
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US7776303B2 (en) * | 2006-08-30 | 2010-08-17 | Ppg Industries Ohio, Inc. | Production of ultrafine metal carbide particles utilizing polymeric feed materials |
ATE508708T1 (en) | 2006-09-14 | 2011-05-15 | Boston Scient Ltd | MEDICAL DEVICES WITH A DRUG-RELEASING COATING |
US7981150B2 (en) | 2006-11-09 | 2011-07-19 | Boston Scientific Scimed, Inc. | Endoprosthesis with coatings |
US20080181155A1 (en) * | 2007-01-31 | 2008-07-31 | Texas Instruments Incorporated | Apparatus for and method of detecting wireless local area network signals using a low power receiver |
US8431149B2 (en) | 2007-03-01 | 2013-04-30 | Boston Scientific Scimed, Inc. | Coated medical devices for abluminal drug delivery |
US8070797B2 (en) | 2007-03-01 | 2011-12-06 | Boston Scientific Scimed, Inc. | Medical device with a porous surface for delivery of a therapeutic agent |
US8067054B2 (en) | 2007-04-05 | 2011-11-29 | Boston Scientific Scimed, Inc. | Stents with ceramic drug reservoir layer and methods of making and using the same |
US7976915B2 (en) | 2007-05-23 | 2011-07-12 | Boston Scientific Scimed, Inc. | Endoprosthesis with select ceramic morphology |
US8367506B2 (en) | 2007-06-04 | 2013-02-05 | Micron Technology, Inc. | High-k dielectrics with gold nano-particles |
US20080306785A1 (en) * | 2007-06-08 | 2008-12-11 | Motorola, Inc. | Apparatus and methods for optimizing supply chain configurations |
US8002823B2 (en) | 2007-07-11 | 2011-08-23 | Boston Scientific Scimed, Inc. | Endoprosthesis coating |
US7942926B2 (en) | 2007-07-11 | 2011-05-17 | Boston Scientific Scimed, Inc. | Endoprosthesis coating |
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US7931683B2 (en) | 2007-07-27 | 2011-04-26 | Boston Scientific Scimed, Inc. | Articles having ceramic coated surfaces |
US8815273B2 (en) | 2007-07-27 | 2014-08-26 | Boston Scientific Scimed, Inc. | Drug eluting medical devices having porous layers |
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US7938855B2 (en) | 2007-11-02 | 2011-05-10 | Boston Scientific Scimed, Inc. | Deformable underlayer for stent |
US8216632B2 (en) | 2007-11-02 | 2012-07-10 | Boston Scientific Scimed, Inc. | Endoprosthesis coating |
US8029554B2 (en) | 2007-11-02 | 2011-10-04 | Boston Scientific Scimed, Inc. | Stent with embedded material |
US8920491B2 (en) | 2008-04-22 | 2014-12-30 | Boston Scientific Scimed, Inc. | Medical devices having a coating of inorganic material |
US8932346B2 (en) * | 2008-04-24 | 2015-01-13 | Boston Scientific Scimed, Inc. | Medical devices having inorganic particle layers |
EP2303350A2 (en) | 2008-06-18 | 2011-04-06 | Boston Scientific Scimed, Inc. | Endoprosthesis coating |
WO2010008969A2 (en) * | 2008-07-16 | 2010-01-21 | Boston Scientific Scimed, Inc. | Medical devices having metal coatings for controlled drug release |
EP2332164A1 (en) * | 2008-09-03 | 2011-06-15 | Dow Corning Corporation | Low pressure high frequency pulsed plasma reactor for producing nanoparticles |
US8231980B2 (en) | 2008-12-03 | 2012-07-31 | Boston Scientific Scimed, Inc. | Medical implants including iridium oxide |
US8071156B2 (en) | 2009-03-04 | 2011-12-06 | Boston Scientific Scimed, Inc. | Endoprostheses |
US8287937B2 (en) | 2009-04-24 | 2012-10-16 | Boston Scientific Scimed, Inc. | Endoprosthese |
US8286895B2 (en) * | 2009-05-07 | 2012-10-16 | Florida State University Research Foundation | High bandwidth micro-actuators for active flow control |
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US8834964B2 (en) * | 2009-12-11 | 2014-09-16 | Ngimat, Co. | Process for forming high surface area embedded coating with high abrasion resistance |
US8119977B2 (en) * | 2010-01-29 | 2012-02-21 | Pusan National University Industry-University Cooperation Foundation | Aerodynamic lens capable of focusing nanoparticles in a wide range |
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US8614416B2 (en) * | 2010-06-08 | 2013-12-24 | Ionwerks, Inc. | Nonoparticulate assisted nanoscale molecular imaging by mass spectrometery |
KR101301967B1 (en) * | 2011-05-20 | 2013-08-30 | 한국에너지기술연구원 | Plasma Nano-powder Synthesizing and Coating Device and Method of the same |
US8728951B2 (en) | 2012-07-31 | 2014-05-20 | Varian Semiconductor Equipment Associates, Inc. | Method and system for ion-assisted processing |
FR2994443B1 (en) * | 2012-08-10 | 2015-02-27 | Commissariat Energie Atomique | PROCESS FOR SYNTHESIS OF NANOSTRUCTURE COMPOSITE MATERIAL AND ASSOCIATED IMPLEMENTATION DEVICE |
WO2014087746A1 (en) | 2012-12-03 | 2014-06-12 | 富士電機株式会社 | Particle beam forming device |
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FR3045418A1 (en) | 2015-12-18 | 2017-06-23 | Commissariat Energie Atomique | METHOD FOR CONTROLLING THE DIVERGENCE OF A VACUUM PARTICLE JET WITH AERODYNAMIC LENS AND ASSOCIATED AERODYNAMIC LENS |
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CN107855276B (en) * | 2017-11-02 | 2023-08-08 | 广州禾信仪器股份有限公司 | Particulate matter separation device and separation method |
EP4034386A4 (en) * | 2019-09-25 | 2023-10-11 | Integrated Deposition Solutions, Inc. | Aerosol-based printing cartridge and use thereof in apparatus and method of use thereof |
CN113463093A (en) * | 2021-07-06 | 2021-10-01 | 广西大学 | Device and process method for synthesizing composite coating in situ by using chemical vapor deposition to assist laser cladding |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5270542A (en) * | 1992-12-31 | 1993-12-14 | Regents Of The University Of Minnesota | Apparatus and method for shaping and detecting a particle beam |
US5874134A (en) * | 1996-01-29 | 1999-02-23 | Regents Of The University Of Minnesota | Production of nanostructured materials by hypersonic plasma particle deposition |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5021221A (en) | 1980-10-20 | 1991-06-04 | Aero Chem Research Lab., Inc. | Apparatus for producing high purity silicon from flames of sodium and silicon tetrachloride |
WO1985003460A1 (en) | 1984-02-13 | 1985-08-15 | Schmitt Jerome J Iii | Method and apparatus for the gas jet deposition of conducting and dielectric thin solid films and products produced thereby |
JP2829221B2 (en) * | 1993-06-30 | 1998-11-25 | 財団法人国際超電導産業技術研究センター | Method of forming oxide film on metal substrate by thermal plasma evaporation method |
US5460701A (en) * | 1993-07-27 | 1995-10-24 | Nanophase Technologies Corporation | Method of making nanostructured materials |
US5514350A (en) * | 1994-04-22 | 1996-05-07 | Rutgers, The State University Of New Jersey | Apparatus for making nanostructured ceramic powders and whiskers |
US5565677A (en) * | 1995-08-04 | 1996-10-15 | The University Of Delaware | Aerodynamic nozzle for aerosol particle beam formation into a vacuum |
US6387531B1 (en) * | 1998-07-27 | 2002-05-14 | Nanogram Corporation | Metal (silicon) oxide/carbon composite particles |
JP2963993B1 (en) * | 1998-07-24 | 1999-10-18 | 工業技術院長 | Ultra-fine particle deposition method |
US6379419B1 (en) * | 1998-08-18 | 2002-04-30 | Noranda Inc. | Method and transferred arc plasma system for production of fine and ultrafine powders |
US6610959B2 (en) * | 2001-04-26 | 2003-08-26 | Regents Of The University Of Minnesota | Single-wire arc spray apparatus and methods of using same |
-
2001
- 2001-07-19 US US10/333,273 patent/US6924004B2/en not_active Expired - Lifetime
- 2001-07-19 AU AU2001277007A patent/AU2001277007A1/en not_active Abandoned
- 2001-07-19 WO PCT/US2001/022766 patent/WO2002005969A2/en active Application Filing
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5270542A (en) * | 1992-12-31 | 1993-12-14 | Regents Of The University Of Minnesota | Apparatus and method for shaping and detecting a particle beam |
US5874134A (en) * | 1996-01-29 | 1999-02-23 | Regents Of The University Of Minnesota | Production of nanostructured materials by hypersonic plasma particle deposition |
Non-Patent Citations (3)
Title |
---|
AKEDO J ET AL: "Jet molding system for realization of three-dimensional micro-structures", SENSORS AND ACTUATORS A, ELSEVIER SEQUOIA S.A., LAUSANNE, CH, vol. 69, no. 1, 30 June 1998 (1998-06-30), pages 106 - 112, XP004134648, ISSN: 0924-4247 * |
FONZO DI F ET AL: "FOCUSED NANOPARTICLE-BEAM DEPOSITION OF PATTERNED MICROSTRUCTURES", APPLIED PHYSICS LETTERS, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, vol. 77, no. 6, 7 August 2000 (2000-08-07), pages 910 - 912, XP000956862, ISSN: 0003-6951 * |
RAO N ET AL: "NANOPARTICLE FORMATION USING A PLASMA EXPANSION PROCESS", PLASMA CHEMISTRY AND PLASMA PROCESSING, PLENUM PRESS. NEW YORK, US, vol. 15, no. 4, 1 December 1995 (1995-12-01), pages 581 - 606, XP000539562, ISSN: 0272-4324 * |
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US20040046130A1 (en) | 2004-03-11 |
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AU2001277007A1 (en) | 2002-01-30 |
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