WO2002018313A1 - Oxetane-modified compounds and photocuring compounds derived therefrom, processes for preparation of both and curing compositions contaning the photocuring compounds - Google Patents

Oxetane-modified compounds and photocuring compounds derived therefrom, processes for preparation of both and curing compositions contaning the photocuring compounds Download PDF

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Publication number
WO2002018313A1
WO2002018313A1 PCT/JP2001/007222 JP0107222W WO0218313A1 WO 2002018313 A1 WO2002018313 A1 WO 2002018313A1 JP 0107222 W JP0107222 W JP 0107222W WO 0218313 A1 WO0218313 A1 WO 0218313A1
Authority
WO
WIPO (PCT)
Prior art keywords
compounds
photocuring
oxetane
alkali metal
modified
Prior art date
Application number
PCT/JP2001/007222
Other languages
French (fr)
Japanese (ja)
Inventor
Tadatomi Nishikubo
Atsushi Kameyama
Hidekazu Miyabe
Masaki Sasaki
Masatoshi Kusama
Original Assignee
Kanagawa University
Taiyo Ink Manufacturing Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanagawa University, Taiyo Ink Manufacturing Co., Ltd. filed Critical Kanagawa University
Priority to JP2002523431A priority Critical patent/JP4909487B2/en
Publication of WO2002018313A1 publication Critical patent/WO2002018313A1/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/28Chemically modified polycondensates
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/285Permanent coating compositions
    • H05K3/287Photosensitive compositions
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4644Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4673Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
    • H05K3/4676Single layer compositions

Abstract

Oxetane-modified compounds can be prepared in extremely high yield by reacting a compound (a) having a phenolic hydroxyl group with a monofunctional oxetane compound (b) having a primary hydroxyl group in the presence of at least one catalyst (c) selected from the group consisting of alkali metal alkoxides, alkali metal phenoxides, alkali metal carboxylates, crown ether complexes of these alkali metal compounds, metal hydroxides and metal hydrides. The obtained oxetane-modified compounds give photocuring compounds via reactions with ethylenically unsaturated compounds (d) having hydroxyl-reactive functional groups, and these photocuring compounds give alkali-soluble photocuring compounds via reactions with polybasic acid anhydrides (e). The photocuring compounds are useful as the photocuring component of photosetting compositions or photo- and thermo-setting compositions.
PCT/JP2001/007222 2000-08-30 2001-08-23 Oxetane-modified compounds and photocuring compounds derived therefrom, processes for preparation of both and curing compositions contaning the photocuring compounds WO2002018313A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002523431A JP4909487B2 (en) 2000-08-30 2001-08-23 Oxetane-modified compounds and photocurable compounds derived therefrom, methods for their production and curable compositions containing them

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000260798 2000-08-30
JP2000-260798 2000-08-30

Publications (1)

Publication Number Publication Date
WO2002018313A1 true WO2002018313A1 (en) 2002-03-07

Family

ID=18748753

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2001/007222 WO2002018313A1 (en) 2000-08-30 2001-08-23 Oxetane-modified compounds and photocuring compounds derived therefrom, processes for preparation of both and curing compositions contaning the photocuring compounds

Country Status (3)

Country Link
JP (1) JP4909487B2 (en)
TW (1) TWI239947B (en)
WO (1) WO2002018313A1 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005037876A1 (en) * 2003-10-15 2005-04-28 Toagosei Co., Ltd. Polymer having oxetanyl group and cation-curable resin composition containing the same
JP2011162677A (en) * 2010-02-10 2011-08-25 Kanagawa Univ Polymer compound, curable composition and optical material, and manufacturing method of those
WO2018230322A1 (en) * 2017-06-12 2018-12-20 Dic株式会社 Polymerizable compound and liquid-crystal composition
US11739270B2 (en) 2018-03-01 2023-08-29 Dic Corporation Polymerizable compound as well as liquid crystal composition and liquid crystal display device each including polymerizable compound
US11760934B2 (en) 2017-11-17 2023-09-19 Dic Corporation Polymerizable compound, and liquid crystal composition and liquid crystal display element in which the compound is used

Citations (10)

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DE2121525A1 (en) * 1971-05-03 1972-11-16 Badische Anilin- & Soda-Fabrik Ag, 6700 Ludwigshafen Anthraquinone dyes - contg sulphite ester gps with increased thermal stability
US3875112A (en) * 1971-04-23 1975-04-01 Bayer Ag Aromatic polycarbonates with aliphatic hydroxyl groups
JPS5736174A (en) * 1980-08-12 1982-02-26 Dainippon Printing Co Ltd Electric ray-curing type adhesive for laminating
JPS5993772A (en) * 1982-11-18 1984-05-30 Dainippon Printing Co Ltd Colored adhesive for laminate curable by electron rays
EP0213925A2 (en) * 1985-08-30 1987-03-11 Minnesota Mining And Manufacturing Company Copolymerizable UV stabilizers
EP0344111A2 (en) * 1988-05-27 1989-11-29 Ciba-Geigy Ag Substituted tetrathio- and tetraselenotetracenes
JPH0827208A (en) * 1994-07-15 1996-01-30 Nippon Kayaku Co Ltd Actinic energy radiation-curing composition and cured article
JPH09258438A (en) * 1996-03-19 1997-10-03 Nippon Zeon Co Ltd Photosensitive resin composition
WO1999010303A1 (en) * 1997-08-26 1999-03-04 Research Corporation Technologies, Inc. Radiation-curable propenyl compounds, uses thereof, and compositions containing them
EP0902018A2 (en) * 1997-09-04 1999-03-17 F. Hoffmann-La Roche Ag 2-(Arylphenyl)amino-imidazoline derivatives

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11246540A (en) * 1998-03-04 1999-09-14 Ube Ind Ltd Oxetane group-containing calix(4)resorcin arene derivative and its production

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3875112A (en) * 1971-04-23 1975-04-01 Bayer Ag Aromatic polycarbonates with aliphatic hydroxyl groups
DE2121525A1 (en) * 1971-05-03 1972-11-16 Badische Anilin- & Soda-Fabrik Ag, 6700 Ludwigshafen Anthraquinone dyes - contg sulphite ester gps with increased thermal stability
JPS5736174A (en) * 1980-08-12 1982-02-26 Dainippon Printing Co Ltd Electric ray-curing type adhesive for laminating
JPS5993772A (en) * 1982-11-18 1984-05-30 Dainippon Printing Co Ltd Colored adhesive for laminate curable by electron rays
EP0213925A2 (en) * 1985-08-30 1987-03-11 Minnesota Mining And Manufacturing Company Copolymerizable UV stabilizers
EP0344111A2 (en) * 1988-05-27 1989-11-29 Ciba-Geigy Ag Substituted tetrathio- and tetraselenotetracenes
JPH0827208A (en) * 1994-07-15 1996-01-30 Nippon Kayaku Co Ltd Actinic energy radiation-curing composition and cured article
JPH09258438A (en) * 1996-03-19 1997-10-03 Nippon Zeon Co Ltd Photosensitive resin composition
WO1999010303A1 (en) * 1997-08-26 1999-03-04 Research Corporation Technologies, Inc. Radiation-curable propenyl compounds, uses thereof, and compositions containing them
EP0902018A2 (en) * 1997-09-04 1999-03-17 F. Hoffmann-La Roche Ag 2-(Arylphenyl)amino-imidazoline derivatives

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
BULL. SOC. CHIM. FR., vol. 2, 1967, pages 645 - 650 *
CHEMICAL ABSTRACTS, vol. 67, 1967, Columbus, Ohio, US; abstract no. 2842H, SEYDEN-PENNE J. AND STRZALKO T.: "Synthesis of phenyl ethers with a neopentyl structure. VII. Reaction of sodium cynide with 1,3-propanediol sulfonates" page 260; XP002949973 *
CRIVELLO J.V. AND LOHDEN G.: "The preparation of novel 1-propenyl ethers and their cationic photopolymerization", J. POLYM. SCI. PART A POLYMER CHEMISTRY, vol. 34, no. 10, 1996, pages 2051 - 2062, XP002949974 *

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005037876A1 (en) * 2003-10-15 2005-04-28 Toagosei Co., Ltd. Polymer having oxetanyl group and cation-curable resin composition containing the same
JP2011162677A (en) * 2010-02-10 2011-08-25 Kanagawa Univ Polymer compound, curable composition and optical material, and manufacturing method of those
WO2018230322A1 (en) * 2017-06-12 2018-12-20 Dic株式会社 Polymerizable compound and liquid-crystal composition
CN110573490A (en) * 2017-06-12 2019-12-13 Dic株式会社 Polymerizable compound and liquid crystal composition
US11174217B2 (en) 2017-06-12 2021-11-16 Dic Corporation Polymerizable compound and liquid crystal composition
CN110573490B (en) * 2017-06-12 2023-01-13 Dic株式会社 Polymerizable compound and liquid crystal composition
US11760934B2 (en) 2017-11-17 2023-09-19 Dic Corporation Polymerizable compound, and liquid crystal composition and liquid crystal display element in which the compound is used
US11739270B2 (en) 2018-03-01 2023-08-29 Dic Corporation Polymerizable compound as well as liquid crystal composition and liquid crystal display device each including polymerizable compound

Also Published As

Publication number Publication date
TWI239947B (en) 2005-09-21
JP4909487B2 (en) 2012-04-04
JPWO2002018313A1 (en) 2004-01-15

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