WO2002023588A3 - Capacitively coupled plasma reactor - Google Patents

Capacitively coupled plasma reactor Download PDF

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Publication number
WO2002023588A3
WO2002023588A3 PCT/US2001/042111 US0142111W WO0223588A3 WO 2002023588 A3 WO2002023588 A3 WO 2002023588A3 US 0142111 W US0142111 W US 0142111W WO 0223588 A3 WO0223588 A3 WO 0223588A3
Authority
WO
WIPO (PCT)
Prior art keywords
plasma
region
plasma region
generating
capacitively coupled
Prior art date
Application number
PCT/US2001/042111
Other languages
French (fr)
Other versions
WO2002023588A2 (en
Inventor
Bill H Quon
Original Assignee
Tokyo Electron Ltd
Bill H Quon
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd, Bill H Quon filed Critical Tokyo Electron Ltd
Priority to AU2001289211A priority Critical patent/AU2001289211A1/en
Publication of WO2002023588A2 publication Critical patent/WO2002023588A2/en
Publication of WO2002023588A3 publication Critical patent/WO2002023588A3/en
Priority to US10/378,691 priority patent/US20030150562A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H01J37/32165—Plural frequencies
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means

Abstract

A capacitively coupled plasma reactor composed of: a reactor chamber enclosing a plasma region; upper and lower main plasma generating electrodes for generating a processing plasma in a central portion of the plasma region by transmitting electrical power from a power source to the central portion while a gas is present in the plasma region; and a magnetic mirror including at least one set of magnets for maintaining a boundary layer plasma in a boundary portion of the plasma region around the processing plasma. A capacitively coupled plasma reactor composed of: a reactor chamber enclosing a plasma region; upper and lower plasma generating electrodes for generating a processing plasma in the plasma region by transmitting electrical power from a power source to the plasma region while a gas is present in the plasma region; and power supplies for applying a VHF drive voltage to the upper plasma generating electrode and RF bias voltages at a lower frequency than the VHF drive voltage to the upper and lower plasma generating electrodes.
PCT/US2001/042111 2000-09-12 2001-09-12 Capacitively coupled plasma reactor WO2002023588A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
AU2001289211A AU2001289211A1 (en) 2000-09-12 2001-09-12 Capacitively coupled plasma reactor
US10/378,691 US20030150562A1 (en) 2000-09-12 2003-03-05 Apparatus and method to control the uniformity of plasma by reducing radial loss

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US23187800P 2000-09-12 2000-09-12
US60/231,878 2000-09-12

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/378,691 Continuation US20030150562A1 (en) 2000-09-12 2003-03-05 Apparatus and method to control the uniformity of plasma by reducing radial loss

Publications (2)

Publication Number Publication Date
WO2002023588A2 WO2002023588A2 (en) 2002-03-21
WO2002023588A3 true WO2002023588A3 (en) 2002-09-12

Family

ID=22870971

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2001/042111 WO2002023588A2 (en) 2000-09-12 2001-09-12 Capacitively coupled plasma reactor

Country Status (4)

Country Link
US (1) US20030150562A1 (en)
AU (1) AU2001289211A1 (en)
TW (1) TW511398B (en)
WO (1) WO2002023588A2 (en)

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WO2003005406A1 (en) * 2001-07-03 2003-01-16 Tokyo Electron Limited Plasma pump with inter-stage plasma source
KR100585089B1 (en) * 2003-05-27 2006-05-30 삼성전자주식회사 Plasma processing apparatus for processing the edge of wafer, insulating plate for plasma processing, bottom electrode for plasma processing, method of plasma processing the edge of wafer and method of fabricating semiconductor device using the same
US7400096B1 (en) 2004-07-19 2008-07-15 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Large area plasma source
US7305935B1 (en) 2004-08-25 2007-12-11 The United States Of America As Represented By The Administration Of Nasa Slotted antenna waveguide plasma source
US7323116B2 (en) * 2004-09-27 2008-01-29 Lam Research Corporation Methods and apparatus for monitoring a process in a plasma processing system by measuring self-bias voltage
US7780814B2 (en) * 2005-07-08 2010-08-24 Applied Materials, Inc. Wafer pre-clean reactor cable termination for selective suppression/reflection of source and bias frequency cross products
US20080194091A1 (en) * 2007-02-13 2008-08-14 Taiwan Semiconductor Manufacturing Co., Ltd. Method for fabricating nitrided oxide layer
US9287096B2 (en) 2007-09-27 2016-03-15 Lam Research Corporation Methods and apparatus for a hybrid capacitively-coupled and an inductively-coupled plasma processing system
US20090236214A1 (en) * 2008-03-20 2009-09-24 Karthik Janakiraman Tunable ground planes in plasma chambers
US9887069B2 (en) 2008-12-19 2018-02-06 Lam Research Corporation Controlling ion energy distribution in plasma processing systems
CN101880868B (en) 2010-06-11 2012-03-07 深圳市创益科技发展有限公司 Deposition box for silicon-based film solar cells
CN101857953B (en) 2010-06-11 2012-04-18 深圳市创益科技发展有限公司 Face feed electrode for thin-film solar cell deposition
CN101882646B (en) 2010-06-11 2012-01-25 深圳市创益科技发展有限公司 Deposition clamp of film solar cell
CN101859801B (en) 2010-06-11 2013-02-20 深圳市创益科技发展有限公司 Discharge electrode plate array for thin film solar cell settling
CN101882647B (en) 2010-06-11 2012-01-25 深圳市创益科技发展有限公司 Movable holder for silicon-based film solar cells
CN102185217B (en) * 2011-03-04 2013-02-06 深圳市创益科技发展有限公司 Connecting member and method for radio-frequency power supply in silicon-based film battery deposition clamp
US8900403B2 (en) 2011-05-10 2014-12-02 Lam Research Corporation Semiconductor processing system having multiple decoupled plasma sources
US20120258555A1 (en) * 2011-04-11 2012-10-11 Lam Research Corporation Multi-Frequency Hollow Cathode and Systems Implementing the Same
JP6018757B2 (en) 2012-01-18 2016-11-02 東京エレクトロン株式会社 Substrate processing equipment
US9209032B2 (en) 2013-03-15 2015-12-08 Tokyo Electron Limited Electric pressure systems for control of plasma properties and uniformity
EP2819049B1 (en) * 2013-06-27 2015-11-18 Nxp B.V. Device with capacitive security shield
CN110249416B (en) 2017-04-07 2023-09-12 应用材料公司 Plasma density control at substrate edge
WO2020014448A1 (en) * 2018-07-11 2020-01-16 Board Of Trustees Of Michigan State University Vertically oriented plasma reactor
US11545343B2 (en) 2019-04-22 2023-01-03 Board Of Trustees Of Michigan State University Rotary plasma reactor

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US5444207A (en) * 1992-03-26 1995-08-22 Kabushiki Kaisha Toshiba Plasma generating device and surface processing device and method for processing wafers in a uniform magnetic field
EP0969123A1 (en) * 1997-03-07 2000-01-05 OHMI, Tadahiro Plasma etching device

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US4691662A (en) * 1983-02-28 1987-09-08 Michigan State University Dual plasma microwave apparatus and method for treating a surface
US4885074A (en) * 1987-02-24 1989-12-05 International Business Machines Corporation Plasma reactor having segmented electrodes
US5707486A (en) * 1990-07-31 1998-01-13 Applied Materials, Inc. Plasma reactor using UHF/VHF and RF triode source, and process
US5252178A (en) * 1992-06-24 1993-10-12 Texas Instruments Incorporated Multi-zone plasma processing method and apparatus
US5286297A (en) * 1992-06-24 1994-02-15 Texas Instruments Incorporated Multi-electrode plasma processing apparatus
US5292370A (en) * 1992-08-14 1994-03-08 Martin Marietta Energy Systems, Inc. Coupled microwave ECR and radio-frequency plasma source for plasma processing
KR100302167B1 (en) * 1993-11-05 2001-11-22 히가시 데쓰로 Plasma Treatment Equipment and Plasma Treatment Methods
US6375860B1 (en) * 1995-03-10 2002-04-23 General Atomics Controlled potential plasma source
US5656123A (en) * 1995-06-07 1997-08-12 Varian Associates, Inc. Dual-frequency capacitively-coupled plasma reactor for materials processing
US6214162B1 (en) * 1996-09-27 2001-04-10 Tokyo Electron Limited Plasma processing apparatus
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TW516113B (en) * 1999-04-14 2003-01-01 Hitachi Ltd Plasma processing device and plasma processing method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5444207A (en) * 1992-03-26 1995-08-22 Kabushiki Kaisha Toshiba Plasma generating device and surface processing device and method for processing wafers in a uniform magnetic field
EP0969123A1 (en) * 1997-03-07 2000-01-05 OHMI, Tadahiro Plasma etching device

Also Published As

Publication number Publication date
WO2002023588A2 (en) 2002-03-21
AU2001289211A1 (en) 2002-03-26
US20030150562A1 (en) 2003-08-14
TW511398B (en) 2002-11-21

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