WO2002043921A1 - Tampon de polissage, procede de fabrication de ce tampon de polissage, et couche d'amortissement pour ce tampon de polissage - Google Patents

Tampon de polissage, procede de fabrication de ce tampon de polissage, et couche d'amortissement pour ce tampon de polissage Download PDF

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Publication number
WO2002043921A1
WO2002043921A1 PCT/JP2001/010363 JP0110363W WO0243921A1 WO 2002043921 A1 WO2002043921 A1 WO 2002043921A1 JP 0110363 W JP0110363 W JP 0110363W WO 0243921 A1 WO0243921 A1 WO 0243921A1
Authority
WO
WIPO (PCT)
Prior art keywords
polishing pad
abrasive grains
polishing
distributed
performed easily
Prior art date
Application number
PCT/JP2001/010363
Other languages
English (en)
French (fr)
Inventor
Koichi Ono
Tetsuo Shimomura
Masahiko Nakamori
Takatoshi Yamada
Shigeru Komai
Masayuki Tsutsumi
Original Assignee
Toyo Boseki Kabushiki Kaisha
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Boseki Kabushiki Kaisha filed Critical Toyo Boseki Kabushiki Kaisha
Priority to JP2002545884A priority Critical patent/JP4177100B2/ja
Priority to US10/432,410 priority patent/US7192340B2/en
Priority to KR1020037006642A priority patent/KR100867339B1/ko
Priority to AU2002218480A priority patent/AU2002218480A1/en
Publication of WO2002043921A1 publication Critical patent/WO2002043921A1/ja
Priority to US11/366,981 priority patent/US7762870B2/en
Priority to US11/366,238 priority patent/US7329170B2/en
Priority to US11/366,077 priority patent/US7641540B2/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/22—Lapping pads for working plane surfaces characterised by a multi-layered structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B24D11/001—Manufacture of flexible abrasive materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B24D11/008—Finishing manufactured abrasive sheets, e.g. cutting, deforming
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/20—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
    • B24D3/28—Resins or natural or synthetic macromolecular compounds
PCT/JP2001/010363 2000-12-01 2001-11-28 Tampon de polissage, procede de fabrication de ce tampon de polissage, et couche d'amortissement pour ce tampon de polissage WO2002043921A1 (fr)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2002545884A JP4177100B2 (ja) 2000-12-01 2001-11-28 研磨パッド及びその製造方法並びに研磨パッド用クッション層
US10/432,410 US7192340B2 (en) 2000-12-01 2001-11-28 Polishing pad, method of producing the same, and cushion layer for polishing pad
KR1020037006642A KR100867339B1 (ko) 2000-12-01 2001-11-28 연마 패드 및 그 제조 방법
AU2002218480A AU2002218480A1 (en) 2000-12-01 2001-11-28 Polishing pad, method of manufacturing the polishing pad, and cushion layer for polishing pad
US11/366,981 US7762870B2 (en) 2000-12-01 2006-03-02 Polishing pad and cushion layer for polishing pad
US11/366,238 US7329170B2 (en) 2000-12-01 2006-03-02 Method of producing polishing pad
US11/366,077 US7641540B2 (en) 2000-12-01 2006-03-02 Polishing pad and cushion layer for polishing pad

Applications Claiming Priority (24)

Application Number Priority Date Filing Date Title
JP2000367468 2000-12-01
JP2000-367469 2000-12-01
JP2000367469 2000-12-01
JP2000-367468 2000-12-01
JP2001013405 2001-01-22
JP2001-13405 2001-01-22
JP2001-61221 2001-03-06
JP2001061221 2001-03-06
JP2001103699 2001-04-02
JP2001-103699 2001-04-02
JP2001225568 2001-07-26
JP2001-225568 2001-07-26
JP2001-234577 2001-08-02
JP2001234577 2001-08-02
JP2001269928 2001-09-06
JP2001-269928 2001-09-06
JP2001-274011 2001-09-10
JP2001274011 2001-09-10
JP2001-302941 2001-09-28
JP2001-302939 2001-09-28
JP2001302940 2001-09-28
JP2001302941 2001-09-28
JP2001302939 2001-09-28
JP2001-302940 2001-09-28

Related Child Applications (4)

Application Number Title Priority Date Filing Date
US10432410 A-371-Of-International 2001-11-28
US11/366,981 Division US7762870B2 (en) 2000-12-01 2006-03-02 Polishing pad and cushion layer for polishing pad
US11/366,238 Division US7329170B2 (en) 2000-12-01 2006-03-02 Method of producing polishing pad
US11/366,077 Division US7641540B2 (en) 2000-12-01 2006-03-02 Polishing pad and cushion layer for polishing pad

Publications (1)

Publication Number Publication Date
WO2002043921A1 true WO2002043921A1 (fr) 2002-06-06

Family

ID=27583556

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2001/010363 WO2002043921A1 (fr) 2000-12-01 2001-11-28 Tampon de polissage, procede de fabrication de ce tampon de polissage, et couche d'amortissement pour ce tampon de polissage

Country Status (5)

Country Link
US (4) US7192340B2 (ja)
JP (4) JP4177100B2 (ja)
KR (4) KR100867339B1 (ja)
CN (4) CN100496896C (ja)
WO (1) WO2002043921A1 (ja)

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JP2004167605A (ja) * 2002-11-15 2004-06-17 Rodel Nitta Co 研磨パッドおよび研磨装置
WO2004059715A1 (en) * 2002-12-28 2004-07-15 Skc Co., Ltd. Polishing pads, conditioner and methods for polishing using the same
JP2004223701A (ja) * 2002-11-29 2004-08-12 Mitsui Chemicals Inc 研磨材
JP2004235446A (ja) * 2003-01-30 2004-08-19 Toyobo Co Ltd 研磨パッド
JP2004235445A (ja) * 2003-01-30 2004-08-19 Toyobo Co Ltd 研磨パッド
JP2004303983A (ja) * 2003-03-31 2004-10-28 Fuji Photo Film Co Ltd 研磨パッド
JP2005103702A (ja) * 2003-09-30 2005-04-21 Toyo Tire & Rubber Co Ltd Ｃｍｐ用研磨パッド及びその梱包方法
JP2005129644A (ja) * 2003-10-22 2005-05-19 Disco Abrasive Syst Ltd 固定砥粒研磨パッド，研磨装置
JP2005177934A (ja) * 2003-12-19 2005-07-07 Toyo Tire & Rubber Co Ltd Ｃｍｐ用研磨パッド、及びそれを用いた研磨方法
JP2005324302A (ja) * 2004-05-17 2005-11-24 Toyo Tire & Rubber Co Ltd 研磨パッドおよびその製造方法
JP2006110665A (ja) * 2004-10-14 2006-04-27 Nihon Micro Coating Co Ltd 研磨パッド
CN100362630C (zh) * 2002-06-20 2008-01-16 株式会社尼康 抛光体、抛光装置、半导体器件以及半导体器件的制造方法
JP2008084984A (ja) * 2006-09-26 2008-04-10 Fujifilm Corp 光ナノインプリントリソグラフィ用光硬化性組成物およびそれを用いたパターン形成方法
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JP2011200984A (ja) * 2010-03-26 2011-10-13 Toray Ind Inc 研磨パッド
JP5154704B1 (ja) * 2012-06-29 2013-02-27 三島光産株式会社 研磨パッド成形金型の製造方法、その方法で製造される研磨パッド成形金型、及びその金型で製造した研磨パッド
US8895458B2 (en) 2004-04-21 2014-11-25 Toray Industries, Inc. Abrasive cloth and method for producing nanofiber structure
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WO2018207670A1 (ja) * 2017-05-12 2018-11-15 株式会社クラレ 鎖伸長剤，ポリウレタンとその改質方法，研磨層，研磨パッド及び研磨方法
CN109318136A (zh) * 2018-11-29 2019-02-12 华侨大学 一种柔性抛光装置
JP2019141997A (ja) * 2012-04-25 2019-08-29 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 印刷による化学機械研磨パッド
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KR20210001793U (ko) * 2020-01-27 2021-08-04 마루이시 산교 가부시키가이샤 부직포로 이루어지는 2층 구조의 연마패드
US11446788B2 (en) 2014-10-17 2022-09-20 Applied Materials, Inc. Precursor formulations for polishing pads produced by an additive manufacturing process
US11745302B2 (en) 2014-10-17 2023-09-05 Applied Materials, Inc. Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process
US11772229B2 (en) 2016-01-19 2023-10-03 Applied Materials, Inc. Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process
US11958162B2 (en) 2020-01-17 2024-04-16 Applied Materials, Inc. CMP pad construction with composite material properties using additive manufacturing processes

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