WO2002048766A3 - Large area optical integrated circuits - Google Patents

Large area optical integrated circuits Download PDF

Info

Publication number
WO2002048766A3
WO2002048766A3 PCT/US2001/047493 US0147493W WO0248766A3 WO 2002048766 A3 WO2002048766 A3 WO 2002048766A3 US 0147493 W US0147493 W US 0147493W WO 0248766 A3 WO0248766 A3 WO 0248766A3
Authority
WO
WIPO (PCT)
Prior art keywords
large area
optical devices
substrates
area substrates
integrated circuits
Prior art date
Application number
PCT/US2001/047493
Other languages
French (fr)
Other versions
WO2002048766A2 (en
Inventor
Cecilia Y Mak
John M White
Kam S Law
Dan Maydan
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to KR10-2003-7007785A priority Critical patent/KR20040052444A/en
Priority to EP01990046A priority patent/EP1356324A2/en
Priority to JP2002550016A priority patent/JP2004535592A/en
Publication of WO2002048766A2 publication Critical patent/WO2002048766A2/en
Publication of WO2002048766A3 publication Critical patent/WO2002048766A3/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/12004—Combinations of two or more optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/132—Integrated optical circuits characterised by the manufacturing method by deposition of thin films

Abstract

In one aspect, the invention provides methods and apparatus for forming optical devices on large area substrates. The large area substrates are preferably made of quartz, silica or fused silica. The large area substrates enable larger optical devices to be formed on a single die. In another aspect, the invention provides methods and apparatus for forming integrated optical devices on large area substrates, such as quartz, silica or fused silica substrates. In another aspect, the invention provides methods and apparatus for forming optical devices using damascene techniques on large area substrates or silicon substrates. In another aspect, methods for forming optical devices by bonding an upper cladding layer on a lower cladding and a core is provided.
PCT/US2001/047493 2000-12-11 2001-12-06 Large area optical integrated circuits WO2002048766A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR10-2003-7007785A KR20040052444A (en) 2000-12-11 2001-12-06 Optical integrated circuits (ics)
EP01990046A EP1356324A2 (en) 2000-12-11 2001-12-06 Optical integrated circuits (ics)
JP2002550016A JP2004535592A (en) 2000-12-11 2001-12-06 Optical integrated circuit (IC)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/734,950 2000-12-11
US09/734,950 US7087179B2 (en) 2000-12-11 2000-12-11 Optical integrated circuits (ICs)

Publications (2)

Publication Number Publication Date
WO2002048766A2 WO2002048766A2 (en) 2002-06-20
WO2002048766A3 true WO2002048766A3 (en) 2003-04-10

Family

ID=24953716

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2001/047493 WO2002048766A2 (en) 2000-12-11 2001-12-06 Large area optical integrated circuits

Country Status (7)

Country Link
US (1) US7087179B2 (en)
EP (1) EP1356324A2 (en)
JP (1) JP2004535592A (en)
KR (1) KR20040052444A (en)
CN (1) CN1502053A (en)
TW (1) TW517418B (en)
WO (1) WO2002048766A2 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2402494A (en) * 2003-06-05 2004-12-08 Alcatel Optronics Uk Ltd Integrated optic device with cladding having mesa formations
CN100368837C (en) * 2005-04-21 2008-02-13 中国科学院半导体研究所 Production of phosphor silicic acid glass-layer light waveguide and its integration by standard process
KR101803982B1 (en) * 2009-10-13 2017-12-01 스코르피오스 테크놀러지스, 인코포레이티드 Method and system for hybrid integration of a tunable laser
US9247638B2 (en) * 2010-11-10 2016-01-26 Xyratex Technology Limited Optical printed circuit board and a method of manufacturing an optical printed circuit board
US9184057B2 (en) * 2011-03-18 2015-11-10 Basf Se Method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices having patterned material layers with line-space dimensions of 50 nm and less
KR20140027917A (en) * 2011-03-25 2014-03-07 이서영 Lightwave circuit and method for manufacturing same
KR102125277B1 (en) * 2012-06-26 2020-06-22 삼성전자주식회사 Optical integrated circuits, semiconductor devices including the same, and methods of manufacturing the same
EP2685297B1 (en) * 2012-07-13 2017-12-06 Huawei Technologies Co., Ltd. A process for manufacturing a photonic circuit with active and passive structures
CN104977655A (en) * 2015-06-18 2015-10-14 湖南晶图科技有限公司 Wafer processing method for improving performance of PLC optical waveguides

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US4856859A (en) * 1987-03-13 1989-08-15 Hitachi, Ltd. Optical waveguide and method for fabricating the same
US4972799A (en) * 1989-01-26 1990-11-27 Canon Kabushiki Kaisha Microwave plasma chemical vapor deposition apparatus for mass-producing functional deposited films
US5165004A (en) * 1990-12-17 1992-11-17 Pioneer Electronic Corporation Wavelength conversion element
EP0575157A1 (en) * 1992-06-16 1993-12-22 The Furukawa Electric Co., Ltd. Method of manufacturing silica waveguide optical components
JPH06263452A (en) * 1993-03-05 1994-09-20 Sumitomo Electric Ind Ltd Production of optical waveguide
EP0803589A1 (en) * 1995-11-09 1997-10-29 Nec Corporation Method of manufacturing optical waveguide having no void
DE19723284A1 (en) * 1997-06-04 1998-12-10 Bosch Gmbh Robert Passive or amplifying optical waveguides
US5858051A (en) * 1995-05-08 1999-01-12 Toshiba Machine Co., Ltd. Method of manufacturing optical waveguide
JPH1152159A (en) * 1997-08-04 1999-02-26 Matsushita Electric Ind Co Ltd Production of optical waveguide
US5904491A (en) * 1996-04-24 1999-05-18 Northern Telecom Limited Planar waveguides
EP1014121A2 (en) * 1998-12-21 2000-06-28 Lsi Logic Corporation On-chip single layer horizontal deflecting waveguide and damascene method of fabricating the same
US6151430A (en) * 1998-07-08 2000-11-21 Gore Enterprise Holdings, Inc. Photonic device having an integal guide and method of manufacturing

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JPS6065582A (en) * 1983-09-20 1985-04-15 Nippon Telegr & Teleph Corp <Ntt> Grain boundary josephson junction photodetector
GB8414878D0 (en) * 1984-06-11 1984-07-18 Gen Electric Co Plc Integrated optical waveguides
US5155336A (en) * 1990-01-19 1992-10-13 Applied Materials, Inc. Rapid thermal heating apparatus and method
US5125946A (en) * 1990-12-10 1992-06-30 Corning Incorporated Manufacturing method for planar optical waveguides
US5396351A (en) * 1991-12-20 1995-03-07 Apple Computer, Inc. Polarizing fiber-optic faceplate of stacked adhered glass elements in a liquid crystal display
US5253319A (en) * 1992-02-24 1993-10-12 Corning Incorporated Planar optical waveguides with planar optical elements
JP2637891B2 (en) * 1993-03-26 1997-08-06 日本電気株式会社 Manufacturing method of optical waveguide
US5441768A (en) * 1994-02-08 1995-08-15 Applied Materials, Inc. Multi-step chemical vapor deposition method for thin film transistors
NZ298459A (en) * 1995-01-19 1997-10-24 British Telecomm Optical switch with semiconductor gain media in each arm of mach-zehnder interferometer
US5814565A (en) * 1995-02-23 1998-09-29 University Of Utah Research Foundation Integrated optic waveguide immunosensor
US5949934A (en) * 1996-04-05 1999-09-07 Fujikura, Ltd. Optical waveguide grating and production method therefor
GB2312524A (en) * 1996-04-24 1997-10-29 Northern Telecom Ltd Planar optical waveguide cladding by PECVD method
US5881199A (en) * 1996-12-02 1999-03-09 Lucent Technologies Inc. Optical branching device integrated with tunable attenuators for system gain/loss equalization
US5930439A (en) * 1997-10-01 1999-07-27 Northern Telecom Limited Planar optical waveguide
US6024044A (en) * 1997-10-09 2000-02-15 Applied Komatsu Technology, Inc. Dual frequency excitation of plasma for film deposition
US6222971B1 (en) * 1998-07-17 2001-04-24 David Slobodin Small inlet optical panel and a method of making a small inlet optical panel
EP0987580A1 (en) * 1998-09-16 2000-03-22 Akzo Nobel N.V. Optical intensity modulator and switch comprising the same
US6306563B1 (en) * 1999-06-21 2001-10-23 Corning Inc. Optical devices made from radiation curable fluorinated compositions
GB2355078A (en) 1999-10-07 2001-04-11 Kymata Ltd Waveguide with composite cladding layer
JP2001124945A (en) * 1999-10-28 2001-05-11 Oki Electric Ind Co Ltd Y-branching waveguide
US6500603B1 (en) * 1999-11-11 2002-12-31 Mitsui Chemicals, Inc. Method for manufacturing polymer optical waveguide
WO2001040836A1 (en) * 1999-12-02 2001-06-07 Gemfire Corporation Photodefinition of optical devices

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4425146A (en) * 1979-12-17 1984-01-10 Nippon Telegraph & Telephone Public Corporation Method of making glass waveguide for optical circuit
US4856859A (en) * 1987-03-13 1989-08-15 Hitachi, Ltd. Optical waveguide and method for fabricating the same
US4972799A (en) * 1989-01-26 1990-11-27 Canon Kabushiki Kaisha Microwave plasma chemical vapor deposition apparatus for mass-producing functional deposited films
US5165004A (en) * 1990-12-17 1992-11-17 Pioneer Electronic Corporation Wavelength conversion element
EP0575157A1 (en) * 1992-06-16 1993-12-22 The Furukawa Electric Co., Ltd. Method of manufacturing silica waveguide optical components
JPH06263452A (en) * 1993-03-05 1994-09-20 Sumitomo Electric Ind Ltd Production of optical waveguide
US5858051A (en) * 1995-05-08 1999-01-12 Toshiba Machine Co., Ltd. Method of manufacturing optical waveguide
EP0803589A1 (en) * 1995-11-09 1997-10-29 Nec Corporation Method of manufacturing optical waveguide having no void
US5904491A (en) * 1996-04-24 1999-05-18 Northern Telecom Limited Planar waveguides
DE19723284A1 (en) * 1997-06-04 1998-12-10 Bosch Gmbh Robert Passive or amplifying optical waveguides
JPH1152159A (en) * 1997-08-04 1999-02-26 Matsushita Electric Ind Co Ltd Production of optical waveguide
US6151430A (en) * 1998-07-08 2000-11-21 Gore Enterprise Holdings, Inc. Photonic device having an integal guide and method of manufacturing
EP1014121A2 (en) * 1998-12-21 2000-06-28 Lsi Logic Corporation On-chip single layer horizontal deflecting waveguide and damascene method of fabricating the same

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* Cited by examiner, † Cited by third party
Title
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PATENT ABSTRACTS OF JAPAN vol. 1999, no. 05 31 May 1999 (1999-05-31) *

Also Published As

Publication number Publication date
JP2004535592A (en) 2004-11-25
TW517418B (en) 2003-01-11
US7087179B2 (en) 2006-08-08
KR20040052444A (en) 2004-06-23
CN1502053A (en) 2004-06-02
EP1356324A2 (en) 2003-10-29
WO2002048766A2 (en) 2002-06-20
US20050115921A1 (en) 2005-06-02

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