WO2002061759A3 - Flash memory device and method of erasing - Google Patents

Flash memory device and method of erasing Download PDF

Info

Publication number
WO2002061759A3
WO2002061759A3 PCT/US2002/002567 US0202567W WO02061759A3 WO 2002061759 A3 WO2002061759 A3 WO 2002061759A3 US 0202567 W US0202567 W US 0202567W WO 02061759 A3 WO02061759 A3 WO 02061759A3
Authority
WO
WIPO (PCT)
Prior art keywords
block
erase
cells
convergence
memory device
Prior art date
Application number
PCT/US2002/002567
Other languages
French (fr)
Other versions
WO2002061759A2 (en
Inventor
Andrei Mihnea
Chun Chen
Paul Rudeck
Andrew R Bicksler
Original Assignee
Micron Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micron Technology Inc filed Critical Micron Technology Inc
Publication of WO2002061759A2 publication Critical patent/WO2002061759A2/en
Publication of WO2002061759A3 publication Critical patent/WO2002061759A3/en

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/34Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
    • G11C16/3404Convergence or correction of memory cell threshold voltages; Repair or recovery of overerased or overprogrammed cells
    • G11C16/3409Circuits or methods to recover overerased nonvolatile memory cells detected during erase verification, usually by means of a "soft" programming step
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/10Programming or data input circuits
    • G11C16/14Circuits for erasing electrically, e.g. erase voltage switching circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/34Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
    • G11C16/3404Convergence or correction of memory cell threshold voltages; Repair or recovery of overerased or overprogrammed cells
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/10Programming or data input circuits
    • G11C16/14Circuits for erasing electrically, e.g. erase voltage switching circuits
    • G11C16/16Circuits for erasing electrically, e.g. erase voltage switching circuits for erasing blocks, e.g. arrays, words, groups

Landscapes

  • Read Only Memory (AREA)
  • Semiconductor Memories (AREA)
  • Non-Volatile Memory (AREA)

Abstract

A non-volatile memory device includes an improved method for erasing a block of stack-gate single transistor flash memory cells. The memory performs an efficient and controllable mode of programming, referred to as block convergence. During an erase operation, one or more electrical erase pulses of fixed number, duration and voltage waveform are appleid to memory cells in an adressable block of the memory device array. The erase pulse(s) fully erase all bits in the block. A block of convergence operation is applied simultaneously to all cells in the block. The block convergence operation brings a threshold voltage of cells, which may have become over-erased during the erase operation, to a controlled level. A reverse-bias pulse, capable of inducing band-to-band tunnelling across one juction in the structure of the flash memory cells, is applied to a first junction. The other junction receives either a reverse bias or floating potential. The memory can implement several biasing schemes while performing the block convergence operation.
PCT/US2002/002567 2001-01-30 2002-01-30 Flash memory device and method of erasing WO2002061759A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/772,667 US6563741B2 (en) 2001-01-30 2001-01-30 Flash memory device and method of erasing
US09/772,667 2001-01-30

Publications (2)

Publication Number Publication Date
WO2002061759A2 WO2002061759A2 (en) 2002-08-08
WO2002061759A3 true WO2002061759A3 (en) 2004-04-01

Family

ID=25095809

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2002/002567 WO2002061759A2 (en) 2001-01-30 2002-01-30 Flash memory device and method of erasing

Country Status (2)

Country Link
US (2) US6563741B2 (en)
WO (1) WO2002061759A2 (en)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990088517A (en) * 1998-05-22 1999-12-27 마 유에 예일 A nonvolatile memory cell structure and method for operating nonvolatile memory cells
EP1757263B1 (en) * 1999-06-24 2009-09-23 Shin-Etsu Chemical Co., Ltd. Dermatic cosmetic material
TW519734B (en) * 2001-12-04 2003-02-01 Macronix Int Co Ltd Programming and erasing methods of non-volatile memory having nitride tunneling layer
US6795348B2 (en) * 2002-05-29 2004-09-21 Micron Technology, Inc. Method and apparatus for erasing flash memory
US7043274B2 (en) * 2002-06-28 2006-05-09 Interdigital Technology Corporation System for efficiently providing coverage of a sectorized cell for common and dedicated channels utilizing beam forming and sweeping
US6649453B1 (en) * 2002-08-29 2003-11-18 Micron Technology, Inc. Contactless uniform-tunneling separate p-well (CUSP) non-volatile memory array architecture, fabrication and operation
US6798694B2 (en) * 2002-08-29 2004-09-28 Micron Technology, Inc. Method for reducing drain disturb in programming
US7178004B2 (en) 2003-01-31 2007-02-13 Yan Polansky Memory array programming circuit and a method for using the circuit
US6903361B2 (en) * 2003-09-17 2005-06-07 Micron Technology, Inc. Non-volatile memory structure
US6975538B2 (en) * 2003-10-08 2005-12-13 Micron Technology, Inc. Memory block erasing in a flash memory device
TWI247311B (en) * 2004-03-25 2006-01-11 Elite Semiconductor Esmt Circuit and method for preventing nonvolatile memory from over erasure
US7652930B2 (en) * 2004-04-01 2010-01-26 Saifun Semiconductors Ltd. Method, circuit and system for erasing one or more non-volatile memory cells
US20060044899A1 (en) * 2004-08-27 2006-03-02 Ellis Robert W Method and apparatus for destroying flash memory
US7251164B2 (en) * 2004-11-10 2007-07-31 Innovative Silicon S.A. Circuitry for and method of improving statistical distribution of integrated circuits
EP1684307A1 (en) * 2005-01-19 2006-07-26 Saifun Semiconductors Ltd. Method, circuit and systems for erasing one or more non-volatile memory cells
US7345918B2 (en) 2005-08-31 2008-03-18 Micron Technology, Inc. Selective threshold voltage verification and compaction
US7808818B2 (en) 2006-01-12 2010-10-05 Saifun Semiconductors Ltd. Secondary injection for NROM
US7768835B2 (en) * 2006-08-09 2010-08-03 Micron Technology, Inc. Non-volatile memory erase verify
US7701780B2 (en) 2007-05-31 2010-04-20 Micron Technology, Inc. Non-volatile memory cell healing
US7986553B2 (en) * 2007-06-15 2011-07-26 Micron Technology, Inc. Programming of a solid state memory utilizing analog communication of bit patterns
US7619931B2 (en) * 2007-06-26 2009-11-17 Micron Technology, Inc. Program-verify method with different read and verify pass-through voltages
US20090003065A1 (en) * 2007-06-26 2009-01-01 Micron Technology, Inc. Flash cell with improved program disturb
US7532027B2 (en) * 2007-09-28 2009-05-12 Adtron, Inc. Deliberate destruction of integrated circuits
US7916543B2 (en) * 2007-10-22 2011-03-29 Micron Technology, Inc. Memory cell operation
US7924623B2 (en) 2008-05-27 2011-04-12 Micron Technology, Inc. Method for memory cell erasure with a programming monitor of reference cells
US8064267B2 (en) 2008-11-14 2011-11-22 Micron Technology, Inc. Erase voltage reduction in a non-volatile memory device
TWI419166B (en) * 2010-01-08 2013-12-11 Yield Microelectronics Corp Low - pressure rapid erasure of nonvolatile memory
US8797802B2 (en) * 2012-03-15 2014-08-05 Macronix International Co., Ltd. Method and apparatus for shortened erase operation
US9082490B2 (en) * 2013-06-18 2015-07-14 Flashsilicon Incorporation Ultra-low power programming method for N-channel semiconductor non-volatile memory
TWI514393B (en) * 2013-08-07 2015-12-21 Winbond Electronics Corp Non-volatile memory system and method for biasing non-volatile memory
US9728278B2 (en) 2014-10-24 2017-08-08 Micron Technology, Inc. Threshold voltage margin analysis
CN113906508A (en) 2019-05-31 2022-01-07 美光科技公司 Method for checking an erase phase of a memory device

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5615147A (en) * 1994-03-03 1997-03-25 Rohm Corporation Low voltage one transistor flash EEPROM cell using Fowler-Nordheim programming and erase
US5742541A (en) * 1995-03-24 1998-04-21 Sharp Kabushiki Kaisha Writing method for nonvolatile semiconductor memory with soft-write repair for over-erased cells
US5912845A (en) * 1997-09-10 1999-06-15 Macronix International Co., Ltd. Method and circuit for substrate current induced hot e- injection (SCIHE) approach for VT convergence at low VCC voltage
US6172909B1 (en) * 1999-08-09 2001-01-09 Advanced Micro Devices, Inc. Ramped gate technique for soft programming to tighten the Vt distribution

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2707970B2 (en) * 1994-04-11 1998-02-04 日本電気株式会社 Erase method for nonvolatile semiconductor memory device
US5490109A (en) * 1994-06-28 1996-02-06 Intel Corporation Method and apparatus for preventing over-erasure of flash EEPROM memory devices
US5576991A (en) * 1994-07-01 1996-11-19 Advanced Micro Devices, Inc. Multistepped threshold convergence for a flash memory array
US5933847A (en) 1995-09-28 1999-08-03 Canon Kabushiki Kaisha Selecting erase method based on type of power supply for flash EEPROM
US5856944A (en) 1995-11-13 1999-01-05 Alliance Semiconductor Corporation Self-converging over-erase repair method for flash EPROM
JP2982676B2 (en) * 1995-12-08 1999-11-29 日本電気株式会社 Over-erase relief method for nonvolatile semiconductor memory device
US5675537A (en) 1996-08-22 1997-10-07 Advanced Micro Devices, Inc. Erase method for page mode multiple bits-per-cell flash EEPROM
US6097632A (en) 1997-04-18 2000-08-01 Micron Technology, Inc. Source regulation circuit for an erase operation of flash memory
US5862078A (en) 1997-08-11 1999-01-19 Taiwan Semiconductor Manufacturing Company, Ltd. Mixed mode erase method to improve flash eeprom write/erase threshold closure
US5838618A (en) 1997-09-11 1998-11-17 Taiwan Semiconductor Manufacturing Company Ltd. Bi-modal erase method for eliminating cycling-induced flash EEPROM cell write/erase threshold closure
US5903499A (en) 1997-09-12 1999-05-11 Taiwan Semiconductor Manufacturing Company, Ltd. Method to erase a flash EEPROM using negative gate source erase followed by a high negative gate erase
US6055183A (en) 1997-10-24 2000-04-25 Taiwan Semiconductor Manufacturing Company, Ltd. Erase method of flash EEPROM by using snapback characteristic
US5963477A (en) * 1997-12-09 1999-10-05 Macronix International Co., Ltd. Flash EPROM erase algorithm with wordline level retry
WO1999031669A1 (en) 1997-12-18 1999-06-24 Advanced Micro Devices, Inc. Biasing method and structure for reducing band-to-band and/or avalanche currents during the erase of flash memory devices
US6023426A (en) 1998-03-09 2000-02-08 Eon Silicon Devices, Inc. Method of achieving narrow VT distribution after erase in flash EEPROM
US6043530A (en) 1998-04-15 2000-03-28 Chang; Ming-Bing Flash EEPROM device employing polysilicon sidewall spacer as an erase gate
US6005809A (en) 1998-06-19 1999-12-21 Taiwan Semiconductor Manufacturing Company, Ltd. Program and erase method for a split gate flash EEPROM
US6052310A (en) 1998-08-12 2000-04-18 Advanced Micro Devices Method for tightening erase threshold voltage distribution in flash electrically erasable programmable read-only memory (EEPROM)
US6049484A (en) 1998-09-10 2000-04-11 Taiwan Semiconductor Manufacturing Company Erase method to improve flash EEPROM endurance by combining high voltage source erase and negative gate erase
US6198662B1 (en) 1999-06-24 2001-03-06 Amic Technology, Inc. Circuit and method for pre-erasing/erasing flash memory array
KR100308192B1 (en) 1999-07-28 2001-11-01 윤종용 Flash memory devcie capable of preventing an over-erase of flash memory cells and an erasure method thereof
US6261906B1 (en) 1999-08-03 2001-07-17 Worldwide Semiconductor Manufacturing Corp. Method for forming a flash memory cell with improved drain erase performance
US6172915B1 (en) 1999-09-30 2001-01-09 Eon Silicon Devices, Inc. Unified erase method in flash EEPROM

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5615147A (en) * 1994-03-03 1997-03-25 Rohm Corporation Low voltage one transistor flash EEPROM cell using Fowler-Nordheim programming and erase
US5742541A (en) * 1995-03-24 1998-04-21 Sharp Kabushiki Kaisha Writing method for nonvolatile semiconductor memory with soft-write repair for over-erased cells
US5912845A (en) * 1997-09-10 1999-06-15 Macronix International Co., Ltd. Method and circuit for substrate current induced hot e- injection (SCIHE) approach for VT convergence at low VCC voltage
US6172909B1 (en) * 1999-08-09 2001-01-09 Advanced Micro Devices, Inc. Ramped gate technique for soft programming to tighten the Vt distribution

Also Published As

Publication number Publication date
US6563741B2 (en) 2003-05-13
US6798699B2 (en) 2004-09-28
US20030128591A1 (en) 2003-07-10
WO2002061759A2 (en) 2002-08-08
US20020101765A1 (en) 2002-08-01

Similar Documents

Publication Publication Date Title
WO2002061759A3 (en) Flash memory device and method of erasing
US6169693B1 (en) Self-convergence of post-erase threshold voltages in a flash memory cell using transient response
KR100496797B1 (en) Program method of semiconductor memory device
US7821835B2 (en) Concurrent programming of non-volatile memory
US7272044B2 (en) Flash memory
JP5300298B2 (en) Method of operating memory device including discharge of source / drain region and related electronic device
JP3284358B2 (en) Non-volatile memory device
KR100290282B1 (en) Nonvolatile Semiconductor Memory Device Reduces Program Time
JP3856694B2 (en) Flash memory device and erase method thereof
US8467245B2 (en) Non-volatile memory device with program current clamp and related method
US5576991A (en) Multistepped threshold convergence for a flash memory array
US20070115729A1 (en) Method and apparatus for reducing stress in word line driver transistors during erasure
WO2001075899A3 (en) Page mode erase in a flash memory array
JPH09161490A (en) Nonvolatile semiconductor memory
US5862078A (en) Mixed mode erase method to improve flash eeprom write/erase threshold closure
US6256702B1 (en) Nonvolatile memory device with extended storage and high reliability through writing the same data into two memory cells
JP2007035249A (en) Nonvolatile memory device for controlling slope of word line voltage and its program method
KR100262918B1 (en) Method and device for erasing non-volatile semiconductor memory with smaller erase variation
US6049484A (en) Erase method to improve flash EEPROM endurance by combining high voltage source erase and negative gate erase
US6381177B1 (en) Method for controlled soft programming of non-volatile memory cells, in particular of the flash EEPROM and EPROM type
EP2498258B1 (en) Non-volatile memory device with program current clamp and related method
US5949717A (en) Method to improve flash EEPROM cell write/erase threshold voltage closure
JPH11273372A (en) Flash memory cell and array having improved preprogram and erasing characteristics
KR100317500B1 (en) Gate voltage control circuit for flash memory cell
JP2000252447A (en) Non-volatile semiconductor storage device and data erasing method therefor

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SD SE SG SI SK SL TJ TM TN TR TT TZ UA UG UZ VN YU ZA ZM ZW

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
REG Reference to national code

Ref country code: DE

Ref legal event code: 8642

122 Ep: pct application non-entry in european phase
NENP Non-entry into the national phase

Ref country code: JP

WWW Wipo information: withdrawn in national office

Country of ref document: JP