WO2002099500A3 - Correction of birefringence in cubic crystalline projection lenses and optical systems - Google Patents

Correction of birefringence in cubic crystalline projection lenses and optical systems Download PDF

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Publication number
WO2002099500A3
WO2002099500A3 PCT/US2002/017071 US0217071W WO02099500A3 WO 2002099500 A3 WO2002099500 A3 WO 2002099500A3 US 0217071 W US0217071 W US 0217071W WO 02099500 A3 WO02099500 A3 WO 02099500A3
Authority
WO
WIPO (PCT)
Prior art keywords
retardance
elements
cubic crystalline
optical
birefringence
Prior art date
Application number
PCT/US2002/017071
Other languages
French (fr)
Other versions
WO2002099500A2 (en
Inventor
Jeffrey M Hoffman
James P Mcguire
Original Assignee
Optical Res Associates
Jeffrey M Hoffman
James P Mcguire
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Optical Res Associates, Jeffrey M Hoffman, James P Mcguire filed Critical Optical Res Associates
Priority to KR1020037015766A priority Critical patent/KR100850324B1/en
Priority to DE60229935T priority patent/DE60229935D1/en
Priority to EP02752014A priority patent/EP1393114B1/en
Priority to AU2002346708A priority patent/AU2002346708A1/en
Priority to JP2003502557A priority patent/JP4347686B2/en
Publication of WO2002099500A2 publication Critical patent/WO2002099500A2/en
Publication of WO2002099500A3 publication Critical patent/WO2002099500A3/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking

Abstract

An optical system includes multiple cubic crystalline optical elements aligned along a common optical axis and having their crystal lattices oriented with respect to each other to minimize the effects of intrinsic birefringence and produce a system with reduced retardance. The optical system may be a refractive or catadioptric system having a high numerical aperture and using light with a wavelength at or below (248) nanometers. The net retardance of the system is less than the sum of the retardance contributions of the respective optical elements as the elements are oriented such that the intrinsic birefringences of the individual elements cancel each other out. In one embodiment, two [110] cubic crystalline optical elements are clocked with respect to one another and used in conjunction with a [100] cubic crystalline optical element to reduce retardance. Various birefringent elements, wave plates, and combinations thereof provide additional correction for residual retardance and wavefront aberrations. The optical system may be used in a photolithography tool to pattern substrates such as semiconductor substrates and thereby produce semiconductor devices.
PCT/US2002/017071 2001-06-01 2002-05-31 Correction of birefringence in cubic crystalline projection lenses and optical systems WO2002099500A2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR1020037015766A KR100850324B1 (en) 2001-06-01 2002-05-31 Correction of birefringence in cubic crystalline optical systems
DE60229935T DE60229935D1 (en) 2001-06-01 2002-05-31 COMPENSATION OF DOUBLE BREAKING IN CUBIC CRYSTALLINE PROJECTION LINES AND OPTICAL SYSTEMS
EP02752014A EP1393114B1 (en) 2001-06-01 2002-05-31 Correction of birefringence in cubic crystalline projection lenses and optical systems
AU2002346708A AU2002346708A1 (en) 2001-06-01 2002-05-31 Correction of birefringence in cubic crystalline projection lenses and optical systems
JP2003502557A JP4347686B2 (en) 2001-06-01 2002-05-31 Correction of birefringence in cubic optical systems.

Applications Claiming Priority (14)

Application Number Priority Date Filing Date Title
US29521201P 2001-06-01 2001-06-01
US60/295,212 2001-06-01
US29669401P 2001-06-06 2001-06-06
US60/296,694 2001-06-06
US29960301P 2001-06-20 2001-06-20
US29949701P 2001-06-20 2001-06-20
US60/299,603 2001-06-20
US60/299,497 2001-06-20
US33509301P 2001-10-30 2001-10-30
US60/335,093 2001-10-30
US33218301P 2001-11-21 2001-11-21
US60/332,183 2001-11-21
US10/071,375 2002-02-07
US10/071,375 US6683710B2 (en) 2001-06-01 2002-02-07 Correction of birefringence in cubic crystalline optical systems

Publications (2)

Publication Number Publication Date
WO2002099500A2 WO2002099500A2 (en) 2002-12-12
WO2002099500A3 true WO2002099500A3 (en) 2003-10-09

Family

ID=27568307

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2002/017071 WO2002099500A2 (en) 2001-06-01 2002-05-31 Correction of birefringence in cubic crystalline projection lenses and optical systems

Country Status (8)

Country Link
US (6) US6683710B2 (en)
EP (1) EP1393114B1 (en)
JP (2) JP4347686B2 (en)
KR (1) KR100850324B1 (en)
AT (1) ATE414927T1 (en)
AU (1) AU2002346708A1 (en)
DE (1) DE60229935D1 (en)
WO (1) WO2002099500A2 (en)

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