WO2003006183A3 - Method and apparatus for cleaning semiconductor wafers and other flat media - Google Patents

Method and apparatus for cleaning semiconductor wafers and other flat media Download PDF

Info

Publication number
WO2003006183A3
WO2003006183A3 PCT/US2002/021997 US0221997W WO03006183A3 WO 2003006183 A3 WO2003006183 A3 WO 2003006183A3 US 0221997 W US0221997 W US 0221997W WO 03006183 A3 WO03006183 A3 WO 03006183A3
Authority
WO
WIPO (PCT)
Prior art keywords
rotor
door
surfactant
box
box door
Prior art date
Application number
PCT/US2002/021997
Other languages
French (fr)
Other versions
WO2003006183A2 (en
Inventor
Daniel P Bexten
James Bryer
Jerry R Norby
Original Assignee
Semitool Inc
Daniel P Bexten
James Bryer
Jerry R Norby
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/108,278 external-priority patent/US6691718B2/en
Application filed by Semitool Inc, Daniel P Bexten, James Bryer, Jerry R Norby filed Critical Semitool Inc
Priority to EP02749953A priority Critical patent/EP1404463A4/en
Priority to JP2003511982A priority patent/JP2004535071A/en
Publication of WO2003006183A2 publication Critical patent/WO2003006183A2/en
Publication of WO2003006183A3 publication Critical patent/WO2003006183A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays

Abstract

A machine (10) for cleaning containers (52) such as flat media carriers (52) or boxes (52) has inside and outside arrays of nozzels (R1-R8) arranged to spray a cleaning solution onto containers (52) supported on a spinning rotor (70) in a chamber (24). The cleaning solution, a mixture of water and a detergent or surfactant is prepared by drawing out surfactant directly from a surfactant storage vessel (35) by means of a metering pump (48, 49). The flow rate of the water is measured by a flow meter (116, 118) and in combination with the metering pump (48, 49), a proper surfactant is injected into the water line (140) to produce a mixture with a desired surfactant concentration for removing contaminants. Box holder assemblies (250a-250d) on the rotor (70) include upper and lower hooks (322, 324) for securing boxes (52) to the rotor (70). A box door holder assembly (206a, 206b) is also provided on the rotor (70). The box door holder assembly (206a, 206b) preferably has a plurality of box door holding positions. Each box door holding position advantageously has a door guide (344) and door hooks (322, 324) for holding a door. The box door holder assembly allows both the boxes (52) and their doors to be cleaned with the centrifugal cleaner (10), avoiding the need for separate cleaning of the doors. In one configuration, the rotor (70) is provided an even number of box holder assemblies (206a, 206b) symmetrically spaced about the rotor (70) and an even number of door holder assemblies (206a, 206b) symmetrically spaced about the rotor (70).
PCT/US2002/021997 2001-07-12 2002-07-09 Method and apparatus for cleaning semiconductor wafers and other flat media WO2003006183A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP02749953A EP1404463A4 (en) 2001-07-12 2002-07-09 Method and apparatus for cleaning semiconductor wafers and other flat media
JP2003511982A JP2004535071A (en) 2001-07-12 2002-07-09 Method for removing contaminants from flat media carrier, flat media carrier cleaning device, media carrier cleaning device, and box cleaning system

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US90503001A 2001-07-12 2001-07-12
US09/905,030 2001-07-12
US10/108,278 2002-03-26
US10/108,278 US6691718B2 (en) 1999-07-28 2002-03-26 Wafer container cleaning system

Publications (2)

Publication Number Publication Date
WO2003006183A2 WO2003006183A2 (en) 2003-01-23
WO2003006183A3 true WO2003006183A3 (en) 2003-02-27

Family

ID=26805734

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2002/021997 WO2003006183A2 (en) 2001-07-12 2002-07-09 Method and apparatus for cleaning semiconductor wafers and other flat media

Country Status (4)

Country Link
EP (1) EP1404463A4 (en)
JP (1) JP2004535071A (en)
TW (1) TWI223345B (en)
WO (1) WO2003006183A2 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101886414B1 (en) * 2016-09-27 2018-08-09 주식회사 유닉 Apparatus and system for cleaning wafer container
CN108565235B (en) * 2018-05-31 2024-03-01 亚智系统科技(苏州)有限公司 Surface treatment and packaging system for fan-out type wafer-level chip and operation method
SG11202100082XA (en) 2018-07-06 2021-02-25 Oem Group Llc Systems and methods for a spray measurement apparatus
CN108940996A (en) * 2018-07-27 2018-12-07 深圳市凯尔迪光电科技有限公司 High-accuracy integrated circuit eccentric cleaning equipment
CN111081594B (en) * 2019-09-25 2022-09-30 北京时代民芯科技有限公司 Cleaning tool and method for JLCC image sensor circuit before packaging
CN110808219B (en) * 2019-11-01 2021-05-14 江苏亚电科技有限公司 Wafer storage box cleaning device and cleaning method
CN112191588B (en) * 2020-09-18 2021-12-21 程瑶 Cleaning machine and cleaning method matched with solar power generation panel in production process
KR102587371B1 (en) * 2020-12-21 2023-10-12 주식회사 뉴파워 프라즈마 Cleaning chamber including lifting cover door, glass chemical-strengthening apparatus including the same and method for strengthening ultra thin glass
CN115338173B (en) * 2022-08-31 2023-09-26 浙江中科智谷光电科技有限公司 Cleaning equipment for liquid crystal module processing and control method

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4437479A (en) * 1981-12-30 1984-03-20 Atcor Decontamination apparatus for semiconductor wafer handling equipment
US4736759A (en) * 1986-02-21 1988-04-12 Robert A. Coberly Apparatus for cleaning rinsing and drying substrates
US5238503A (en) * 1991-04-09 1993-08-24 International Business Machines Corporation Device for decontaminating a semiconductor wafer container
US5301700A (en) * 1992-03-05 1994-04-12 Tokyo Electron Limited Washing system
US5363867A (en) * 1992-01-21 1994-11-15 Shinko Electric Co., Ltd. Article storage house in a clean room
US5698038A (en) * 1994-07-01 1997-12-16 Texas Instruments Incorporated Method for wafer carrier cleaning
US6096100A (en) * 1997-12-12 2000-08-01 Texas Instruments Incorporated Method for processing wafers and cleaning wafer-handling implements
US6248177B1 (en) * 1998-01-09 2001-06-19 Fluoroware, Inc. Method of cleaning a wafer carrier
US6267133B1 (en) * 1997-09-13 2001-07-31 Zf Friedrichshafen Ag Method for mounting a steering valve with a centring unit

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5224503A (en) * 1992-06-15 1993-07-06 Semitool, Inc. Centrifugal wafer carrier cleaning apparatus
US6412502B1 (en) * 1999-07-28 2002-07-02 Semitool, Inc. Wafer container cleaning system

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4437479A (en) * 1981-12-30 1984-03-20 Atcor Decontamination apparatus for semiconductor wafer handling equipment
US4736759A (en) * 1986-02-21 1988-04-12 Robert A. Coberly Apparatus for cleaning rinsing and drying substrates
US5238503A (en) * 1991-04-09 1993-08-24 International Business Machines Corporation Device for decontaminating a semiconductor wafer container
US5363867A (en) * 1992-01-21 1994-11-15 Shinko Electric Co., Ltd. Article storage house in a clean room
US5301700A (en) * 1992-03-05 1994-04-12 Tokyo Electron Limited Washing system
US5698038A (en) * 1994-07-01 1997-12-16 Texas Instruments Incorporated Method for wafer carrier cleaning
US6267133B1 (en) * 1997-09-13 2001-07-31 Zf Friedrichshafen Ag Method for mounting a steering valve with a centring unit
US6096100A (en) * 1997-12-12 2000-08-01 Texas Instruments Incorporated Method for processing wafers and cleaning wafer-handling implements
US6248177B1 (en) * 1998-01-09 2001-06-19 Fluoroware, Inc. Method of cleaning a wafer carrier

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP1404463A4 *

Also Published As

Publication number Publication date
JP2004535071A (en) 2004-11-18
WO2003006183A2 (en) 2003-01-23
TWI223345B (en) 2004-11-01
EP1404463A2 (en) 2004-04-07
EP1404463A4 (en) 2004-10-06

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