WO2003040830A2 - Optical spot grid array printer - Google Patents
Optical spot grid array printer Download PDFInfo
- Publication number
- WO2003040830A2 WO2003040830A2 PCT/US2002/035658 US0235658W WO03040830A2 WO 2003040830 A2 WO2003040830 A2 WO 2003040830A2 US 0235658 W US0235658 W US 0235658W WO 03040830 A2 WO03040830 A2 WO 03040830A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- substrate
- array
- beams
- printer
- optical beams
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2057—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using an addressed light valve, e.g. a liquid crystal device
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/70391—Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Facsimile Scanning Arrangements (AREA)
Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003542405A JP2006502558A (en) | 2001-11-07 | 2002-11-07 | Optical spot grating array printer |
EP02797070A EP1446703A2 (en) | 2001-11-07 | 2002-11-07 | Optical spot grid array printer |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US33102901P | 2001-11-07 | 2001-11-07 | |
US60/331,029 | 2001-11-07 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2003040830A2 true WO2003040830A2 (en) | 2003-05-15 |
WO2003040830A3 WO2003040830A3 (en) | 2003-10-16 |
Family
ID=23292312
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2002/035658 WO2003040830A2 (en) | 2001-11-07 | 2002-11-07 | Optical spot grid array printer |
Country Status (6)
Country | Link |
---|---|
US (1) | US6897941B2 (en) |
EP (1) | EP1446703A2 (en) |
JP (1) | JP2006502558A (en) |
KR (1) | KR20050044371A (en) |
CN (1) | CN1791839A (en) |
WO (1) | WO2003040830A2 (en) |
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WO2005022265A2 (en) * | 2003-08-27 | 2005-03-10 | Koninklijke Philips Electronics N.V. | Method of forming optical images, apparatus for carrying out said method and process for manufacturing a device using said method |
JP2005148634A (en) * | 2003-11-19 | 2005-06-09 | Tadahiro Omi | Method for drawing mask and mask drawing apparatus |
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US8994920B1 (en) | 2010-05-07 | 2015-03-31 | Kenneth C. Johnson | Optical systems and methods for absorbance modulation |
US9188874B1 (en) | 2011-05-09 | 2015-11-17 | Kenneth C. Johnson | Spot-array imaging system for maskless lithography and parallel confocal microscopy |
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US7378025B2 (en) | 2005-02-22 | 2008-05-27 | Asml Netherlands B.V. | Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method |
US7224431B2 (en) * | 2005-02-22 | 2007-05-29 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7428038B2 (en) | 2005-02-28 | 2008-09-23 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid |
US7324185B2 (en) * | 2005-03-04 | 2008-01-29 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7684010B2 (en) * | 2005-03-09 | 2010-03-23 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing |
US7330238B2 (en) * | 2005-03-28 | 2008-02-12 | Asml Netherlands, B.V. | Lithographic apparatus, immersion projection apparatus and device manufacturing method |
US7411654B2 (en) * | 2005-04-05 | 2008-08-12 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7291850B2 (en) * | 2005-04-08 | 2007-11-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US20060232753A1 (en) * | 2005-04-19 | 2006-10-19 | Asml Holding N.V. | Liquid immersion lithography system with tilted liquid flow |
US8248577B2 (en) * | 2005-05-03 | 2012-08-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7317507B2 (en) * | 2005-05-03 | 2008-01-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7433016B2 (en) | 2005-05-03 | 2008-10-07 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
KR100638107B1 (en) * | 2005-06-09 | 2006-10-24 | 연세대학교 산학협력단 | Light-modulating nano/micro scale aperture array device having immersion layer and high speed nano scale pattern recording system using the same |
US7751027B2 (en) | 2005-06-21 | 2010-07-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7652746B2 (en) * | 2005-06-21 | 2010-01-26 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7468779B2 (en) * | 2005-06-28 | 2008-12-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7834974B2 (en) | 2005-06-28 | 2010-11-16 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7474379B2 (en) * | 2005-06-28 | 2009-01-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7262422B2 (en) * | 2005-07-01 | 2007-08-28 | Spansion Llc | Use of supercritical fluid to dry wafer and clean lens in immersion lithography |
JP2007025394A (en) * | 2005-07-19 | 2007-02-01 | Fujifilm Holdings Corp | Pattern forming method |
US7535644B2 (en) * | 2005-08-12 | 2009-05-19 | Asml Netherlands B.V. | Lens element, lithographic apparatus, device manufacturing method, and device manufactured thereby |
US8054445B2 (en) * | 2005-08-16 | 2011-11-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7411658B2 (en) | 2005-10-06 | 2008-08-12 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
EP1987397A4 (en) * | 2005-10-26 | 2015-08-19 | Micronic Mydata AB | Writing apparatuses and methods |
US7804577B2 (en) | 2005-11-16 | 2010-09-28 | Asml Netherlands B.V. | Lithographic apparatus |
US7864292B2 (en) | 2005-11-16 | 2011-01-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7656501B2 (en) * | 2005-11-16 | 2010-02-02 | Asml Netherlands B.V. | Lithographic apparatus |
US7633073B2 (en) * | 2005-11-23 | 2009-12-15 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7773195B2 (en) * | 2005-11-29 | 2010-08-10 | Asml Holding N.V. | System and method to increase surface tension and contact angle in immersion lithography |
US7626181B2 (en) * | 2005-12-09 | 2009-12-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7420194B2 (en) * | 2005-12-27 | 2008-09-02 | Asml Netherlands B.V. | Lithographic apparatus and substrate edge seal |
US7839483B2 (en) * | 2005-12-28 | 2010-11-23 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and a control system |
US7649611B2 (en) | 2005-12-30 | 2010-01-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7893047B2 (en) * | 2006-03-03 | 2011-02-22 | Arch Chemicals, Inc. | Biocide composition comprising pyrithione and pyrrole derivatives |
US8045134B2 (en) | 2006-03-13 | 2011-10-25 | Asml Netherlands B.V. | Lithographic apparatus, control system and device manufacturing method |
US9477158B2 (en) | 2006-04-14 | 2016-10-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7969548B2 (en) * | 2006-05-22 | 2011-06-28 | Asml Netherlands B.V. | Lithographic apparatus and lithographic apparatus cleaning method |
US7697115B2 (en) * | 2006-06-23 | 2010-04-13 | Asml Holding N.V. | Resonant scanning mirror |
US8045135B2 (en) | 2006-11-22 | 2011-10-25 | Asml Netherlands B.V. | Lithographic apparatus with a fluid combining unit and related device manufacturing method |
US8634053B2 (en) | 2006-12-07 | 2014-01-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9632425B2 (en) | 2006-12-07 | 2017-04-25 | Asml Holding N.V. | Lithographic apparatus, a dryer and a method of removing liquid from a surface |
US7791709B2 (en) * | 2006-12-08 | 2010-09-07 | Asml Netherlands B.V. | Substrate support and lithographic process |
US8654305B2 (en) * | 2007-02-15 | 2014-02-18 | Asml Holding N.V. | Systems and methods for insitu lens cleaning in immersion lithography |
US8817226B2 (en) | 2007-02-15 | 2014-08-26 | Asml Holding N.V. | Systems and methods for insitu lens cleaning using ozone in immersion lithography |
US8947629B2 (en) * | 2007-05-04 | 2015-02-03 | Asml Netherlands B.V. | Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method |
US7866330B2 (en) * | 2007-05-04 | 2011-01-11 | Asml Netherlands B.V. | Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method |
US9013672B2 (en) * | 2007-05-04 | 2015-04-21 | Asml Netherlands B.V. | Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method |
US8011377B2 (en) | 2007-05-04 | 2011-09-06 | Asml Netherlands B.V. | Cleaning device and a lithographic apparatus cleaning method |
US8148663B2 (en) | 2007-07-31 | 2012-04-03 | Applied Materials, Inc. | Apparatus and method of improving beam shaping and beam homogenization |
US8582079B2 (en) * | 2007-08-14 | 2013-11-12 | Applied Materials, Inc. | Using phase difference of interference lithography for resolution enhancement |
US20100002210A1 (en) * | 2007-08-31 | 2010-01-07 | Applied Materials, Inc. | Integrated interference-assisted lithography |
US20090117491A1 (en) * | 2007-08-31 | 2009-05-07 | Applied Materials, Inc. | Resolution enhancement techniques combining interference-assisted lithography with other photolithography techniques |
US20090111056A1 (en) * | 2007-08-31 | 2009-04-30 | Applied Materials, Inc. | Resolution enhancement techniques combining four beam interference-assisted lithography with other photolithography techniques |
US8111380B2 (en) * | 2007-09-14 | 2012-02-07 | Luminescent Technologies, Inc. | Write-pattern determination for maskless lithography |
US8379187B2 (en) * | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
JP2010060990A (en) * | 2008-09-05 | 2010-03-18 | Hitachi High-Technologies Corp | Exposure device, exposure method, and method for manufacturing display panel substrate |
JP2012510085A (en) | 2008-11-26 | 2012-04-26 | マイクロニック マイデータ アーベー | Image read / write method using complex two-dimensional interlace scheme |
EP2359193B1 (en) * | 2008-12-05 | 2013-02-13 | Micronic Mydata AB | Rotating arm for writing an image on a workpiece |
US20100324418A1 (en) * | 2009-06-23 | 2010-12-23 | Essa El-Aklouk | Ultrasound transducer |
US8427630B2 (en) * | 2009-08-21 | 2013-04-23 | Samsung Electronics Co., Ltd. | Semiconductor manufacturing apparatus |
NL2005207A (en) * | 2009-09-28 | 2011-03-29 | Asml Netherlands Bv | Heat pipe, lithographic apparatus and device manufacturing method. |
WO2011090690A1 (en) * | 2009-12-28 | 2011-07-28 | Pioneer Hi-Bred International, Inc. | Sorghum fertility restorer genotypes and methods of marker-assisted selection |
US8743165B2 (en) | 2010-03-05 | 2014-06-03 | Micronic Laser Systems Ab | Methods and device for laser processing |
EP2381310B1 (en) | 2010-04-22 | 2015-05-06 | ASML Netherlands BV | Fluid handling structure and lithographic apparatus |
JP5515120B2 (en) | 2010-10-29 | 2014-06-11 | 株式会社ブイ・テクノロジー | Scan exposure equipment using microlens array |
WO2012059582A1 (en) * | 2010-11-04 | 2012-05-10 | Micronic Mydata AB | Method and device scanning a two-dimensional brush through an acousto-optic deflector (aod) having an extended field in a scanning direction |
US8896909B2 (en) | 2010-11-04 | 2014-11-25 | Micronic Ab | Method and device scanning a two-dimensional brush through an acousto-optic deflector (AOD) having an extended field in a scanning direction |
US8653454B2 (en) | 2011-07-13 | 2014-02-18 | Luminescent Technologies, Inc. | Electron-beam image reconstruction |
DE102011081247A1 (en) * | 2011-08-19 | 2013-02-21 | Carl Zeiss Smt Gmbh | Exposure system and method for the structured exposure of a photosensitive layer |
ES2444504T3 (en) | 2011-09-05 | 2014-02-25 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Laser device with a laser unit, and a fluid container for cooling means of said laser unit |
EP2565998A1 (en) | 2011-09-05 | 2013-03-06 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Gas ring laser device |
ES2438751T3 (en) | 2011-09-05 | 2014-01-20 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Device and procedure for marking an object by means of a laser beam |
EP2564971B1 (en) * | 2011-09-05 | 2015-08-26 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Marking apparatus with a plurality of laser and a set of deflecting means |
EP2564972B1 (en) | 2011-09-05 | 2015-08-26 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Marking apparatus with a plurality of lasers, deflection means and telescopic means for each laser beam |
EP2564975B1 (en) | 2011-09-05 | 2014-12-10 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Marking apparatus with a plurality of lasers and individually adjustable sets of deflection means |
EP2564970B1 (en) | 2011-09-05 | 2015-08-26 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Marking device for marking an object with marking light with different light modules employing different marking technologies |
EP2564973B1 (en) | 2011-09-05 | 2014-12-10 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Marking apparatus with a plurality of lasers and a combining deflection device |
EP2565995B1 (en) | 2011-09-05 | 2013-12-18 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Gas laser device with gas reservoir |
ES2544269T3 (en) | 2011-09-05 | 2015-08-28 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Marking apparatus with a plurality of gas lasers with resonance tubes and deflection means individually adjustable |
EP2564976B1 (en) | 2011-09-05 | 2015-06-10 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Marking apparatus with at least one gas laser and heat dissipator |
EP2565993B1 (en) | 2011-09-05 | 2014-01-29 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Laser device and method for generating laser light |
ES2452529T3 (en) | 2011-09-05 | 2014-04-01 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Laser device and procedure for marking an object |
US8822106B2 (en) * | 2012-04-13 | 2014-09-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Grid refinement method |
US8785815B2 (en) * | 2012-06-22 | 2014-07-22 | Applied Materials, Inc. | Aperture control of thermal processing radiation |
US10149390B2 (en) | 2012-08-27 | 2018-12-04 | Mycronic AB | Maskless writing of a workpiece using a plurality of exposures having different focal planes using multiple DMDs |
US9018108B2 (en) | 2013-01-25 | 2015-04-28 | Applied Materials, Inc. | Low shrinkage dielectric films |
DE102013213842A1 (en) * | 2013-07-16 | 2015-01-22 | Carl Zeiss Smt Gmbh | Optical component |
JP6296730B2 (en) * | 2013-09-06 | 2018-03-20 | 株式会社Screenホールディングス | Optical modulator and exposure head |
US11302516B2 (en) | 2014-01-13 | 2022-04-12 | Frederick A. Flitsch | Method and apparatus for an imaging system |
US10049853B2 (en) | 2014-01-13 | 2018-08-14 | Frederick A. Flitsch | Method and apparatus for an imaging system of biological material |
US11915909B2 (en) | 2014-01-13 | 2024-02-27 | Frederick A. Flitsch | Method and apparatus for an imaging system |
US10761195B2 (en) | 2016-04-22 | 2020-09-01 | OPSYS Tech Ltd. | Multi-wavelength LIDAR system |
TWI613534B (en) * | 2016-08-25 | 2018-02-01 | Double layer microlens array optical element | |
DE112018002863T5 (en) | 2017-06-06 | 2020-04-09 | Organofab Technologies, Inc. | METHOD AND DEVICE FOR A TISSUE ENGINEERING SYSTEM |
CN107561876A (en) * | 2017-10-19 | 2018-01-09 | 苏州源卓光电科技有限公司 | A kind of new mask-free photolithography system and its technological process |
JP7388720B2 (en) | 2017-11-15 | 2023-11-29 | オプシス テック リミテッド | Noise-adaptive solid-state LIDAR system |
US20210033708A1 (en) * | 2019-07-31 | 2021-02-04 | OPSYS Tech Ltd. | High-Resolution Solid-State LIDAR Transmitter |
CN112156819B (en) * | 2020-08-25 | 2022-05-10 | 华东师范大学重庆研究院 | Large-breadth array femtosecond laser micro-fluidic chip direct printing method and device |
CN116626996A (en) * | 2023-05-23 | 2023-08-22 | 无锡物联网创新中心有限公司 | Deep ultraviolet lithography machine based on optical fiber array |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1997034171A2 (en) * | 1996-02-28 | 1997-09-18 | Johnson Kenneth C | Microlens scanner for microlithography and wide-field confocal microscopy |
US5900637A (en) * | 1997-05-30 | 1999-05-04 | Massachusetts Institute Of Technology | Maskless lithography using a multiplexed array of fresnel zone plates |
US6002466A (en) * | 1996-06-29 | 1999-12-14 | Deutsches Zentrum Fuer Luft -Und Raumfahrt E.V. | Lithography exposure device |
US6379867B1 (en) * | 2000-01-10 | 2002-04-30 | Ball Semiconductor, Inc. | Moving exposure system and method for maskless lithography system |
Family Cites Families (78)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US633508A (en) * | 1898-07-11 | 1899-09-19 | Andrew J Fansher | Hog-trough. |
US3617125A (en) | 1969-04-24 | 1971-11-02 | Ncr Co | Automatic generation of microscopic patterns in multiplicity at final size |
US3861804A (en) | 1971-04-01 | 1975-01-21 | Xerox Corp | Inferometry readout of phase information |
US3877801A (en) | 1973-12-20 | 1975-04-15 | Itek Corp | Image translation apparatus |
US3973954A (en) | 1973-12-28 | 1976-08-10 | Xerox Corporation | Imaging method including exposure of photoconductive imaging member through lenticular lens element |
US3973953A (en) | 1973-12-28 | 1976-08-10 | Xerox Corporation | Imaging method including exposure of photoconductive imaging member through lenticular lens element |
US4272186A (en) | 1979-05-21 | 1981-06-09 | Polaroid Corporation | Camera method and apparatus for recording with selected contrast |
JPS5793907U (en) | 1980-11-26 | 1982-06-09 | ||
US4465934A (en) | 1981-01-23 | 1984-08-14 | Veeco Instruments Inc. | Parallel charged particle beam exposure system |
JPS57181549A (en) | 1981-04-30 | 1982-11-09 | Masatake Sato | Converting method for image |
US4353628A (en) | 1981-05-08 | 1982-10-12 | Delta Scan, Inc. | Apparatus for producing images on radiation sensitive recording mediums |
JPS57191628A (en) | 1981-05-21 | 1982-11-25 | Ricoh Co Ltd | Recording method using solid state light emitting element |
US4377753A (en) | 1981-06-01 | 1983-03-22 | Eastman Kodak Company | High resolution optical-addressing device and electronic scanner and/or printer apparatus employing such device |
JPS5818622A (en) | 1981-07-25 | 1983-02-03 | Ricoh Co Ltd | Recording device |
US4498742A (en) | 1981-09-10 | 1985-02-12 | Nippon Kogaku K.K. | Illumination optical arrangement |
USRE34634E (en) | 1982-02-26 | 1994-06-07 | Nippon Kogaku Kabushiki Kaisha | Light illumination device |
US4464030A (en) | 1982-03-26 | 1984-08-07 | Rca Corporation | Dynamic accuracy X-Y positioning table for use in a high precision light-spot writing system |
JPS59127017A (en) | 1983-01-12 | 1984-07-21 | Olympus Optical Co Ltd | Optical scanner |
US4619508A (en) | 1984-04-28 | 1986-10-28 | Nippon Kogaku K. K. | Illumination optical arrangement |
DE3427611A1 (en) | 1984-07-26 | 1988-06-09 | Bille Josef | LASER BEAM LITHOGRAPH |
CN1004245B (en) | 1984-10-29 | 1989-05-17 | 株式会社半导体能源研究所 | Electronic device manufacturing method |
US4668080A (en) | 1985-11-29 | 1987-05-26 | Rca Corporation | Method and apparatus for forming large area high resolution patterns |
US5242803A (en) | 1987-07-17 | 1993-09-07 | Martin Marietta Energy Systems, Inc. | Rotor assembly and assay method |
US5027132A (en) | 1988-03-25 | 1991-06-25 | Texas Instruments Incorporated | Position compensation of laser scan for stage movement |
JP2572626B2 (en) | 1988-04-28 | 1997-01-16 | 旭光学工業株式会社 | Method of forming reticle and microstructure array |
JP2663560B2 (en) | 1988-10-12 | 1997-10-15 | 日本電気株式会社 | Laser processing equipment |
GB8824131D0 (en) | 1988-10-14 | 1988-11-23 | Secretary Trade Ind Brit | Method of making product with feature having multiplicity of fine lines |
EP0368482A1 (en) | 1988-10-14 | 1990-05-16 | Secretary Of State For Trade And Industry In Her Britannic Majesty's Gov. Of The U.K. Of Great Britain And Northern Ireland | Method of making a product with a feature having a multiplicity of fine lines |
US5121160A (en) | 1989-03-09 | 1992-06-09 | Canon Kabushiki Kaisha | Exposure method and apparatus |
US5148322A (en) | 1989-11-09 | 1992-09-15 | Omron Tateisi Electronics Co. | Micro aspherical lens and fabricating method therefor and optical device |
US5436114A (en) | 1989-12-06 | 1995-07-25 | Hitachi, Ltd. | Method of optical lithography with super resolution and projection printing apparatus |
JP3245882B2 (en) | 1990-10-24 | 2002-01-15 | 株式会社日立製作所 | Pattern forming method and projection exposure apparatus |
DE59107758D1 (en) | 1990-11-10 | 1996-06-05 | Groskopf Rudolf Dr Ing | Optical scanning device with confocal beam path, in which light source and detector matrix are used |
EP0967524A3 (en) | 1990-11-15 | 2000-01-05 | Nikon Corporation | Projection exposure method and apparatus |
US5635976A (en) | 1991-07-17 | 1997-06-03 | Micronic Laser Systems Ab | Method and apparatus for the production of a structure by focused laser radiation on a photosensitively coated substrate |
EP0529125B1 (en) | 1991-08-27 | 1996-07-31 | International Business Machines Corporation | Method and apparatus for generating high resolution optical images |
US5166508A (en) | 1991-09-20 | 1992-11-24 | United Technologies Corporation | Optical processor for controlling a deformable mirror |
WO1993009472A1 (en) | 1991-10-30 | 1993-05-13 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Light exposure device |
JPH0770470B2 (en) | 1991-10-30 | 1995-07-31 | フラウンホファー・ゲゼルシャフト・ツール・フォルデルング・デル・アンゲバンテン・フォルシュング・アインゲトラーゲネル・フェライン | Irradiation device |
JP3321194B2 (en) | 1992-02-10 | 2002-09-03 | 株式会社クラレ | Photo mask |
DE69226511T2 (en) | 1992-03-05 | 1999-01-28 | Micronic Laser Systems Ab | Method and device for exposing substrates |
US5282088A (en) | 1992-10-19 | 1994-01-25 | Mark Davidson | Aplanatic microlens and method for making same |
JP3316936B2 (en) | 1992-10-22 | 2002-08-19 | 株式会社ニコン | Illumination optical device, exposure device, and transfer method using the exposure device |
US5517279A (en) | 1993-08-30 | 1996-05-14 | Hugle; William B. | Lens array photolithography |
NL9301973A (en) | 1992-11-20 | 1994-06-16 | Samsung Electronics Co Ltd | Exposure system for a projection exposure apparatus. |
KR100234357B1 (en) | 1992-11-21 | 1999-12-15 | 윤종용 | Enlightening apparatus |
US5463200A (en) | 1993-02-11 | 1995-10-31 | Lumonics Inc. | Marking of a workpiece by light energy |
US5412200A (en) | 1993-03-01 | 1995-05-02 | Rhoads; Geoffrey B. | Wide field distortion-compensating imaging system and methods |
DE69418131D1 (en) | 1993-03-01 | 1999-06-02 | Gen Signal Corp | DEVICE FOR GENERATING AN ADJUSTABLE RING-SHAPED LIGHTING FOR A PHOTOLITHOGRAPHIC PROJECTION APPARATUS |
IL109589A0 (en) | 1993-05-14 | 1994-08-26 | Hughes Aircraft Co | Apparatus and method for performing high spatial resolution thin film layer thickness metrology |
JPH06337366A (en) | 1993-05-21 | 1994-12-06 | Xerox Corp | Exposure device for raster output scanner in electrophotography printer |
KR950704670A (en) | 1993-09-30 | 1995-11-20 | 가따다 데쯔야 | Confocal Optics |
US5436725A (en) | 1993-10-12 | 1995-07-25 | Hughes Aircraft Company | Cofocal optical system for thickness measurements of patterned wafers |
US5539567A (en) | 1994-06-16 | 1996-07-23 | Texas Instruments Incorporated | Photolithographic technique and illuminator using real-time addressable phase shift light shift |
US5866911A (en) | 1994-07-15 | 1999-02-02 | Baer; Stephen C. | Method and apparatus for improving resolution in scanned optical system |
FR2725558B1 (en) | 1994-10-10 | 1996-10-31 | Commissariat Energie Atomique | METHOD FOR FORMING HOLES IN A PHOTOSENSITIVE RESIN LAYER APPLICATION TO THE MANUFACTURE OF MICROPOINT EMISSIVE CATHODE ELECTRON SOURCES AND FLAT DISPLAY SCREENS |
JP3251150B2 (en) | 1994-12-29 | 2002-01-28 | 日本板硝子株式会社 | Flat microlens array and method of manufacturing the same |
US5631721A (en) | 1995-05-24 | 1997-05-20 | Svg Lithography Systems, Inc. | Hybrid illumination system for use in photolithography |
DE19522936C2 (en) | 1995-06-23 | 1999-01-07 | Fraunhofer Ges Forschung | Device for structuring a photolithographic layer |
AU6601996A (en) | 1995-07-31 | 1997-02-26 | Lsi Logic Corporation | Lithography systems employing programmable reticles |
FR2737928B1 (en) | 1995-08-17 | 1997-09-12 | Commissariat Energie Atomique | DEVICE FOR INSOLATING MICROMETRIC AND / OR SUBMICROMETRIC ZONES IN A PHOTOSENSITIVE LAYER AND METHOD FOR PRODUCING PATTERNS IN SUCH A LAYER |
US5691541A (en) | 1996-05-14 | 1997-11-25 | The Regents Of The University Of California | Maskless, reticle-free, lithography |
DE19624276C2 (en) | 1996-06-18 | 1999-07-08 | Fraunhofer Ges Forschung | Phase-modulating microstructures for highly integrated area light modulators |
US5870176A (en) | 1996-06-19 | 1999-02-09 | Sandia Corporation | Maskless lithography |
GB9619839D0 (en) | 1996-09-23 | 1996-11-06 | Hugle Lithography Inc | Photolithography masking arrangements |
US6177980B1 (en) | 1997-02-20 | 2001-01-23 | Kenneth C. Johnson | High-throughput, maskless lithography system |
JPH10253883A (en) | 1997-03-07 | 1998-09-25 | Fuji Photo Optical Co Ltd | Projecting lens |
EP0881542A1 (en) | 1997-05-26 | 1998-12-02 | Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno | Lithography system |
SE9800665D0 (en) | 1998-03-02 | 1998-03-02 | Micronic Laser Systems Ab | Improved method for projection printing using a micromirror SLM |
US6248988B1 (en) | 1998-05-05 | 2001-06-19 | Kla-Tencor Corporation | Conventional and confocal multi-spot scanning optical microscope |
US6188519B1 (en) | 1999-01-05 | 2001-02-13 | Kenneth Carlisle Johnson | Bigrating light valve |
US6498685B1 (en) | 1999-01-11 | 2002-12-24 | Kenneth C. Johnson | Maskless, microlens EUV lithography system |
US6424404B1 (en) | 1999-01-11 | 2002-07-23 | Kenneth C. Johnson | Multi-stage microlens array |
US6392752B1 (en) | 1999-06-14 | 2002-05-21 | Kenneth Carlisle Johnson | Phase-measuring microlens microscopy |
US6333508B1 (en) | 1999-10-07 | 2001-12-25 | Lucent Technologies, Inc. | Illumination system for electron beam lithography tool |
JP4741115B2 (en) | 2000-08-14 | 2011-08-03 | イーリス エルエルシー | Lithographic projection apparatus and device manufacturing method |
US20020163629A1 (en) * | 2001-05-07 | 2002-11-07 | Michael Switkes | Methods and apparatus employing an index matching medium |
WO2003017317A1 (en) | 2001-08-13 | 2003-02-27 | Mapper Lithography Ip B.V. | Lithography system comprising a protected converter plate |
-
2002
- 2002-11-07 WO PCT/US2002/035658 patent/WO2003040830A2/en active Application Filing
- 2002-11-07 US US10/289,201 patent/US6897941B2/en not_active Expired - Lifetime
- 2002-11-07 CN CNA028246365A patent/CN1791839A/en active Pending
- 2002-11-07 KR KR1020047006981A patent/KR20050044371A/en active IP Right Grant
- 2002-11-07 JP JP2003542405A patent/JP2006502558A/en active Pending
- 2002-11-07 EP EP02797070A patent/EP1446703A2/en not_active Withdrawn
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1997034171A2 (en) * | 1996-02-28 | 1997-09-18 | Johnson Kenneth C | Microlens scanner for microlithography and wide-field confocal microscopy |
US6002466A (en) * | 1996-06-29 | 1999-12-14 | Deutsches Zentrum Fuer Luft -Und Raumfahrt E.V. | Lithography exposure device |
US5900637A (en) * | 1997-05-30 | 1999-05-04 | Massachusetts Institute Of Technology | Maskless lithography using a multiplexed array of fresnel zone plates |
US6379867B1 (en) * | 2000-01-10 | 2002-04-30 | Ball Semiconductor, Inc. | Moving exposure system and method for maskless lithography system |
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Also Published As
Publication number | Publication date |
---|---|
CN1791839A (en) | 2006-06-21 |
US20030123040A1 (en) | 2003-07-03 |
WO2003040830A3 (en) | 2003-10-16 |
JP2006502558A (en) | 2006-01-19 |
US6897941B2 (en) | 2005-05-24 |
EP1446703A2 (en) | 2004-08-18 |
KR20050044371A (en) | 2005-05-12 |
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