WO2003040830A3 - Optical spot grid array printer - Google Patents

Optical spot grid array printer Download PDF

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Publication number
WO2003040830A3
WO2003040830A3 PCT/US2002/035658 US0235658W WO03040830A3 WO 2003040830 A3 WO2003040830 A3 WO 2003040830A3 US 0235658 W US0235658 W US 0235658W WO 03040830 A3 WO03040830 A3 WO 03040830A3
Authority
WO
WIPO (PCT)
Prior art keywords
grid array
resist
spot
optical spot
array printer
Prior art date
Application number
PCT/US2002/035658
Other languages
French (fr)
Other versions
WO2003040830A2 (en
Inventor
Gilad Almogy
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to EP02797070A priority Critical patent/EP1446703A2/en
Priority to JP2003542405A priority patent/JP2006502558A/en
Publication of WO2003040830A2 publication Critical patent/WO2003040830A2/en
Publication of WO2003040830A3 publication Critical patent/WO2003040830A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2057—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using an addressed light valve, e.g. a liquid crystal device
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/70391—Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays

Abstract

A high resolution and high data rate spot grid array printer system is provided, wherein an image is formed by scanning spot-grid array of optical beams across a substrate layered with a resist. High resolution is achieved by apodizing the optical beams to provide a narrower main lobe. Unwanted recordation of side lobes upon the substrate is prevented by assuring that the side lobes do not include energy above the threshold of the resist, using a memoryless resist, and by using a slanted and interleaved scan pattern adapted for use with the spot-grid array pattern and the memoryless characteristic of the resist.
PCT/US2002/035658 2001-11-07 2002-11-07 Optical spot grid array printer WO2003040830A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP02797070A EP1446703A2 (en) 2001-11-07 2002-11-07 Optical spot grid array printer
JP2003542405A JP2006502558A (en) 2001-11-07 2002-11-07 Optical spot grating array printer

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US33102901P 2001-11-07 2001-11-07
US60/331,029 2001-11-07

Publications (2)

Publication Number Publication Date
WO2003040830A2 WO2003040830A2 (en) 2003-05-15
WO2003040830A3 true WO2003040830A3 (en) 2003-10-16

Family

ID=23292312

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2002/035658 WO2003040830A2 (en) 2001-11-07 2002-11-07 Optical spot grid array printer

Country Status (6)

Country Link
US (1) US6897941B2 (en)
EP (1) EP1446703A2 (en)
JP (1) JP2006502558A (en)
KR (1) KR20050044371A (en)
CN (1) CN1791839A (en)
WO (1) WO2003040830A2 (en)

Families Citing this family (239)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9188874B1 (en) 2011-05-09 2015-11-17 Kenneth C. Johnson Spot-array imaging system for maskless lithography and parallel confocal microscopy
US9097983B2 (en) 2011-05-09 2015-08-04 Kenneth C. Johnson Scanned-spot-array EUV lithography system
US8994920B1 (en) 2010-05-07 2015-03-31 Kenneth C. Johnson Optical systems and methods for absorbance modulation
WO2003038518A1 (en) 2001-10-30 2003-05-08 Pixelligent Technologies Llc Advanced exposure techniques for programmable lithography
CN1292310C (en) * 2001-12-17 2006-12-27 皇家飞利浦电子股份有限公司 Method of forming optical images, diffration element for use with this method, apparatus for carrying out this method
JP3938714B2 (en) * 2002-05-16 2007-06-27 大日本スクリーン製造株式会社 Exposure equipment
JP4279053B2 (en) * 2002-06-07 2009-06-17 富士フイルム株式会社 Exposure head and exposure apparatus
JP2004062156A (en) * 2002-06-07 2004-02-26 Fuji Photo Film Co Ltd Exposure head and exposure apparatus
DE10230652A1 (en) * 2002-07-08 2004-01-29 Carl Zeiss Smt Ag Optical device with an illuminating light source
US6960773B2 (en) * 2002-07-22 2005-11-01 Massachusetts Institute Of Technology System and method for maskless lithography using an array of improved diffractive focusing elements
SG121819A1 (en) * 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
DE60335595D1 (en) * 2002-11-12 2011-02-17 Asml Netherlands Bv Immersion lithographic apparatus and method of making a device
US9482966B2 (en) 2002-11-12 2016-11-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN101470360B (en) 2002-11-12 2013-07-24 Asml荷兰有限公司 Immersion lithographic apparatus and device manufacturing method
SG121822A1 (en) * 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US10503084B2 (en) 2002-11-12 2019-12-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7372541B2 (en) * 2002-11-12 2008-05-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7110081B2 (en) * 2002-11-12 2006-09-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
SG121818A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
SG131766A1 (en) * 2002-11-18 2007-05-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
DE60319658T2 (en) * 2002-11-29 2009-04-02 Asml Netherlands B.V. Lithographic apparatus and method of making a device
US7242455B2 (en) * 2002-12-10 2007-07-10 Nikon Corporation Exposure apparatus and method for producing device
FR2849218B1 (en) * 2002-12-20 2005-03-04 Mauna Kea Technologies CONFOCAL OPTICAL HEAD, IN PARTICULAR MINIATURE, INTEGRATED SCANNING AND CONFOCAL IMAGING SYSTEM IMPLEMENTING SAID HEAD
EP3301511A1 (en) 2003-02-26 2018-04-04 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
JP4390189B2 (en) * 2003-04-10 2009-12-24 大日本スクリーン製造株式会社 Pattern drawing device
TWI295414B (en) 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1480080A1 (en) * 2003-05-22 2004-11-24 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI347741B (en) * 2003-05-30 2011-08-21 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP4749682B2 (en) * 2003-06-04 2011-08-17 富士フイルム株式会社 Exposure equipment
US7213963B2 (en) 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7317504B2 (en) 2004-04-08 2008-01-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP2261741A3 (en) * 2003-06-11 2011-05-25 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US6867844B2 (en) * 2003-06-19 2005-03-15 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles
US6809794B1 (en) * 2003-06-27 2004-10-26 Asml Holding N.V. Immersion photolithography system and method using inverted wafer-projection optics interface
EP1491956B1 (en) 2003-06-27 2006-09-06 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1498778A1 (en) * 2003-06-27 2005-01-19 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
DE60321779D1 (en) * 2003-06-30 2008-08-07 Asml Netherlands Bv Lithographic apparatus and method for making an article
EP1494074A1 (en) * 2003-06-30 2005-01-05 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2005006418A1 (en) * 2003-07-09 2005-01-20 Nikon Corporation Exposure apparatus and method for manufacturing device
US7738074B2 (en) 2003-07-16 2010-06-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1500982A1 (en) 2003-07-24 2005-01-26 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1503244A1 (en) * 2003-07-28 2005-02-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
US7175968B2 (en) * 2003-07-28 2007-02-13 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and a substrate
US7326522B2 (en) 2004-02-11 2008-02-05 Asml Netherlands B.V. Device manufacturing method and a substrate
US7779781B2 (en) 2003-07-31 2010-08-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US6844206B1 (en) 2003-08-21 2005-01-18 Advanced Micro Devices, Llp Refractive index system monitor and control for immersion lithography
KR101094114B1 (en) * 2003-08-26 2011-12-15 가부시키가이샤 니콘 Optical element and exposure device
US8149381B2 (en) 2003-08-26 2012-04-03 Nikon Corporation Optical element and exposure apparatus
CN1842747A (en) * 2003-08-27 2006-10-04 皇家飞利浦电子股份有限公司 Method of forming optical images, apparatus for carrying out said method and process for manufacturing a device using said method
US7459709B2 (en) * 2003-08-27 2008-12-02 Koninklijke Philips Electronics N.V. Method of forming optical images, a control circuit for use with this method, apparatus for carrying out said method and process for manufacturing a device using said method
EP2261740B1 (en) 2003-08-29 2014-07-09 ASML Netherlands BV Lithographic apparatus
TWI245163B (en) 2003-08-29 2005-12-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
TWI263859B (en) 2003-08-29 2006-10-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US6954256B2 (en) * 2003-08-29 2005-10-11 Asml Netherlands B.V. Gradient immersion lithography
US7158211B2 (en) * 2003-09-29 2007-01-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1519230A1 (en) * 2003-09-29 2005-03-30 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1519231B1 (en) 2003-09-29 2005-12-21 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7056646B1 (en) 2003-10-01 2006-06-06 Advanced Micro Devices, Inc. Use of base developers as immersion lithography fluid
US7369217B2 (en) * 2003-10-03 2008-05-06 Micronic Laser Systems Ab Method and device for immersion lithography
US7109498B2 (en) * 2003-10-09 2006-09-19 Asml Netherlands B.V. Radiation source, lithographic apparatus, and device manufacturing method
EP1524557A1 (en) * 2003-10-15 2005-04-20 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1524558A1 (en) * 2003-10-15 2005-04-20 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7411653B2 (en) * 2003-10-28 2008-08-12 Asml Netherlands B.V. Lithographic apparatus
US7352433B2 (en) 2003-10-28 2008-04-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7113259B2 (en) * 2003-10-31 2006-09-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7528929B2 (en) 2003-11-14 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4510429B2 (en) * 2003-11-19 2010-07-21 財団法人国際科学振興財団 Mask drawing method and mask drawing apparatus
US7545481B2 (en) * 2003-11-24 2009-06-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7460206B2 (en) * 2003-12-19 2008-12-02 Carl Zeiss Smt Ag Projection objective for immersion lithography
US6995830B2 (en) * 2003-12-22 2006-02-07 Asml Netherlands B.V. Lithographic projection apparatus and device manufacturing method
US7394521B2 (en) * 2003-12-23 2008-07-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7589818B2 (en) * 2003-12-23 2009-09-15 Asml Netherlands B.V. Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus
US7256873B2 (en) * 2004-01-28 2007-08-14 Asml Netherlands B.V. Enhanced lithographic resolution through double exposure
US7580559B2 (en) 2004-01-29 2009-08-25 Asml Holding N.V. System and method for calibrating a spatial light modulator
US7050146B2 (en) 2004-02-09 2006-05-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7081947B2 (en) * 2004-02-27 2006-07-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7741012B1 (en) 2004-03-01 2010-06-22 Advanced Micro Devices, Inc. Method for removal of immersion lithography medium in immersion lithography processes
US7227618B1 (en) 2004-03-24 2007-06-05 Baokang Bi Pattern generating systems
US7227619B2 (en) * 2004-04-01 2007-06-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7034917B2 (en) * 2004-04-01 2006-04-25 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured thereby
US7295283B2 (en) * 2004-04-02 2007-11-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7898642B2 (en) 2004-04-14 2011-03-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20050243295A1 (en) * 2004-04-30 2005-11-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing
US7379159B2 (en) * 2004-05-03 2008-05-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7616383B2 (en) 2004-05-18 2009-11-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7486381B2 (en) * 2004-05-21 2009-02-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US6989886B2 (en) * 2004-06-08 2006-01-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7481867B2 (en) 2004-06-16 2009-01-27 Edwards Limited Vacuum system for immersion photolithography
US7116404B2 (en) * 2004-06-30 2006-10-03 Asml Netherlands B.V Lithographic apparatus and device manufacturing method
US7463330B2 (en) 2004-07-07 2008-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7161663B2 (en) * 2004-07-22 2007-01-09 Asml Netherlands B.V. Lithographic apparatus
KR100684872B1 (en) * 2004-08-03 2007-02-20 삼성전자주식회사 Optical System For Spatially Controlling Light Polarization And Method Of Making The Same
US7304715B2 (en) * 2004-08-13 2007-12-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20060044533A1 (en) * 2004-08-27 2006-03-02 Asmlholding N.V. System and method for reducing disturbances caused by movement in an immersion lithography system
US7846649B2 (en) * 2004-09-13 2010-12-07 Applied Materials Israel, Ltd. High resolution printer and a method for high resolution printing
US7133114B2 (en) * 2004-09-20 2006-11-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20060060653A1 (en) * 2004-09-23 2006-03-23 Carl Wittenberg Scanner system and method for simultaneously acquiring data images from multiple object planes
US7522261B2 (en) * 2004-09-24 2009-04-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7355674B2 (en) * 2004-09-28 2008-04-08 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and computer program product
US7894040B2 (en) * 2004-10-05 2011-02-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7209213B2 (en) * 2004-10-07 2007-04-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7379155B2 (en) 2004-10-18 2008-05-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7119876B2 (en) * 2004-10-18 2006-10-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7251013B2 (en) 2004-11-12 2007-07-31 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7583357B2 (en) * 2004-11-12 2009-09-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7423720B2 (en) * 2004-11-12 2008-09-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7414699B2 (en) * 2004-11-12 2008-08-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7411657B2 (en) 2004-11-17 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7474384B2 (en) * 2004-11-22 2009-01-06 Asml Holding N.V. Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus
US7145630B2 (en) * 2004-11-23 2006-12-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7256121B2 (en) * 2004-12-02 2007-08-14 Texas Instruments Incorporated Contact resistance reduction by new barrier stack process
US7161654B2 (en) * 2004-12-02 2007-01-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7446850B2 (en) * 2004-12-03 2008-11-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7248334B2 (en) * 2004-12-07 2007-07-24 Asml Netherlands B.V. Sensor shield
US7397533B2 (en) * 2004-12-07 2008-07-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7196770B2 (en) * 2004-12-07 2007-03-27 Asml Netherlands B.V. Prewetting of substrate before immersion exposure
US7365827B2 (en) 2004-12-08 2008-04-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7352440B2 (en) 2004-12-10 2008-04-01 Asml Netherlands B.V. Substrate placement in immersion lithography
US7403261B2 (en) * 2004-12-15 2008-07-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7528931B2 (en) 2004-12-20 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7880860B2 (en) 2004-12-20 2011-02-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7202939B2 (en) 2004-12-22 2007-04-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7126672B2 (en) * 2004-12-27 2006-10-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7756660B2 (en) 2004-12-28 2010-07-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7405805B2 (en) * 2004-12-28 2008-07-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7145636B2 (en) * 2004-12-28 2006-12-05 Asml Netherlands Bv System and method for determining maximum operational parameters used in maskless applications
US7491661B2 (en) * 2004-12-28 2009-02-17 Asml Netherlands B.V. Device manufacturing method, top coat material and substrate
US20060147821A1 (en) 2004-12-30 2006-07-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE602006012746D1 (en) * 2005-01-14 2010-04-22 Asml Netherlands Bv Lithographic apparatus and manufacturing method
SG124351A1 (en) 2005-01-14 2006-08-30 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
KR101427056B1 (en) 2005-01-31 2014-08-05 가부시키가이샤 니콘 Exposure apparatus and method for manufacturing device
US8692973B2 (en) * 2005-01-31 2014-04-08 Nikon Corporation Exposure apparatus and method for producing device
JP4638826B2 (en) * 2005-02-04 2011-02-23 富士フイルム株式会社 Drawing apparatus and drawing method
US20060186355A1 (en) * 2005-02-04 2006-08-24 Smith Henry I Phase-shift masked zone plate array lithography
CN101128775B (en) * 2005-02-10 2012-07-25 Asml荷兰有限公司 Immersion liquid, exposure apparatus, and exposure process
US7224431B2 (en) * 2005-02-22 2007-05-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7378025B2 (en) 2005-02-22 2008-05-27 Asml Netherlands B.V. Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method
US8018573B2 (en) 2005-02-22 2011-09-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7428038B2 (en) * 2005-02-28 2008-09-23 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid
US7324185B2 (en) * 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7684010B2 (en) * 2005-03-09 2010-03-23 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing
US7330238B2 (en) * 2005-03-28 2008-02-12 Asml Netherlands, B.V. Lithographic apparatus, immersion projection apparatus and device manufacturing method
US7411654B2 (en) 2005-04-05 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7291850B2 (en) * 2005-04-08 2007-11-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20060232753A1 (en) * 2005-04-19 2006-10-19 Asml Holding N.V. Liquid immersion lithography system with tilted liquid flow
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7433016B2 (en) 2005-05-03 2008-10-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7317507B2 (en) * 2005-05-03 2008-01-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7742148B2 (en) 2005-06-08 2010-06-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method for writing a digital image
KR100638107B1 (en) * 2005-06-09 2006-10-24 연세대학교 산학협력단 Light-modulating nano/micro scale aperture array device having immersion layer and high speed nano scale pattern recording system using the same
US7652746B2 (en) * 2005-06-21 2010-01-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7751027B2 (en) 2005-06-21 2010-07-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7834974B2 (en) 2005-06-28 2010-11-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7468779B2 (en) * 2005-06-28 2008-12-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7474379B2 (en) 2005-06-28 2009-01-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7262422B2 (en) * 2005-07-01 2007-08-28 Spansion Llc Use of supercritical fluid to dry wafer and clean lens in immersion lithography
JP2007025394A (en) * 2005-07-19 2007-02-01 Fujifilm Holdings Corp Pattern forming method
US7535644B2 (en) * 2005-08-12 2009-05-19 Asml Netherlands B.V. Lens element, lithographic apparatus, device manufacturing method, and device manufactured thereby
US8054445B2 (en) * 2005-08-16 2011-11-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7411658B2 (en) 2005-10-06 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4938784B2 (en) * 2005-10-26 2012-05-23 マイクロニック レーザー システムズ アクチボラゲット Writing apparatus and method
US7864292B2 (en) * 2005-11-16 2011-01-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7656501B2 (en) * 2005-11-16 2010-02-02 Asml Netherlands B.V. Lithographic apparatus
US7804577B2 (en) 2005-11-16 2010-09-28 Asml Netherlands B.V. Lithographic apparatus
US7633073B2 (en) * 2005-11-23 2009-12-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7773195B2 (en) * 2005-11-29 2010-08-10 Asml Holding N.V. System and method to increase surface tension and contact angle in immersion lithography
US20070127005A1 (en) * 2005-12-02 2007-06-07 Asml Holding N.V. Illumination system
US7626181B2 (en) * 2005-12-09 2009-12-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7420194B2 (en) * 2005-12-27 2008-09-02 Asml Netherlands B.V. Lithographic apparatus and substrate edge seal
US7839483B2 (en) * 2005-12-28 2010-11-23 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and a control system
US7649611B2 (en) 2005-12-30 2010-01-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7893047B2 (en) * 2006-03-03 2011-02-22 Arch Chemicals, Inc. Biocide composition comprising pyrithione and pyrrole derivatives
US8045134B2 (en) 2006-03-13 2011-10-25 Asml Netherlands B.V. Lithographic apparatus, control system and device manufacturing method
US9477158B2 (en) * 2006-04-14 2016-10-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7969548B2 (en) * 2006-05-22 2011-06-28 Asml Netherlands B.V. Lithographic apparatus and lithographic apparatus cleaning method
US7697115B2 (en) * 2006-06-23 2010-04-13 Asml Holding N.V. Resonant scanning mirror
US8045135B2 (en) * 2006-11-22 2011-10-25 Asml Netherlands B.V. Lithographic apparatus with a fluid combining unit and related device manufacturing method
US9632425B2 (en) 2006-12-07 2017-04-25 Asml Holding N.V. Lithographic apparatus, a dryer and a method of removing liquid from a surface
US8634053B2 (en) 2006-12-07 2014-01-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7791709B2 (en) * 2006-12-08 2010-09-07 Asml Netherlands B.V. Substrate support and lithographic process
US8654305B2 (en) * 2007-02-15 2014-02-18 Asml Holding N.V. Systems and methods for insitu lens cleaning in immersion lithography
US8817226B2 (en) 2007-02-15 2014-08-26 Asml Holding N.V. Systems and methods for insitu lens cleaning using ozone in immersion lithography
US8947629B2 (en) * 2007-05-04 2015-02-03 Asml Netherlands B.V. Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US7866330B2 (en) * 2007-05-04 2011-01-11 Asml Netherlands B.V. Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US9013672B2 (en) * 2007-05-04 2015-04-21 Asml Netherlands B.V. Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US8011377B2 (en) 2007-05-04 2011-09-06 Asml Netherlands B.V. Cleaning device and a lithographic apparatus cleaning method
US8148663B2 (en) * 2007-07-31 2012-04-03 Applied Materials, Inc. Apparatus and method of improving beam shaping and beam homogenization
US8582079B2 (en) * 2007-08-14 2013-11-12 Applied Materials, Inc. Using phase difference of interference lithography for resolution enhancement
US20090111056A1 (en) * 2007-08-31 2009-04-30 Applied Materials, Inc. Resolution enhancement techniques combining four beam interference-assisted lithography with other photolithography techniques
US20090117491A1 (en) * 2007-08-31 2009-05-07 Applied Materials, Inc. Resolution enhancement techniques combining interference-assisted lithography with other photolithography techniques
US20100002210A1 (en) * 2007-08-31 2010-01-07 Applied Materials, Inc. Integrated interference-assisted lithography
US8111380B2 (en) * 2007-09-14 2012-02-07 Luminescent Technologies, Inc. Write-pattern determination for maskless lithography
US8379187B2 (en) * 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
JP2010060990A (en) * 2008-09-05 2010-03-18 Hitachi High-Technologies Corp Exposure device, exposure method, and method for manufacturing display panel substrate
JP2012510085A (en) * 2008-11-26 2012-04-26 マイクロニック マイデータ アーベー Image read / write method using complex two-dimensional interlace scheme
JP5469674B2 (en) * 2008-12-05 2014-04-16 マイクロニック マイデータ アーベー Method and system for writing on a workpiece
US20100324418A1 (en) * 2009-06-23 2010-12-23 Essa El-Aklouk Ultrasound transducer
US8427630B2 (en) * 2009-08-21 2013-04-23 Samsung Electronics Co., Ltd. Semiconductor manufacturing apparatus
NL2005207A (en) * 2009-09-28 2011-03-29 Asml Netherlands Bv Heat pipe, lithographic apparatus and device manufacturing method.
MX2012007581A (en) * 2009-12-28 2012-07-30 Pioneer Hi Bred Int Sorghum fertility restorer genotypes and methods of marker-assisted selection.
US8743165B2 (en) 2010-03-05 2014-06-03 Micronic Laser Systems Ab Methods and device for laser processing
EP2381310B1 (en) 2010-04-22 2015-05-06 ASML Netherlands BV Fluid handling structure and lithographic apparatus
JP5515120B2 (en) 2010-10-29 2014-06-11 株式会社ブイ・テクノロジー Scan exposure equipment using microlens array
US8896909B2 (en) 2010-11-04 2014-11-25 Micronic Ab Method and device scanning a two-dimensional brush through an acousto-optic deflector (AOD) having an extended field in a scanning direction
WO2012059581A1 (en) * 2010-11-04 2012-05-10 Micronic Mydata AB Method and device with an advanced acousto-optic deflector (aod) and a dense brush of flying spots
US8653454B2 (en) 2011-07-13 2014-02-18 Luminescent Technologies, Inc. Electron-beam image reconstruction
DE102011081247A1 (en) * 2011-08-19 2013-02-21 Carl Zeiss Smt Gmbh Exposure system and method for the structured exposure of a photosensitive layer
EP2564971B1 (en) * 2011-09-05 2015-08-26 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Marking apparatus with a plurality of laser and a set of deflecting means
DK2564975T3 (en) 2011-09-05 2015-01-12 Alltec Angewandte Laserlicht Technologie Ges Mit Beschränkter Haftung Selection apparatus with a plurality of lasers and sets of deflecting agents that can be individually adjusted
ES2452529T3 (en) 2011-09-05 2014-04-01 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Laser device and procedure for marking an object
ES2549507T3 (en) 2011-09-05 2015-10-28 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Marking device to mark an object with a marking light with different light modules using different marking technologies
DK2565673T3 (en) 2011-09-05 2014-01-06 Alltec Angewandte Laserlicht Technologie Gmbh Device and method for marking an object by means of a laser beam
EP2565993B1 (en) 2011-09-05 2014-01-29 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Laser device and method for generating laser light
ES2530069T3 (en) 2011-09-05 2015-02-26 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Marking apparatus with a plurality of lasers and a combination deflection device
EP2564972B1 (en) 2011-09-05 2015-08-26 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Marking apparatus with a plurality of lasers, deflection means and telescopic means for each laser beam
EP2565996B1 (en) 2011-09-05 2013-12-11 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Laser device with a laser unit, and a fluid container for a cooling means of said laser unit
EP2565998A1 (en) 2011-09-05 2013-03-06 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Gas ring laser device
ES2446364T3 (en) 2011-09-05 2014-03-07 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Gas laser device with gas tank
EP2564974B1 (en) 2011-09-05 2015-06-17 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Marking apparatus with a plurality of gas lasers with resonator tubes and individually adjustable deflection means
ES2544034T3 (en) 2011-09-05 2015-08-27 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Marking apparatus with at least one gas laser and one thermodisipator
US8822106B2 (en) * 2012-04-13 2014-09-02 Taiwan Semiconductor Manufacturing Company, Ltd. Grid refinement method
US8785815B2 (en) * 2012-06-22 2014-07-22 Applied Materials, Inc. Aperture control of thermal processing radiation
US10149390B2 (en) 2012-08-27 2018-12-04 Mycronic AB Maskless writing of a workpiece using a plurality of exposures having different focal planes using multiple DMDs
US9018108B2 (en) 2013-01-25 2015-04-28 Applied Materials, Inc. Low shrinkage dielectric films
DE102013213842A1 (en) * 2013-07-16 2015-01-22 Carl Zeiss Smt Gmbh Optical component
JP6296730B2 (en) * 2013-09-06 2018-03-20 株式会社Ｓｃｒｅｅｎホールディングス Optical modulator and exposure head
US11302516B2 (en) 2014-01-13 2022-04-12 Frederick A. Flitsch Method and apparatus for an imaging system
US11915909B2 (en) 2014-01-13 2024-02-27 Frederick A. Flitsch Method and apparatus for an imaging system
US10049853B2 (en) 2014-01-13 2018-08-14 Frederick A. Flitsch Method and apparatus for an imaging system of biological material
US10761195B2 (en) 2016-04-22 2020-09-01 OPSYS Tech Ltd. Multi-wavelength LIDAR system
TWI613534B (en) * 2016-08-25 2018-02-01 Double layer microlens array optical element
EP3559747A1 (en) * 2016-12-20 2019-10-30 EV Group E. Thallner GmbH Device and method for exposing a light-sensitive layer
US11048230B2 (en) 2017-06-06 2021-06-29 Organofab Technologies, Inc. Method and apparatus for a tissue engineering system
CN107561876A (en) * 2017-10-19 2018-01-09 苏州源卓光电科技有限公司 A kind of new mask-free photolithography system and its technological process
JP7388720B2 (en) 2017-11-15 2023-11-29 オプシス テック リミテッド Noise-adaptive solid-state LIDAR system
US20210033708A1 (en) * 2019-07-31 2021-02-04 OPSYS Tech Ltd. High-Resolution Solid-State LIDAR Transmitter
CN112156819B (en) * 2020-08-25 2022-05-10 华东师范大学重庆研究院 Large-breadth array femtosecond laser micro-fluidic chip direct printing method and device
CN116626996A (en) * 2023-05-23 2023-08-22 无锡物联网创新中心有限公司 Deep ultraviolet lithography machine based on optical fiber array

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997034171A2 (en) * 1996-02-28 1997-09-18 Johnson Kenneth C Microlens scanner for microlithography and wide-field confocal microscopy
US5900637A (en) * 1997-05-30 1999-05-04 Massachusetts Institute Of Technology Maskless lithography using a multiplexed array of fresnel zone plates
US6002466A (en) * 1996-06-29 1999-12-14 Deutsches Zentrum Fuer Luft -Und Raumfahrt E.V. Lithography exposure device
US6379867B1 (en) * 2000-01-10 2002-04-30 Ball Semiconductor, Inc. Moving exposure system and method for maskless lithography system

Family Cites Families (78)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US633508A (en) * 1898-07-11 1899-09-19 Andrew J Fansher Hog-trough.
US3617125A (en) 1969-04-24 1971-11-02 Ncr Co Automatic generation of microscopic patterns in multiplicity at final size
US3861804A (en) 1971-04-01 1975-01-21 Xerox Corp Inferometry readout of phase information
US3877801A (en) 1973-12-20 1975-04-15 Itek Corp Image translation apparatus
US3973953A (en) 1973-12-28 1976-08-10 Xerox Corporation Imaging method including exposure of photoconductive imaging member through lenticular lens element
US3973954A (en) 1973-12-28 1976-08-10 Xerox Corporation Imaging method including exposure of photoconductive imaging member through lenticular lens element
US4272186A (en) 1979-05-21 1981-06-09 Polaroid Corporation Camera method and apparatus for recording with selected contrast
JPS5793907U (en) 1980-11-26 1982-06-09
US4465934A (en) 1981-01-23 1984-08-14 Veeco Instruments Inc. Parallel charged particle beam exposure system
JPS57181549A (en) 1981-04-30 1982-11-09 Masatake Sato Converting method for image
US4353628A (en) 1981-05-08 1982-10-12 Delta Scan, Inc. Apparatus for producing images on radiation sensitive recording mediums
JPS57191628A (en) 1981-05-21 1982-11-25 Ricoh Co Ltd Recording method using solid state light emitting element
US4377753A (en) 1981-06-01 1983-03-22 Eastman Kodak Company High resolution optical-addressing device and electronic scanner and/or printer apparatus employing such device
JPS5818622A (en) 1981-07-25 1983-02-03 Ricoh Co Ltd Recording device
US4498742A (en) 1981-09-10 1985-02-12 Nippon Kogaku K.K. Illumination optical arrangement
USRE34634E (en) 1982-02-26 1994-06-07 Nippon Kogaku Kabushiki Kaisha Light illumination device
US4464030A (en) 1982-03-26 1984-08-07 Rca Corporation Dynamic accuracy X-Y positioning table for use in a high precision light-spot writing system
JPS59127017A (en) 1983-01-12 1984-07-21 Olympus Optical Co Ltd Optical scanner
US4619508A (en) 1984-04-28 1986-10-28 Nippon Kogaku K. K. Illumination optical arrangement
DE3427611A1 (en) 1984-07-26 1988-06-09 Bille Josef LASER BEAM LITHOGRAPH
US4680855A (en) 1984-10-29 1987-07-21 Semiconductor Energy Laboratory Co., Ltd. Electronic device manufacturing methods
US4668080A (en) 1985-11-29 1987-05-26 Rca Corporation Method and apparatus for forming large area high resolution patterns
US5242803A (en) 1987-07-17 1993-09-07 Martin Marietta Energy Systems, Inc. Rotor assembly and assay method
US5027132A (en) 1988-03-25 1991-06-25 Texas Instruments Incorporated Position compensation of laser scan for stage movement
JP2572626B2 (en) 1988-04-28 1997-01-16 旭光学工業株式会社 Method of forming reticle and microstructure array
JP2663560B2 (en) 1988-10-12 1997-10-15 日本電気株式会社 Laser processing equipment
EP0368482A1 (en) 1988-10-14 1990-05-16 Secretary Of State For Trade And Industry In Her Britannic Majesty's Gov. Of The U.K. Of Great Britain And Northern Ireland Method of making a product with a feature having a multiplicity of fine lines
GB8824131D0 (en) 1988-10-14 1988-11-23 Secretary Trade Ind Brit Method of making product with feature having multiplicity of fine lines
US5121160A (en) 1989-03-09 1992-06-09 Canon Kabushiki Kaisha Exposure method and apparatus
US5148322A (en) 1989-11-09 1992-09-15 Omron Tateisi Electronics Co. Micro aspherical lens and fabricating method therefor and optical device
US5436114A (en) 1989-12-06 1995-07-25 Hitachi, Ltd. Method of optical lithography with super resolution and projection printing apparatus
JP3245882B2 (en) 1990-10-24 2002-01-15 株式会社日立製作所 Pattern forming method and projection exposure apparatus
ATE137588T1 (en) 1990-11-10 1996-05-15 Grosskopf Rudolf Dr Ing OPTICAL SCANNING DEVICE WITH CONFOCAL BEAM PATH USING LIGHT SOURCE AND DETECTOR MATRIX
EP0486316B1 (en) 1990-11-15 2000-04-19 Nikon Corporation Projection exposure method and apparatus
US5635976A (en) 1991-07-17 1997-06-03 Micronic Laser Systems Ab Method and apparatus for the production of a structure by focused laser radiation on a photosensitively coated substrate
EP0529125B1 (en) 1991-08-27 1996-07-31 International Business Machines Corporation Method and apparatus for generating high resolution optical images
US5166508A (en) 1991-09-20 1992-11-24 United Technologies Corporation Optical processor for controlling a deformable mirror
EP0610183B1 (en) 1991-10-30 1995-05-10 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Exposure device
EP0610184B1 (en) 1991-10-30 1995-05-03 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Light exposure device
JP3321194B2 (en) 1992-02-10 2002-09-03 株式会社クラレ Photo mask
EP0558781B1 (en) 1992-03-05 1998-08-05 Micronic Laser Systems Ab Method and apparatus for exposure of substrates
US5282088A (en) 1992-10-19 1994-01-25 Mark Davidson Aplanatic microlens and method for making same
JP3316936B2 (en) 1992-10-22 2002-08-19 株式会社ニコン Illumination optical device, exposure device, and transfer method using the exposure device
US5517279A (en) 1993-08-30 1996-05-14 Hugle; William B. Lens array photolithography
NL9301973A (en) 1992-11-20 1994-06-16 Samsung Electronics Co Ltd Exposure system for a projection exposure apparatus.
KR100234357B1 (en) 1992-11-21 1999-12-15 윤종용 Enlightening apparatus
US5463200A (en) 1993-02-11 1995-10-31 Lumonics Inc. Marking of a workpiece by light energy
DE69418131D1 (en) 1993-03-01 1999-06-02 Gen Signal Corp DEVICE FOR GENERATING AN ADJUSTABLE RING-SHAPED LIGHTING FOR A PHOTOLITHOGRAPHIC PROJECTION APPARATUS
US5412200A (en) 1993-03-01 1995-05-02 Rhoads; Geoffrey B. Wide field distortion-compensating imaging system and methods
IL109589A0 (en) 1993-05-14 1994-08-26 Hughes Aircraft Co Apparatus and method for performing high spatial resolution thin film layer thickness metrology
JPH06337366A (en) 1993-05-21 1994-12-06 Xerox Corp Exposure device for raster output scanner in electrophotography printer
EP0679864A4 (en) 1993-09-30 1997-12-17 Komatsu Mfg Co Ltd Confocal optical apparatus.
US5436725A (en) 1993-10-12 1995-07-25 Hughes Aircraft Company Cofocal optical system for thickness measurements of patterned wafers
US5539567A (en) 1994-06-16 1996-07-23 Texas Instruments Incorporated Photolithographic technique and illuminator using real-time addressable phase shift light shift
US5866911A (en) 1994-07-15 1999-02-02 Baer; Stephen C. Method and apparatus for improving resolution in scanned optical system
FR2725558B1 (en) 1994-10-10 1996-10-31 Commissariat Energie Atomique METHOD FOR FORMING HOLES IN A PHOTOSENSITIVE RESIN LAYER APPLICATION TO THE MANUFACTURE OF MICROPOINT EMISSIVE CATHODE ELECTRON SOURCES AND FLAT DISPLAY SCREENS
JP3251150B2 (en) 1994-12-29 2002-01-28 日本板硝子株式会社 Flat microlens array and method of manufacturing the same
US5631721A (en) 1995-05-24 1997-05-20 Svg Lithography Systems, Inc. Hybrid illumination system for use in photolithography
DE19522936C2 (en) 1995-06-23 1999-01-07 Fraunhofer Ges Forschung Device for structuring a photolithographic layer
AU6601996A (en) 1995-07-31 1997-02-26 Lsi Logic Corporation Lithography systems employing programmable reticles
FR2737928B1 (en) 1995-08-17 1997-09-12 Commissariat Energie Atomique DEVICE FOR INSOLATING MICROMETRIC AND / OR SUBMICROMETRIC ZONES IN A PHOTOSENSITIVE LAYER AND METHOD FOR PRODUCING PATTERNS IN SUCH A LAYER
US5691541A (en) 1996-05-14 1997-11-25 The Regents Of The University Of California Maskless, reticle-free, lithography
DE19624276C2 (en) 1996-06-18 1999-07-08 Fraunhofer Ges Forschung Phase-modulating microstructures for highly integrated area light modulators
US5870176A (en) 1996-06-19 1999-02-09 Sandia Corporation Maskless lithography
GB9619839D0 (en) 1996-09-23 1996-11-06 Hugle Lithography Inc Photolithography masking arrangements
US6177980B1 (en) 1997-02-20 2001-01-23 Kenneth C. Johnson High-throughput, maskless lithography system
JPH10253883A (en) 1997-03-07 1998-09-25 Fuji Photo Optical Co Ltd Projecting lens
EP0881542A1 (en) 1997-05-26 1998-12-02 Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno Lithography system
SE9800665D0 (en) 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
US6248988B1 (en) 1998-05-05 2001-06-19 Kla-Tencor Corporation Conventional and confocal multi-spot scanning optical microscope
US6188519B1 (en) 1999-01-05 2001-02-13 Kenneth Carlisle Johnson Bigrating light valve
US6498685B1 (en) 1999-01-11 2002-12-24 Kenneth C. Johnson Maskless, microlens EUV lithography system
US6424404B1 (en) 1999-01-11 2002-07-23 Kenneth C. Johnson Multi-stage microlens array
US6392752B1 (en) 1999-06-14 2002-05-21 Kenneth Carlisle Johnson Phase-measuring microlens microscopy
US6333508B1 (en) 1999-10-07 2001-12-25 Lucent Technologies, Inc. Illumination system for electron beam lithography tool
DE60134922D1 (en) 2000-08-14 2008-09-04 Elith Llc Lithographic apparatus
WO2002091078A1 (en) * 2001-05-07 2002-11-14 Massachusetts Institute Of Technology Methods and apparatus employing an index matching medium
WO2003017317A1 (en) 2001-08-13 2003-02-27 Mapper Lithography Ip B.V. Lithography system comprising a protected converter plate

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997034171A2 (en) * 1996-02-28 1997-09-18 Johnson Kenneth C Microlens scanner for microlithography and wide-field confocal microscopy
US6002466A (en) * 1996-06-29 1999-12-14 Deutsches Zentrum Fuer Luft -Und Raumfahrt E.V. Lithography exposure device
US5900637A (en) * 1997-05-30 1999-05-04 Massachusetts Institute Of Technology Maskless lithography using a multiplexed array of fresnel zone plates
US6379867B1 (en) * 2000-01-10 2002-04-30 Ball Semiconductor, Inc. Moving exposure system and method for maskless lithography system

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