WO2003054630A3 - Device and method for modifying the surface of a workpiece using photonic radiation - Google Patents

Device and method for modifying the surface of a workpiece using photonic radiation Download PDF

Info

Publication number
WO2003054630A3
WO2003054630A3 PCT/AT2002/000354 AT0200354W WO03054630A3 WO 2003054630 A3 WO2003054630 A3 WO 2003054630A3 AT 0200354 W AT0200354 W AT 0200354W WO 03054630 A3 WO03054630 A3 WO 03054630A3
Authority
WO
WIPO (PCT)
Prior art keywords
radiation
workpiece
modifying
photonic radiation
lens elements
Prior art date
Application number
PCT/AT2002/000354
Other languages
German (de)
French (fr)
Other versions
WO2003054630A8 (en
WO2003054630A2 (en
Inventor
Dieter Baeuerle
Klaus Piglmayer
Original Assignee
Dieter Baeuerle
Innovationsagentur Gmbh
Klaus Piglmayer
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dieter Baeuerle, Innovationsagentur Gmbh, Klaus Piglmayer filed Critical Dieter Baeuerle
Priority to AU2002361370A priority Critical patent/AU2002361370A1/en
Publication of WO2003054630A2 publication Critical patent/WO2003054630A2/en
Publication of WO2003054630A3 publication Critical patent/WO2003054630A3/en
Publication of WO2003054630A8 publication Critical patent/WO2003054630A8/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
    • B23K26/0608—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams in the same heat affected zone [HAZ]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/067—Dividing the beam into multiple beams, e.g. multifocusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source

Abstract

The invention relates to a device and a method for modifying the surface (1') of a workpiece using photonic radiation (2), especially laser radiation. Said device comprises a radiation source (3) and a mask device, said mask device being configured by a support (7), permeable to the radiation (2), to whose side facing the workpiece (1) individual lens elements (9) are adhered and the radiation (2) is bundled into partial beams (10) by the individual lens elements (9).
PCT/AT2002/000354 2001-12-21 2002-12-18 Device and method for modifying the surface of a workpiece using photonic radiation WO2003054630A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2002361370A AU2002361370A1 (en) 2001-12-21 2002-12-18 Device and method for modifying the surface of a workpiece using photonic radiation

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
AT0201901A AT411755B (en) 2001-12-21 2001-12-21 DEVICE AND METHOD FOR MODIFYING A WORKPIECE SURFACE WITH THE AID OF PHOTON RADIATION
ATA2019/2001 2001-12-21

Publications (3)

Publication Number Publication Date
WO2003054630A2 WO2003054630A2 (en) 2003-07-03
WO2003054630A3 true WO2003054630A3 (en) 2003-11-06
WO2003054630A8 WO2003054630A8 (en) 2004-01-15

Family

ID=3689631

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/AT2002/000354 WO2003054630A2 (en) 2001-12-21 2002-12-18 Device and method for modifying the surface of a workpiece using photonic radiation

Country Status (3)

Country Link
AT (1) AT411755B (en)
AU (1) AU2002361370A1 (en)
WO (1) WO2003054630A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2731126A1 (en) 2012-11-09 2014-05-14 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Method for bonding bare chip dies
FR3014177B1 (en) * 2013-12-04 2019-05-17 Commissariat A L'energie Atomique Et Aux Energies Alternatives SURFACE STRUCTURE FOR THERMAL SOLAR ABSORBERS AND METHOD FOR PRODUCING THE SAME.

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5723264A (en) * 1996-03-14 1998-03-03 Eastman Kodak Company Pattern transfer techniques for fabrication of lenslet arrays using specialized polyesters
JP2000180605A (en) * 1998-12-17 2000-06-30 Nippon Telegr & Teleph Corp <Ntt> Manufacture of refracting micro-lens and its device
US6107011A (en) * 1999-01-06 2000-08-22 Creo Srl Method of high resolution optical scanning utilizing primary and secondary masks
US6133986A (en) * 1996-02-28 2000-10-17 Johnson; Kenneth C. Microlens scanner for microlithography and wide-field confocal microscopy

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3321194B2 (en) * 1992-02-10 2002-09-03 株式会社クラレ Photo mask

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6133986A (en) * 1996-02-28 2000-10-17 Johnson; Kenneth C. Microlens scanner for microlithography and wide-field confocal microscopy
US5723264A (en) * 1996-03-14 1998-03-03 Eastman Kodak Company Pattern transfer techniques for fabrication of lenslet arrays using specialized polyesters
JP2000180605A (en) * 1998-12-17 2000-06-30 Nippon Telegr & Teleph Corp <Ntt> Manufacture of refracting micro-lens and its device
US6107011A (en) * 1999-01-06 2000-08-22 Creo Srl Method of high resolution optical scanning utilizing primary and secondary masks

Non-Patent Citations (5)

* Cited by examiner, † Cited by third party
Title
"ULTRA-RESOLUTION IMAGE TRANSFER", IBM TECHNICAL DISCLOSURE BULLETIN, IBM CORP. NEW YORK, US, vol. 34, no. 10A, 1 March 1992 (1992-03-01), pages 158 - 162, XP000302260, ISSN: 0018-8689 *
FOGARASSY E ET AL: "LASER-INDUCED FORWARD TRANSFER OF HIGH-TC YBACUO AND BISRCACUO SUPERCONDUCTING THIN FILMS", JOURNAL OF APPLIED PHYSICS, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, vol. 66, no. 1, 1 July 1989 (1989-07-01), pages 457 - 459, XP000030332, ISSN: 0021-8979 *
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 09 13 October 2000 (2000-10-13) *
VOLCKAERTS B ET AL: "Deep lithography with protons: a generic technology for the fabrication of refractive micro-optical modules", PAGE(S) 103-104, XP010518558 *
VOLKEL R ET AL: "Microlens Lithography and Smart Masks", MICROELECTRONIC ENGINEERING, ELSEVIER PUBLISHERS BV., AMSTERDAM, NL, vol. 35, no. 1, 1 February 1997 (1997-02-01), pages 513 - 516, XP004054112, ISSN: 0167-9317 *

Also Published As

Publication number Publication date
WO2003054630A8 (en) 2004-01-15
WO2003054630A2 (en) 2003-07-03
AU2002361370A8 (en) 2003-07-09
AU2002361370A1 (en) 2003-07-09
AT411755B (en) 2004-05-25
ATA20192001A (en) 2003-10-15

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