WO2003070846A3 - Drying resist with a solvent bath and supercritical co2 - Google Patents
Drying resist with a solvent bath and supercritical co2 Download PDFInfo
- Publication number
- WO2003070846A3 WO2003070846A3 PCT/US2003/004698 US0304698W WO03070846A3 WO 2003070846 A3 WO2003070846 A3 WO 2003070846A3 US 0304698 W US0304698 W US 0304698W WO 03070846 A3 WO03070846 A3 WO 03070846A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- solvent bath
- supercritical
- drying
- solvent
- rinse liquid
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/11—Treatments for avoiding stiction of elastic or moving parts of MEMS
- B81C2201/117—Using supercritical fluid, e.g. carbon dioxide, for removing sacrificial layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP03713498A EP1474723A2 (en) | 2002-02-15 | 2003-02-14 | DRYING RESIST WITH A SOLVENT BATH AND SUPERCRITICAL CO sb 2 /sb |
AU2003217547A AU2003217547A1 (en) | 2002-02-15 | 2003-02-14 | Drying resist with a solvent bath and supercritical co2 |
JP2003569749A JP2006508521A (en) | 2002-02-15 | 2003-02-14 | Drying of resist using solvent bath and supercritical CO2 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US35775602P | 2002-02-15 | 2002-02-15 | |
US60/357,756 | 2002-02-15 | ||
US35862202P | 2002-02-20 | 2002-02-20 | |
US60/358,622 | 2002-02-20 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2003070846A2 WO2003070846A2 (en) | 2003-08-28 |
WO2003070846A3 true WO2003070846A3 (en) | 2003-11-27 |
Family
ID=27760472
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2003/004698 WO2003070846A2 (en) | 2002-02-15 | 2003-02-14 | Drying resist with a solvent bath and supercritical co2 |
Country Status (5)
Country | Link |
---|---|
US (1) | US6928746B2 (en) |
EP (1) | EP1474723A2 (en) |
JP (1) | JP2006508521A (en) |
AU (1) | AU2003217547A1 (en) |
WO (1) | WO2003070846A2 (en) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030183251A1 (en) * | 2001-04-24 | 2003-10-02 | Kabushiski Kaisha Kobe Seiko Sho | Process for drying an object having microstructure and the object obtained by the same |
US7011716B2 (en) * | 2003-04-29 | 2006-03-14 | Advanced Technology Materials, Inc. | Compositions and methods for drying patterned wafers during manufacture of integrated circuitry products |
JP2004233954A (en) * | 2002-12-02 | 2004-08-19 | Tokyo Ohka Kogyo Co Ltd | Resist pattern forming method and resist pattern |
US7049053B2 (en) * | 2003-06-11 | 2006-05-23 | Intel Corporation | Supercritical carbon dioxide to reduce line edge roughness |
KR20060017414A (en) * | 2004-08-20 | 2006-02-23 | 삼성에스디아이 주식회사 | Fabrication method of organic electroluminescence display device |
KR20060020044A (en) * | 2004-08-30 | 2006-03-06 | 삼성에스디아이 주식회사 | The fabricating method of oled and the fabricating method of donor device |
US7008853B1 (en) * | 2005-02-25 | 2006-03-07 | Infineon Technologies, Ag | Method and system for fabricating free-standing nanostructures |
JP4237184B2 (en) * | 2005-03-31 | 2009-03-11 | エルピーダメモリ株式会社 | Manufacturing method of semiconductor device |
US7789971B2 (en) | 2005-05-13 | 2010-09-07 | Tokyo Electron Limited | Treatment of substrate using functionalizing agent in supercritical carbon dioxide |
DE102008048540A1 (en) * | 2008-09-15 | 2010-04-15 | Gebr. Schmid Gmbh & Co. | Process for the treatment of substrates, substrate and treatment device for carrying out the method |
JP5426439B2 (en) * | 2010-03-15 | 2014-02-26 | 株式会社東芝 | Supercritical drying method and supercritical drying apparatus |
JP5477131B2 (en) * | 2010-04-08 | 2014-04-23 | 東京エレクトロン株式会社 | Substrate processing equipment |
JP5620234B2 (en) * | 2010-11-15 | 2014-11-05 | 株式会社東芝 | Supercritical drying method and substrate processing apparatus for semiconductor substrate |
DE102014100005A1 (en) | 2013-05-29 | 2014-12-04 | Amo Gmbh | Coating of resist on a substrate for ultra-high resolution lithography |
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-
2003
- 2003-02-14 JP JP2003569749A patent/JP2006508521A/en active Pending
- 2003-02-14 US US10/367,080 patent/US6928746B2/en not_active Expired - Fee Related
- 2003-02-14 WO PCT/US2003/004698 patent/WO2003070846A2/en active Search and Examination
- 2003-02-14 EP EP03713498A patent/EP1474723A2/en not_active Withdrawn
- 2003-02-14 AU AU2003217547A patent/AU2003217547A1/en not_active Abandoned
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6358673B1 (en) * | 1998-09-09 | 2002-03-19 | Nippon Telegraph And Telephone Corporation | Pattern formation method and apparatus |
US6562146B1 (en) * | 2001-02-15 | 2003-05-13 | Micell Technologies, Inc. | Processes for cleaning and drying microelectronic structures using liquid or supercritical carbon dioxide |
Also Published As
Publication number | Publication date |
---|---|
AU2003217547A1 (en) | 2003-09-09 |
EP1474723A2 (en) | 2004-11-10 |
US20040035021A1 (en) | 2004-02-26 |
AU2003217547A8 (en) | 2003-09-09 |
JP2006508521A (en) | 2006-03-09 |
WO2003070846A2 (en) | 2003-08-28 |
US6928746B2 (en) | 2005-08-16 |
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