WO2003080516A1 - Tungstate compound and method for production thereof - Google Patents

Tungstate compound and method for production thereof Download PDF

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Publication number
WO2003080516A1
WO2003080516A1 PCT/JP2003/003424 JP0303424W WO03080516A1 WO 2003080516 A1 WO2003080516 A1 WO 2003080516A1 JP 0303424 W JP0303424 W JP 0303424W WO 03080516 A1 WO03080516 A1 WO 03080516A1
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Prior art keywords
oxide
zirconium
compound
solution
tungsten oxide
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PCT/JP2003/003424
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French (fr)
Japanese (ja)
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Kiyotaka Dohke
Tamayoshi Yoshioka
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Asahi Kasei Kabushiki Kaisha
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Priority to JP2003578283A priority Critical patent/JPWO2003080516A1/en
Priority to AU2003221446A priority patent/AU2003221446A1/en
Publication of WO2003080516A1 publication Critical patent/WO2003080516A1/en

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    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G41/00Compounds of tungsten
    • C01G41/006Compounds containing, besides tungsten, two or more other elements, with the exception of oxygen or hydrogen
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G41/00Compounds of tungsten
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/60Optical properties, e.g. expressed in CIELAB-values
    • C01P2006/62L* (lightness axis)
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/60Optical properties, e.g. expressed in CIELAB-values
    • C01P2006/63Optical properties, e.g. expressed in CIELAB-values a* (red-green axis)
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/60Optical properties, e.g. expressed in CIELAB-values
    • C01P2006/64Optical properties, e.g. expressed in CIELAB-values b* (yellow-blue axis)
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/60Optical properties, e.g. expressed in CIELAB-values
    • C01P2006/65Chroma (C*)
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/60Optical properties, e.g. expressed in CIELAB-values
    • C01P2006/66Hue (H*)
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/80Compositional purity

Definitions

  • the present invention relates to a method for producing a powder having a negative coefficient of thermal expansion and having various uses for controlling thermal expansion of a substance, and more particularly to a powder having higher purity by removing impurities from the powder.
  • the present invention relates to a method for producing a powder which can easily obtain a powder.
  • the invention more particularly, formula (A - Z D Z) ( W 1 _ X R X) 2 0 8 (A is Z r or H f or a mixture thereof, D is a solid zirconium oxide or acid Ihihafuniumu Soluble elements, Z is less than the maximum solid solution atomic ratio limited by the type of each element, R is solid solution in tungsten oxide
  • X is a value less than the maximum solid solution atom ratio limited by the type of each element. This method is hereinafter referred to as zirconium tungstate).
  • Zirconium tungstate or the like is a heat-shrinkable oxide, and by utilizing its negative thermal expansion characteristics, as described in JP-A-10-96827, as a member for suppressing other thermal expansion in contact with it. Applied to electronic parts materials, optical parts materials, precision machine parts materials.
  • zirconium oxide or oxidized hafnium or a mixture thereof (hereinafter referred to as acid) Dry zirconium) and tantalum oxide are mixed, squeezed, and calcined, and then quenched.
  • dry zirconium and tantalum oxide are mixed, squeezed, and calcined, and then quenched.
  • raw material powders are mixed at a stoichiometric ratio and synthesized. Since it is volatilized at a temperature of C or higher, the stoichiometric ratio is easily lost, and zirconium oxide and the like are likely to remain as impurities.
  • Zirconium tandastate has a purity of more than 90% for use in the above applications as having a negative thermal expansion property.
  • Both methods are metastable by rapidly cooling a compound such as zirconium tungstate that is stably present at a temperature of 1,105 to 1,257 ° C to synthesize zirconium tungstate. It includes the step of recovering as a substance. In other words, a quenching step is essential for recovering zirconium tungstate at room temperature.
  • Japanese Patent Application Laid-Open No. 2002-265652 describes a method in which a press-formed body heated to a high temperature by sintering is rapidly taken out into an atmosphere outside a furnace near room temperature and naturally cooled.
  • a method of forcibly cooling by spraying a non-reactive gas a method of directly or separately adding a fired body into a large amount of a non-reactive liquid, a non-reactive cooling gas such as spraying from a cylinder such as nitrogen, etc.
  • a method for forcibly cooling a fired body with a non-reactive liquefied gas is disclosed.
  • tungsten oxide dissolves in a trace amount of water, and its diffusion occurs over time, causing problems such as coloring.
  • tungsten oxide has both electrical conductivity and ion conductivity, and also has a problem of absorbing electrons, which may adversely affect electronic parts and materials.
  • Tungsten oxide is yellow-green, and if it is contained even in trace amounts, zirconium tungstate and the like tend to be colored, so zirconium tungstate is used to control the temperature sensitivity of Bragg gratings
  • zirconium tungstate is used to control the temperature sensitivity of Bragg gratings
  • the diffusion of tungsten oxide would adversely affect light transmission.
  • an industrial method for obtaining high-purity (particularly, close to 100% high-purity) zirconium tungstate or the like from zirconium tungstate containing impurities after the firing and quenching steps has been established.
  • an object of the present invention is to provide a method for easily producing high-purity zirconium tungstate or the like, and in particular, to provide a method for producing zirconium tungstate or the like having a low content of a simple tungsten oxide. That is.
  • the above object is achieved by treating zirconium tungstate or the like containing an unreacted substance or a decomposed substance with an alkali solution, and the content of high purity, particularly the tungsten oxide of the problem, is low.
  • a method for producing zirconium acid or the like is provided. That is, aspects of the present invention are as follows.
  • the molar ratio of zirconium and / or Z or hafnium in the zirconium compound, hafnium compound or a mixture thereof to tungsten in the tandastene compound is 0.25 or more and less than 0.5.
  • step (ii) includes performing an alkali solution treatment using an ammonia solution.
  • step (iii) includes treating with an alkaline solution using an ammonium solution.
  • step (iii) comprises treating with an alkaline solution having a pH of 11.0 to 13.5.
  • A is Z r or H f or a mixture thereof
  • D is capable of solid solution in the acid zirconium or acid Ihihafuniumu element
  • Z is 0 or 0.2 following values
  • R is an element capable of forming a solid solution in tungsten oxide
  • X is a value of 0 to 0.25
  • the zirconium tungstate or the like in the present invention the composition formula (Ai- Z D Z) (! _XR x) 2 ° 8 (A is Z r or H f or a mixture thereof, D is Sani ⁇ zirconate Elements that can form a solid solution in dium or hafnium oxide; Z is a value less than the maximum solid solution atomic ratio defined by the type of each element; R is an element that can form a solid solution in tungsten oxide; is limited by the type of each element Value less than or equal to the maximum solid solution atomic ratio. ).
  • the A-containing compound (zirconium compound or hafnium compound or a mixture thereof) and the tungsten compound used in the production method of the present invention are typically zirconium oxide, hafnium oxide or a mixture thereof, and tungsten oxide. Or a salt of zirconium oxide or the like or zirconium nitrate or the like with tungstic acid.
  • zirconium oxide, hafnium oxide or a mixture thereof, and tungsten oxide used in the dry method will be described.
  • the compounds of D and R include oxides, hydroxides, chlorides, nitrides, carbides, and oxyacid salts such as nitrates and carbonates.
  • D is an element capable of forming a solid solution with zirconium oxide or ichhafnium oxide, and examples thereof include an alkaline earth metal such as Ca and a rare earth metal such as Y.
  • Z is specifically 0.2 or less, and is typically from 0 to 0.1.
  • R is an element capable of forming a solid solution in tungsten oxide, and examples thereof include elements of Group I1 or Group I or Group IA.
  • X is specifically 0.25 or less, typically 0-0.2.
  • Zirconium tungstate (Z rW 2 ⁇ 8) and hafnium tungstate (Hf W 2 O s) are both acid I arsenide having a negative thermal expansion coefficient, in the manufacture how the present invention, can be applied to both of It is.
  • the raw material powders zirconium oxide and hafnium oxide are
  • zircon-ZrSi0 4 usually called baddeleyite (Baddeleyite'Zr0 2):! Zirconium ore containing ⁇ 2% hafnium (zirconium oxide and hafnium oxide Ore mixture).
  • zirconium oxide When zirconium oxide is used for nuclear applications, and except that it is refined as metal zirconium or metal hafnium, it is generally used as a raw material named “zirconium oxide” without being separated from zirconia and hafnium oxide. Sold as' used. The mixture obtained as a raw material in the production method of the present invention without separation is used, or zirconium oxide and hafnium oxide are added in desired amounts according to the purpose (or with only one of them). ) Can be used.
  • the method for producing zirconium tandastate or the like of the present invention includes the steps of mixing oxidized zirconium and the like with tungsten oxide, pressing (if necessary), calcining, and quenching.
  • the tungsten oxide which is an unreacted substance or a decomposition product, is dissolved and removed by subjecting the sintered body of the present invention to a solution treatment. It can also be applied to the removal of unreacted or acid tungsten contained as a decomposition product in zirconium tandastate manufactured through any known mixing method such as a dry method and a wet method described in It is a thing.
  • the molar ratio of zirconium oxide to tungsten oxide in the mixing step is preferably from 0.25 to 0.5.
  • any of the well-known methods can also be used for each of the above-described pressing, firing, and quenching steps.
  • Tungsten oxide contained in zirconium tungstate or the like can be selectively separated alone by dissolving it in an alkaline solution without affecting other components, for example, without simultaneously dissolving zirconium tungstate. Therefore, in order not to leave zirconium oxide etc. alone as much as possible, the molar ratio of zirconium oxide etc. to tungsten oxide is made lower than 0.5, and the residual tungsten oxide is treated with aluminum. High purity of zirconium tungstate can be achieved.
  • the molar ratio of zirconium oxide to tungsten oxide is more preferably 0.25 to 0.499, more preferably 0.35 to 0.495, and-. Or 0.45 to 0.492.
  • the "solution treatment” refers to immersing zirconium tungstate or the like (whether manufactured by a dry method or a method manufactured by a wet method) in the solution.
  • the hydrogen ion concentration (pH) of the alkaline solution for the alkaline solution treatment is preferably in the range of 11.0 to 13.5. If the pH is less than 11.0, it takes time to dissolve the tungsten oxide, and if the pH exceeds 13.5, zirconia tungstate also dissolves, and the yield may decrease. is there.
  • the pH is about 14.0 at 5 wt%, the pH is about 13.9 at 2.5 wt%, 0 In the case of 16 wt%, the pH is about 12.7, in the case of aqueous ammonia, the pH is about 14.5 in the case of 25 wt%, in the case of 1 wt% the pH is about 13.0, in the case of 5 ⁇ 7% H is about 12.5.
  • an alkaline aqueous solution such as an alkaline metal hydroxide or an alkaline earth metal, or an ammonia solution such as an ammonium hydroxide is used.
  • an aqueous ammonia solution that does not leave ions such as alkali metals after washing and is easy to remove is preferable.
  • a relatively weak basic aqueous ammonia solution is preferable. It is possible to obtain zirconium tungstate or the like having a purity of nearly 100% by the treatment with the aqueous ammonium solution.
  • the allowable content of oxidized tungsten contained as an impurity in an oxide such as zirconium tungstate varies depending on the application to be applied, but is determined by converting the amount of tungsten eluted into the aluminum oxide. It is preferable that the content of tungsten oxide as the calculated value is not more than 10% by weight of the whole. This amount is 5% by weight or less is more preferable. It is more preferably at most 1% by weight, more preferably at most 0.5% by weight.
  • the peak ratio on the chart to zirconium tungstate such as zirconium oxide before treatment was 1%. It was 0.4 after the treatment, and it was found that zirconium oxide and the like were removed as secondary (with removal of tungsten oxide). This is very convenient for removing impurities by decomposition during quenching.
  • the mechanism of the secondary removal of zirconium oxide and the like is as follows. When tungsten oxide is eluted from the solid matter of the decomposed zirconium oxide and the like and the titanium oxide, on the other hand, fine powder zirconium oxide and the like are generated. It was presumed that it would be easily removed by filtration or the like.
  • Alrikuri solution processing is better in the form of powder in terms of efficiency! / ,.
  • the grinding after the quenching step can be sufficiently performed by reducing the average particle size to 1 mm or less. More preferably, the average particle size is 100 microns or less. More preferably, the average particle size is 50 microns or less. More preferably, it is 10 microns or less. It is preferable to reduce the particle size in order to shorten the dissolution time of tungsten oxide from the powder.
  • the heating temperature is preferably higher, but is preferably in the range from 70 ° C to the boiling temperature of the alkali solution. More preferably, the temperature is preferably from 80 to: L 00 ° C in order to shorten the processing time.
  • Tungsten oxide can be treated in an alkaline solution at a concentration of about 1% by weight.
  • the amount of the alkaline solution depends on the concentration, it is preferably larger than the degree of completely immersing the powder, and the mass ratio of the alkaline solution to the powder is preferably 2 to 20 and more preferably 5 to 1 It is 0.
  • the remaining alkaline solution can be reused.
  • a general method for synthesizing zirconium tungstate or the like is as follows: 1, 105-1, In this method, calcined compounds that are stably present at a temperature of 257 ° C are dropped in water or quenched by liquid nitrogen or the like, and are recovered as metastable substances. Therefore, when a compact is used, it is important from the viewpoint of removing impurities that the metastable substance, such as zirconium tungstate, is not decomposed. It is preferred to reduce the dimensions to 10 mm or less, more preferably 5 mm or less, more preferably 2 mm or less.
  • the amount of tungsten oxide is ideally completely zero, but is preferably 1% by weight or less. It is more preferably at most 0.5% by weight, more preferably at most 0.2% by weight.
  • the content of tungsten oxide such as zirconium tungstate is calculated from the tungsten extracted by alkali from the comminuted compound.
  • An example of the analysis is described below step by step.
  • Tungsten oxide which is an impurity, has a yellow-green color, and the other components, zirconium tungstate and zirconium oxide, are white. For this reason, the amount of tungsten oxide can be evaluated by measuring the color of the product.
  • Known methods can be used for color measurement, such as XYZ color system display, L * a * b * color system display, L * C * h color system display, The color measurement can be performed using the uncertainty color system display and the L * u * V * display. (For example, coloring materials, Vol. 69, No. 8, pp. 539-550, or
  • the chromaticity of the oxide powder of the present invention, in the L * a * b * color system display preferably a is 1.1 or more, 0 or less, and b is 0 or more, 2.5 or less, more preferably Is that a is -0.75 or more, 0 or less and b is 0 or more, 2.00 or less, and more preferably a mosquito, -0.5 or more, 0 or less and b is 0 or more, 1.5 or less, Most preferably, a can be represented by -0.3 or more and 0 or less, and b is 0 or more and 0.75 or less.
  • tungsten oxide is manufactured by Wako Pure Chemical Co., Ltd.
  • the oxide of the present invention when coloring the oxide of the present invention with a color such as light pink or blue, it is necessary that the oxide be white or transparent because the color of the tungsten oxide affects the oxide. In addition, when used for applications that transmit or reflect light, it is desirable that the material be whiter or more transparent.
  • the fired body was colored yellow-green.
  • the fired body is pulverized with a ball mill to obtain an average particle size of 3 ⁇ m, 10 g is weighed, immersed in 50 g of a 10% aqueous ammonia solution, heated to 80 ° C, immersed for 2 hours, and then buried in a Buchnarort. A 5 C filter paper was placed in the filter, filtered, washed 8 times using distilled water, and dried in the air at 99 ° C.
  • the powder after washing and drying was white.
  • the zirconium tungstate containing / o and zirconium tungstate powder having a purity of 99.8% obtained by the same method as in Example 1 were mixed so as to have an average particle diameter l O jum. Pulverize with a ball mill, immerse 50 g as a sample in 100 g of water each, and perform 50 temperature cycles of holding for 1 hour at each temperature of 20 ° C and 50 ° C as a temperature load added.
  • ICP-AES inductively coupled plasma emission spectrometer
  • a method for easily and industrially producing high-purity, particularly low content of a single element of tungsten oxide, such as zirconium tandate is provided, so that problems such as coloring can be avoided, and It is applied to electronic component materials, optical component materials, and precision mechanical component materials by utilizing its negative thermal expansion characteristics without adversely affecting other electronic components.
  • problems such as coloring
  • it can be used without adversely affecting light transmission.
  • a weakly basic solution is used as the alkali solution in the alkali solution treatment of the present method, the safety when the present method is used industrially is enhanced.

Abstract

A method for producing a oxide (A 1-Z DZ)(W1-XRX)2O8 wherein A is Zr or Hf or a mixture thereof, D is an element capable of forming a solid solution with a zirconium oxide or a hafnium oxide, Z is a number of 0 to 0.2, R is an element capable of forming a solid solution with a tungsten oxide, and X is a number of 0 to 0.25, which comprises mixing a composition comprising a zirconium compound or hafnium compound or a mixture thereof and a tungsten compound, firing the resultant mixture, followed by quenching, and then treating the resultant product with an alkaline solution. The method can be used for producing a powder of zirconium tungstate or the like which has enhanced purity, in particular, is suppressed in the content of simple tungsten oxide.

Description

酸化合物及びその製造方法 技術分野  Acid compound and method for producing the same
本発明は、 負の熱膨張係数を有し、 物質の温度膨張制御等のために様々な用途 を有する粉体の製造方法に関し、 特に前記粉体の不純物を除去しより高純度の前 記粉末を容易に得る粉体の製造方明法に関する。 本発明は、 更に詳しくは、 組成式 (A — ZDZ) (W1_XRX) 208 (Aは Z r又は H f 又はそれらの混合物、 Dは酸化ジルコニウム又は酸ィヒハフニウムに固溶し得る元素、 Zは各元素の種類 によって限定される最大固溶原子割合以下の値、 Rは酸化タングステンに固溶し 書 The present invention relates to a method for producing a powder having a negative coefficient of thermal expansion and having various uses for controlling thermal expansion of a substance, and more particularly to a powder having higher purity by removing impurities from the powder. The present invention relates to a method for producing a powder which can easily obtain a powder. The invention, more particularly, formula (A - Z D Z) ( W 1 _ X R X) 2 0 8 (A is Z r or H f or a mixture thereof, D is a solid zirconium oxide or acid Ihihafuniumu Soluble elements, Z is less than the maximum solid solution atomic ratio limited by the type of each element, R is solid solution in tungsten oxide
得る元素、 Xは各元素の種類によって限定される最大固溶原子割合以下の値。 以 下タングステン酸ジルコニウム等と呼ぶ) で表される粉体の製造方法に関するも のである。 The element to be obtained, X is a value less than the maximum solid solution atom ratio limited by the type of each element. This method is hereinafter referred to as zirconium tungstate).
背景技術 Background art
タングステン酸ジルコニウム等は熱収縮性酸ィ匕物であり、 その負の熱膨張特性 を利用して、 特開平 10— 96827号公報に記載されるように、 それと接する 他の熱膨張を押さえる部材として、 電子部品材料、 光学部品材料、 精密機械部品 材料に適用される。  Zirconium tungstate or the like is a heat-shrinkable oxide, and by utilizing its negative thermal expansion characteristics, as described in JP-A-10-96827, as a member for suppressing other thermal expansion in contact with it. Applied to electronic parts materials, optical parts materials, precision machine parts materials.
タングステン酸ジルコニウム等の製造方法としては、 特開 2002— 1048 77号公報、 特開 2002— 265274号公報または、 S o l i d  As a method for producing zirconium tungstate or the like, JP-A-2002-104877, JP-A-2002-265274, or Solid
S t a t e C o mm un i c a t i o n s ( (2000年発行) 第 1 14卷、 第 453— 455頁) に記載されているように、 酸化ジルコニウム又は酸ィ匕ハフ ニゥム又はその混合体 (以下これらを酸ィ匕ジルコニウム等という) と酸化タンダ ステンを混合、 圧搾、 焼成により合成し、 その後急冷する乾式方法がある。 乾式 方法においては、 原料粉末を化学量論比で混合し合成するが、 原料粉末のうち、 酸化タングステンが 800。C以上の温度で揮発するため、 化学量論比が崩れ易く、 酸化ジルコ二ゥム等が不純物として残り易い。 タンダステン酸ジルコニゥム等は、 負の熱膨張特性を持つものとして上記用途で使用するために、 90%以上の純度 が要求されるものであるから、 このような不純物の存在は出来るだけ排除される べきである。 従って、 上記特開平 1 0— 9 6 8 2 7号公報においては酸化タング ステンが昇華しないよう白金箔で包むまたは羞をすることで前記酸化タンダステ ンの揮発を防止している。 また、 特開 2 0 0 2— 2 6 5 2 7 4号公報においては 原料粉末の粒径を規定し、 且つ成形に際し成形体の大きさ及び成型圧力を一定の 範囲に規定することにより、 前記酸ィヒタングステンの揮発を防止し、 生成物中の タングステン酸ジルコニウム等以外の不純物の生成を制御しょうとしている。 また、 米国特許第 5, 5 1 4, 3 6 0号明細書に記載されるように、 ォキシハ 口ゲン化ジルコニゥム等又は硝酸ジルコニル等とタンダステン酸の溶液を用レ、、 塩を生成させ、 それを乾燥後、 焼成により合成し、 急冷する湿式方法が提案され ている。 As described in State Communications (2000, Vol. 114, pp. 453-455), zirconium oxide or oxidized hafnium or a mixture thereof (hereinafter referred to as acid) Dry zirconium) and tantalum oxide are mixed, squeezed, and calcined, and then quenched. In the dry method, raw material powders are mixed at a stoichiometric ratio and synthesized. Since it is volatilized at a temperature of C or higher, the stoichiometric ratio is easily lost, and zirconium oxide and the like are likely to remain as impurities. Zirconium tandastate has a purity of more than 90% for use in the above applications as having a negative thermal expansion property. Therefore, the presence of such impurities should be eliminated as much as possible. Therefore, in the above-mentioned Japanese Patent Application Laid-Open No. 10-96887, the volatilization of the tundasten oxide is prevented by wrapping or shaking it with platinum foil so that the tungsten oxide does not sublime. Further, in Japanese Patent Application Laid-Open No. 2002-2657024, the particle size of the raw material powder is defined, and the size and the molding pressure of the molded body are defined within a certain range during molding. It is trying to prevent volatilization of tungsten oxide and control the generation of impurities other than zirconium tungstate in the product. As described in US Pat. No. 5,514,360, a solution of zirconium oxide or zirconyl nitrate or the like and tandastanoic acid is used to form a salt. A wet method has been proposed, in which syrups are dried, synthesized by firing, and quenched.
何れの方法も、 タングステン酸ジルコニウム等を合成するために、 1, 1 0 5 〜 1, 2 5 7 °Cの温度で安定的に存在するタングステン酸ジルコニウム等の化合 物を急冷することによって準安定物質として回収する工程を含んでいる。 換言す れば、 タングステン酸ジルコニウム等を常温で回収するには急冷工程が必須であ る。  Both methods are metastable by rapidly cooling a compound such as zirconium tungstate that is stably present at a temperature of 1,105 to 1,257 ° C to synthesize zirconium tungstate. It includes the step of recovering as a substance. In other words, a quenching step is essential for recovering zirconium tungstate at room temperature.
急冷工程に関して、 特開 2 0 0 2— 2 6 5 2 7 4号公報において、 焼成により 高温となった加圧成形体を常温に近い炉外の雰囲気中に急速に取り出して自然冷 却させる方法、 非反応性の気体を吹きかけて強制冷却する方法、 多量の非反応性 の液体中に焼成体をそのまま又は分割し投入する方法、 非反応性冷却ガス例えば 窒素等ボンベより噴霧する等の冷却ガス、 又は非反応性液化ガスで焼成体を強制 冷却する方法が開示されている。  Regarding the quenching step, Japanese Patent Application Laid-Open No. 2002-265652 describes a method in which a press-formed body heated to a high temperature by sintering is rapidly taken out into an atmosphere outside a furnace near room temperature and naturally cooled. A method of forcibly cooling by spraying a non-reactive gas, a method of directly or separately adding a fired body into a large amount of a non-reactive liquid, a non-reactive cooling gas such as spraying from a cylinder such as nitrogen, etc. A method for forcibly cooling a fired body with a non-reactive liquefied gas is disclosed.
しかしながら、 タングステン酸ジルコニウム等を工業的に生産する場合、 これ らの急冷工程においても、 急冷時に完全に焼成体全体が急冷されず、 一部のタン ダステン酸ジルコニウム等が分解し、 得られた粉体中に不純物として混入すると いう問題があった。 この不純物は分解生成物である酸ィヒジルコニウム等及び酸化 タングステンであり、 これらの不純物とタングステン酸ジルコ二ゥム等は科学的 構造が類似しているため、 分離精製することは容易でなく、 ある程度以上の割合 で不純物を含んだ状態のものを利用せざるを得ない状態であった。 酸化タングステンは高温のアルカリ水溶液中に溶解することが知られている力 J o u r n a l o f C r y s t a l Gr owt h ( (2000年発行) 第 21 2号、 第 1 67—1 72頁) に開示されているように 5 %水酸ィ匕ナトリゥム 水溶液に対しては、 タングステン酸ジルコニウム等の溶解速度のほうが大きく、 分離が難しいことが知られている。 However, when zirconium tungstate or the like is industrially produced, even in these quenching steps, the entire fired body is not completely quenched during the quenching, and some of the zirconium tungstate is decomposed to obtain powder. There was a problem that impurities were mixed in the body. These impurities are the decomposition products, i.e., zirconium acid and tungsten oxide.Since these impurities and zirconium tungstate have similar scientific structures, it is not easy to separate and purify them. It was inevitable to use those containing impurities in a certain proportion or more. Tungsten oxide is known to dissolve in high-temperature alkaline aqueous solutions. As disclosed in Journalof Crystal Growth (2000), No. 212, pp. 167-172. In addition, it is known that the dissolution rate of zirconium tungstate or the like is higher in a 5% aqueous sodium hydroxide solution, and separation is difficult.
特に酸化タングステンは水分に微量に溶けるため、 経時に伴ってその拡散が発 生し、 着色等の問題を発生する。 同時に、 酸化タングステンは電気伝導性及びィ オン電導性を併せ持ち、 又は電子を吸収する等の問題もあって、 電子部品材等に 悪影響を及ぼすことが懸念されていた。 酸化タングステンは黄緑色であり、 それ が微量でも含まれるとタングステン酸ジルコニウム等の全体が着色される傾向が あるため、 タングステン酸ジルコニウム等がブラッググレーティングの温度感度 を制御することに用いられるような場合には、 酸ィ匕タングステンの拡散によって、 光の透過への悪影響等も懸念されるものであった。  In particular, tungsten oxide dissolves in a trace amount of water, and its diffusion occurs over time, causing problems such as coloring. At the same time, there has been a concern that tungsten oxide has both electrical conductivity and ion conductivity, and also has a problem of absorbing electrons, which may adversely affect electronic parts and materials. Tungsten oxide is yellow-green, and if it is contained even in trace amounts, zirconium tungstate and the like tend to be colored, so zirconium tungstate is used to control the temperature sensitivity of Bragg gratings There was also a concern that the diffusion of tungsten oxide would adversely affect light transmission.
こうして従来の技術において、 焼成及び急冷の工程を経た後の不純物を含んだ タングステン酸ジルコニウム等から高純度 (特に 100 %近い高純度) のタング ステン酸ジルコニウム等を得る工業的な方法は確立されていなかった。 従って、 本発明の目的は、 高純度のタングステン酸ジルコニウム等を簡便に製造する方法 を提供することであり、 特に単体の酸化タングステンの含有量が低い、 タングス テン酸ジルコニゥム等の製造方法を提供することである。  Thus, in the prior art, an industrial method for obtaining high-purity (particularly, close to 100% high-purity) zirconium tungstate or the like from zirconium tungstate containing impurities after the firing and quenching steps has been established. Did not. Accordingly, an object of the present invention is to provide a method for easily producing high-purity zirconium tungstate or the like, and in particular, to provide a method for producing zirconium tungstate or the like having a low content of a simple tungsten oxide. That is.
発明の開示 Disclosure of the invention
本発明によれば、 未反応物質又は分解物質を含むタングステン酸ジルコニウム 等をアルカリ溶液処理することによって、 上記目的を達成し、 高純度の、 特に問 題の酸化タングステンの含有量が低レ、タングステン酸ジルコニゥム等を製造する 方法が提供される。 すなわち、 本発明の態様は以下のとおりである。  According to the present invention, the above object is achieved by treating zirconium tungstate or the like containing an unreacted substance or a decomposed substance with an alkali solution, and the content of high purity, particularly the tungsten oxide of the problem, is low. A method for producing zirconium acid or the like is provided. That is, aspects of the present invention are as follows.
(1) 酸ィ匕物 ( — ZDZ) (Wi— XRX) 208 (Aは Z r又は H f 又はそれ らの混合物、 Dは酸化ジルコニウム又は酸化ハフニウムに固溶し得る元素、 Zは 0以上 0. 2以下の数値、 Rは酸化タングステンに固溶し得る元素、 Xは 0以上 0. 25以下の数値である) を製造する方法であって、 (1) Sani匕物 (- Z D Z) (Wi- X R X) 2 0 8 (A is Z r or H f or et mixtures, D is capable of solid solution in the zirconium oxide or hafnium oxide element , Z is a value of 0 or more and 0.2 or less, R is an element that can be dissolved in tungsten oxide, and X is a value of 0 or more and 0.25 or less).
( i ) ジルコニウム化合物又はハフニウム化合物又はそれらの混合物、 及びタン ダステン化合物を含む組成物を混合する工程、 (i) a zirconium compound or a hafnium compound or a mixture thereof, and tan Mixing a composition comprising a dasten compound,
(i i) 前記混合された組成物を焼成し、 続いて急冷する工程、  (ii) firing the mixed composition, followed by quenching;
(i i i) 前記急冷された組成物をアルカリ溶液処理する工程を含む、 上記製造 方法。  (iii) The above-mentioned production method, comprising a step of treating the quenched composition with an alkaline solution.
(2) 上記 (i) 工程において、 ジルコニウム化合物、 ハフニウム化合物又はそ れらの混合物中のジルコニゥム及ぴ Z又はハフニウムの、 タンダステン化合物中 のタングステンに対するモル比を 0. 25以上0. 5未満とする、 上記 (1) 項 に記載の製造方法。  (2) In the step (i), the molar ratio of zirconium and / or Z or hafnium in the zirconium compound, hafnium compound or a mixture thereof to tungsten in the tandastene compound is 0.25 or more and less than 0.5. The production method according to the above (1).
(3) Z = 0、 かつ X-0である、 上記 (1) 項又は (2) 項に記載の製造方法。  (3) The production method according to the above (1) or (2), wherein Z = 0 and X-0.
(4) 上記 (i i i) 工程において、 アンモニゥム溶液を用いてアルカリ溶液処 理することを含む、 上記 (1) 項又は (2) 項に記載の製造方法。  (4) The production method according to the above (1) or (2), wherein the step (ii) includes performing an alkali solution treatment using an ammonia solution.
(5) Z = 0、 かつ X=0であり、 上記 (i i i) 工程において、 アンモニゥム 溶液を用いてアルカリ溶液処理することを含む、 上記 (1) 項又は (2) 項に記 載の製造方法。  (5) The production method according to the above (1) or (2), wherein Z = 0 and X = 0, and the step (iii) includes treating with an alkaline solution using an ammonium solution. .
(6) 上記 (i i i) 工程において、 pHが 11. 0〜13. 5のアルカリ溶液 を用いてアルカリ溶液処理することを含む、 上記 (1) 項又は (2) 項に記載の 製造方法。  (6) The production method according to the above (1) or (2), wherein the step (iii) comprises treating with an alkaline solution having a pH of 11.0 to 13.5.
(7) 上記 (1) 〜 (6) 項のいずれか 1項に記載の方法によって製造された酸 化物 (Ai— ZDZ) (Wi一 XRX) 208o (7) above (1) to (6) any one oxides prepared by the method described in Section section (Ai- Z D Z) (Wi one X R X) 2 0 8o
(8) L* a *b *表色系表示にて、 aがー 1以上 0以下、 かつ bが 0以上 2. 5以下であって、 透明または白色を呈する酸化物 (A — ZDZ) (8) at L * a * b * color system display, a guard 1 or 0 or less, and there is b is 0 or 2.5 or less, transparent or oxides exhibiting white (A - Z D Z )
(W^xRx) 208 (ここで、 Aは Z r又は H f又はそれらの混合物、 Dは酸 化ジルコニウム又は酸ィヒハフニウムに固溶し得る元素、 Zは 0以上 0. 2以下の 数値、 Rは酸化タングステンに固溶し得る元素、 Xは 0以上 0. 25以下の数値 である) 。 (W ^ xRx) 2 0 8 ( wherein, A is Z r or H f or a mixture thereof, D is capable of solid solution in the acid zirconium or acid Ihihafuniumu element, Z is 0 or 0.2 following values, R is an element capable of forming a solid solution in tungsten oxide, and X is a value of 0 to 0.25).
発明を実施するための最良の形態 BEST MODE FOR CARRYING OUT THE INVENTION
以下に本発明を詳細に説明する。  Hereinafter, the present invention will be described in detail.
本発明におけるタングステン酸ジルコニウム等とは、 組成式 (Ai— ZDZ) ( !_xRx) 2°8 (Aは Z r又は H f 又はそれらの混合物、 Dは酸ィ匕ジルコ 二ゥム又は酸化ハフニゥムに固溶し得る元素、 Zは各元素の種類によって限定さ れる最大固溶原子割合以下の値、 Rは酸化タングステンに固溶し得る元素、 は 各元素の種類によって限定される最大固溶原子割合以下の値。 ) である。 The zirconium tungstate or the like in the present invention, the composition formula (Ai- Z D Z) (! _XR x) 2 ° 8 (A is Z r or H f or a mixture thereof, D is Sani匕zirconate Elements that can form a solid solution in dium or hafnium oxide; Z is a value less than the maximum solid solution atomic ratio defined by the type of each element; R is an element that can form a solid solution in tungsten oxide; is limited by the type of each element Value less than or equal to the maximum solid solution atomic ratio. ).
本発明の製造方法において使用される A含有ィヒ合物 (ジルコニウム化合物又は ハフニウム化合物又はそれらの混合物) 、 タングステン化合物は、 典型的には酸 化ジルコニウム、 酸ィ匕ハフニウム又はそれらの混合物、 酸化タングステン又は、 ォキシハ口ゲン化ジルコニゥム等又は硝酸ジルコニゥム等とタングステン酸の塩 である。 本明細書の以下の記载では、 前記乾式方法で使用される酸化ジルコニゥ ム、 酸化ハフニウムまたはそれらの混合物、 酸化タングステンについて説明する。 まず原料粉末の混合物が、 焼成したときの組成式 (Ai— ZDZ) The A-containing compound (zirconium compound or hafnium compound or a mixture thereof) and the tungsten compound used in the production method of the present invention are typically zirconium oxide, hafnium oxide or a mixture thereof, and tungsten oxide. Or a salt of zirconium oxide or the like or zirconium nitrate or the like with tungstic acid. In the following description of the present specification, zirconium oxide, hafnium oxide or a mixture thereof, and tungsten oxide used in the dry method will be described. First a mixture of raw material powder, the composition when calcined formula (Ai- Z D Z)
(W^xRx ) 208を満たすように、 A含有化合物粉末及びタングステン化 合物粉末に D及び Z又は Rの単体又は化合物粉末を添加し、 乾式又は湿式混合し て混合粉末を調製する。 ここで、 Aは Z r又は Hf 又は、 !:及び!^ でぁる。 また、 上記の D及ぴ Rの化合物とは、 酸化物、 水酸化物、 塩化物、 窒化物、 炭化 物、 硝酸塩や炭酸塩などの酸素酸塩等を挙げることができる。 (W ^ XRX) so as to satisfy the 20 8, were added alone or compound powder of D and Z or R to A-containing compound powder and tungsten of compound powder to prepare a mixed powder by dry or wet mixing. Here, A is Zr or Hf or! :as well as! ^ The compounds of D and R include oxides, hydroxides, chlorides, nitrides, carbides, and oxyacid salts such as nitrates and carbonates.
Dは酸化ジルコニウム又は酸ィヒハフニウムに固溶し得る元素であり、 C a等の アル力リ土類金属及び Y等の希土類金属等を挙げることができる。 Zは具体的に は 0. 2以下であり、 典型的には 0〜0. 1である。  D is an element capable of forming a solid solution with zirconium oxide or ichhafnium oxide, and examples thereof include an alkaline earth metal such as Ca and a rare earth metal such as Y. Z is specifically 0.2 or less, and is typically from 0 to 0.1.
Rは酸ィ匕タングステンに固溶し得る元素であり、 I I 1 族又は¥ 族又は I A族等の元素を挙げることができる。 Xは具体的には 0. 25以下であり、 典 型的には 0〜0. 2である。  R is an element capable of forming a solid solution in tungsten oxide, and examples thereof include elements of Group I1 or Group I or Group IA. X is specifically 0.25 or less, typically 0-0.2.
また、 z=oかつ x=oである場合には、 顕著な負の熱膨張特性を有する粉体 を製造する上で好ましい。  When z = o and x = o, it is preferable to produce a powder having remarkable negative thermal expansion characteristics.
タングステン酸ジルコニウム (Z rW28) 及びタングステン酸ハフニウム (Hf W2Os) は共に負の熱膨張係数を有する酸ィヒ物であり、 本発明の製造方 法において、 両者共に適用できるものである。 Zirconium tungstate (Z rW 28) and hafnium tungstate (Hf W 2 O s) are both acid I arsenide having a negative thermal expansion coefficient, in the manufacture how the present invention, can be applied to both of It is.
一般に、 原料粉末である酸化ジルコニウム及び酸ィ匕ハフニウムは、 ジルコン Generally, the raw material powders zirconium oxide and hafnium oxide are
(Zircon-ZrSi04) 、 バデライト (Baddeleyite'Zr02) と呼ばれる通常:!〜 2 %のハフニウムを含有しているジルコニウム鉱石 (酸化ジルコニウムと酸化ハフ 二ゥムの混合物鉱石) より精製される。 酸化ジルコニウムを原子力用途に使用す る場合、 及び金属ジルコニウムまたは金属ハフニウムとして精鍊する以外は、 一 般的に酸ィヒジルコニゥムと酸化ハフニゥムと分離をせずにそのまま "酸化ジルコ 二ゥム" という名称の原料として販売 '使用されている。 本発明の製造方法にお ける原料としても分離をせずに入手した混合物のまま、 または、 目的に応じて酸 化ジルコニウムと酸化ハフニゥムのそれぞれを所望量添加して (又はどちらか一 方のみで) 使用することが出来る。 (Zircon-ZrSi0 4), usually called baddeleyite (Baddeleyite'Zr0 2):! Zirconium ore containing ~ 2% hafnium (zirconium oxide and hafnium oxide Ore mixture). When zirconium oxide is used for nuclear applications, and except that it is refined as metal zirconium or metal hafnium, it is generally used as a raw material named “zirconium oxide” without being separated from zirconia and hafnium oxide. Sold as' used. The mixture obtained as a raw material in the production method of the present invention without separation is used, or zirconium oxide and hafnium oxide are added in desired amounts according to the purpose (or with only one of them). ) Can be used.
本発明のタンダステン酸ジルコ二ゥム等の製造方法は、 酸ィ匕ジルコニゥム等と 酸化タングステンを混合、 (必要に応じて圧搾) 、 焼成及ぴ急冷の工程を用いて 製造する際に、 急冷後の焼結体をアル力リ溶液処理することによつて未反応物ま たは分解生成物である酸化タングステンを溶解除去するものであり、 このアル力 リ溶液処理は、 前記従来の技術の項で記載した乾式方法、 湿式方法等の公知の何 れの混合工程を経て製造されたタンダステン酸ジルコニゥム等に未反応物又は分 解生成物として含まれる酸ィヒタングステンを除去する場合にも適用できるもので ある。 混合工程における酸ィ匕ジルコニウム等の酸ィ匕タングステンに対するモル比 は、 0 . 2 5〜0 . 5とすることが好ましい。 なお、 上記の圧搾、 焼成、 及び急 冷の各工程についても公知の何れかの方法も使用することが可能である。  The method for producing zirconium tandastate or the like of the present invention includes the steps of mixing oxidized zirconium and the like with tungsten oxide, pressing (if necessary), calcining, and quenching. The tungsten oxide, which is an unreacted substance or a decomposition product, is dissolved and removed by subjecting the sintered body of the present invention to a solution treatment. It can also be applied to the removal of unreacted or acid tungsten contained as a decomposition product in zirconium tandastate manufactured through any known mixing method such as a dry method and a wet method described in It is a thing. The molar ratio of zirconium oxide to tungsten oxide in the mixing step is preferably from 0.25 to 0.5. In addition, any of the well-known methods can also be used for each of the above-described pressing, firing, and quenching steps.
タングステン酸ジルコ二ゥム等の他の元素との固溶体を作る場合は、 固溶させ たい元素 (上記の D及び/ "又は R) とタングステン酸ジルコ二ゥム等を混合し、 約 1, 2 0 0 °Cの温度に上げ、 その後、 急冷することにより得ることが可能であ る。  When making a solid solution with other elements such as zirconium tungstate, mix the element to be dissolved (D and / or R above) with zirconium tungstate, etc. It can be obtained by raising the temperature to 00 ° C and then quenching.
タングステン酸ジルコニウム等に含まれる酸化タングステンは、 他の成分に影 響を与えないで、 例えばタングステン酸ジルコニウムを同時に溶解させてしまう ことなく、 アルカリ溶液に溶解させて単独で選択的に分離できる。 それ故、 酸ィヒ ジルコニウム等をできる限り単独で残存させないよう、 酸ィヒジルコニウム等の酸 化タングステンに対するモル比率を 0 . 5より低くし、 残った酸化タングステン のアル力リ処理をすることにより、 タングステン酸ジルコニウム等の高純度化が 出来る。 酸ィ匕ジルコニウム等の酸化タングステンに対するモル比率は、 より好ま しくは 0 . 2 5〜0 . 4 9 9、 更に好ましくは 0 . 3 5〜0 . 4 9 5、 - しくは 0. 45〜0. 492である。 Tungsten oxide contained in zirconium tungstate or the like can be selectively separated alone by dissolving it in an alkaline solution without affecting other components, for example, without simultaneously dissolving zirconium tungstate. Therefore, in order not to leave zirconium oxide etc. alone as much as possible, the molar ratio of zirconium oxide etc. to tungsten oxide is made lower than 0.5, and the residual tungsten oxide is treated with aluminum. High purity of zirconium tungstate can be achieved. The molar ratio of zirconium oxide to tungsten oxide is more preferably 0.25 to 0.499, more preferably 0.35 to 0.495, and-. Or 0.45 to 0.492.
この方法により、 酸化タングステン、 酸化ジルコニゥム等の不純物を極力低下 させることが可能になり、 高純度のタングステン酸ジルコニウム等を得ることが 可能となった。 タングステン酸ジルコニウム等として、 酸化ジルコニウムを含ん でも問題のないものは、 上記と逆の比率にすることも可能であるが、 この場合で も酸化タングステンは急冷等の分解により不純物として含有されることになり、 アル力リ溶液処理は必要となる。 本発明で言うところの 「アル力リ溶液処理」 と は、 タングステン酸ジルコニウム等 (乾式方法で製造されたものであれ、 湿式方 法で製造されたものであれ) をアル力リ溶液に浸漬することを指す。  By this method, impurities such as tungsten oxide and zirconium oxide can be reduced as much as possible, and high-purity zirconium tungstate can be obtained. If the zirconium tungstate or the like contains no zirconium oxide and does not cause any problem, the ratio can be reversed.However, even in this case, the tungsten oxide is included as an impurity due to decomposition such as rapid cooling. Therefore, solution processing is required. In the present invention, the "solution treatment" refers to immersing zirconium tungstate or the like (whether manufactured by a dry method or a method manufactured by a wet method) in the solution. Refers to
前記アルカリ溶液処理のためのアルカリ溶液の、 水素イオン濃度 (pH) は、 1 1. 0-13. 5の範囲が好ましい。 pHが 1 1. 0未満であると酸化タング ステンの溶解に時間を要し、 pHが 13. 5を超える場合は、 タングステン酸ジ ルコニゥム等も溶解してしまう為、 収率が低下することがある。 pHの目安とし ては、 代表的なアル力リ溶液である水酸化ナトリゥムの場合、 5 w t %の場合 p Hは 14. 0程度、 2. 5 w t%の場合 pHは 13. 9程度、 0. 16wt%の 場合 pHは 12. 7程度であり、 アンモニゥム水溶液の場合、 25wt%の場合 pHは 14. 5程度、 1 Ow t%の場合 pHは 1 3. 0程度、 5^七%の場合 Hは 12. 5程度である。  The hydrogen ion concentration (pH) of the alkaline solution for the alkaline solution treatment is preferably in the range of 11.0 to 13.5. If the pH is less than 11.0, it takes time to dissolve the tungsten oxide, and if the pH exceeds 13.5, zirconia tungstate also dissolves, and the yield may decrease. is there. As a guideline of pH, in the case of sodium hydroxide, which is a typical alcohol solution, the pH is about 14.0 at 5 wt%, the pH is about 13.9 at 2.5 wt%, 0 In the case of 16 wt%, the pH is about 12.7, in the case of aqueous ammonia, the pH is about 14.5 in the case of 25 wt%, in the case of 1 wt% the pH is about 13.0, in the case of 5 ^ 7% H is about 12.5.
前記アル力リ溶液処理のためのアル力リ溶液としては、 水酸化アル力リ金属又 はアル力リ土類金属等のアル力リ水溶液、 及び水酸化ァンモニゥム等のアンモニ ゥム溶液を用いることが可能である。 中でも、 洗浄後にアルカリ金属等のイオン の残存がなく、 除去が簡便なアンモニゥム水溶液が好ましい。 また、 安全性の面 からも、 比較的弱塩基性である了ンモニゥム水溶液は好ましい。 ァンモニゥム水 溶液による処理によって、 100%近い純度のタングステン酸ジルコニウム等を 得ることが可能である。  As the alkaline solution for the alkaline solution treatment, an alkaline aqueous solution such as an alkaline metal hydroxide or an alkaline earth metal, or an ammonia solution such as an ammonium hydroxide is used. Is possible. Among them, an aqueous ammonia solution that does not leave ions such as alkali metals after washing and is easy to remove is preferable. Also, from the viewpoint of safety, a relatively weak basic aqueous ammonia solution is preferable. It is possible to obtain zirconium tungstate or the like having a purity of nearly 100% by the treatment with the aqueous ammonium solution.
本発明において、 タングステン酸ジルコニウム等である酸化物に不純物として 含まれる酸ィ匕タングステンの許容含有量は、 適用される用途によって変わるが、 アル力リに溶出されたタングステンの量から換算して求めた値としての酸化タン グステンの含有量は、 全体の 10重量%以下であることが好ましい。 この量は、 5重量%以下がより好ましい。 更に好ましくは 1重量%以下、 一層好ましくは 0 . 5重量%以下である。 In the present invention, the allowable content of oxidized tungsten contained as an impurity in an oxide such as zirconium tungstate varies depending on the application to be applied, but is determined by converting the amount of tungsten eluted into the aluminum oxide. It is preferable that the content of tungsten oxide as the calculated value is not more than 10% by weight of the whole. This amount is 5% by weight or less is more preferable. It is more preferably at most 1% by weight, more preferably at most 0.5% by weight.
前記アル力リ溶液処理前後の酸化ジルコニウム等の含有状況を X線回折パター ンを拡大し確認した結果、 処理前の酸化ジルコ二ゥム等のタングステン酸ジルコ ニゥム等に対するチャート上のピーク比を 1とした時、 処理後に 0 . 4になって おり、 酸化ジルコニウム等が (酸化タングステンの除去と共に) 副次的に除去さ れていることが判明した。 このことは、 急冷時の分解による不純物の除去のため に非常に好都合である。  As a result of expanding the X-ray diffraction pattern and confirming the content of zirconium oxide and the like before and after the treatment with the alkaline solution, the peak ratio on the chart to zirconium tungstate such as zirconium oxide before treatment was 1%. It was 0.4 after the treatment, and it was found that zirconium oxide and the like were removed as secondary (with removal of tungsten oxide). This is very convenient for removing impurities by decomposition during quenching.
この副次的な酸化ジルコニウム等の除去のメカニズムとしては、 分解した酸化 ジルコニウム等と酸ィヒタングステンの固体物から酸化タングステンが溶出される 際、 一方で微粉体の酸ィヒジルコニウム等が生成し、 濾過等で除去され易くなるも のと推定された。  The mechanism of the secondary removal of zirconium oxide and the like is as follows. When tungsten oxide is eluted from the solid matter of the decomposed zirconium oxide and the like and the titanium oxide, on the other hand, fine powder zirconium oxide and the like are generated. It was presumed that it would be easily removed by filtration or the like.
アル力リ溶液処理は、 粉体の状態で処理した方が効率の面から良!/、。 急冷工程 後の粉碎は、 平均粒径 1 mm以下となるように行えば十分にアル力リ処理が可能 である。 より好ましくは平均粒径 1 0 0ミクロン以下がよい。 更に好ましくは、 平均粒径 5 0ミクロン以下がよレ、。 一層好ましくは、 1 0ミクロン以下がよレ、。 粒径を小さくすることは、 粉体からの酸化タングステンの溶解時間を短縮する上 で好ましい。  Alrikuri solution processing is better in the form of powder in terms of efficiency! / ,. The grinding after the quenching step can be sufficiently performed by reducing the average particle size to 1 mm or less. More preferably, the average particle size is 100 microns or less. More preferably, the average particle size is 50 microns or less. More preferably, it is 10 microns or less. It is preferable to reduce the particle size in order to shorten the dissolution time of tungsten oxide from the powder.
アルカリ処理は、 加熱攪拌をしてアルカリによる酸ィ匕タングステンの分離を促 進することが好ましい。 加熱温度は高い方が良いが、 好ましくは 7 0 °Cからアル カリ溶液の沸騰温度までの範囲がよい。 より好ましくは、 処理時間を短くするた め 8 0〜: L 0 0 °Cがよい。  In the alkali treatment, it is preferable to heat and stir to promote the separation of tungsten oxide by alkali. The heating temperature is preferably higher, but is preferably in the range from 70 ° C to the boiling temperature of the alkali solution. More preferably, the temperature is preferably from 80 to: L 00 ° C in order to shorten the processing time.
ただし、 沸縢させると、 粉体が沈降した密度の大きいアルカリ溶液の低部で突 沸し易いため、 沸騰させないようにした方が良い。 酸化タングステンの処理濃度 は、 アルカリ溶液中で 1重量%程度でも処理可能である。 アルカリ溶液の量は、 その濃度にもよるが、 粉体を完全に浸す程度よりも多くし、 アルカリ溶液の粉体 に対する質量比が 2〜 2 0であることが好ましく、 より好ましくは 5〜1 0であ る。 また、 残分のアルカリ溶液は、 再利用することも可能である。  However, if boiled, the powder will easily boil in the lower part of the high density alkaline solution where the powder has settled, so it is better not to boil. Tungsten oxide can be treated in an alkaline solution at a concentration of about 1% by weight. Although the amount of the alkaline solution depends on the concentration, it is preferably larger than the degree of completely immersing the powder, and the mass ratio of the alkaline solution to the powder is preferably 2 to 20 and more preferably 5 to 1 It is 0. The remaining alkaline solution can be reused.
タングステン酸ジルコニウム等を合成する一般的な方法は、 1, 1 0 5〜1 , 257°Cの温度で安定的に存在する焼成された化合物を、 水中投下又は液体窒素 等により急冷し、 準安定物質として回収する方法である。 従って、 圧縮体を用い る場合は、 準安定物質のタングステン酸ジルコニウム等が分解されないようにす ることが不純物除去の観点からも重要であり、 内部が急冷されるよう、 焼成され た化合物の最小寸法を 10 mm以下、 更に好ましくは 5 mm以下、 一層好ましく は 2 mm以下に小さくすることが好ましい。 A general method for synthesizing zirconium tungstate or the like is as follows: 1, 105-1, In this method, calcined compounds that are stably present at a temperature of 257 ° C are dropped in water or quenched by liquid nitrogen or the like, and are recovered as metastable substances. Therefore, when a compact is used, it is important from the viewpoint of removing impurities that the metastable substance, such as zirconium tungstate, is not decomposed. It is preferred to reduce the dimensions to 10 mm or less, more preferably 5 mm or less, more preferably 2 mm or less.
タングステン酸ジルコニウム等が電子部品材料等の場合は、 酸化タングステン の量は、 完全にゼロであるのが理想であるが、 1重量%以下が好ましい。 0. 5 重量%以下が更に好ましく、 0. 2重量%以下が一層好ましい。  When zirconium tungstate or the like is an electronic component material, the amount of tungsten oxide is ideally completely zero, but is preferably 1% by weight or less. It is more preferably at most 0.5% by weight, more preferably at most 0.2% by weight.
タングステン酸ジルコニウム等の酸化タングステンの含有量は、 粉碎した化合 物より、 アルカリにより抽出されたタングステンから算定したものであり、 以下 に、 分析の一例を手順を追って下記に記載する。  The content of tungsten oxide such as zirconium tungstate is calculated from the tungsten extracted by alkali from the comminuted compound. An example of the analysis is described below step by step.
( 1 ) 微小に粉砕した試料 0. 1 gをビーカーに 0. 01 m gまで抨量し採取す る。  (1) Weigh 0.1 g of the finely ground sample in a beaker to 0.01 mg and collect.
(2) 希アンモニア水 (約 2%) を注ぎ入れ、 150°Cに力!]温し、 残留したタン グステン酸化物を溶解する。  (2) Pour dilute aqueous ammonia (about 2%) and heat to 150 ° C!] To dissolve the remaining tungsten oxide.
(3) 5 Cの濾紙を用いてろ過し、 温希アンモニア水にて数回洗浄した後、 蒸留 水にて洗浄を行う。 ろ液は廃棄する。  (3) Filter with 5C filter paper, wash several times with warm dilute ammonia water, and then wash with distilled water. Discard the filtrate.
(3) 濾紙をるつぼ中に移し、 乾燥した後バーナーにて弱く加熱し、 濾紙を炭化 する。  (3) Transfer the filter paper into a crucible, dry it and heat it slightly with a burner to carbonize the filter paper.
(4) ガスの発生が無くなるまで炭化した後、 550°Cの電気マツフル炉に移し て完全に灰化させる。  (4) After carbonization until the generation of gas disappears, transfer to an electric Matsufuru furnace at 550 ° C for complete incineration.
(5) 灰化した試料にアルカリ融剤として炭酸ナトリウム 1 gを加え、 パーナ一 にて融解する。  (5) Add 1 g of sodium carbonate as an alkali flux to the incinerated sample and melt it with a wrench.
(6) 十分に融解した試料を放冷し、 蒸留水を加えて加温溶解する。  (6) Allow the sufficiently melted sample to cool, add distilled water, and heat and dissolve.
(7) 不溶解分を 5 Cの濾紙を用いてろ別し、 温水にて数回洗浄する。 洗浄液は ろ液と合わせてメスフラスコに移して後、 蒸留水にて定容とする。 (溶液 A) (7) Filter off the insoluble matter using 5 C filter paper and wash several times with warm water. Transfer the washing solution together with the filtrate to a volumetric flask, and make up to constant volume with distilled water. (Solution A)
(8) 濾紙をるつぼに移し、 乾燥した後パーナ一にて弱く加熱し、 濾紙を炭化す る。 (9) ガスの発生が無くなるまで炭化した後、 550°Cの電気マツフル炉に移し て完全に灰化させる。 (8) Transfer the filter paper to a crucible, dry it and heat it slightly with a wrench to carbonize the filter paper. (9) After carbonization until the generation of gas disappears, transfer to an electric Matsufuru furnace at 550 ° C to completely incinerate.
(10) 灰化した試料に酸融剤硫酸水素力リウム 1 gを力 [1え、 バーナーにて融解 する。  (10) Apply 1 g of potassium hydrogen sulphate as an acid flux to the incinerated sample and melt it with a burner.
(1 1) 十分に融解した試料を放冷し、 希硝酸を加えて加温溶解する。  (1 1) Allow the fully melted sample to cool, add diluted nitric acid, and heat and dissolve.
(1 2) 溶液をメスフラスコに移して後、 蒸留水にて定容とする。 (溶液 B) (12) Transfer the solution to a volumetric flask, and make up to constant volume with distilled water. (Solution B)
(1 3) 溶液 A及び Bについて希釈し、 溶液中のタングステン濃度を誘導結合プ ラズマ発光分光分析装置 (I CP-AES) にて定量する。 (13) Dilute solutions A and B, and determine the tungsten concentration in the solution using an inductively coupled plasma emission spectrometer (ICP-AES).
本分析方法を用いると、 純度 99. 1 %のタングステン酸ジルコニウム試料に、 99. 9 wt%の酸化タングステン又は 99. 9 w t %の酸化ジルコニウムを不 純物として添加し、 添加濃度に対応してタングステン酸ジルコニウムの純度の直 線回帰を求めたところ、 99. 96 %の信頼度が得られた。  Using this analytical method, 99.9 wt% of tungsten oxide or 99.9 wt% of zirconium oxide was added as an impurity to a 99.1% pure zirconium tungstate sample. The linear regression of the purity of zirconium tungstate was determined and found to be 99.96% reliable.
また、 不純物である酸化タングステンは黄緑色を呈しており、 その他の構成物 であるタングステン酸ジルコニウム及び酸化ジルコニウムは白色である。 このた め、 酸ィ匕タングステンの量は、 生成物の色彩計測を実施することで評価すること ができる。 色彩計測に関しては、 公知の方法を用いることができ、 一般的な色度 を表す XYZ表色系表示や、 L*a *b *表色系表示、 L*C*h表色系表示、 マ ンセル表色系表示、 L * u * V *表示を用いて色彩計測を実施することが出来る。 (例えば、 色材、 第 69卷、 第 8号、 第 539〜550頁、 又は、  Tungsten oxide, which is an impurity, has a yellow-green color, and the other components, zirconium tungstate and zirconium oxide, are white. For this reason, the amount of tungsten oxide can be evaluated by measuring the color of the product. Known methods can be used for color measurement, such as XYZ color system display, L * a * b * color system display, L * C * h color system display, The color measurement can be performed using the uncertainty color system display and the L * u * V * display. (For example, coloring materials, Vol. 69, No. 8, pp. 539-550, or
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本発明の酸化物粉末の色度は、 L * a * b *表色系表示にて、 好ましくは aが 一 1. 0以上、 0以下かつ、 bが 0以上、 2. 5以下、 より好ましくは、 aがー 0. 75以上、 0以下かつ bが、 0以上、 2. 00以下、 さらに好ましくは、 a カ、 —0. 5以上、 0以下かつ bが 0以上、 1. 5以下、 最も好ましくは、 aが -0. 3以上、 0以下かつ bが 0以上、 0. 75以下で表すことができるもので ある。 L* a *b *表色系表示の絶対値が小さいほど酸ィ匕物 AW28はより透明 または白色を呈する。 The chromaticity of the oxide powder of the present invention, in the L * a * b * color system display, preferably a is 1.1 or more, 0 or less, and b is 0 or more, 2.5 or less, more preferably Is that a is -0.75 or more, 0 or less and b is 0 or more, 2.00 or less, and more preferably a mosquito, -0.5 or more, 0 or less and b is 0 or more, 1.5 or less, Most preferably, a can be represented by -0.3 or more and 0 or less, and b is 0 or more and 0.75 or less. L * a * b * as the absolute value of the color system displays a small Sani匕物AW 28 exhibits more transparent or white.
酸化物 (Ai— ZDZ) (W!_XRX) 28をより透明または白色とすること によって、 不純物である酸化タンダステンの含有量が少ないことが容易に判るた め好ましい。 また、 酸化タングステンは、 和光純薬 (株) 製品安全データシート、Oxide (Ai- Z D Z) (W ! _ X R X) 2 〇 8 more transparent or to white to This is preferable because it is easy to find that the content of tundastene oxide as an impurity is small. In addition, tungsten oxide is manufactured by Wako Pure Chemical Co., Ltd.
MSDS No. 20— 0346によると、 労働安全衛生法第 57条の 2 (令第 1 8条の 2) 名称等を通知すべき有害物 N o. 336と記載されている有害物で ありこれを除去できることは好ましい。 According to MSDS No. 20-0346, harmful substances whose names, etc. to be notified under Article 57-2 of the Occupational Safety and Health Act (Ordinance Article 18-2) Preferably, it can be removed.
また、 本発明の酸化物に、 薄いピンク ·青などの色を着色する場合、 酸化タン ダステンの色が影響するためより白または透明であることが必要である。 また、 光を通す又は光を反射する用途に使用する場合、 より白又は透明であることが望 ましい。  In addition, when coloring the oxide of the present invention with a color such as light pink or blue, it is necessary that the oxide be white or transparent because the color of the tungsten oxide affects the oxide. In addition, when used for applications that transmit or reflect light, it is desirable that the material be whiter or more transparent.
実施例 Example
以下に、 実施例により本発明を具体的に説明するが、 本発明はこれらによって なんら限定されるものではない。  Hereinafter, the present invention will be described specifically with reference to Examples, but the present invention is not limited thereto.
実施例 1 Example 1
酸化ジルコニウムの酸化タングステンに対するモル比率を 0. 49にし、 ボー ルミルで 2時間混合し、 200 k gZcm で圧縮成形し、 1 , 200 °Cで焼成 し、 焼成体を水中に投下することによって急冷してから回収した。 焼成体は黄緑 色に着色していた。 焼成体をボールミルで粉碎し、 平均粒径 3ミクロンにしたも のを 10 g秤量し、 50 gの 10 %アンモニア水溶液中に浸漬後、 80°Cに加温 し 2時間浸漬処理後、 ブフナロート中に 5 Cのろ紙を配置しろ過し、 蒸留水を用 い 8回洗浄後、 99 °Cの大気中で乾燥し最終粉体を得た。 水洗 ·乾燥後の粉体は 白色であった。 処理前後での色の差異を測定するため、 ミノルタカメラ株式会社 製色彩式差計 C R— 300を用い色度を測定した。 処理前の粉末は、 L * C * h 表色表示にて GY 95. 45 (C=6. 38 ; h= 1 1 9. 0) 、 L* a *b* 表色系表示にて a =— 3. 09、 b = 5. 58であり、 処理後の粉末は L*C* h表色系表示にて GY 97. 82 (C= 1. 55 ; h= 1 09. 4) 、 L* a * b *表色系表示にて a =—0. 26、 b = 1. 46を示した。 X線回折により分 析した結果、 不純物はピークとして確認できなかった。 前記の分析方法を用いて、 分析した結果、 純度が 99. 8 %であることが確認された。 了ンモニァ水溶液に よりアルカリ処理しない場合は、 98. 0%であった。 実施例 2 The molar ratio of tungsten oxide zirconium oxide to 0.49, and mixed for 2 hours at baud mill, and compression molded at 200 k GZC m, quenched by calcined at 1, 200 ° C, dropping the fired body in water And then recovered. The fired body was colored yellow-green. The fired body is pulverized with a ball mill to obtain an average particle size of 3 μm, 10 g is weighed, immersed in 50 g of a 10% aqueous ammonia solution, heated to 80 ° C, immersed for 2 hours, and then buried in a Buchnarort. A 5 C filter paper was placed in the filter, filtered, washed 8 times using distilled water, and dried in the air at 99 ° C. to obtain a final powder. The powder after washing and drying was white. To measure the color difference before and after the treatment, the chromaticity was measured using a color difference meter CR-300 manufactured by Minolta Camera Co., Ltd. The powder before treatment is GY 95.45 (C = 6.38; h = 19.10) in the L * C * h color specification, and a = in the L * a * b * color specification. — 3.09, b = 5.58, the powder after processing is L * C * h color system GY 97.82 (C = 1.55; h = 10.99.4), L * In the a * b * color system display, a = —0.26 and b = 1.46 were shown. As a result of analysis by X-ray diffraction, no impurity could be confirmed as a peak. As a result of analysis using the above-mentioned analysis method, it was confirmed that the purity was 99.8%. When alkali treatment was not performed with the aqueous ammonia solution, it was 98.0%. Example 2
酸化タングステンを不純物として 1 0重量。/o含むタングステン酸ジルコニウム と実施例 1と同様の方法によつて得られた純度 9 9 . 8 %のタングステン酸ジル コ二ゥムの粉末を、 それぞれ平均粒径 l O ju mとなるようにボールミルで粉砕し、 それぞれ 1 0 0 gの水の中に試料として 5 0 gを浸漬し、 温度負荷として 2 0 °C と 5 0 °Cの各温度に 1時間保持する温度サイクルを 5 0回加えた。  10 weight of tungsten oxide as impurity. The zirconium tungstate containing / o and zirconium tungstate powder having a purity of 99.8% obtained by the same method as in Example 1 were mixed so as to have an average particle diameter l O jum. Pulverize with a ball mill, immerse 50 g as a sample in 100 g of water each, and perform 50 temperature cycles of holding for 1 hour at each temperature of 20 ° C and 50 ° C as a temperature load added.
この水を誘導結合プラズマ発光分光分析装置 (I C P— A E S ) にて定量分析 した結果、 酸化タングステンを不純物として 1 0重量%含むタングステン酸ジル コユウムからは、 酸化タングステン換算で 0 . 0 5 g /水 1 0 0 gが検出された 力 純度 9 9 . 8 %のタングステン酸ジルコニウムの試料からは検出限界以下で 認めることが出来なかった。  Quantitative analysis of this water with an inductively coupled plasma emission spectrometer (ICP-AES) showed that from zirconium tungstate containing 10% by weight of tungsten oxide as an impurity, 0.055 g / water in terms of tungsten oxide was obtained. 100 g was detected. From the zirconium tungstate sample with a power purity of 99.8%, it was not detected below the detection limit.
実施例 3 Example 3
実施例 2で作成したものと同じ 2種類の平均粒径 1 0 // mの粉末をエポキシ樹 脂の成形板に密着させ、 5 0 °Cで 6 0日間加温後、 前記粉末を除去したエポキシ 樹脂の表面分析を X線マイクロアナライザー (島津製作所 (株) 製、 E P MA— C 1 ) を用いて行った。 その結果、 酸化タングステンを不純物として 1 0重量% 含むタングステン酸ジルコ二ゥムからは、 タングステンのピークが検出されたが、 純度 9 9 . 8。/。のタングステン酸ジルコ -ゥムの試料の場合は検出限界以下であ つに。  The same two types of powder having an average particle diameter of 10 // m as those prepared in Example 2 were adhered to a molded plate of epoxy resin, heated at 50 ° C for 60 days, and then the powder was removed. The surface analysis of the epoxy resin was performed using an X-ray microanalyzer (EPMA-C1 manufactured by Shimadzu Corporation). As a result, a peak of tungsten was detected from zirconium tungstate containing 10% by weight of tungsten oxide as an impurity, but the purity was 99.8. /. In the case of the sample of zirconium-tungstate, it is below the detection limit.
産業上の利用可能性 Industrial applicability
本発明によれば、 高純度の、 特に単体の酸化タングステンの含有量が低い、 タ ンダステン酸ジルコニゥム等を簡便に工業的に製造する方法を提供されるため、 着色等の問題を回避し、 かつ他の電子部品に悪影響を及ぼすことなく、 その負の 熱膨張特性を利用して、 電子部品材料、 光学部品材料、 精密機械部品材料に適用 される。 また、 着色の問題の回避により、 ブラックグレーティングの温度感度を 制御することに用いられるような場合でも、 光通過への悪影響無しに使用するこ とが可能である。 なお、 本方法のアルカリ溶液処理におけるアルカリ溶液として 弱塩基性のものを用いた場合には、 本方法を工業的に利用する場合の安全性が増 強される。  According to the present invention, a method for easily and industrially producing high-purity, particularly low content of a single element of tungsten oxide, such as zirconium tandate, is provided, so that problems such as coloring can be avoided, and It is applied to electronic component materials, optical component materials, and precision mechanical component materials by utilizing its negative thermal expansion characteristics without adversely affecting other electronic components. In addition, by avoiding the problem of coloring, even when used for controlling the temperature sensitivity of a black grating, it can be used without adversely affecting light transmission. In addition, when a weakly basic solution is used as the alkali solution in the alkali solution treatment of the present method, the safety when the present method is used industrially is enhanced.

Claims

請 求 の 範 囲 The scope of the claims
1. 酸化物 (A — ZDZ) (W^xRx) 208を製造する方法であって、 ここで、 Aは Z r又は H f 又はそれらの混合物、 Dは酸ィ匕ジルコニウム又は酸化 ハフニウムに固溶し得る元素、 Zは 0以上 0. 2以下の数値、 Rは酸化タングス テンに固溶し得る元素、 Xは 0以上 0. 25以下の数値であり、 1. oxide - a (A Z D Z) (W ^ xRx) process for producing 2 08, where, A is Z r or H f or a mixture thereof, D is Sani匕zirconium or hafnium oxide Z is a value from 0 to 0.2, R is an element that can form a solid solution in tungsten oxide, X is a value from 0 to 0.25,
( i ) ジルコニウム化合物又はハフニウム化合物又はそれらの混合物、 及びタン ダステン化合物を含む組成物を混合する工程、  (i) a step of mixing a composition comprising a zirconium compound or a hafnium compound or a mixture thereof, and a tandustene compound;
( i 1 ) 前記混合された組成物を、 焼成し、 続いて急冷する工程、  (i1) firing the mixed composition, followed by quenching;
( 1 i i) 前記急冷された組成物をアルカリ溶液処理する工程  (1ii) a step of treating the quenched composition with an alkaline solution
を含む、 上記製造方法。 The manufacturing method described above.
2. 上記 (i) 工程において、 ジルコニウム化合物、 ハフニウム化合物又はそ れらの混合物中のジルコニウム及び/又はハフニゥムの、 タンダステン化合物中 のタングステンに対するモル比を 0. 25以上0. 5未満とする、 請求項 1記載 の製造方法。  2. In the above step (i), the molar ratio of zirconium and / or hafnium in the zirconium compound, hafnium compound or a mixture thereof to tungsten in the tandastene compound is 0.25 or more and less than 0.5. Item 1. The manufacturing method according to Item 1.
3. Z = 0、 かつ X= 0である、 請求項 1又は 2に記載の製造方法。  3. The production method according to claim 1, wherein Z = 0 and X = 0.
4. 上記 (i i i) 工程において、 アンモユウム溶液を用いてアルカリ溶液処 理することを含む、 請求項 1項又は 2項に記載の製造方法。  4. The production method according to claim 1, wherein in the step (ii), an alkali solution treatment is performed using an ammonium solution.
5. Z = 0、 かつ X=0であり、 上記 ( i l l) 工程において、 アンモニゥム 溶液を用いてアルカリ溶液処理することを含む、 請求項 1項又は 2項に記載の製 造方法。  5. The production method according to claim 1, wherein Z = 0 and X = 0, and wherein the (ill) step includes performing an alkali solution treatment using an ammonium solution.
6. 上記 (i i i) 工程において、 pHが 1 1. 0〜13. 5のアルカリ溶液 を用いてアル力リ溶液処理することを含む、 請求項 1項又は 2項に記載の製造方 法。  6. The production method according to claim 1 or 2, wherein the step (iii) includes treating with an alkaline solution having a pH of 11.0 to 13.5.
7. 請求項 1〜6項のいずれか 1項に記載の方法によって製造された酸ィ匕物 (Ai一 ZDZ) (W1_XRX) 2087. produced by a method according to any one of claims 1-6 wherein the Sani匕物(Ai one Z D Z) (W 1 _ X R X) 2 0 8.
8. L* a *b *表色系表示にて、 aがー 1以上 0以下、 かつ bが 0以上 2. 5以下であって、 透明または白色を呈する酸化物  8. In the L * a * b * color system display, a is -1 to 0 and b is 0 to 2.5 and the oxide is transparent or white.
(AT _ZDZ) (WI - RX) 2°8 (ここで、 Aは Z r又は H f又はそれらの 混合物、 Dは酸化ジルコニウム又は酸化ハフニウムに固溶し得る元素、 Zは 0以 上 0 . 2以下の数値、 Rは酸化タングステンに固溶し得る元素、 Xは 0以上 0 . 2 5以下の数値である) 。 (AT _ Z D Z ) (WI-R X ) 2 ° 8 (where A is Zr or Hf or their Mixture, D is an element that can be dissolved in zirconium oxide or hafnium oxide, Z is a value between 0 and 0.2, R is an element that can be dissolved in tungsten oxide, X is a value between 0 and 0.25 Is).
PCT/JP2003/003424 2002-03-22 2003-03-20 Tungstate compound and method for production thereof WO2003080516A1 (en)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5453700A (en) * 1977-10-07 1979-04-27 Tokuyama Soda Co Ltd Production of zirconium tungstate
US5514360A (en) * 1995-03-01 1996-05-07 The State Of Oregon, Acting By And Through The Oregon State Board Of Higher Education, Acting For And On Behalf Of Oregon State University Negative thermal expansion materials
US6183716B1 (en) * 1997-07-30 2001-02-06 State Of Oregon Acting By And Through The State Board Of Higher Education Of Behalf Of Oregon State University Solution method for making molybdate and tungstate negative thermal expansion materials and compounds made by the method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5453700A (en) * 1977-10-07 1979-04-27 Tokuyama Soda Co Ltd Production of zirconium tungstate
US5514360A (en) * 1995-03-01 1996-05-07 The State Of Oregon, Acting By And Through The Oregon State Board Of Higher Education, Acting For And On Behalf Of Oregon State University Negative thermal expansion materials
US6183716B1 (en) * 1997-07-30 2001-02-06 State Of Oregon Acting By And Through The State Board Of Higher Education Of Behalf Of Oregon State University Solution method for making molybdate and tungstate negative thermal expansion materials and compounds made by the method

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