WO2003092256A3 - Projection method and projection system comprising an optical filtering process - Google Patents

Projection method and projection system comprising an optical filtering process Download PDF

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Publication number
WO2003092256A3
WO2003092256A3 PCT/EP2003/004012 EP0304012W WO03092256A3 WO 2003092256 A3 WO2003092256 A3 WO 2003092256A3 EP 0304012 W EP0304012 W EP 0304012W WO 03092256 A3 WO03092256 A3 WO 03092256A3
Authority
WO
WIPO (PCT)
Prior art keywords
imaging system
filtering process
optical
projection
pupil
Prior art date
Application number
PCT/EP2003/004012
Other languages
German (de)
French (fr)
Other versions
WO2003092256A2 (en
Inventor
Christian Wagner
Martin Brunotte
Volker Graeschus
Paul Graeupner
Original Assignee
Zeiss Carl Smt Ag
Christian Wagner
Martin Brunotte
Volker Graeschus
Paul Graeupner
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Christian Wagner, Martin Brunotte, Volker Graeschus, Paul Graeupner filed Critical Zeiss Carl Smt Ag
Priority to AU2003224088A priority Critical patent/AU2003224088A1/en
Publication of WO2003092256A2 publication Critical patent/WO2003092256A2/en
Publication of WO2003092256A3 publication Critical patent/WO2003092256A3/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift

Abstract

According to the invention, an imaging system is used during the imaging of a pattern arranged in an object plane of an optical imaging system into the image plane of said imaging system, wherein a plurality of optical elements and at least one pupil plane are located between the object plane and the image plane, said pupil planes being Fourier-transformed into field planes of the imaging system. An angle-selective, optical filtering process is carried out in the region of the field planes by means of an optical filter element, the angle-dependent filter function of said filter element being calculated as a function of a desired fixed filter function for the region of the pupil.
PCT/EP2003/004012 2002-04-24 2003-04-17 Projection method and projection system comprising an optical filtering process WO2003092256A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2003224088A AU2003224088A1 (en) 2002-04-24 2003-04-17 Projection method and projection system comprising an optical filtering process

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10218989A DE10218989A1 (en) 2002-04-24 2002-04-24 Projection method and projection system with optical filtering
DE10218989.7 2002-04-24

Publications (2)

Publication Number Publication Date
WO2003092256A2 WO2003092256A2 (en) 2003-11-06
WO2003092256A3 true WO2003092256A3 (en) 2004-09-16

Family

ID=28798877

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2003/004012 WO2003092256A2 (en) 2002-04-24 2003-04-17 Projection method and projection system comprising an optical filtering process

Country Status (3)

Country Link
AU (1) AU2003224088A1 (en)
DE (1) DE10218989A1 (en)
WO (1) WO2003092256A2 (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1700168A2 (en) * 2003-12-22 2006-09-13 Koninklijke Philips Electronics N.V. Lithographic projection device, method and substrate for manufacturing electronic devices, and obtained electronic device
WO2005069078A1 (en) 2004-01-19 2005-07-28 Carl Zeiss Smt Ag Microlithographic projection exposure apparatus with immersion projection lens
EP1759248A1 (en) * 2004-06-04 2007-03-07 Carl Zeiss SMT AG Projection system with compensation of intensity variatons and compensation element therefor
JP4599936B2 (en) 2004-08-17 2010-12-15 株式会社ニコン Illumination optical apparatus, adjustment method of illumination optical apparatus, exposure apparatus, and exposure method
DE102005015627A1 (en) 2005-04-06 2006-10-12 Carl Zeiss Smt Ag Optical imaging device
EP1904894A1 (en) * 2005-07-18 2008-04-02 Carl Zeiss SMT AG Pellicle for use in a microlithographic exposure apparatus
DE102005042496A1 (en) 2005-09-05 2007-03-08 Carl Zeiss Sms Gmbh Method of correcting apodization in microscopic imaging systems
JP5097119B2 (en) 2005-11-03 2012-12-12 カール・ツァイス・エスエムティー・ゲーエムベーハー Microlithography projection exposure apparatus
KR101164460B1 (en) * 2006-04-07 2012-07-18 신에쓰 가가꾸 고교 가부시끼가이샤 Pellicle for lithography
JP5299937B2 (en) 2006-05-18 2013-09-25 カール・ツァイス・エスエムティー・ゲーエムベーハー How to correct the optical proximity effect
EP1906251A1 (en) 2006-09-26 2008-04-02 Carl Zeiss SMT AG Projection exposure method and projection exposure system
EP2188673A1 (en) 2007-08-03 2010-05-26 Carl Zeiss SMT AG Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate
WO2012041341A1 (en) 2010-09-30 2012-04-05 Carl Zeiss Smt Gmbh Projection exposure system and projection exposure method
DE102017208340A1 (en) 2017-05-17 2018-11-22 Carl Zeiss Smt Gmbh Projection exposure method and projection objective with adjustment of the pupil transmission

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5595857A (en) * 1990-10-24 1997-01-21 Hitachi, Ltd. Method of forming a pattern and projection exposure apparatus
JPH0968790A (en) * 1995-08-30 1997-03-11 Nec Corp Photomask
WO2001002907A1 (en) * 1999-07-01 2001-01-11 Smith Bruce W Apparatus and method of image enhancement through spatial filtering
JP2001085315A (en) * 1999-09-16 2001-03-30 Nikon Corp Illumination optical apparatus and aligner having illumination optical apparatus
US6233041B1 (en) * 1990-08-21 2001-05-15 Nikon Corporation Exposure method utilizing diffracted light having different orders of diffraction

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08316124A (en) * 1995-05-19 1996-11-29 Hitachi Ltd Method and apparatus for projection exposing
DE19929403A1 (en) * 1999-06-26 2000-12-28 Zeiss Carl Fa Objective, in particular objective for a semiconductor lithography projection exposure system and manufacturing method

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6233041B1 (en) * 1990-08-21 2001-05-15 Nikon Corporation Exposure method utilizing diffracted light having different orders of diffraction
US5595857A (en) * 1990-10-24 1997-01-21 Hitachi, Ltd. Method of forming a pattern and projection exposure apparatus
JPH0968790A (en) * 1995-08-30 1997-03-11 Nec Corp Photomask
WO2001002907A1 (en) * 1999-07-01 2001-01-11 Smith Bruce W Apparatus and method of image enhancement through spatial filtering
JP2001085315A (en) * 1999-09-16 2001-03-30 Nikon Corp Illumination optical apparatus and aligner having illumination optical apparatus

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 1997, no. 07 31 July 1997 (1997-07-31) *
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 20 10 July 2001 (2001-07-10) *

Also Published As

Publication number Publication date
DE10218989A1 (en) 2003-11-06
AU2003224088A8 (en) 2003-11-10
WO2003092256A2 (en) 2003-11-06
AU2003224088A1 (en) 2003-11-10

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