WO2003105182A3 - Externally excited torroidal plasma source with magnetic control of ion distribution - Google Patents

Externally excited torroidal plasma source with magnetic control of ion distribution Download PDF

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Publication number
WO2003105182A3
WO2003105182A3 PCT/US2003/018025 US0318025W WO03105182A3 WO 2003105182 A3 WO2003105182 A3 WO 2003105182A3 US 0318025 W US0318025 W US 0318025W WO 03105182 A3 WO03105182 A3 WO 03105182A3
Authority
WO
WIPO (PCT)
Prior art keywords
processing region
tube
plasma source
plasma
reentrant
Prior art date
Application number
PCT/US2003/018025
Other languages
French (fr)
Other versions
WO2003105182A2 (en
Inventor
Kenneth S Collins
Hiroji Hanawa
Yan Ye
Kartik Ramaswamy
Andrew Nguyen
Michael S Barnes
Huong Thanh Nguyen
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to KR1020047019828A priority Critical patent/KR101011580B1/en
Publication of WO2003105182A2 publication Critical patent/WO2003105182A2/en
Publication of WO2003105182A3 publication Critical patent/WO2003105182A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32412—Plasma immersion ion implantation

Abstract

A plasma reactor is described that includes a vacuum chamber defined by an enclosure including a side wall and a workpiece support pedestal within the chamber defining a processing region overlying said pedestal. The chamber has at least a first pair of ports near opposing sides of said processing region and a first external reentrant tube is connected at respective ends thereof to the pair of ports. The reactor further includes a process gas injection apparatus (such as a gas distribution plate) and an RF power applicator coupled to the reentrant tube for applying plasma source power to process gases within the tube to produce a reentrant torroidal plasma current through the first tube and across said processing region. A magnet controls radial distribution of plasma ion density in the processing region, the magnet having an elongated pole piece defining a pole piece axis intersecting the processing region.
PCT/US2003/018025 2002-06-05 2003-06-05 Externally excited torroidal plasma source with magnetic control of ion distribution WO2003105182A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020047019828A KR101011580B1 (en) 2002-06-05 2003-06-05 Externally excited torroidal plasma source with magnetic control of ion distribution

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/164,327 2002-06-05
US10/164,327 US6939434B2 (en) 2000-08-11 2002-06-05 Externally excited torroidal plasma source with magnetic control of ion distribution

Publications (2)

Publication Number Publication Date
WO2003105182A2 WO2003105182A2 (en) 2003-12-18
WO2003105182A3 true WO2003105182A3 (en) 2004-03-04

Family

ID=29710179

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2003/018025 WO2003105182A2 (en) 2002-06-05 2003-06-05 Externally excited torroidal plasma source with magnetic control of ion distribution

Country Status (4)

Country Link
US (7) US6939434B2 (en)
KR (1) KR101011580B1 (en)
TW (1) TWI333396B (en)
WO (1) WO2003105182A2 (en)

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