WO2004015862A3 - Acoustic resonators - Google Patents
Acoustic resonators Download PDFInfo
- Publication number
- WO2004015862A3 WO2004015862A3 PCT/GB2003/003504 GB0303504W WO2004015862A3 WO 2004015862 A3 WO2004015862 A3 WO 2004015862A3 GB 0303504 W GB0303504 W GB 0303504W WO 2004015862 A3 WO2004015862 A3 WO 2004015862A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- primer
- layer
- electrode
- layers
- substrate
- Prior art date
Links
- 239000013078 crystal Substances 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/42—Piezoelectric device making
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49005—Acoustic transducer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
- Y10T29/49156—Manufacturing circuit on or in base with selective destruction of conductive paths
Abstract
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10393038T DE10393038B4 (en) | 2002-08-13 | 2003-08-11 | Acoustic resonator, as well as its production and selection process for a primary or base layer with crystallographic structure |
GB0501682A GB2406582A (en) | 2002-08-13 | 2003-08-11 | Acoustic resonators |
AU2003252992A AU2003252992A1 (en) | 2002-08-13 | 2003-08-11 | Acoustic resonators |
JP2004527057A JP5116945B2 (en) | 2002-08-13 | 2003-08-11 | Acoustic resonator |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US40272802P | 2002-08-13 | 2002-08-13 | |
GB0218762A GB0218762D0 (en) | 2002-08-13 | 2002-08-13 | Acoustic resonators |
US60/402,728 | 2002-08-13 | ||
GB0218762.3 | 2002-08-13 | ||
GB0227981.8 | 2002-11-30 | ||
GB0227981A GB0227981D0 (en) | 2002-11-30 | 2002-11-30 | Acoustic resonators |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2004015862A2 WO2004015862A2 (en) | 2004-02-19 |
WO2004015862A3 true WO2004015862A3 (en) | 2004-10-14 |
Family
ID=31721069
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/GB2003/003504 WO2004015862A2 (en) | 2002-08-13 | 2003-08-11 | Acoustic resonators |
Country Status (5)
Country | Link |
---|---|
JP (2) | JP5116945B2 (en) |
AU (1) | AU2003252992A1 (en) |
DE (1) | DE10393038B4 (en) |
GB (1) | GB2406582A (en) |
WO (1) | WO2004015862A2 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6944922B2 (en) * | 2002-08-13 | 2005-09-20 | Trikon Technologies Limited | Method of forming an acoustic resonator |
JP5983164B2 (en) * | 2012-08-07 | 2016-08-31 | 旭硝子株式会社 | Glass substrate with Ti film, glass substrate with metal film using the same, glass substrate with Ti film, method for producing glass substrate with metal film using the same, and method for evaluating flatness of glass substrate surface |
CN104767500B (en) * | 2014-01-03 | 2018-11-09 | 佛山市艾佛光通科技有限公司 | Cavity type thin film bulk acoustic wave resonator and preparation method thereof |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5587620A (en) * | 1993-12-21 | 1996-12-24 | Hewlett-Packard Company | Tunable thin film acoustic resonators and method for making the same |
EP0963040A2 (en) * | 1998-06-02 | 1999-12-08 | Hewlett-Packard Company | Acoustic resonator and method for making the same |
EP1054460A2 (en) * | 1999-05-20 | 2000-11-22 | TDK Corporation | Thin film piezoelectric device for acoustic resonators |
US20020006733A1 (en) * | 2000-04-27 | 2002-01-17 | Tdk Corporation | Multilayer thin film and its fabrication process as well as electron device |
GB2391408A (en) * | 2002-07-30 | 2004-02-04 | Agilent Technologies Inc | FBAR thin-film resonator with protective layer |
US20040021400A1 (en) * | 2002-07-30 | 2004-02-05 | Bradley Paul D. | Resonator with seed layer |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4482833A (en) * | 1981-04-01 | 1984-11-13 | Westinghouse Electric Corp. | Method for obtaining oriented gold and piezoelectric films |
US4502932A (en) * | 1983-10-13 | 1985-03-05 | The United States Of America As Represented By The United States Department Of Energy | Acoustic resonator and method of making same |
JPS61170561A (en) * | 1985-01-25 | 1986-08-01 | Nippon Telegr & Teleph Corp <Ntt> | Formation of high melting point metal film |
JP2659394B2 (en) * | 1988-05-09 | 1997-09-30 | 三井東圧化学株式会社 | Semiconductor thin film manufacturing method |
KR960000190B1 (en) * | 1992-11-09 | 1996-01-03 | 엘지전자주식회사 | Semiconductor manufacturing method and apparatus thereof |
JPH10308393A (en) * | 1997-05-02 | 1998-11-17 | Tokyo Electron Ltd | Manufacture and manufacturing device of semiconductor device |
JP3813740B2 (en) * | 1997-07-11 | 2006-08-23 | Tdk株式会社 | Substrates for electronic devices |
JP2000160337A (en) * | 1998-11-30 | 2000-06-13 | Hitachi Ltd | Magnetron sputtering device |
JP2000273629A (en) * | 1999-03-18 | 2000-10-03 | Ulvac Japan Ltd | Formation of low resistance metallic thin film |
GB2349392B (en) * | 1999-04-20 | 2003-10-22 | Trikon Holdings Ltd | A method of depositing a layer |
US6349454B1 (en) * | 1999-07-29 | 2002-02-26 | Agere Systems Guardian Corp. | Method of making thin film resonator apparatus |
JP4021601B2 (en) * | 1999-10-29 | 2007-12-12 | 株式会社東芝 | Sputtering apparatus and film forming method |
AU2001272643A1 (en) * | 2000-07-27 | 2002-02-13 | Stephen Robert Burgess | Magnetron sputtering |
JP4016583B2 (en) * | 2000-08-31 | 2007-12-05 | 株式会社村田製作所 | Piezoelectric thin film resonator, filter and electronic device |
US6377137B1 (en) * | 2000-09-11 | 2002-04-23 | Agilent Technologies, Inc. | Acoustic resonator filter with reduced electromagnetic influence due to die substrate thickness |
JP2002374145A (en) * | 2001-06-15 | 2002-12-26 | Ube Electronics Ltd | Piezoelectric thin-film resonator |
-
2003
- 2003-08-11 AU AU2003252992A patent/AU2003252992A1/en not_active Abandoned
- 2003-08-11 JP JP2004527057A patent/JP5116945B2/en not_active Expired - Lifetime
- 2003-08-11 WO PCT/GB2003/003504 patent/WO2004015862A2/en active Application Filing
- 2003-08-11 DE DE10393038T patent/DE10393038B4/en not_active Expired - Lifetime
- 2003-08-11 GB GB0501682A patent/GB2406582A/en not_active Withdrawn
-
2010
- 2010-01-29 JP JP2010019112A patent/JP5074540B2/en not_active Expired - Lifetime
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5587620A (en) * | 1993-12-21 | 1996-12-24 | Hewlett-Packard Company | Tunable thin film acoustic resonators and method for making the same |
EP0963040A2 (en) * | 1998-06-02 | 1999-12-08 | Hewlett-Packard Company | Acoustic resonator and method for making the same |
EP1054460A2 (en) * | 1999-05-20 | 2000-11-22 | TDK Corporation | Thin film piezoelectric device for acoustic resonators |
US20020006733A1 (en) * | 2000-04-27 | 2002-01-17 | Tdk Corporation | Multilayer thin film and its fabrication process as well as electron device |
GB2391408A (en) * | 2002-07-30 | 2004-02-04 | Agilent Technologies Inc | FBAR thin-film resonator with protective layer |
US20040021400A1 (en) * | 2002-07-30 | 2004-02-05 | Bradley Paul D. | Resonator with seed layer |
Non-Patent Citations (2)
Title |
---|
LEE S-H ET AL: "Influence of electrodes and Bragg reflector on the quality of thin film bulk acoustic wave resonators", 2002 IEEE INTERNATIONAL FREQUENCY CONTROL SYMPOSIUM AND PDA EXHIBITION, NEW ORLEANS, USA, 29 May 2002 (2002-05-29) - 31 May 2002 (2002-05-31), pages 45 - 49, XP010618917, ISBN: 0-7803-7082-1 * |
YOSHINO Y ET AL: "Effect of buffer electrodes in crystallization of zinc oxide thin film for thin film bulk acoustic wave resonator", MATERIALS SCIENCE OF MICROELECTROMECHANICAL SYSTEMS (MEMS) DEVICES II. SYMPOSIUM, BOSTON, USA, 29 November 1999 (1999-11-29) - 1 December 1999 (1999-12-01), Mat. Res. Soc. Symp. Proc., vol. 605, 2000, pages 267 - 272, XP009030776, ISBN: 1-55899-513-7 * |
Also Published As
Publication number | Publication date |
---|---|
WO2004015862A2 (en) | 2004-02-19 |
DE10393038T5 (en) | 2005-07-28 |
GB0501682D0 (en) | 2005-03-02 |
JP5074540B2 (en) | 2012-11-14 |
JP2010161781A (en) | 2010-07-22 |
JP5116945B2 (en) | 2013-01-09 |
GB2406582A (en) | 2005-04-06 |
AU2003252992A1 (en) | 2004-02-25 |
JP2005536098A (en) | 2005-11-24 |
DE10393038B4 (en) | 2013-11-07 |
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