WO2004019077A3 - Structures and methods for reducing retardance - Google Patents
Structures and methods for reducing retardance Download PDFInfo
- Publication number
- WO2004019077A3 WO2004019077A3 PCT/US2003/026164 US0326164W WO2004019077A3 WO 2004019077 A3 WO2004019077 A3 WO 2004019077A3 US 0326164 W US0326164 W US 0326164W WO 2004019077 A3 WO2004019077 A3 WO 2004019077A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- retardance
- cubic crystalline
- structures
- optical elements
- methods
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S359/00—Optical: systems and elements
- Y10S359/90—Methods
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004529761A JP4831967B2 (en) | 2002-08-22 | 2003-08-21 | Optical system, optical apparatus, optical imaging method, method for reducing retardance caused by intrinsic birefringence, photolithography system, and method of forming semiconductor device |
AU2003258318A AU2003258318A1 (en) | 2002-08-22 | 2003-08-21 | Structures and methods for reducing retardance |
Applications Claiming Priority (10)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US40585302P | 2002-08-22 | 2002-08-22 | |
US60/405,853 | 2002-08-22 | ||
US43268802P | 2002-12-11 | 2002-12-11 | |
US60/432,688 | 2002-12-11 | ||
US10/331,103 US6958864B2 (en) | 2002-08-22 | 2002-12-26 | Structures and methods for reducing polarization aberration in integrated circuit fabrication systems |
US10/331,101 US7072102B2 (en) | 2002-08-22 | 2002-12-26 | Methods for reducing polarization aberration in optical systems |
US10/331,159 US7075720B2 (en) | 2002-08-22 | 2002-12-26 | Structures and methods for reducing polarization aberration in optical systems |
US10/331,101 | 2002-12-26 | ||
US10/331,103 | 2002-12-26 | ||
US10/331,159 | 2002-12-26 |
Publications (3)
Publication Number | Publication Date |
---|---|
WO2004019077A2 WO2004019077A2 (en) | 2004-03-04 |
WO2004019077A9 WO2004019077A9 (en) | 2004-04-08 |
WO2004019077A3 true WO2004019077A3 (en) | 2005-05-06 |
Family
ID=31892049
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2003/026164 WO2004019077A2 (en) | 2002-08-22 | 2003-08-21 | Structures and methods for reducing retardance |
Country Status (4)
Country | Link |
---|---|
US (5) | US7075720B2 (en) |
JP (1) | JP4831967B2 (en) |
AU (1) | AU2003258318A1 (en) |
WO (1) | WO2004019077A2 (en) |
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US7075720B2 (en) * | 2002-08-22 | 2006-07-11 | Asml Netherlands B.V. | Structures and methods for reducing polarization aberration in optical systems |
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2002
- 2002-12-26 US US10/331,159 patent/US7075720B2/en not_active Expired - Lifetime
- 2002-12-26 US US10/331,103 patent/US6958864B2/en not_active Expired - Lifetime
- 2002-12-26 US US10/331,101 patent/US7072102B2/en not_active Expired - Lifetime
-
2003
- 2003-08-21 WO PCT/US2003/026164 patent/WO2004019077A2/en active Application Filing
- 2003-08-21 AU AU2003258318A patent/AU2003258318A1/en not_active Abandoned
- 2003-08-21 JP JP2004529761A patent/JP4831967B2/en not_active Expired - Fee Related
-
2006
- 2006-04-12 US US11/402,025 patent/US7511885B2/en not_active Expired - Fee Related
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2009
- 2009-02-17 US US12/372,462 patent/US7656582B2/en not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
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US6366404B1 (en) * | 1999-01-06 | 2002-04-02 | Nikon Corporation | Projection optical system, production method thereof, and projection exposure apparatus using it |
Also Published As
Publication number | Publication date |
---|---|
US20040036971A1 (en) | 2004-02-26 |
WO2004019077A2 (en) | 2004-03-04 |
US6958864B2 (en) | 2005-10-25 |
US7075720B2 (en) | 2006-07-11 |
US7656582B2 (en) | 2010-02-02 |
JP4831967B2 (en) | 2011-12-07 |
US20040036985A1 (en) | 2004-02-26 |
US20060187549A1 (en) | 2006-08-24 |
AU2003258318A1 (en) | 2004-03-11 |
AU2003258318A8 (en) | 2004-03-11 |
US7511885B2 (en) | 2009-03-31 |
US20090153964A1 (en) | 2009-06-18 |
US20040036961A1 (en) | 2004-02-26 |
WO2004019077A9 (en) | 2004-04-08 |
US7072102B2 (en) | 2006-07-04 |
JP2005535939A (en) | 2005-11-24 |
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