WO2004044025A8 - Anti-reflective coatings for photolithography and methods of preparation thereof - Google Patents

Anti-reflective coatings for photolithography and methods of preparation thereof

Info

Publication number
WO2004044025A8
WO2004044025A8 PCT/US2003/036354 US0336354W WO2004044025A8 WO 2004044025 A8 WO2004044025 A8 WO 2004044025A8 US 0336354 W US0336354 W US 0336354W WO 2004044025 A8 WO2004044025 A8 WO 2004044025A8
Authority
WO
WIPO (PCT)
Prior art keywords
agent
photolithography
preparation
methods
reflective coatings
Prior art date
Application number
PCT/US2003/036354
Other languages
French (fr)
Other versions
WO2004044025A3 (en
WO2004044025A2 (en
Inventor
Teresa Baldwin
Joseph Kennedy
Nancy Iwamoto
Tadashi Nakano
William Bedwell
Jason Stuck
Arlene Suedemeyer
Mello Hebert
Bo Li
Original Assignee
Honeywell Int Inc
Teresa Baldwin
Joseph Kennedy
Nancy Iwamoto
Tadashi Nakano
William Bedwell
Jason Stuck
Arlene Suedemeyer
Mello Hebert
Bo Li
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from PCT/US2002/036327 external-priority patent/WO2003044078A1/en
Application filed by Honeywell Int Inc, Teresa Baldwin, Joseph Kennedy, Nancy Iwamoto, Tadashi Nakano, William Bedwell, Jason Stuck, Arlene Suedemeyer, Mello Hebert, Bo Li filed Critical Honeywell Int Inc
Priority to AU2003295517A priority Critical patent/AU2003295517A1/en
Publication of WO2004044025A2 publication Critical patent/WO2004044025A2/en
Publication of WO2004044025A3 publication Critical patent/WO2004044025A3/en
Publication of WO2004044025A8 publication Critical patent/WO2004044025A8/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)

Abstract

Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one densifying agent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography.
PCT/US2003/036354 2002-11-12 2003-11-12 Anti-reflective coatings for photolithography and methods of preparation thereof WO2004044025A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2003295517A AU2003295517A1 (en) 2002-11-12 2003-11-12 Anti-reflective coatings for photolithography and methods of preparation thereof

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US44469702P 2002-11-12 2002-11-12
PCT/US2002/036327 WO2003044078A1 (en) 2001-11-15 2002-11-12 Anti-reflective coatings for photolithography and methods of preparation thereof
US60/444,697 2002-11-12
USPCT/US02/36327 2002-11-12
US50919903P 2003-10-07 2003-10-07
US60/509,199 2003-10-07

Publications (3)

Publication Number Publication Date
WO2004044025A2 WO2004044025A2 (en) 2004-05-27
WO2004044025A3 WO2004044025A3 (en) 2004-07-15
WO2004044025A8 true WO2004044025A8 (en) 2004-10-07

Family

ID=32685877

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2003/036354 WO2004044025A2 (en) 2002-11-12 2003-11-12 Anti-reflective coatings for photolithography and methods of preparation thereof

Country Status (2)

Country Link
AU (1) AU2003295517A1 (en)
WO (1) WO2004044025A2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8809482B2 (en) 2008-12-10 2014-08-19 Dow Corning Corporation Silsesquioxane resins
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100804873B1 (en) 1999-06-10 2008-02-20 얼라이드시그날 인코퍼레이티드 Spin-on-glass anti-reflective coatings for photolithography
EP1627007B1 (en) 2003-05-23 2007-10-31 Dow Corning Corporation Siloxane resin-based anti-reflective coating composition having high wet etch rate
ATE400672T1 (en) 2004-12-17 2008-07-15 Dow Corning METHOD FOR FORMING AN ANTIREFLECTION COATING
KR101191098B1 (en) 2004-12-17 2012-10-15 다우 코닝 코포레이션 Siloxane resin coating
NO325797B1 (en) * 2005-10-14 2008-07-21 Nor X Ind As Light preservative based on organic / inorganic hybrid polymer, process for preparation and use of same
KR101324052B1 (en) 2006-02-13 2013-11-01 다우 코닝 코포레이션 Antireflective coating material
US7550249B2 (en) 2006-03-10 2009-06-23 Az Electronic Materials Usa Corp. Base soluble polymers for photoresist compositions
WO2007144452A1 (en) * 2006-06-13 2007-12-21 Braggone Oy Hybrid inorganic-organic polymer compositions for anti-reflective coatings
US7704670B2 (en) * 2006-06-22 2010-04-27 Az Electronic Materials Usa Corp. High silicon-content thin film thermosets
US7759046B2 (en) 2006-12-20 2010-07-20 Az Electronic Materials Usa Corp. Antireflective coating compositions
US8026040B2 (en) 2007-02-20 2011-09-27 Az Electronic Materials Usa Corp. Silicone coating composition
US8524441B2 (en) 2007-02-27 2013-09-03 Az Electronic Materials Usa Corp. Silicon-based antireflective coating compositions
TWI439494B (en) * 2007-02-27 2014-06-01 Braggone Oy Process for producing an organosiloxane polymer
US8987039B2 (en) 2007-10-12 2015-03-24 Air Products And Chemicals, Inc. Antireflective coatings for photovoltaic applications
WO2009088600A1 (en) 2008-01-08 2009-07-16 Dow Corning Toray Co., Ltd. Silsesquioxane resins
EP2238198A4 (en) 2008-01-15 2011-11-16 Dow Corning Silsesquioxane resins
CN101990551B (en) 2008-03-04 2012-10-03 陶氏康宁公司 Silsesquioxane resins
US8241707B2 (en) 2008-03-05 2012-08-14 Dow Corning Corporation Silsesquioxane resins
CN104769058A (en) * 2012-08-31 2015-07-08 霍尼韦尔国际公司 Highly durable anti-reflective coatings
EP3194502A4 (en) 2015-04-13 2018-05-16 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6368400B1 (en) * 2000-07-17 2002-04-09 Honeywell International Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8809482B2 (en) 2008-12-10 2014-08-19 Dow Corning Corporation Silsesquioxane resins
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements

Also Published As

Publication number Publication date
AU2003295517A1 (en) 2004-06-03
AU2003295517A8 (en) 2004-06-03
WO2004044025A3 (en) 2004-07-15
WO2004044025A2 (en) 2004-05-27

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