WO2004082003A3 - Apparatuses and methods for forming a substantially facet-free epitaxial film - Google Patents

Apparatuses and methods for forming a substantially facet-free epitaxial film Download PDF

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Publication number
WO2004082003A3
WO2004082003A3 PCT/US2004/006408 US2004006408W WO2004082003A3 WO 2004082003 A3 WO2004082003 A3 WO 2004082003A3 US 2004006408 W US2004006408 W US 2004006408W WO 2004082003 A3 WO2004082003 A3 WO 2004082003A3
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WO
WIPO (PCT)
Prior art keywords
epitaxial film
apparatuses
methods
forming
free epitaxial
Prior art date
Application number
PCT/US2004/006408
Other languages
French (fr)
Other versions
WO2004082003A2 (en
Inventor
Jean R Vatus
Lance A Scudder
Paul B Comita
Original Assignee
Applied Materials Inc
Jean R Vatus
Lance A Scudder
Paul B Comita
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc, Jean R Vatus, Lance A Scudder, Paul B Comita filed Critical Applied Materials Inc
Publication of WO2004082003A2 publication Critical patent/WO2004082003A2/en
Publication of WO2004082003A3 publication Critical patent/WO2004082003A3/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/0237—Materials
    • H01L21/02373—Group 14 semiconducting materials
    • H01L21/02381—Silicon, silicon germanium, germanium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02524—Group 14 semiconducting materials
    • H01L21/02532—Silicon, silicon germanium, germanium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/0257—Doping during depositing
    • H01L21/02573—Conductivity type
    • H01L21/02576—N-type
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/0257—Doping during depositing
    • H01L21/02573—Conductivity type
    • H01L21/02579—P-type
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02636—Selective deposition, e.g. simultaneous growth of mono- and non-monocrystalline semiconductor materials
    • H01L21/02639—Preparation of substrate for selective deposition

Abstract

A method of making a substantially facet-free epitaxial film is disclosed. A substrate having predetermined regions is first provided. An epitaxial film forming process gas and a carrier gas are introduced into a reactor chamber. The epitaxial film forming process gas and the carrier have a flow ratio between 1:1 and 1:200. The epitaxial film is deposited into the predetermined regions of the substrate wherein the substrate has a temperature between about 350°C and about 900°C when the epitaxial film is being deposited.
PCT/US2004/006408 2003-03-07 2004-03-01 Apparatuses and methods for forming a substantially facet-free epitaxial film WO2004082003A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/384,256 US20040175893A1 (en) 2003-03-07 2003-03-07 Apparatuses and methods for forming a substantially facet-free epitaxial film
US10/384,256 2003-03-07

Publications (2)

Publication Number Publication Date
WO2004082003A2 WO2004082003A2 (en) 2004-09-23
WO2004082003A3 true WO2004082003A3 (en) 2004-12-02

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2004/006408 WO2004082003A2 (en) 2003-03-07 2004-03-01 Apparatuses and methods for forming a substantially facet-free epitaxial film

Country Status (2)

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US (1) US20040175893A1 (en)
WO (1) WO2004082003A2 (en)

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