WO2004087434A1 - Processes and donor elements for transferring thermally sensitive materials to substrates - Google Patents
Processes and donor elements for transferring thermally sensitive materials to substrates Download PDFInfo
- Publication number
- WO2004087434A1 WO2004087434A1 PCT/US2004/009187 US2004009187W WO2004087434A1 WO 2004087434 A1 WO2004087434 A1 WO 2004087434A1 US 2004009187 W US2004009187 W US 2004009187W WO 2004087434 A1 WO2004087434 A1 WO 2004087434A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- layer
- substrate
- donor element
- transfer
- organic
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
- B41M5/42—Intermediate, backcoat, or covering layers
- B41M5/44—Intermediate, backcoat, or covering layers characterised by the macromolecular compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/382—Contact thermal transfer or sublimation processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/382—Contact thermal transfer or sublimation processes
- B41M5/38207—Contact thermal transfer or sublimation processes characterised by aspects not provided for in groups B41M5/385 - B41M5/395
- B41M5/38214—Structural details, e.g. multilayer systems
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/18—Deposition of organic active material using non-liquid printing techniques, e.g. thermal transfer printing from a donor sheet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M2205/00—Printing methods or features related to printing methods; Location or type of the layers
- B41M2205/30—Thermal donors, e.g. thermal ribbons
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
- B41M5/42—Intermediate, backcoat, or covering layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having a potential-jump barrier or a surface barrier
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/464—Lateral top-gate IGFETs comprising only a single gate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having a potential-jump barrier or a surface barrier
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/466—Lateral bottom-gate IGFETs comprising only a single gate
Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP04758354A EP1606120A1 (en) | 2003-03-27 | 2004-03-25 | Processes and donor elements for transferring thermally sensitive materials to substrates |
JP2006509301A JP2006524916A (en) | 2003-03-27 | 2004-03-25 | Method and donor element for transferring a heat sensitive material to a substrate |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US45805803P | 2003-03-27 | 2003-03-27 | |
US60/458,058 | 2003-03-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2004087434A1 true WO2004087434A1 (en) | 2004-10-14 |
Family
ID=33131744
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2004/009187 WO2004087434A1 (en) | 2003-03-27 | 2004-03-25 | Processes and donor elements for transferring thermally sensitive materials to substrates |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP1606120A1 (en) |
JP (1) | JP2006524916A (en) |
KR (1) | KR20050109604A (en) |
CN (1) | CN1764551A (en) |
TW (1) | TW200508049A (en) |
WO (1) | WO2004087434A1 (en) |
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006048015A1 (en) | 2004-11-01 | 2006-05-11 | Nanofiber A/S | Soft lift-off of organic nanofibres |
WO2006055701A2 (en) * | 2004-11-19 | 2006-05-26 | Massachusetts Institute Of Technology | Low-voltage organic transistors on flexible substrates using high-gate dielectric insulators by room temperature process |
JP2006190756A (en) * | 2005-01-05 | 2006-07-20 | Konica Minolta Holdings Inc | Organic thin film transistor and its fabrication process |
JP2006351543A (en) * | 2005-06-18 | 2006-12-28 | Samsung Sdi Co Ltd | Method of patterning nano conductive film |
JP2006352143A (en) * | 2005-06-18 | 2006-12-28 | Samsung Sdi Co Ltd | Patterning method of organic semiconductor |
JP2006351613A (en) * | 2005-06-13 | 2006-12-28 | Matsushita Electric Ind Co Ltd | Field effect transistor, its manufacturing method and electronic apparatus |
WO2007094757A2 (en) * | 2005-02-22 | 2007-08-23 | Eastman Kodak Company | Adhesive transfer method of carbon nanotube layer |
WO2008010978A2 (en) | 2006-07-17 | 2008-01-24 | E. I. Du Pont De Nemours And Company | Metal compositions, thermal imaging donors and patterned multilayer compositions derived therefrom |
JP2008085312A (en) * | 2006-08-30 | 2008-04-10 | Semiconductor Energy Lab Co Ltd | Method for manufacturing semiconductor device |
JP2008537631A (en) * | 2005-03-31 | 2008-09-18 | スリーエム イノベイティブ プロパティズ カンパニー | Display manufacturing method |
GB2453766A (en) * | 2007-10-18 | 2009-04-22 | Novalia Ltd | Method of fabricating an electronic device |
WO2010015822A1 (en) * | 2008-08-05 | 2010-02-11 | Cambridge Display Technology Limited | Method of making organic thin film transistors using a laser induced thermal transfer printing process |
JP2010262980A (en) * | 2009-04-30 | 2010-11-18 | Jsr Corp | Curable composition for nanoimprint lithography, and nanoimprint method |
EP2482355A1 (en) * | 2006-07-17 | 2012-08-01 | E. I. du Pont de Nemours and Company | Thin film transistor comprising novel conductor and dielectric compositions |
US8343779B2 (en) | 2007-04-19 | 2013-01-01 | Basf Se | Method for forming a pattern on a substrate and electronic device formed thereby |
US8659014B2 (en) | 2006-08-30 | 2014-02-25 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing semiconductor device |
US20150372234A1 (en) * | 2013-03-19 | 2015-12-24 | Fujifilm Corporation | Method for producing organic semiconductor element |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2894514B1 (en) * | 2005-12-08 | 2008-02-15 | Essilor Int | METHOD OF TRANSFERRING A MICRONIC PATTERN TO AN OPTICAL ARTICLE AND OPTICAL ARTICLE THUS OBTAINED |
US7744717B2 (en) * | 2006-07-17 | 2010-06-29 | E. I. Du Pont De Nemours And Company | Process for enhancing the resolution of a thermally transferred pattern |
KR20090111091A (en) * | 2008-04-21 | 2009-10-26 | (주)모디스텍 | Conductive film structure and patterning method |
KR102480950B1 (en) * | 2014-12-24 | 2022-12-23 | 올싸거널 인코포레이티드 | Photolithographic patterning of electronic devices |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2083726A (en) | 1980-09-09 | 1982-03-24 | Minnesota Mining & Mfg | Preparation of multi-colour prints by laser irradiation and materials for use therein |
US4942141A (en) | 1989-06-16 | 1990-07-17 | Eastman Kodak Company | Infrared absorbing squarylium dyes for dye-donor element used in laser-induced thermal dye transfer |
US4948776A (en) | 1989-06-16 | 1990-08-14 | Eastman Kodak Company | Infrared absorbing chalcogenopyrylo-arylidene dyes for dye-donor element used in laser-induced thermal dye transfer |
US5019549A (en) | 1990-10-25 | 1991-05-28 | Kellogg Reid E | Donor element for thermal imaging containing infra-red absorbing squarylium compound |
EP0880303A1 (en) | 1996-11-25 | 1998-11-25 | Seiko Epson Corporation | Method of producing organic el elements, organic el elements and organic el display device |
WO1999043031A1 (en) | 1998-02-23 | 1999-08-26 | Cambridge Display Technology Ltd. | Display devices |
WO1999066483A1 (en) | 1998-06-19 | 1999-12-23 | Cambridge Display Technology Ltd. | Backlit displays |
US6087196A (en) | 1998-01-30 | 2000-07-11 | The Trustees Of Princeton University | Fabrication of organic semiconductor devices using ink jet printing |
US6358664B1 (en) * | 2000-09-15 | 2002-03-19 | 3M Innovative Properties Company | Electronically active primer layers for thermal patterning of materials for electronic devices |
US20020054201A1 (en) * | 1998-09-24 | 2002-05-09 | Hideichiro Takeda | Thermal transfer sheet, thermal transfer recording method, thermal transfer recording system, resonance circuit and process for producing the same |
US20020158574A1 (en) * | 2001-04-27 | 2002-10-31 | 3M Innovative Properties Company | Organic displays and devices containing oriented electronically active layers |
-
2004
- 2004-03-25 JP JP2006509301A patent/JP2006524916A/en active Pending
- 2004-03-25 CN CNA2004800083329A patent/CN1764551A/en active Pending
- 2004-03-25 WO PCT/US2004/009187 patent/WO2004087434A1/en not_active Application Discontinuation
- 2004-03-25 EP EP04758354A patent/EP1606120A1/en not_active Withdrawn
- 2004-03-25 KR KR1020057018045A patent/KR20050109604A/en not_active Application Discontinuation
- 2004-03-26 TW TW093108334A patent/TW200508049A/en unknown
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2083726A (en) | 1980-09-09 | 1982-03-24 | Minnesota Mining & Mfg | Preparation of multi-colour prints by laser irradiation and materials for use therein |
US4942141A (en) | 1989-06-16 | 1990-07-17 | Eastman Kodak Company | Infrared absorbing squarylium dyes for dye-donor element used in laser-induced thermal dye transfer |
US4948776A (en) | 1989-06-16 | 1990-08-14 | Eastman Kodak Company | Infrared absorbing chalcogenopyrylo-arylidene dyes for dye-donor element used in laser-induced thermal dye transfer |
US5019549A (en) | 1990-10-25 | 1991-05-28 | Kellogg Reid E | Donor element for thermal imaging containing infra-red absorbing squarylium compound |
EP0880303A1 (en) | 1996-11-25 | 1998-11-25 | Seiko Epson Corporation | Method of producing organic el elements, organic el elements and organic el display device |
US6087196A (en) | 1998-01-30 | 2000-07-11 | The Trustees Of Princeton University | Fabrication of organic semiconductor devices using ink jet printing |
WO1999043031A1 (en) | 1998-02-23 | 1999-08-26 | Cambridge Display Technology Ltd. | Display devices |
WO1999066483A1 (en) | 1998-06-19 | 1999-12-23 | Cambridge Display Technology Ltd. | Backlit displays |
US20020054201A1 (en) * | 1998-09-24 | 2002-05-09 | Hideichiro Takeda | Thermal transfer sheet, thermal transfer recording method, thermal transfer recording system, resonance circuit and process for producing the same |
US6358664B1 (en) * | 2000-09-15 | 2002-03-19 | 3M Innovative Properties Company | Electronically active primer layers for thermal patterning of materials for electronic devices |
US20020158574A1 (en) * | 2001-04-27 | 2002-10-31 | 3M Innovative Properties Company | Organic displays and devices containing oriented electronically active layers |
Cited By (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8034400B2 (en) | 2004-11-01 | 2011-10-11 | Nanofiber A/S | Soft-lift off of organic nanofibers |
WO2006048015A1 (en) | 2004-11-01 | 2006-05-11 | Nanofiber A/S | Soft lift-off of organic nanofibres |
US7408187B2 (en) | 2004-11-19 | 2008-08-05 | Massachusetts Institute Of Technology | Low-voltage organic transistors on flexible substrates using high-gate dielectric insulators by room temperature process |
WO2006055701A2 (en) * | 2004-11-19 | 2006-05-26 | Massachusetts Institute Of Technology | Low-voltage organic transistors on flexible substrates using high-gate dielectric insulators by room temperature process |
WO2006055701A3 (en) * | 2004-11-19 | 2006-08-10 | Massachusetts Inst Technology | Low-voltage organic transistors on flexible substrates using high-gate dielectric insulators by room temperature process |
JP2006190756A (en) * | 2005-01-05 | 2006-07-20 | Konica Minolta Holdings Inc | Organic thin film transistor and its fabrication process |
WO2007094757A2 (en) * | 2005-02-22 | 2007-08-23 | Eastman Kodak Company | Adhesive transfer method of carbon nanotube layer |
WO2007094757A3 (en) * | 2005-02-22 | 2007-11-01 | Eastman Kodak Co | Adhesive transfer method of carbon nanotube layer |
JP2008537631A (en) * | 2005-03-31 | 2008-09-18 | スリーエム イノベイティブ プロパティズ カンパニー | Display manufacturing method |
JP2006351613A (en) * | 2005-06-13 | 2006-12-28 | Matsushita Electric Ind Co Ltd | Field effect transistor, its manufacturing method and electronic apparatus |
JP2006352143A (en) * | 2005-06-18 | 2006-12-28 | Samsung Sdi Co Ltd | Patterning method of organic semiconductor |
JP2006351543A (en) * | 2005-06-18 | 2006-12-28 | Samsung Sdi Co Ltd | Method of patterning nano conductive film |
KR101174871B1 (en) * | 2005-06-18 | 2012-08-17 | 삼성디스플레이 주식회사 | Patterning method for organic semiconductor |
KR101223718B1 (en) * | 2005-06-18 | 2013-01-18 | 삼성디스플레이 주식회사 | Method for patterning nano conductive film |
WO2008010978A2 (en) | 2006-07-17 | 2008-01-24 | E. I. Du Pont De Nemours And Company | Metal compositions, thermal imaging donors and patterned multilayer compositions derived therefrom |
EP2482355A1 (en) * | 2006-07-17 | 2012-08-01 | E. I. du Pont de Nemours and Company | Thin film transistor comprising novel conductor and dielectric compositions |
US8659014B2 (en) | 2006-08-30 | 2014-02-25 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing semiconductor device |
JP2008085312A (en) * | 2006-08-30 | 2008-04-10 | Semiconductor Energy Lab Co Ltd | Method for manufacturing semiconductor device |
US8343779B2 (en) | 2007-04-19 | 2013-01-01 | Basf Se | Method for forming a pattern on a substrate and electronic device formed thereby |
GB2453766A (en) * | 2007-10-18 | 2009-04-22 | Novalia Ltd | Method of fabricating an electronic device |
US8969127B2 (en) | 2007-10-18 | 2015-03-03 | Novalia Ltd | Apparatus for and method of fabricating an electronic device by transfer of material onto a substrate |
WO2010015822A1 (en) * | 2008-08-05 | 2010-02-11 | Cambridge Display Technology Limited | Method of making organic thin film transistors using a laser induced thermal transfer printing process |
US8476121B2 (en) | 2008-08-05 | 2013-07-02 | Cambridge Display Technology Limited | Organic thin film transistors and methods of making them |
GB2462591B (en) * | 2008-08-05 | 2013-04-03 | Cambridge Display Tech Ltd | Organic thin film transistors and methods of making the same |
JP2010262980A (en) * | 2009-04-30 | 2010-11-18 | Jsr Corp | Curable composition for nanoimprint lithography, and nanoimprint method |
US20150372234A1 (en) * | 2013-03-19 | 2015-12-24 | Fujifilm Corporation | Method for producing organic semiconductor element |
US9711725B2 (en) | 2013-03-19 | 2017-07-18 | Fujifilm Corporation | Method for producing organic semiconductor element |
Also Published As
Publication number | Publication date |
---|---|
TW200508049A (en) | 2005-03-01 |
CN1764551A (en) | 2006-04-26 |
JP2006524916A (en) | 2006-11-02 |
EP1606120A1 (en) | 2005-12-21 |
KR20050109604A (en) | 2005-11-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP1606120A1 (en) | Processes and donor elements for transferring thermally sensitive materials to substrates | |
US7518140B2 (en) | Flat panel display and method of fabricating the same | |
US7645478B2 (en) | Methods of making displays | |
KR100694716B1 (en) | Thermal transfer of light-emitting polymers | |
US6358664B1 (en) | Electronically active primer layers for thermal patterning of materials for electronic devices | |
KR101213489B1 (en) | Radiation curable thermal transfer elements | |
US7229676B2 (en) | Thermal imaging processes and products of electroactive organic material | |
US7485576B2 (en) | Method of forming conductive pattern, thin film transistor, and method of manufacturing the same | |
US7259443B2 (en) | Methods for forming patterns on a filled dielectric material on substrates | |
US20030124265A1 (en) | Method and materials for transferring a material onto a plasma treated surface according to a pattern | |
JP2006140433A (en) | Organic thin-film transistor, its manufacturing method and flat-panel display provided therewith | |
US7316874B2 (en) | Process and donor elements for transferring thermally sensitive materials to substrates by thermal imaging | |
JP2008066439A (en) | Method of manufacturing organic thin film transistor | |
KR20060089838A (en) | Donor film for thin film transfer | |
JP2018041759A (en) | Thin-film transistor and image display device | |
KR100708694B1 (en) | Flat panel display and method for fabricating the same | |
KR100751339B1 (en) | Organic light emitting diode and method for fabricating the same | |
KR100708695B1 (en) | Flat panel display and method for fabricating the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): BW GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
DPEN | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed from 20040101) | ||
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2004758354 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1020057018045 Country of ref document: KR Ref document number: 2006509301 Country of ref document: JP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 20048083329 Country of ref document: CN |
|
WWP | Wipo information: published in national office |
Ref document number: 1020057018045 Country of ref document: KR |
|
WWP | Wipo information: published in national office |
Ref document number: 2004758354 Country of ref document: EP |
|
WWW | Wipo information: withdrawn in national office |
Ref document number: 2004758354 Country of ref document: EP |