WO2004092831A3 - Photoresists and methods for use thereof - Google Patents
Photoresists and methods for use thereof Download PDFInfo
- Publication number
- WO2004092831A3 WO2004092831A3 PCT/US2004/011025 US2004011025W WO2004092831A3 WO 2004092831 A3 WO2004092831 A3 WO 2004092831A3 US 2004011025 W US2004011025 W US 2004011025W WO 2004092831 A3 WO2004092831 A3 WO 2004092831A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- photoresists
- methods
- resists
- imaged
- chemically
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
- G03F7/405—Treatment with inorganic or organometallic reagents after imagewise removal
Abstract
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US46240903P | 2003-04-09 | 2003-04-09 | |
US60/462,409 | 2003-04-09 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2004092831A2 WO2004092831A2 (en) | 2004-10-28 |
WO2004092831A3 true WO2004092831A3 (en) | 2005-06-23 |
Family
ID=33299941
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2004/011025 WO2004092831A2 (en) | 2003-04-09 | 2004-04-09 | Photoresists and methods for use thereof |
Country Status (3)
Country | Link |
---|---|
US (2) | US7297616B2 (en) |
TW (1) | TW200506516A (en) |
WO (1) | WO2004092831A2 (en) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4149306B2 (en) * | 2003-04-30 | 2008-09-10 | 東京応化工業株式会社 | Positive resist composition and resist pattern forming method |
JP4303044B2 (en) * | 2003-06-23 | 2009-07-29 | Necエレクトロニクス株式会社 | Chemically amplified resist composition and method for manufacturing a semiconductor integrated circuit device using the chemically amplified resist composition |
US7427463B2 (en) * | 2003-10-14 | 2008-09-23 | Intel Corporation | Photoresists with reduced outgassing for extreme ultraviolet lithography |
US7951522B2 (en) * | 2004-12-29 | 2011-05-31 | Tokyo Ohka Kogyo Co., Ltd. | Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal |
US7081327B2 (en) * | 2004-12-29 | 2006-07-25 | Tokyo Ohka Kogyo Co., Ltd. | Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal |
US7927778B2 (en) * | 2004-12-29 | 2011-04-19 | Tokyo Ohka Kogyo Co., Ltd. | Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal |
US20070020386A1 (en) * | 2005-07-20 | 2007-01-25 | Bedell Daniel W | Encapsulation of chemically amplified resist template for low pH electroplating |
EP2041786A2 (en) * | 2006-07-10 | 2009-04-01 | Nxp B.V. | Integrated circuit, transponder, method of producing an integrated circuit and method of producing a transponder |
US8448870B2 (en) * | 2006-07-10 | 2013-05-28 | Nxp B.V. | Transponder and method of producing a transponder |
FR2904328B1 (en) * | 2006-07-27 | 2008-10-24 | St Microelectronics Sa | DEPOSITION BY ADSORPTION UNDER AN ELECTRIC FIELD |
JP5101541B2 (en) * | 2008-05-15 | 2012-12-19 | 信越化学工業株式会社 | Pattern formation method |
US10377692B2 (en) * | 2009-09-09 | 2019-08-13 | Sumitomo Chemical Company, Limited | Photoresist composition |
JP2011175241A (en) * | 2009-12-15 | 2011-09-08 | Rohm & Haas Electronic Materials Llc | Photoresist and method for use thereof |
EP2336827B1 (en) * | 2009-12-15 | 2015-09-16 | Rohm and Haas Electronic Materials LLC | Method for providing an ion-implanted semiconductor substrate |
US8343706B2 (en) | 2010-01-25 | 2013-01-01 | International Business Machines Corporation | Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same |
US20110300367A1 (en) | 2010-06-07 | 2011-12-08 | Ching-Kee Chien | Optical Fiber With Photoacid Coating |
JP5844613B2 (en) * | 2010-11-17 | 2016-01-20 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC | Photosensitive copolymer and photoresist composition |
EP2472327A1 (en) * | 2010-12-30 | 2012-07-04 | Rohm and Haas Electronic Materials LLC | Photoresists and methods for use thereof |
US9322986B2 (en) | 2013-06-24 | 2016-04-26 | Corning Incorporated | Optical fiber coating for short data network |
US10095113B2 (en) * | 2013-12-06 | 2018-10-09 | Taiwan Semiconductor Manufacturing Company | Photoresist and method |
US9644056B2 (en) * | 2015-02-18 | 2017-05-09 | Sumitomo Chemical Company, Limited | Compound, resin and photoresist composition |
US10451969B2 (en) | 2015-04-24 | 2019-10-22 | Toray Industries, Inc. | Resin composition, method for manufacturing semiconductor element using the same, and semiconductor device |
KR102093677B1 (en) * | 2015-11-05 | 2020-03-26 | 후지필름 가부시키가이샤 | Actinic ray-sensitive or radiation-sensitive resin composition, pattern formation method, and manufacturing method of electronic device |
EP3497519B1 (en) * | 2016-08-09 | 2020-11-25 | Merck Patent GmbH | Enviromentally stable, thick film, chemically amplified resist |
JP6648726B2 (en) * | 2017-03-22 | 2020-02-14 | 信越化学工業株式会社 | Resist material and pattern forming method |
WO2019054311A1 (en) | 2017-09-13 | 2019-03-21 | 富士フイルム株式会社 | Active light ray-sensitive or radiation-sensitive resin composition, resist film, method for forming pattern, and method for producing electronic device |
US20200209743A1 (en) * | 2018-12-31 | 2020-07-02 | Rohm And Haas Electronic Materials Llc | Composition for preparing thick film photorest, thick film photoresist, and process of preparing the same |
US20200356001A1 (en) * | 2019-05-10 | 2020-11-12 | Rohm And Haas Electronic Materials Llc | Photoresist compositions and methods of forming resist patterns with such compositions |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6042997A (en) * | 1996-06-11 | 2000-03-28 | Ibm Corporation | Copolymers and photoresist compositions comprising copolymer resin binder component |
US6352818B1 (en) * | 1999-09-01 | 2002-03-05 | Taiwan Semiconductor Manufacturing Company | Photoresist development method employing multiple photoresist developer rinse |
US6458430B1 (en) * | 1999-12-22 | 2002-10-01 | Axcelis Technologies, Inc. | Pretreatment process for plasma immersion ion implantation |
US6841338B2 (en) * | 2001-08-16 | 2005-01-11 | Samsung Electronics Co. Ltd. | Photoresist composition and method of forming a photoresist pattern with a controlled remnant ratio |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4767721A (en) * | 1986-02-10 | 1988-08-30 | Hughes Aircraft Company | Double layer photoresist process for well self-align and ion implantation masking |
JP3116751B2 (en) * | 1993-12-03 | 2000-12-11 | ジェイエスアール株式会社 | Radiation-sensitive resin composition |
US5858623A (en) * | 1997-04-07 | 1999-01-12 | Taiwan Semiconductor Manufacturing Company | Method for attenuating photoresist layer outgassing |
US6136501A (en) * | 1998-08-28 | 2000-10-24 | Shipley Company, L.L.C. | Polymers and photoresist compositions comprising same |
EP1031878A1 (en) * | 1999-02-23 | 2000-08-30 | Shipley Company LLC | Novel polymers and photoresist compositions comprising same |
US6369874B1 (en) * | 2000-04-18 | 2002-04-09 | Silicon Valley Group, Inc. | Photoresist outgassing mitigation system method and apparatus for in-vacuum lithography |
US6524936B2 (en) * | 2000-12-22 | 2003-02-25 | Axcelis Technologies, Inc. | Process for removal of photoresist after post ion implantation |
US6730452B2 (en) * | 2001-01-26 | 2004-05-04 | International Business Machines Corporation | Lithographic photoresist composition and process for its use |
JP4297408B2 (en) * | 2001-05-11 | 2009-07-15 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | Thick film photoresists and how to use them |
US7022455B2 (en) * | 2001-12-28 | 2006-04-04 | Shipley Company, L.L.C. | Photoacid-labile polymers and photoresists comprising same |
US6866986B2 (en) * | 2002-07-10 | 2005-03-15 | Cypress Semiconductor Corporation | Method of 193 NM photoresist stabilization by the use of ion implantation |
EP1422565A3 (en) * | 2002-11-20 | 2005-01-05 | Shipley Company LLC | Multilayer photoresist systems |
TWI317458B (en) * | 2003-03-03 | 2009-11-21 | Rohm & Haas Elect Mat | Polymers and photoresists comprising same |
-
2004
- 2004-04-09 WO PCT/US2004/011025 patent/WO2004092831A2/en active Application Filing
- 2004-04-09 US US10/822,225 patent/US7297616B2/en active Active
- 2004-04-09 TW TW093109851A patent/TW200506516A/en unknown
-
2007
- 2007-10-31 US US11/981,623 patent/US20080220597A1/en not_active Abandoned
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6042997A (en) * | 1996-06-11 | 2000-03-28 | Ibm Corporation | Copolymers and photoresist compositions comprising copolymer resin binder component |
US6352818B1 (en) * | 1999-09-01 | 2002-03-05 | Taiwan Semiconductor Manufacturing Company | Photoresist development method employing multiple photoresist developer rinse |
US6458430B1 (en) * | 1999-12-22 | 2002-10-01 | Axcelis Technologies, Inc. | Pretreatment process for plasma immersion ion implantation |
US6841338B2 (en) * | 2001-08-16 | 2005-01-11 | Samsung Electronics Co. Ltd. | Photoresist composition and method of forming a photoresist pattern with a controlled remnant ratio |
Also Published As
Publication number | Publication date |
---|---|
US20050032373A1 (en) | 2005-02-10 |
US20080220597A1 (en) | 2008-09-11 |
WO2004092831A2 (en) | 2004-10-28 |
US7297616B2 (en) | 2007-11-20 |
TW200506516A (en) | 2005-02-16 |
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