WO2005008747A3 - Methods and systems for inspection of wafers and reticles using designer intent data - Google Patents

Methods and systems for inspection of wafers and reticles using designer intent data Download PDF

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Publication number
WO2005008747A3
WO2005008747A3 PCT/US2004/021459 US2004021459W WO2005008747A3 WO 2005008747 A3 WO2005008747 A3 WO 2005008747A3 US 2004021459 W US2004021459 W US 2004021459W WO 2005008747 A3 WO2005008747 A3 WO 2005008747A3
Authority
WO
WIPO (PCT)
Prior art keywords
inspection
wafer
reticle
computer
methods
Prior art date
Application number
PCT/US2004/021459
Other languages
French (fr)
Other versions
WO2005008747A2 (en
Inventor
Paul Frank Marella
Sharon Mccauley
Ellis Chang
William Volk
James Wiley
Sterling Watson
Sagar A Kekare
Carl Hess
Original Assignee
Kla Tencor Technologies
Paul Frank Marella
Sharon Mccauley
Ellis Chang
William Volk
James Wiley
Sterling Watson
Sagar A Kekare
Carl Hess
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to DE602004020230T priority Critical patent/DE602004020230D1/en
Priority to KR1020067000200A priority patent/KR101089643B1/en
Priority to EP04777530A priority patent/EP1646913B1/en
Priority to CN200480025041.0A priority patent/CN1846170B/en
Priority to JP2006518815A priority patent/JP4758343B2/en
Application filed by Kla Tencor Technologies, Paul Frank Marella, Sharon Mccauley, Ellis Chang, William Volk, James Wiley, Sterling Watson, Sagar A Kekare, Carl Hess filed Critical Kla Tencor Technologies
Publication of WO2005008747A2 publication Critical patent/WO2005008747A2/en
Publication of WO2005008747A3 publication Critical patent/WO2005008747A3/en
Priority to IL172941A priority patent/IL172941A/en
Priority to IL232892A priority patent/IL232892A/en
Priority to IL248278A priority patent/IL248278A/en
Priority to IL253910A priority patent/IL253910B/en
Priority to IL281931A priority patent/IL281931B/en
Priority to IL290018A priority patent/IL290018B2/en

Links

Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/0006—Industrial image inspection using a design-rule based approach
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/7065—Defects, e.g. optical inspection of patterned layer for defects
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/0008—Industrial image inspection checking presence/absence
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95676—Masks, reticles, shadow masks
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

Abstract

Methods and systems for inspection of wafers and reticles using designer intent data are provided. One computer-implemented method includes identifying nuisance defects on a wafer based on inspection data produced by inspection of a reticle, which is used to form a pattern on the wafer prior to inspection of the wafer. Another computer-implemented method includes detecting defects on a wafer by analyzing data generated by inspection of the wafer in combination with data representative of a reticle, which includes designations identifying different types of portions of the reticle. An additional computer-implemented method includes determining a property of a manufacturing process used to process a wafer based on defects that alter a characteristic of a device formed on the wafer. Further computer-implemented methods include altering or simulating one or more characteristics of a design of an integrated circuit based on data generated by inspection of a wafer.
PCT/US2004/021459 2003-07-03 2004-07-02 Methods and systems for inspection of wafers and reticles using designer intent data WO2005008747A2 (en)

Priority Applications (11)

Application Number Priority Date Filing Date Title
DE602004020230T DE602004020230D1 (en) 2003-07-03 2004-07-02 METHOD OF INSPECTING WAFERS AND RETICLES USING DEVELOPER INTRODUCTION DATA
KR1020067000200A KR101089643B1 (en) 2003-07-03 2004-07-02 Methods and systems for inspection of wafers and reticles using designer intent data
EP04777530A EP1646913B1 (en) 2003-07-03 2004-07-02 Methods for inspection of wafers and reticles using designer intent data
CN200480025041.0A CN1846170B (en) 2003-07-03 2004-07-02 Use designer to be intended to the method and system of data checks wafer and mask
JP2006518815A JP4758343B2 (en) 2003-07-03 2004-07-02 Wafer and reticle inspection methods and systems using designer intent data
IL172941A IL172941A (en) 2003-07-03 2006-01-02 Methods for inspection of wafers and reticles using designer intent data
IL232892A IL232892A (en) 2003-07-03 2014-05-29 Monitoring fabrication of integrated circuits on a semi-conductor wafer
IL248278A IL248278A (en) 2003-07-03 2016-10-10 Monitoring fabrication of integrated circuits on semi-conductor wafer
IL253910A IL253910B (en) 2003-07-03 2017-08-08 Monitoring fabrication of integrated circuits on semi-conductor wafer
IL281931A IL281931B (en) 2003-07-03 2021-03-31 Monitoring fabrication of integrated circuits on semi-conductor wafer
IL290018A IL290018B2 (en) 2003-07-03 2022-01-20 Monitoring fabrication of integrated circuits on semi-conductor wafer

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US48533803P 2003-07-03 2003-07-03
US60/485,338 2003-07-03
US10/883,372 US9002497B2 (en) 2003-07-03 2004-07-01 Methods and systems for inspection of wafers and reticles using designer intent data
US10/883,372 2004-07-01

Publications (2)

Publication Number Publication Date
WO2005008747A2 WO2005008747A2 (en) 2005-01-27
WO2005008747A3 true WO2005008747A3 (en) 2005-08-25

Family

ID=33555782

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2004/021459 WO2005008747A2 (en) 2003-07-03 2004-07-02 Methods and systems for inspection of wafers and reticles using designer intent data

Country Status (9)

Country Link
US (5) US9002497B2 (en)
EP (1) EP1646913B1 (en)
JP (7) JP4758343B2 (en)
KR (1) KR101089643B1 (en)
CN (4) CN105652589B (en)
AT (1) ATE426835T1 (en)
DE (1) DE602004020230D1 (en)
IL (6) IL172941A (en)
WO (1) WO2005008747A2 (en)

Families Citing this family (149)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9002497B2 (en) * 2003-07-03 2015-04-07 Kla-Tencor Technologies Corp. Methods and systems for inspection of wafers and reticles using designer intent data
US7135344B2 (en) * 2003-07-11 2006-11-14 Applied Materials, Israel, Ltd. Design-based monitoring
US20050234684A1 (en) * 2004-04-19 2005-10-20 Mentor Graphics Corp. Design for manufacturability
US8151220B2 (en) * 2003-12-04 2012-04-03 Kla-Tencor Technologies Corp. Methods for simulating reticle layout data, inspecting reticle layout data, and generating a process for inspecting reticle layout data
JP4758358B2 (en) * 2004-01-29 2011-08-24 ケーエルエー−テンカー コーポレイション Computer-implemented method for detecting defects in reticle design data
US9188974B1 (en) 2004-02-13 2015-11-17 Kla-Tencor Technologies Corp. Methods for improved monitor and control of lithography processes
JP2007536673A (en) * 2004-05-09 2007-12-13 メンター・グラフィクス・コーポレーション Probable defect position identification method, Probable defect position identification tool
JP4904034B2 (en) * 2004-09-14 2012-03-28 ケーエルエー−テンカー コーポレイション Method, system and carrier medium for evaluating reticle layout data
US7562333B2 (en) * 2004-12-23 2009-07-14 Texas Instruments Incorporated Method and process for generating an optical proximity correction model based on layout density
US20060199087A1 (en) * 2005-03-03 2006-09-07 Lucas Kevin D Method of making an integrated circuit by modifying a design layout by accounting for a parameter that varies based on a location within an exposure field
US7310585B2 (en) * 2005-05-12 2007-12-18 International Business Machines Corporation Method of inspecting integrated circuits during fabrication
US9037280B2 (en) * 2005-06-06 2015-05-19 Kla-Tencor Technologies Corp. Computer-implemented methods for performing one or more defect-related functions
US7769225B2 (en) * 2005-08-02 2010-08-03 Kla-Tencor Technologies Corp. Methods and systems for detecting defects in a reticle design pattern
US7228193B2 (en) * 2005-08-15 2007-06-05 Texas Instruments Incorporated Methods for detecting structure dependent process defects
KR100652297B1 (en) 2005-09-29 2006-11-29 동부일렉트로닉스 주식회사 Method for detecting nuisance defect according to increase of sensitivity in semiconductor equipments
JP4774917B2 (en) * 2005-10-27 2011-09-21 凸版印刷株式会社 Mask pattern inspection apparatus and inspection method
US7676077B2 (en) 2005-11-18 2010-03-09 Kla-Tencor Technologies Corp. Methods and systems for utilizing design data in combination with inspection data
EP1955225A4 (en) * 2005-11-18 2009-11-04 Kla Tencor Tech Corp Methods and systems for utilizing design data in combination with inspection data
US7570796B2 (en) * 2005-11-18 2009-08-04 Kla-Tencor Technologies Corp. Methods and systems for utilizing design data in combination with inspection data
US8041103B2 (en) * 2005-11-18 2011-10-18 Kla-Tencor Technologies Corp. Methods and systems for determining a position of inspection data in design data space
KR101195226B1 (en) * 2005-12-29 2012-10-29 삼성전자주식회사 Semiconductor wafer analysis system
JP5152612B2 (en) * 2006-02-23 2013-02-27 株式会社ニコン Information management method, information management system, program, recording medium, pattern inspection apparatus, and substrate inspection apparatus
US20070210453A1 (en) * 2006-03-13 2007-09-13 Texas Instruments Inc. Dummy-fill-structure placement for improved device feature location and access for integrated circuit failure analysis
US7194328B1 (en) * 2006-04-04 2007-03-20 Advanced Micro Devices, Inc. Method and apparatus for tracking reticle history
US8050793B1 (en) * 2006-04-04 2011-11-01 Advanced Micro Devices, Inc. Method and apparatus for linking reticle manufacturing data
DE102006025351B4 (en) * 2006-05-31 2013-04-04 Globalfoundries Inc. Test structure for monitoring leakage currents in a metallization layer and method
US7711177B2 (en) * 2006-06-08 2010-05-04 Kla-Tencor Technologies Corp. Methods and systems for detecting defects on a specimen using a combination of bright field channel data and dark field channel data
US8102408B2 (en) * 2006-06-29 2012-01-24 Kla-Tencor Technologies Corp. Computer-implemented methods and systems for determining different process windows for a wafer printing process for different reticle designs
KR101235171B1 (en) * 2006-08-01 2013-02-20 어플라이드 머티리얼즈 이스라엘 리미티드 Method and system for defect detection
DE102006051489B4 (en) * 2006-10-31 2011-12-22 Advanced Micro Devices, Inc. Test structure for OPC-induced short circuits between lines in a semiconductor device and measurement method
US7904845B2 (en) * 2006-12-06 2011-03-08 Kla-Tencor Corp. Determining locations on a wafer to be reviewed during defect review
US7877722B2 (en) * 2006-12-19 2011-01-25 Kla-Tencor Corp. Systems and methods for creating inspection recipes
US20080162103A1 (en) * 2006-12-29 2008-07-03 Cadence Design Systems, Inc. Method, system, and computer program product for concurrent model aided electronic design automation
US8194968B2 (en) * 2007-01-05 2012-06-05 Kla-Tencor Corp. Methods and systems for using electrical information for a device being fabricated on a wafer to perform one or more defect-related functions
JP4989279B2 (en) * 2007-04-05 2012-08-01 株式会社東芝 Parameter value adjusting method, semiconductor device manufacturing method, and program
JP4417975B2 (en) * 2007-04-20 2010-02-17 株式会社東芝 Semiconductor integrated circuit design method, design apparatus, and design program
US7962863B2 (en) 2007-05-07 2011-06-14 Kla-Tencor Corp. Computer-implemented methods, systems, and computer-readable media for determining a model for predicting printability of reticle features on a wafer
US7738093B2 (en) 2007-05-07 2010-06-15 Kla-Tencor Corp. Methods for detecting and classifying defects on a reticle
US8213704B2 (en) * 2007-05-09 2012-07-03 Kla-Tencor Corp. Methods and systems for detecting defects in a reticle design pattern
US9151712B1 (en) 2007-05-30 2015-10-06 Kla-Tencor Corporation Rule checking for metrology and inspection
JP5064116B2 (en) * 2007-05-30 2012-10-31 Ｈｏｙａ株式会社 Photomask inspection method, photomask manufacturing method, and electronic component manufacturing method
CN101344715B (en) * 2007-07-10 2011-07-13 联华电子股份有限公司 Photomask detection method and on-line immediate photomask detection method
DE102007032958A1 (en) * 2007-07-14 2009-01-15 Carl Zeiss Sms Gmbh Method for determining lithographically relevant mask defects
US7796804B2 (en) * 2007-07-20 2010-09-14 Kla-Tencor Corp. Methods for generating a standard reference die for use in a die to standard reference die inspection and methods for inspecting a wafer
US7711514B2 (en) * 2007-08-10 2010-05-04 Kla-Tencor Technologies Corp. Computer-implemented methods, carrier media, and systems for generating a metrology sampling plan
JP5425779B2 (en) * 2007-08-20 2014-02-26 ケーエルエー−テンカー・コーポレーション A computer-implemented method for determining whether an actual defect is a potential systematic defect or a potentially random defect
GB2452743B (en) * 2007-09-13 2012-08-29 Clipper Data Ltd Improvements relating to diving equipment
US8051093B2 (en) * 2007-12-21 2011-11-01 Advanced Micro Devices, Inc. Method and apparatus for extracting data from a data store
US8139844B2 (en) * 2008-04-14 2012-03-20 Kla-Tencor Corp. Methods and systems for determining a defect criticality index for defects on wafers
US7519216B1 (en) 2008-04-30 2009-04-14 International Business Machines Corporation Systems and methods of maintaining equipment for manufacturing semiconductor devices
US9710903B2 (en) * 2008-06-11 2017-07-18 Kla-Tencor Corp. System and method for detecting design and process defects on a wafer using process monitoring features
KR101623747B1 (en) 2008-07-28 2016-05-26 케이엘에이-텐코어 코오포레이션 Computer-implemented methods, computer-readable media, and systems for classifying defects detected in a memory device area on a wafer
JP5287178B2 (en) * 2008-11-27 2013-09-11 富士通セミコンダクター株式会社 Defect review device
JP5395814B2 (en) 2009-02-04 2014-01-22 株式会社日立ハイテクノロジーズ Semiconductor defect integrated projection method and defect inspection support apparatus equipped with semiconductor defect integrated projection function
JP5619776B2 (en) * 2009-02-06 2014-11-05 ケーエルエー−テンカー コーポレイション Method for selecting one or more parameters for wafer inspection
US8775101B2 (en) 2009-02-13 2014-07-08 Kla-Tencor Corp. Detecting defects on a wafer
US8204297B1 (en) 2009-02-27 2012-06-19 Kla-Tencor Corp. Methods and systems for classifying defects detected on a reticle
US8112241B2 (en) * 2009-03-13 2012-02-07 Kla-Tencor Corp. Methods and systems for generating an inspection process for a wafer
KR101032090B1 (en) * 2009-05-13 2011-05-02 엘아이지에이디피 주식회사 Substrate inspection method
WO2011004534A1 (en) * 2009-07-09 2011-01-13 株式会社 日立ハイテクノロジーズ Semiconductor defect classifying method, semiconductor defect classifying apparatus, and semiconductor defect classifying program
JP5275208B2 (en) * 2009-12-02 2013-08-28 株式会社東芝 Manufacturing method of semiconductor device
CN102129164B (en) * 2010-01-15 2012-08-22 中芯国际集成电路制造(上海)有限公司 Method and system for judging mask defects
JP4918598B2 (en) 2010-01-18 2012-04-18 株式会社ニューフレアテクノロジー Inspection apparatus and inspection method
US8781781B2 (en) 2010-07-30 2014-07-15 Kla-Tencor Corp. Dynamic care areas
WO2012047735A2 (en) * 2010-09-29 2012-04-12 The Regents Of The University Of California In-place resynthesis and remapping techniques for soft error mitigation in fpga
US8656323B2 (en) * 2011-02-22 2014-02-18 Kla-Tencor Corporation Based device risk assessment
US9170211B2 (en) 2011-03-25 2015-10-27 Kla-Tencor Corp. Design-based inspection using repeating structures
JP5782782B2 (en) * 2011-03-30 2015-09-24 株式会社Sumco Specific defect detection method, specific defect detection system and program
KR101800493B1 (en) 2011-04-26 2017-11-22 케이엘에이-텐코 코포레이션 Database-driven cell-to-cell reticle inspection
US20120316855A1 (en) * 2011-06-08 2012-12-13 Kla-Tencor Corporation Using Three-Dimensional Representations for Defect-Related Applications
US9087367B2 (en) 2011-09-13 2015-07-21 Kla-Tencor Corp. Determining design coordinates for wafer defects
CN104137223A (en) * 2012-01-13 2014-11-05 科磊股份有限公司 Method and appparatus for database-assisted requalification reticle inspection
US8666140B2 (en) * 2012-01-18 2014-03-04 United Microelectronics Corp. Defect inspection method for wafer and wafer defect inspection system using the same
US8831334B2 (en) 2012-01-20 2014-09-09 Kla-Tencor Corp. Segmentation for wafer inspection
US10401305B2 (en) * 2012-02-15 2019-09-03 Kla-Tencor Corporation Time-varying intensity map generation for reticles
US9269135B2 (en) * 2012-03-01 2016-02-23 Taiwan Semiconductor Manufacturing Company, Ltd. Defect management systems and methods
US8718353B2 (en) * 2012-03-08 2014-05-06 Kla-Tencor Corporation Reticle defect inspection with systematic defect filter
US10043264B2 (en) 2012-04-19 2018-08-07 Applied Materials Israel Ltd. Integration of automatic and manual defect classification
US9858658B2 (en) * 2012-04-19 2018-01-02 Applied Materials Israel Ltd Defect classification using CAD-based context attributes
US9595091B2 (en) 2012-04-19 2017-03-14 Applied Materials Israel, Ltd. Defect classification using topographical attributes
US9715723B2 (en) 2012-04-19 2017-07-25 Applied Materials Israel Ltd Optimization of unknown defect rejection for automatic defect classification
US9607233B2 (en) 2012-04-20 2017-03-28 Applied Materials Israel Ltd. Classifier readiness and maintenance in automatic defect classification
US8826200B2 (en) 2012-05-25 2014-09-02 Kla-Tencor Corp. Alteration for wafer inspection
FR2994605B1 (en) * 2012-08-20 2014-08-22 Commissariat Energie Atomique METHOD FOR MANUFACTURING EUV MASKS MINIMIZING THE IMPACT OF SUBSTRATE DEFECTS
US9189844B2 (en) 2012-10-15 2015-11-17 Kla-Tencor Corp. Detecting defects on a wafer using defect-specific information
US8948494B2 (en) 2012-11-12 2015-02-03 Kla-Tencor Corp. Unbiased wafer defect samples
US9057965B2 (en) * 2012-12-03 2015-06-16 Taiwan Semiconductor Manufacturing Company, Ltd. Method of generating a set of defect candidates for wafer
FR3000234B1 (en) * 2012-12-21 2015-02-27 Commissariat Energie Atomique METHOD FOR ESTIMATING ELECTRON BEAM LITHOGRAPHY-BASED PRINTING PATTERNS ON PLATES OR MASKS AND CORRESPONDING PRINTING DEVICE
US9053527B2 (en) 2013-01-02 2015-06-09 Kla-Tencor Corp. Detecting defects on a wafer
US9134254B2 (en) 2013-01-07 2015-09-15 Kla-Tencor Corp. Determining a position of inspection system output in design data space
US9311698B2 (en) 2013-01-09 2016-04-12 Kla-Tencor Corp. Detecting defects on a wafer using template image matching
WO2014149197A1 (en) 2013-02-01 2014-09-25 Kla-Tencor Corporation Detecting defects on a wafer using defect-specific and multi-channel information
US9865512B2 (en) 2013-04-08 2018-01-09 Kla-Tencor Corp. Dynamic design attributes for wafer inspection
US9310320B2 (en) 2013-04-15 2016-04-12 Kla-Tencor Corp. Based sampling and binning for yield critical defects
JP6255706B2 (en) * 2013-04-22 2018-01-10 富士通株式会社 Display control apparatus, display control method, display control program, and information providing system
US10114368B2 (en) 2013-07-22 2018-10-30 Applied Materials Israel Ltd. Closed-loop automatic defect inspection and classification
US9518932B2 (en) * 2013-11-06 2016-12-13 Kla-Tencor Corp. Metrology optimized inspection
CN103645692B (en) * 2013-11-26 2016-04-27 上海华力微电子有限公司 Wafer operation control system
JP6244954B2 (en) 2014-02-06 2017-12-13 富士通株式会社 Terminal apparatus, information processing apparatus, display control method, and display control program
KR101939288B1 (en) * 2014-02-12 2019-01-16 에이에스엠엘 네델란즈 비.브이. Method of optimizing a process window
US9576099B2 (en) 2014-03-03 2017-02-21 Taiwan Semiconductor Manufacturing Company, Ltd. Minimizing harmful effects caused by reticle defects by re-arranging IC layout locally
US9595096B2 (en) * 2014-03-10 2017-03-14 The Boeing Company Composite inspection and structural check of multiple layers
US9778205B2 (en) 2014-03-25 2017-10-03 Kla-Tencor Corporation Delta die and delta database inspection
DE102015203628A1 (en) * 2014-03-31 2015-10-01 Heidelberger Druckmaschinen Ag Method for automatic test parameter selection of an image inspection system
JP6570010B2 (en) * 2014-04-02 2019-09-04 ケーエルエー コーポレイション Method, system, and computer program product for generating a high-density registration map for a mask
CN103941541B (en) * 2014-04-11 2017-05-24 京东方科技集团股份有限公司 Position identifying method and device of mask plate polluted area
US9401016B2 (en) * 2014-05-12 2016-07-26 Kla-Tencor Corp. Using high resolution full die image data for inspection
CN104103545A (en) * 2014-08-01 2014-10-15 上海华力微电子有限公司 Wafer defect detection method
US10483081B2 (en) * 2014-10-22 2019-11-19 Kla-Tencor Corp. Self directed metrology and pattern classification
WO2016087069A1 (en) * 2014-12-01 2016-06-09 Asml Netherlands B.V. Methods & apparatus for obtaining diagnostic information relating to a lithographic manufacturing process, lithographic processing system including diagnostic apparatus
CN104573694A (en) * 2014-12-22 2015-04-29 嘉兴百盛光电有限公司 Method for identifying wafer image
KR101647688B1 (en) 2015-07-21 2016-08-12 (주)넥스틴 method of learning automatically die size and die number in a mask
CN105278260B (en) * 2015-11-20 2018-07-24 合肥芯碁微电子装备有限公司 A kind of PCB exposure figures correctness verification method
US10181185B2 (en) 2016-01-11 2019-01-15 Kla-Tencor Corp. Image based specimen process control
US10055534B2 (en) * 2016-03-17 2018-08-21 Applied Materials Israel Ltd. System and method for design based inspection
US10304177B2 (en) * 2016-06-29 2019-05-28 Kla-Tencor Corporation Systems and methods of using z-layer context in logic and hot spot inspection for sensitivity improvement and nuisance suppression
CN106372300B (en) * 2016-08-30 2019-07-23 上海华力微电子有限公司 Manufacturability determination method
US10679909B2 (en) 2016-11-21 2020-06-09 Kla-Tencor Corporation System, method and non-transitory computer readable medium for tuning sensitivies of, and determining a process window for, a modulated wafer
DE102017203879B4 (en) * 2017-03-09 2023-06-07 Carl Zeiss Smt Gmbh Method for analyzing a defect site of a photolithographic mask
US11295432B2 (en) 2017-06-29 2022-04-05 Kla-Tencor Corporation Broad band plasma inspection based on a nuisance map
US10620135B2 (en) * 2017-07-19 2020-04-14 Kla-Tencor Corp. Identifying a source of nuisance defects on a wafer
CN107632495B (en) * 2017-08-16 2020-11-03 上海华力微电子有限公司 Mask plate tiny dust influence assessment method and system
US10408764B2 (en) 2017-09-13 2019-09-10 Applied Materials Israel Ltd. System, method and computer program product for object examination
CN109991232B (en) * 2017-12-29 2022-02-15 上海微电子装备（集团）股份有限公司 Chip edge breakage defect detection method
US10580615B2 (en) * 2018-03-06 2020-03-03 Globalfoundries Inc. System and method for performing failure analysis using virtual three-dimensional imaging
US10818005B2 (en) 2018-03-12 2020-10-27 Kla-Tencor Corp. Previous layer nuisance reduction through oblique illumination
CN108648175B (en) * 2018-04-12 2021-12-14 杭州兆图机器人有限公司 Detection method and device
US10872406B2 (en) * 2018-04-13 2020-12-22 Taiwan Semiconductor Manufacturing Company, Ltd. Hot spot defect detecting method and hot spot defect detecting system
CN108461371B (en) * 2018-05-08 2020-08-25 德淮半导体有限公司 Electron beam scanning apparatus, defect detection system and method
US11195268B2 (en) * 2018-05-22 2021-12-07 Kla-Tencor Corporation Target selection improvements for better design alignment
CN109118482B (en) * 2018-08-07 2019-12-31 腾讯科技（深圳）有限公司 Panel defect analysis method and device and storage medium
US10866197B2 (en) 2018-09-20 2020-12-15 KLA Corp. Dispositioning defects detected on extreme ultraviolet photomasks
US11468553B2 (en) 2018-11-02 2022-10-11 Kla Corporation System and method for determining type and size of defects on blank reticles
US10545099B1 (en) 2018-11-07 2020-01-28 Kla-Tencor Corporation Ultra-high sensitivity hybrid inspection with full wafer coverage capability
US10725454B2 (en) 2018-11-12 2020-07-28 International Business Machines Corporation Mask process aware calibration using mask pattern fidelity inspections
JP7166966B2 (en) * 2019-03-15 2022-11-08 株式会社Ｓｃｒｅｅｎホールディングス Processing condition selection method, substrate processing method, substrate product manufacturing method, processing condition selection device, computer program, and storage medium
US11122680B2 (en) * 2019-03-18 2021-09-14 International Business Machines Corporation Passive methods of loose die identification
CN110992322A (en) * 2019-11-25 2020-04-10 创新奇智(青岛)科技有限公司 Patch mask detection system and detection method based on convolutional neural network
US11360030B2 (en) 2020-02-04 2022-06-14 Applied Materials Isreal Ltd Selecting a coreset of potential defects for estimating expected defects of interest
US11675340B2 (en) * 2020-04-08 2023-06-13 Nanya Technology Corporation System and method for controlling semiconductor manufacturing apparatus
US11328411B2 (en) * 2020-05-04 2022-05-10 KLA Corp. Print check repeater defect detection
CN111863653B (en) * 2020-07-31 2021-07-16 长江存储科技有限责任公司 Wafer defect detection method, detection system and computer readable storage medium
CN112083631B (en) * 2020-08-31 2021-06-08 北京理工大学 Informatics calculation photoetching method
CN112213339B (en) * 2020-09-30 2021-12-10 上海交通大学 Method, system and medium for correcting center and Euler angle of particle diffraction image pattern
US11670154B2 (en) * 2020-10-06 2023-06-06 Nanya Technology Corporation System and method for controlling semiconductor manufacturing apparatus
JP2022092727A (en) * 2020-12-11 2022-06-23 株式会社日立ハイテク Computer system for observation device and method for processing
JP7443268B2 (en) 2021-01-05 2024-03-05 株式会社ニューフレアテクノロジー Defect inspection method
CN113013048A (en) * 2021-02-24 2021-06-22 上海华力集成电路制造有限公司 Wafer defect detection method
US11727556B2 (en) 2021-09-29 2023-08-15 KLA Corp. Defect detection for multi-die masks

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6513151B1 (en) * 2000-09-14 2003-01-28 Advanced Micro Devices, Inc. Full flow focus exposure matrix analysis and electrical testing for new product mask evaluation
US20030022401A1 (en) * 2001-07-24 2003-01-30 Hitachi, Ltd. Semiconductor device inspection method
US6566885B1 (en) * 1999-12-14 2003-05-20 Kla-Tencor Multiple directional scans of test structures on semiconductor integrated circuits

Family Cites Families (100)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4130424A (en) * 1976-08-06 1978-12-19 Bell Telephone Laboratories, Incorporated Process using radiation curable epoxy containing resist and resultant product
JPS59192944A (en) * 1983-04-15 1984-11-01 Hitachi Ltd Classifying method of pattern defect
JPS59103336A (en) * 1983-09-21 1984-06-14 Hitachi Ltd Apparatus for mask inspection and correction thereof
JPS61210390A (en) * 1985-03-15 1986-09-18 株式会社日立製作所 Pattern generator
JPH0721458B2 (en) * 1985-05-29 1995-03-08 株式会社日立製作所 Surface pattern inspection method
JPS62168270A (en) * 1986-01-20 1987-07-24 Nippon Kogaku Kk <Nikon> Pattern changing device
JPS6381576A (en) * 1986-09-26 1988-04-12 Hitachi Ltd Defect check system
JPS63241927A (en) * 1987-03-30 1988-10-07 Nikon Corp Mask inspection
JPH0820231B2 (en) * 1989-03-10 1996-03-04 富士通株式会社 Mask pattern inspection method
US5023424A (en) * 1990-01-22 1991-06-11 Tencor Instruments Shock wave particle removal method and apparatus
JPH063541B2 (en) * 1990-11-16 1994-01-12 株式会社日立製作所 Pattern inspection equipment
JP2842708B2 (en) 1991-07-02 1999-01-06 日特エンジニアリング株式会社 Winding device with taping machine
US5563702A (en) * 1991-08-22 1996-10-08 Kla Instruments Corporation Automated photomask inspection apparatus and method
JPH05272941A (en) * 1992-03-27 1993-10-22 Toshiba Corp Method and apparatus for inspecting pattern
JPH0792094A (en) * 1993-09-21 1995-04-07 Toshiba Corp Pattern defect inspection device
JP3029774B2 (en) * 1994-09-22 2000-04-04 大日本スクリーン製造株式会社 Circuit pattern inspection equipment
JP3986571B2 (en) 1994-12-09 2007-10-03 日本テキサス・インスツルメンツ株式会社 Yield prediction apparatus and method
US5971586A (en) 1995-04-21 1999-10-26 Sony Corporation Identifying causes of semiconductor production yield loss
JPH08334889A (en) * 1995-06-02 1996-12-17 Sony Corp Method for inspecting defect of pattern formed on photomask
KR100199371B1 (en) * 1995-06-24 1999-06-15 김영환 Reticle for defect monitoring
JPH09211840A (en) 1996-02-05 1997-08-15 Matsushita Electric Ind Co Ltd Inspection method and inspection device for reticle as well as inspection method and inspection device for pattern
JP2776416B2 (en) * 1996-05-07 1998-07-16 日本電気株式会社 Reticle visual inspection device
JP3646415B2 (en) * 1996-07-18 2005-05-11 ソニー株式会社 Mask defect detection method
US6076465A (en) * 1996-09-20 2000-06-20 Kla-Tencor Corporation System and method for determining reticle defect printability
JPH10186635A (en) * 1996-12-20 1998-07-14 Sharp Corp Production of photomask
JP3750270B2 (en) 1997-04-21 2006-03-01 凸版印刷株式会社 Photomask defect analysis apparatus and defect analysis method
JP3724111B2 (en) * 1997-04-25 2005-12-07 凸版印刷株式会社 Multi-surface photomask defect analysis apparatus, defect analysis method, and storage medium storing the defect analysis program
JP3750272B2 (en) * 1997-04-30 2006-03-01 凸版印刷株式会社 Photomask defect analysis apparatus, defect analysis method, and recording medium recording the defect analysis program
US7107571B2 (en) * 1997-09-17 2006-09-12 Synopsys, Inc. Visual analysis and verification system using advanced tools
US6470489B1 (en) * 1997-09-17 2002-10-22 Numerical Technologies, Inc. Design rule checking system and method
US6757645B2 (en) * 1997-09-17 2004-06-29 Numerical Technologies, Inc. Visual inspection and verification system
US6578188B1 (en) * 1997-09-17 2003-06-10 Numerical Technologies, Inc. Method and apparatus for a network-based mask defect printability analysis system
US7617474B2 (en) * 1997-09-17 2009-11-10 Synopsys, Inc. System and method for providing defect printability analysis of photolithographic masks with job-based automation
US6408219B2 (en) 1998-05-11 2002-06-18 Applied Materials, Inc. FAB yield enhancement system
KR100267463B1 (en) 1998-07-20 2000-11-01 이재근 Method of measurement of yield loss chips and poor chips classified by a type according to defected chips on the wafer
JP4228417B2 (en) * 1998-07-29 2009-02-25 沖電気工業株式会社 Defect inspection method and apparatus
JP2000091436A (en) * 1998-09-09 2000-03-31 Matsushita Electric Ind Co Ltd Lsi pattern-layout creating method, lsi-pattern forming method, and manufacture of lsi
JP2000122265A (en) * 1998-10-13 2000-04-28 Toppan Printing Co Ltd Photomask appearance inspection device
JP2000147748A (en) 1998-11-18 2000-05-26 Toppan Printing Co Ltd Apparatus for inspecting appearance of photomask
JP4035242B2 (en) * 1998-11-30 2008-01-16 株式会社日立製作所 Circuit pattern inspection method and inspection apparatus
JP2000193594A (en) * 1998-12-24 2000-07-14 Hitachi Ltd Circuit pattern inspecting method and its device
US6476913B1 (en) * 1998-11-30 2002-11-05 Hitachi, Ltd. Inspection method, apparatus and system for circuit pattern
JP4206192B2 (en) 2000-11-09 2009-01-07 株式会社日立製作所 Pattern inspection method and apparatus
US6529621B1 (en) * 1998-12-17 2003-03-04 Kla-Tencor Mechanisms for making and inspecting reticles
US6284553B1 (en) * 1999-02-16 2001-09-04 Advanced Micro Devices, Inc. Location dependent automatic defect classification
JP2000258349A (en) * 1999-03-11 2000-09-22 Toppan Printing Co Ltd Apparatus for visual examination of photomask
JP4158266B2 (en) * 1999-03-11 2008-10-01 凸版印刷株式会社 Photomask appearance inspection device
AU5261200A (en) * 1999-05-20 2000-12-12 Micronic Laser Systems Ab A method for error reduction in lithography
JP2000330261A (en) * 1999-05-24 2000-11-30 Toppan Printing Co Ltd Laser correcting device and method for guaranteeing defect of photomask
JP2000347384A (en) * 1999-06-02 2000-12-15 Toppan Printing Co Ltd Convergent ion beam correcting device and defect guaranteeing method
KR100702741B1 (en) * 1999-06-29 2007-04-03 어플라이드 머티어리얼스, 인코포레이티드 Integrated critical dimension control for semiconductor device manufacturing
JP2001033941A (en) 1999-07-16 2001-02-09 Toshiba Corp Formation of pattern and exposure device
CN1154168C (en) * 1999-08-16 2004-06-16 台湾积体电路制造股份有限公司 Wafer defect detecting and characteristics analyzing method
JP3314762B2 (en) * 1999-08-19 2002-08-12 日本電気株式会社 Electron beam exposure mask, electron beam exposure method using the same, electron beam exposure apparatus, and device manufacturing method
US6868175B1 (en) * 1999-08-26 2005-03-15 Nanogeometry Research Pattern inspection apparatus, pattern inspection method, and recording medium
US6268093B1 (en) * 1999-10-13 2001-07-31 Applied Materials, Inc. Method for reticle inspection using aerial imaging
US6999614B1 (en) 1999-11-29 2006-02-14 Kla-Tencor Corporation Power assisted automatic supervised classifier creation tool for semiconductor defects
JP4312910B2 (en) * 1999-12-02 2009-08-12 株式会社日立製作所 Review SEM
US6778695B1 (en) * 1999-12-23 2004-08-17 Franklin M. Schellenberg Design-based reticle defect prioritization
JP3431567B2 (en) * 2000-03-30 2003-07-28 株式会社東芝 Defect inspection device and inspection method
AU2001225804A1 (en) * 2000-04-18 2001-10-30 Kla-Tencor Corporation Improved test structures and methods for inspecting and utilizing the same
JP4170569B2 (en) * 2000-06-02 2008-10-22 大日本印刷株式会社 Board selection device
JP3968209B2 (en) * 2000-06-29 2007-08-29 株式会社東芝 Photomask defect transfer characteristic evaluation method, photomask defect correction method, and semiconductor device manufacturing method
US6557162B1 (en) * 2000-09-29 2003-04-29 Numerical Technologies, Inc. Method for high yield reticle formation
JP2002196470A (en) * 2000-12-26 2002-07-12 Hitachi Ltd Method of manufacturing photomask and method of manufacturing semiconductor integrated circuit device
DE10103958C1 (en) * 2001-01-30 2002-05-29 Infineon Technologies Ag Defect detection method for semiconductor exposure mask uses comparison of actual mask image with reference mask image
JP4014379B2 (en) * 2001-02-21 2007-11-28 株式会社日立製作所 Defect review apparatus and method
US20020121915A1 (en) * 2001-03-05 2002-09-05 Agere Systems Guardian Corp. Automated pattern clustering detection for wafer probe maps
US6616697B2 (en) 2001-03-13 2003-09-09 Nicholas G. Sotereanos Hip implant assembly
US6619864B2 (en) 2001-03-15 2003-09-16 Optinel Systems, Inc. Optical channel monitor with continuous gas cell calibration
CN1290168C (en) * 2001-03-20 2006-12-13 数字技术股份有限公司 System and method of providing mask defect printablity analysis
JP4334778B2 (en) * 2001-03-21 2009-09-30 大日本印刷株式会社 Substrate selection device and drawing substrate supply method
JP2002288444A (en) * 2001-03-26 2002-10-04 Toshiba Corp Method and system for mask transaction
JP2002303586A (en) * 2001-04-03 2002-10-18 Hitachi Ltd Defect inspection method and defect inspection device
JP4038356B2 (en) * 2001-04-10 2008-01-23 株式会社日立製作所 Defect data analysis method and apparatus, and review system
JP2002311561A (en) * 2001-04-11 2002-10-23 Sony Corp Method for forming pattern, pattern processor and exposure mask
JP2002323749A (en) 2001-04-25 2002-11-08 Dainippon Printing Co Ltd Method for discriminating defect of photomask and defect part having been corrected
JP4266082B2 (en) 2001-04-26 2009-05-20 株式会社東芝 Inspection method for exposure mask pattern
JP2003023056A (en) 2001-07-10 2003-01-24 Hitachi Ltd Method for sorting defect of semiconductor device, method for predicting yield of the semiconductor device, method for manufacturing the semiconductor device, defect-sorting system of semiconductor device and semiconductor device-sorting apparatus, and program used therefor and recording medium
US7035448B2 (en) 2001-08-20 2006-04-25 Hoya Corporation Method of defect inspection of graytone mask and apparatus doing the same
JP4711570B2 (en) * 2001-09-14 2011-06-29 株式会社東京精密 Pattern inspection method and inspection apparatus
JP3934919B2 (en) * 2001-11-13 2007-06-20 株式会社東芝 Mask blank selection method, exposure mask formation method, and semiconductor device manufacturing method
DE10392497T5 (en) 2002-04-11 2005-02-17 Advantest Corp. Manufacturing method and apparatus for avoiding prototype deferment in ASIC / SOC production
JP2003315973A (en) * 2002-04-19 2003-11-06 Fujitsu Ltd Mask design device, mask design method, program, and method of manufacturing semiconductor device
TW535207B (en) * 2002-05-08 2003-06-01 Powerchip Semiconductor Corp Method for automatically controlling defect-specification in manufacturing process of semiconductors
US20040078724A1 (en) 2002-06-26 2004-04-22 Keller S. Brandon Event processing system
JP4334183B2 (en) * 2002-06-28 2009-09-30 株式会社東芝 Mask defect correcting method, mask defect correcting apparatus, and semiconductor device manufacturing method
JP4073265B2 (en) * 2002-07-09 2008-04-09 富士通株式会社 Inspection apparatus and inspection method
US6807657B2 (en) 2002-07-19 2004-10-19 Hewlett-Packard Development Company, L.P. Inter-signal proximity verification in an integrated circuit
US6959251B2 (en) * 2002-08-23 2005-10-25 Kla-Tencor Technologies, Corporation Inspection system setup techniques
JP4220798B2 (en) * 2002-09-20 2009-02-04 株式会社リコー Powder container
AU2003280587A1 (en) 2002-10-30 2004-05-25 Nikon Corporation Mask, mask producing method and exposure method
US6882745B2 (en) * 2002-12-19 2005-04-19 Freescale Semiconductor, Inc. Method and apparatus for translating detected wafer defect coordinates to reticle coordinates using CAD data
US7346470B2 (en) 2003-06-10 2008-03-18 International Business Machines Corporation System for identification of defects on circuits or other arrayed products
US7937495B2 (en) * 2003-06-25 2011-05-03 Cisco Technology, Inc. System and method for modifying data transferred from a source to a destination
US9002497B2 (en) * 2003-07-03 2015-04-07 Kla-Tencor Technologies Corp. Methods and systems for inspection of wafers and reticles using designer intent data
US7135344B2 (en) * 2003-07-11 2006-11-14 Applied Materials, Israel, Ltd. Design-based monitoring
US7297453B2 (en) * 2005-04-13 2007-11-20 Kla-Tencor Technologies Corporation Systems and methods for mitigating variances on a patterned wafer using a prediction model
EP1955225A4 (en) * 2005-11-18 2009-11-04 Kla Tencor Tech Corp Methods and systems for utilizing design data in combination with inspection data
US8718353B2 (en) * 2012-03-08 2014-05-06 Kla-Tencor Corporation Reticle defect inspection with systematic defect filter

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6566885B1 (en) * 1999-12-14 2003-05-20 Kla-Tencor Multiple directional scans of test structures on semiconductor integrated circuits
US6513151B1 (en) * 2000-09-14 2003-01-28 Advanced Micro Devices, Inc. Full flow focus exposure matrix analysis and electrical testing for new product mask evaluation
US20030022401A1 (en) * 2001-07-24 2003-01-30 Hitachi, Ltd. Semiconductor device inspection method

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
ANONYMOUS: "Virtual Stepper", INTERNET ARTICLE, 15 April 2003 (2003-04-15), XP002313695, Retrieved from the Internet <URL:http://web.archive.org/web/20030415065148/http://www.synopsys.com/products/ntimrg/virtual_stepper_ds.html> [retrieved on 20050128] *

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