WO2005010956A3 - Endeffectors for handling semiconductor wafers - Google Patents
Endeffectors for handling semiconductor wafers Download PDFInfo
- Publication number
- WO2005010956A3 WO2005010956A3 PCT/US2004/008767 US2004008767W WO2005010956A3 WO 2005010956 A3 WO2005010956 A3 WO 2005010956A3 US 2004008767 W US2004008767 W US 2004008767W WO 2005010956 A3 WO2005010956 A3 WO 2005010956A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- endeffector
- endeffectors
- wafer
- handling
- wafers
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/141—Associated with semiconductor wafer handling includes means for gripping wafer
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Chemical Vapour Deposition (AREA)
- Manipulator (AREA)
Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE112004001162.0T DE112004001162B4 (en) | 2003-06-27 | 2004-03-23 | End effector for handling semiconductor wafers |
JP2006517080A JP4755088B2 (en) | 2003-06-27 | 2004-03-23 | End effector handling semiconductor wafers |
KR1020057024890A KR101135216B1 (en) | 2003-06-27 | 2004-03-23 | Endeffectors for handling semiconductor wafers |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US48342503P | 2003-06-27 | 2003-06-27 | |
US60/483,425 | 2003-06-27 | ||
US10/781,323 | 2004-02-18 | ||
US10/781,323 US7654596B2 (en) | 2003-06-27 | 2004-02-18 | Endeffectors for handling semiconductor wafers |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2005010956A2 WO2005010956A2 (en) | 2005-02-03 |
WO2005010956A3 true WO2005010956A3 (en) | 2005-09-15 |
Family
ID=33567692
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2004/008767 WO2005010956A2 (en) | 2003-06-27 | 2004-03-23 | Endeffectors for handling semiconductor wafers |
Country Status (6)
Country | Link |
---|---|
US (3) | US7654596B2 (en) |
JP (1) | JP4755088B2 (en) |
KR (1) | KR101135216B1 (en) |
CN (1) | CN101908498A (en) |
DE (1) | DE112004001162B4 (en) |
WO (1) | WO2005010956A2 (en) |
Families Citing this family (70)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000031777A1 (en) * | 1998-11-20 | 2000-06-02 | Steag Rtp Systems, Inc. | Fast heating and cooling apparatus for semiconductor wafers |
US6970644B2 (en) | 2000-12-21 | 2005-11-29 | Mattson Technology, Inc. | Heating configuration for use in thermal processing chambers |
US7015422B2 (en) * | 2000-12-21 | 2006-03-21 | Mattson Technology, Inc. | System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy |
US6835914B2 (en) | 2002-11-05 | 2004-12-28 | Mattson Technology, Inc. | Apparatus and method for reducing stray light in substrate processing chambers |
US7654596B2 (en) * | 2003-06-27 | 2010-02-02 | Mattson Technology, Inc. | Endeffectors for handling semiconductor wafers |
DE102004025150B4 (en) | 2004-05-21 | 2019-05-09 | Mattson Technology, Inc. | Orientation of a semiconductor substrate on a rotating device |
DE102004039443B4 (en) * | 2004-08-13 | 2023-05-25 | Beijing E-Town Semiconductor Technology, Co., Ltd. | Process for the thermal treatment of disc-shaped substrates |
US7993093B2 (en) * | 2004-09-15 | 2011-08-09 | Applied Materials, Inc. | Systems and methods for wafer translation |
WO2006035879A1 (en) * | 2004-09-30 | 2006-04-06 | Hitachi Kokusai Electric Inc. | Heat treatment device and method of manufacturing substrate |
US7255747B2 (en) | 2004-12-22 | 2007-08-14 | Sokudo Co., Ltd. | Coat/develop module with independent stations |
US7798764B2 (en) | 2005-12-22 | 2010-09-21 | Applied Materials, Inc. | Substrate processing sequence in a cartesian robot cluster tool |
US7374391B2 (en) * | 2005-12-22 | 2008-05-20 | Applied Materials, Inc. | Substrate gripper for a substrate handling robot |
US8137465B1 (en) | 2005-04-26 | 2012-03-20 | Novellus Systems, Inc. | Single-chamber sequential curing of semiconductor wafers |
US8282768B1 (en) | 2005-04-26 | 2012-10-09 | Novellus Systems, Inc. | Purging of porogen from UV cure chamber |
US8454750B1 (en) | 2005-04-26 | 2013-06-04 | Novellus Systems, Inc. | Multi-station sequential curing of dielectric films |
US8980769B1 (en) | 2005-04-26 | 2015-03-17 | Novellus Systems, Inc. | Multi-station sequential curing of dielectric films |
KR100708217B1 (en) * | 2005-05-24 | 2007-04-16 | 주식회사 에이디피엔지니어링 | Apparatus for testing substrate |
US8398816B1 (en) | 2006-03-28 | 2013-03-19 | Novellus Systems, Inc. | Method and apparatuses for reducing porogen accumulation from a UV-cure chamber |
US20100267231A1 (en) * | 2006-10-30 | 2010-10-21 | Van Schravendijk Bart | Apparatus for uv damage repair of low k films prior to copper barrier deposition |
US8920097B2 (en) * | 2006-11-02 | 2014-12-30 | Globalfoundries Singapore Pte. Ltd. | Wafer handling system for a loadlock |
US20080166210A1 (en) * | 2007-01-05 | 2008-07-10 | Applied Materials, Inc. | Supinating cartesian robot blade |
KR101349460B1 (en) * | 2007-06-22 | 2014-01-09 | 엘지이노텍 주식회사 | Transfer apparatus of susceptor |
JP4979530B2 (en) * | 2007-09-28 | 2012-07-18 | 日本電産サンキョー株式会社 | Industrial robot |
US8382180B2 (en) * | 2007-10-31 | 2013-02-26 | Applied Material, Inc. | Advanced FI blade for high temperature extraction |
US8426778B1 (en) | 2007-12-10 | 2013-04-23 | Novellus Systems, Inc. | Tunable-illumination reflector optics for UV cure system |
US20090162170A1 (en) * | 2007-12-19 | 2009-06-25 | Asm Japan K.K. | Tandem type semiconductor-processing apparatus |
US20090182454A1 (en) * | 2008-01-14 | 2009-07-16 | Bernardo Donoso | Method and apparatus for self-calibration of a substrate handling robot |
US20100028109A1 (en) * | 2008-07-30 | 2010-02-04 | Fabworx Solutions, Inc. | Edge grip end effector |
JP5456287B2 (en) * | 2008-09-05 | 2014-03-26 | 東京エレクトロン株式会社 | Vertical heat treatment equipment |
JP2010073787A (en) * | 2008-09-17 | 2010-04-02 | Dainippon Screen Mfg Co Ltd | Heat treatment apparatus |
WO2010111784A1 (en) * | 2009-03-31 | 2010-10-07 | Ats Automation Tooling Systems Inc. | Vacuum gripper assembly stabilized by springs |
KR101208644B1 (en) * | 2009-07-03 | 2012-12-06 | 도쿄엘렉트론가부시키가이샤 | Position deviation preventing device, substrate holding member including the same, substrate transfer apparatus and substrate transfer method |
US9837295B2 (en) | 2010-04-15 | 2017-12-05 | Suss Microtec Lithography Gmbh | Apparatus and method for semiconductor wafer leveling, force balancing and contact sensing |
US9859141B2 (en) | 2010-04-15 | 2018-01-02 | Suss Microtec Lithography Gmbh | Apparatus and method for aligning and centering wafers |
JP5539019B2 (en) * | 2010-05-19 | 2014-07-02 | キヤノンアネルバ株式会社 | Substrate support apparatus and vacuum processing apparatus |
KR101209882B1 (en) * | 2010-05-20 | 2012-12-10 | 주식회사 에이티에스엔지니어링 | Robot-arm |
KR101209884B1 (en) * | 2010-05-20 | 2012-12-10 | 주식회사 에이티에스엔지니어링 | Robot-arm |
JP5548163B2 (en) | 2010-09-14 | 2014-07-16 | 株式会社日立国際電気 | Substrate transport mechanism, substrate processing apparatus, and semiconductor device manufacturing method |
DE202012013639U1 (en) * | 2011-12-01 | 2018-12-06 | solar-semi GmbH | Device for processing a substrate |
JP5601331B2 (en) * | 2012-01-26 | 2014-10-08 | 株式会社安川電機 | Robot hand and robot |
JP2013198960A (en) * | 2012-03-26 | 2013-10-03 | Disco Corp | Robot hand |
DE102012006521A1 (en) | 2012-03-30 | 2013-10-02 | Innolas Semiconductor GmbH | Wafer wafer handling unit and method for picking up a wafer wafer |
JP2014093420A (en) * | 2012-11-02 | 2014-05-19 | Toyota Motor Corp | Jig for bonding wafer to support disk and semiconductor device manufacturing method using the same |
JP6088243B2 (en) * | 2012-12-28 | 2017-03-01 | 川崎重工業株式会社 | End effector |
US9061423B2 (en) * | 2013-03-13 | 2015-06-23 | Varian Semiconductor Equipment Associates, Inc. | Wafer handling apparatus |
US8864202B1 (en) * | 2013-04-12 | 2014-10-21 | Varian Semiconductor Equipment Associates, Inc. | Spring retained end effector contact pad |
US9028765B2 (en) | 2013-08-23 | 2015-05-12 | Lam Research Corporation | Exhaust flow spreading baffle-riser to optimize remote plasma window clean |
JP6224437B2 (en) * | 2013-11-26 | 2017-11-01 | 東京エレクトロン株式会社 | Substrate transfer device |
KR20160002345A (en) * | 2014-06-30 | 2016-01-07 | 에이에스엠 아이피 홀딩 비.브이. | Substrate transferring arm and substrate transferring apparatus including the same |
US9425076B2 (en) * | 2014-07-03 | 2016-08-23 | Applied Materials, Inc. | Substrate transfer robot end effector |
US9536764B2 (en) | 2015-01-27 | 2017-01-03 | Lam Research Corporation | End effector for wafer transfer system and method of transferring wafers |
JP6535187B2 (en) | 2015-03-10 | 2019-06-26 | 株式会社荏原製作所 | Substrate transfer hand |
US11183401B2 (en) * | 2015-05-15 | 2021-11-23 | Suss Microtec Lithography Gmbh | System and related techniques for handling aligned substrate pairs |
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JP2017077528A (en) * | 2015-10-20 | 2017-04-27 | 信越化学工業株式会社 | Substrate cleaning device and substrate cleaning method used in photomask-related substrate |
US10124492B2 (en) * | 2015-10-22 | 2018-11-13 | Lam Research Corporation | Automated replacement of consumable parts using end effectors interfacing with plasma processing system |
US10388546B2 (en) | 2015-11-16 | 2019-08-20 | Lam Research Corporation | Apparatus for UV flowable dielectric |
CN105575865A (en) * | 2015-12-23 | 2016-05-11 | 苏州工业园区纳米产业技术研究院有限公司 | Structural transformation of deep silicon machine arm for slices after deep silicon etching process and transformation method thereof |
CN105552016A (en) * | 2015-12-23 | 2016-05-04 | 苏州工业园区纳米产业技术研究院有限公司 | Structure transformation and transformation method for coating machine manipulator suitable for warped wafer |
CN105789091B (en) * | 2016-03-16 | 2020-04-24 | 沈阳拓荆科技有限公司 | Load lock chamber and multi-chamber processing system using the same |
US10607879B2 (en) * | 2016-09-08 | 2020-03-31 | Brooks Automation, Inc. | Substrate processing apparatus |
US9919430B1 (en) * | 2016-12-06 | 2018-03-20 | Jabil Inc. | Apparatus, system and method for providing an end effector |
JP6858041B2 (en) * | 2017-03-16 | 2021-04-14 | 川崎重工業株式会社 | Board transfer device |
US10399231B2 (en) | 2017-05-22 | 2019-09-03 | Taiwan Semiconductor Manufacturing Company, Ltd. | Substrate handling contacts and methods |
US11193178B2 (en) | 2017-08-16 | 2021-12-07 | Beijing E-town Semiconductor Technology Co., Ltd. | Thermal processing of closed shape workpieces |
US10553472B2 (en) * | 2018-06-22 | 2020-02-04 | Jabil Inc. | Apparatus, system and method for providing a bernoulli-based semiconductor wafer pre-aligner |
US11600580B2 (en) | 2019-02-27 | 2023-03-07 | Applied Materials, Inc. | Replaceable end effector contact pads, end effectors, and maintenance methods |
CN114743854A (en) * | 2019-05-14 | 2022-07-12 | 玛特森技术公司 | End effector and system for processing workpiece |
JP2022011045A (en) * | 2020-06-29 | 2022-01-17 | キヤノン株式会社 | Conveyance apparatus, substrate processing apparatus, and article manufacturing method |
US20220063113A1 (en) * | 2020-08-26 | 2022-03-03 | WaferPath, Inc. | Protective cap for a robot end effector |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5022695A (en) * | 1989-01-30 | 1991-06-11 | Texas Instruments Incorporated | Semiconductor slice holder |
US5133635A (en) * | 1990-03-05 | 1992-07-28 | Tet Techno Investment Trust Settlement | Method and apparatus for holding and conveying platelike substrates |
US5810935A (en) * | 1994-12-06 | 1998-09-22 | Electronics And Telecommunications Research Institute | Apparatus for transferring a wafer |
US6283701B1 (en) * | 1999-03-18 | 2001-09-04 | Applied Materials, Inc. | Pneumatically actuated flexure gripper for wafer handling robots |
US20030052497A1 (en) * | 1998-07-10 | 2003-03-20 | Holbrooks Orville Ray | Intelligent integrated circuit wafer handling system with fail safe system |
US20030053902A1 (en) * | 2001-04-11 | 2003-03-20 | Pri Automation, Inc. | Robot arm edge gripping device for handling substrates using two four-bar linkages |
Family Cites Families (89)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52497A (en) | 1975-06-21 | 1977-01-05 | Daiichi Shokai:Kk | Steel ball feeding device for an automatic steel vending machine |
US4024944A (en) * | 1975-12-24 | 1977-05-24 | Texas Instruments Incorporated | Semiconductor slice prealignment system |
US4566726A (en) * | 1984-06-13 | 1986-01-28 | At&T Technologies, Inc. | Method and apparatus for handling semiconductor wafers |
JP2508540B2 (en) * | 1987-11-02 | 1996-06-19 | 三菱マテリアル株式会社 | Wafer position detector |
US4900214A (en) * | 1988-05-25 | 1990-02-13 | American Telephone And Telegraph Company | Method and apparatus for transporting semiconductor wafers |
US5238354A (en) * | 1989-05-23 | 1993-08-24 | Cybeq Systems, Inc. | Semiconductor object pre-aligning apparatus |
US5511934A (en) * | 1991-05-17 | 1996-04-30 | Kensington Laboratories, Inc. | Noncentering specimen prealigner having improved specimen edge detection and tracking |
US5513948A (en) * | 1991-05-17 | 1996-05-07 | Kensington Laboratories, Inc. | Universal specimen prealigner |
US5275521A (en) * | 1991-07-03 | 1994-01-04 | Tokyo Electron Sagami Limited | Wafer transfer device |
JP2867194B2 (en) * | 1992-02-05 | 1999-03-08 | 東京エレクトロン株式会社 | Processing device and processing method |
WO1994019821A1 (en) | 1993-02-26 | 1994-09-01 | Mayer Herbert E | Process and device for transporting flat objects, in particular substrates |
JPH0722502A (en) * | 1993-06-30 | 1995-01-24 | Hitachi Ltd | Handling unit for semiconductor wafer |
US5643366A (en) * | 1994-01-31 | 1997-07-01 | Applied Materials, Inc. | Wafer handling within a vacuum chamber using vacuum |
JPH098107A (en) * | 1995-06-16 | 1997-01-10 | Hitachi Ltd | Work retaining device and method thereof |
US6098484A (en) * | 1995-07-10 | 2000-08-08 | Kensington Laboratories, Inc. | High torque, low hysteresis, multiple link robot arm mechanism |
US6047165A (en) * | 1995-11-14 | 2000-04-04 | Harris Corporation | Wireless, frequency-agile spread spectrum ground link-based aircraft data communication system |
US5647626A (en) * | 1995-12-04 | 1997-07-15 | Taiwan Semiconductor Manufacturing Company, Ltd. | Wafer pickup system |
US5746460A (en) * | 1995-12-08 | 1998-05-05 | Applied Materials, Inc. | End effector for semiconductor wafer transfer device and method of moving a wafer with an end effector |
US6267423B1 (en) | 1995-12-08 | 2001-07-31 | Applied Materials, Inc. | End effector for semiconductor wafer transfer device and method of moving a wafer with an end effector |
US5870488A (en) * | 1996-05-07 | 1999-02-09 | Fortrend Engineering Corporation | Method and apparatus for prealigning wafers in a wafer sorting system |
US6322119B1 (en) | 1999-07-09 | 2001-11-27 | Semitool, Inc. | Robots for microelectronic workpiece handling |
US5980194A (en) * | 1996-07-15 | 1999-11-09 | Applied Materials, Inc. | Wafer position error detection and correction system |
US5820942A (en) * | 1996-12-20 | 1998-10-13 | Ag Associates | Process for depositing a material on a substrate using light energy |
US5980637A (en) * | 1996-12-20 | 1999-11-09 | Steag Rtp Systems, Inc. | System for depositing a material on a substrate using light energy |
US5980187A (en) * | 1997-04-16 | 1999-11-09 | Kla-Tencor Corporation | Mechanism for transporting semiconductor-process masks |
US5874711A (en) * | 1997-04-17 | 1999-02-23 | Ag Associates | Apparatus and method for determining the temperature of a radiating surface |
KR100265757B1 (en) * | 1997-05-09 | 2000-09-15 | 윤종용 | Wafer status checking sensor for prevention of miss loading in wafer processing equipment |
JPH1111663A (en) * | 1997-06-27 | 1999-01-19 | Tokyo Electron Ltd | Substrate conveying device |
US5960158A (en) * | 1997-07-11 | 1999-09-28 | Ag Associates | Apparatus and method for filtering light in a thermal processing chamber |
US6027244A (en) * | 1997-07-24 | 2000-02-22 | Steag Rtp Systems, Inc. | Apparatus for determining the temperature of a semi-transparent radiating body |
US6075922A (en) * | 1997-08-07 | 2000-06-13 | Steag Rtp Systems, Inc. | Process for preventing gas leaks in an atmospheric thermal processing chamber |
JPH11138484A (en) * | 1997-11-07 | 1999-05-25 | Yamaha Motor Co Ltd | Head device of mounting machine |
US6293749B1 (en) | 1997-11-21 | 2001-09-25 | Asm America, Inc. | Substrate transfer system for semiconductor processing equipment |
US6116848A (en) * | 1997-11-26 | 2000-09-12 | Brooks Automation, Inc. | Apparatus and method for high-speed transfer and centering of wafer substrates |
US6222990B1 (en) | 1997-12-03 | 2001-04-24 | Steag Rtp Systems | Heating element for heating the edges of wafers in thermal processing chambers |
US5970382A (en) * | 1998-01-26 | 1999-10-19 | Ag Associates | Process for forming coatings on semiconductor devices |
JPH11220003A (en) * | 1998-02-03 | 1999-08-10 | Shin Meiwa Ind Co Ltd | Wafer holder |
CN1291345A (en) | 1998-02-18 | 2001-04-11 | 应用材料有限公司 | End effector for wafer handlier in processing system |
US6095582A (en) * | 1998-03-11 | 2000-08-01 | Trusi Technologies, Llc | Article holders and holding methods |
US6056434A (en) * | 1998-03-12 | 2000-05-02 | Steag Rtp Systems, Inc. | Apparatus and method for determining the temperature of objects in thermal processing chambers |
US6204484B1 (en) * | 1998-03-31 | 2001-03-20 | Steag Rtp Systems, Inc. | System for measuring the temperature of a semiconductor wafer during thermal processing |
US5970214A (en) * | 1998-05-14 | 1999-10-19 | Ag Associates | Heating device for semiconductor wafers |
US5930456A (en) * | 1998-05-14 | 1999-07-27 | Ag Associates | Heating device for semiconductor wafers |
US6109677A (en) * | 1998-05-28 | 2000-08-29 | Sez North America, Inc. | Apparatus for handling and transporting plate like substrates |
US6034357A (en) * | 1998-06-08 | 2000-03-07 | Steag Rtp Systems Inc | Apparatus and process for measuring the temperature of semiconductor wafers in the presence of radiation absorbing gases |
JP2000040728A (en) * | 1998-07-22 | 2000-02-08 | Nippon Asm Kk | Wafer carrying mechanism |
JP2958311B1 (en) | 1998-08-28 | 1999-10-06 | アプライド マテリアルズ インコーポレイテッド | Wafer transfer robot |
US6210484B1 (en) * | 1998-09-09 | 2001-04-03 | Steag Rtp Systems, Inc. | Heating device containing a multi-lamp cone for heating semiconductor wafers |
US6298280B1 (en) | 1998-09-28 | 2001-10-02 | Asyst Technologies, Inc. | Method for in-cassette wafer center determination |
WO2000031777A1 (en) | 1998-11-20 | 2000-06-02 | Steag Rtp Systems, Inc. | Fast heating and cooling apparatus for semiconductor wafers |
US6256555B1 (en) * | 1998-12-02 | 2001-07-03 | Newport Corporation | Robot arm with specimen edge gripping end effector |
JP2002531942A (en) | 1998-12-02 | 2002-09-24 | ニューポート・コーポレーション | Robot arm end effector holding sample |
US6310328B1 (en) | 1998-12-10 | 2001-10-30 | Mattson Technologies, Inc. | Rapid thermal processing chamber for processing multiple wafers |
US6771895B2 (en) | 1999-01-06 | 2004-08-03 | Mattson Technology, Inc. | Heating device for heating semiconductor wafers in thermal processing chambers |
US6174651B1 (en) * | 1999-01-14 | 2001-01-16 | Steag Rtp Systems, Inc. | Method for depositing atomized materials onto a substrate utilizing light exposure for heating |
US6281141B1 (en) | 1999-02-08 | 2001-08-28 | Steag Rtp Systems, Inc. | Process for forming thin dielectric layers in semiconductor devices |
US6200023B1 (en) * | 1999-03-15 | 2001-03-13 | Steag Rtp Systems, Inc. | Method for determining the temperature in a thermal processing chamber |
US6293696B1 (en) | 1999-05-03 | 2001-09-25 | Steag Rtp Systems, Inc. | System and process for calibrating pyrometers in thermal processing chambers |
US6322116B1 (en) * | 1999-07-23 | 2001-11-27 | Asm America, Inc. | Non-contact end effector |
US6359263B2 (en) | 1999-09-03 | 2002-03-19 | Steag Rtp Systems, Inc. | System for controlling the temperature of a reflective substrate during rapid heating |
US6403923B1 (en) | 1999-09-03 | 2002-06-11 | Mattson Technology, Inc. | System for controlling the temperature of a reflective substrate during rapid heating |
US6514876B1 (en) | 1999-09-07 | 2003-02-04 | Steag Rtp Systems, Inc. | Pre-metal dielectric rapid thermal processing for sub-micron technology |
DE19957758C2 (en) * | 1999-12-01 | 2001-10-25 | Steag Rtp Systems Gmbh | Device and method for aligning disc-shaped substrates |
JP2004507071A (en) | 1999-12-21 | 2004-03-04 | マットソン サーマル プロダクツ インコーポレイテッド | Growth of ultra-thin nitride on Si (100) by rapid thermal N2 treatment |
US20020015636A1 (en) * | 2000-08-04 | 2002-02-07 | Shinsung Eng Corporation | FOUP door opening apparatus of FOUP opener and latch key control method |
US6631935B1 (en) * | 2000-08-04 | 2003-10-14 | Tru-Si Technologies, Inc. | Detection and handling of semiconductor wafer and wafer-like objects |
ATE489726T1 (en) | 2000-09-19 | 2010-12-15 | Mattson Tech Inc | METHOD FOR FORMING DIELECTRIC FILM |
JP4600856B2 (en) * | 2000-10-24 | 2010-12-22 | ムラテックオートメーション株式会社 | Substrate holding device |
US6692219B2 (en) * | 2000-11-29 | 2004-02-17 | Tokyo Electron Limited | Reduced edge contact wafer handling system and method of retrofitting and using same |
JP2002184853A (en) * | 2000-12-15 | 2002-06-28 | Yaskawa Electric Corp | Apparatus for grasping wafer |
US7015422B2 (en) | 2000-12-21 | 2006-03-21 | Mattson Technology, Inc. | System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy |
US6970644B2 (en) | 2000-12-21 | 2005-11-29 | Mattson Technology, Inc. | Heating configuration for use in thermal processing chambers |
US6559424B2 (en) | 2001-01-02 | 2003-05-06 | Mattson Technology, Inc. | Windows used in thermal processing chambers |
US6770146B2 (en) | 2001-02-02 | 2004-08-03 | Mattson Technology, Inc. | Method and system for rotating a semiconductor wafer in processing chambers |
CN1258617C (en) | 2001-03-20 | 2006-06-07 | 马特森技术公司 | Method for depositing coating having relatively high dielectric constant onto substrate |
US6902622B2 (en) | 2001-04-12 | 2005-06-07 | Mattson Technology, Inc. | Systems and methods for epitaxially depositing films on a semiconductor substrate |
US6817640B2 (en) * | 2001-06-28 | 2004-11-16 | Applied Materials, Inc. | Four-bar linkage wafer clamping mechanism |
US7334826B2 (en) * | 2001-07-13 | 2008-02-26 | Semitool, Inc. | End-effectors for handling microelectronic wafers |
US6678581B2 (en) * | 2002-01-14 | 2004-01-13 | Taiwan Semiconductor Manufacturing Co. Ltd | Method of calibrating a wafer edge gripping end effector |
EP1329732A1 (en) * | 2002-01-18 | 2003-07-23 | Agilent Technologies, Inc. (a Delaware corporation) | Determining cable attenuation and loss of signal threshold |
KR101040446B1 (en) | 2002-04-19 | 2011-06-09 | 맷슨 테크놀로지, 인크. | System for depositing a film onto a substrate using a low vapor pressure gas precursor |
US20030209326A1 (en) | 2002-05-07 | 2003-11-13 | Mattson Technology, Inc. | Process and system for heating semiconductor substrates in a processing chamber containing a susceptor |
US6875691B2 (en) | 2002-06-21 | 2005-04-05 | Mattson Technology, Inc. | Temperature control sequence of electroless plating baths |
US7734439B2 (en) | 2002-06-24 | 2010-06-08 | Mattson Technology, Inc. | System and process for calibrating pyrometers in thermal processing chambers |
JP3949021B2 (en) * | 2002-07-25 | 2007-07-25 | シーケーディ株式会社 | Work holding device |
US7101812B2 (en) | 2002-09-20 | 2006-09-05 | Mattson Technology, Inc. | Method of forming and/or modifying a dielectric film on a semiconductor surface |
US6835914B2 (en) | 2002-11-05 | 2004-12-28 | Mattson Technology, Inc. | Apparatus and method for reducing stray light in substrate processing chambers |
JP3945387B2 (en) * | 2002-11-26 | 2007-07-18 | 株式会社日立製作所 | ELECTRIC BRAKE, ITS CONTROL DEVICE, AND ELECTRIC BRAKE CONTROL METHOD |
US7654596B2 (en) | 2003-06-27 | 2010-02-02 | Mattson Technology, Inc. | Endeffectors for handling semiconductor wafers |
-
2004
- 2004-02-18 US US10/781,323 patent/US7654596B2/en active Active
- 2004-03-23 DE DE112004001162.0T patent/DE112004001162B4/en not_active Expired - Lifetime
- 2004-03-23 WO PCT/US2004/008767 patent/WO2005010956A2/en active Application Filing
- 2004-03-23 JP JP2006517080A patent/JP4755088B2/en not_active Expired - Lifetime
- 2004-03-23 KR KR1020057024890A patent/KR101135216B1/en active IP Right Grant
- 2004-03-23 CN CN2010102296736A patent/CN101908498A/en active Pending
-
2009
- 2009-12-17 US US12/640,135 patent/US8109549B2/en not_active Expired - Lifetime
-
2012
- 2012-01-24 US US13/356,820 patent/US8622451B2/en not_active Expired - Lifetime
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5022695A (en) * | 1989-01-30 | 1991-06-11 | Texas Instruments Incorporated | Semiconductor slice holder |
US5133635A (en) * | 1990-03-05 | 1992-07-28 | Tet Techno Investment Trust Settlement | Method and apparatus for holding and conveying platelike substrates |
US5810935A (en) * | 1994-12-06 | 1998-09-22 | Electronics And Telecommunications Research Institute | Apparatus for transferring a wafer |
US20030052497A1 (en) * | 1998-07-10 | 2003-03-20 | Holbrooks Orville Ray | Intelligent integrated circuit wafer handling system with fail safe system |
US6283701B1 (en) * | 1999-03-18 | 2001-09-04 | Applied Materials, Inc. | Pneumatically actuated flexure gripper for wafer handling robots |
US20030053902A1 (en) * | 2001-04-11 | 2003-03-20 | Pri Automation, Inc. | Robot arm edge gripping device for handling substrates using two four-bar linkages |
Also Published As
Publication number | Publication date |
---|---|
JP4755088B2 (en) | 2011-08-24 |
JP2007525001A (en) | 2007-08-30 |
US7654596B2 (en) | 2010-02-02 |
WO2005010956A2 (en) | 2005-02-03 |
US20100096869A1 (en) | 2010-04-22 |
US8109549B2 (en) | 2012-02-07 |
DE112004001162T5 (en) | 2006-07-27 |
US20120126555A1 (en) | 2012-05-24 |
CN101908498A (en) | 2010-12-08 |
KR101135216B1 (en) | 2012-04-12 |
DE112004001162B4 (en) | 2018-10-04 |
US20050006916A1 (en) | 2005-01-13 |
US8622451B2 (en) | 2014-01-07 |
KR20060026444A (en) | 2006-03-23 |
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