WO2005028973A3 - Solid-state flow generator and related systems, applications, and methods - Google Patents

Solid-state flow generator and related systems, applications, and methods Download PDF

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Publication number
WO2005028973A3
WO2005028973A3 PCT/US2004/030446 US2004030446W WO2005028973A3 WO 2005028973 A3 WO2005028973 A3 WO 2005028973A3 US 2004030446 W US2004030446 W US 2004030446W WO 2005028973 A3 WO2005028973 A3 WO 2005028973A3
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WO
WIPO (PCT)
Prior art keywords
applications
solid
methods
channel
flow generator
Prior art date
Application number
PCT/US2004/030446
Other languages
French (fr)
Other versions
WO2005028973A2 (en
Inventor
Raanan A Miller
John A Wright
Original Assignee
Sionex Corp
Raanan A Miller
John A Wright
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sionex Corp, Raanan A Miller, John A Wright filed Critical Sionex Corp
Priority to CA002539484A priority Critical patent/CA2539484A1/en
Priority to EP04784336A priority patent/EP1668298A4/en
Publication of WO2005028973A2 publication Critical patent/WO2005028973A2/en
Publication of WO2005028973A3 publication Critical patent/WO2005028973A3/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/02Details
    • H01J49/10Ion sources; Ion guns
    • H01J49/105Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation, Inductively Coupled Plasma [ICP]
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F03MACHINES OR ENGINES FOR LIQUIDS; WIND, SPRING, OR WEIGHT MOTORS; PRODUCING MECHANICAL POWER OR A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
    • F03HPRODUCING A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
    • F03H1/00Using plasma to produce a reactive propulsive thrust
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/26Mass spectrometers or separator tubes
    • H01J49/34Dynamic spectrometers
    • H01J49/40Time-of-flight spectrometers

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Combustion & Propulsion (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

The invention, in various embodiments, is directed to a solid-state flow generator and related systems, methods and applications. In operation, the ions (18) travel from the ion source (12) toward the ion attractor (14) displace fluid molecules and/or atoms in the constrained channel (16), thereby creating a pressure gradient in the channel (18), such that the pressure is higher near a first end (20) of the channel (16) relative to near a second end (22) of the channel. This causes a fluid flow, which draws in fluid molecules at one end and propels them to a second end.
PCT/US2004/030446 2003-09-17 2004-09-17 Solid-state flow generator and related systems, applications, and methods WO2005028973A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CA002539484A CA2539484A1 (en) 2003-09-17 2004-09-17 Solid-state flow generator and related systems, applications, and methods
EP04784336A EP1668298A4 (en) 2003-09-17 2004-09-17 Solid-state flow generator and related systems, applications, and methods

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US50391303P 2003-09-17 2003-09-17
US60/503,913 2003-09-17
US50392903P 2003-09-18 2003-09-18
US60/503,929 2003-09-18
US61008504P 2004-09-14 2004-09-14
US60/610,085 2004-09-14

Publications (2)

Publication Number Publication Date
WO2005028973A2 WO2005028973A2 (en) 2005-03-31
WO2005028973A3 true WO2005028973A3 (en) 2007-04-19

Family

ID=34381979

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2004/030446 WO2005028973A2 (en) 2003-09-17 2004-09-17 Solid-state flow generator and related systems, applications, and methods

Country Status (4)

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US (3) US7223970B2 (en)
EP (1) EP1668298A4 (en)
CA (1) CA2539484A1 (en)
WO (1) WO2005028973A2 (en)

Families Citing this family (288)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6806463B2 (en) * 1999-07-21 2004-10-19 The Charles Stark Draper Laboratory, Inc. Micromachined field asymmetric ion mobility filter and detection system
US7399958B2 (en) * 1999-07-21 2008-07-15 Sionex Corporation Method and apparatus for enhanced ion mobility based sample analysis using various analyzer configurations
US7157700B2 (en) * 2001-06-30 2007-01-02 Sionex Corporation System for collection of data and identification of unknown ion species in an electric field
US6815669B1 (en) * 1999-07-21 2004-11-09 The Charles Stark Draper Laboratory, Inc. Longitudinal field driven ion mobility filter and detection system
US7122794B1 (en) * 2002-02-21 2006-10-17 Sionex Corporation Systems and methods for ion mobility control
AU2003298597A1 (en) * 2002-10-12 2004-05-25 Sionex Corporation NOx MONITOR USING DIFFERENTIAL MOBILITY SPECTROMETRY
WO2005028973A2 (en) * 2003-09-17 2005-03-31 Sionex Corporation Solid-state flow generator and related systems, applications, and methods
US7071465B2 (en) * 2003-10-14 2006-07-04 Washington State University Research Foundation Ion mobility spectrometry method and apparatus
CA2550088A1 (en) * 2003-12-18 2005-07-07 Sionex Corporation Methods and apparatus for enhanced ion based sample detection using selective pre-separation and amplification
CA2551991A1 (en) * 2004-01-13 2005-07-28 Sionex Corporation Methods and apparatus for enhanced sample identification based on combined analytical techniques
US7456394B2 (en) * 2004-02-02 2008-11-25 Sionex Corporation Compact sample analysis systems and related methods of using combined chromatography and mobility spectrometry techniques
WO2005106450A1 (en) * 2004-04-28 2005-11-10 Sionex Corporation System and method for ion species analysis with enhanced condition control and data interpretation using differential mobility spectrometers
WO2006119167A1 (en) * 2005-04-29 2006-11-09 Sionex Corporation Compact gas chromatography and ion mobility based sample analysis systems, methods, and devices
US7476852B2 (en) * 2005-05-17 2009-01-13 Honeywell International Inc. Ionization-based detection
US7838820B2 (en) * 2005-06-06 2010-11-23 UT-Battlelle, LLC Controlled kinetic energy ion source for miniature ion trap and related spectroscopy system and method
US7579589B2 (en) * 2005-07-26 2009-08-25 Sionex Corporation Ultra compact ion mobility based analyzer apparatus, method, and system
GB0618669D0 (en) * 2006-09-22 2006-11-01 Smiths Group Plc Detection
US20080202461A1 (en) * 2007-02-26 2008-08-28 Honda Motor Co., Ltd. Engine cylinder sleeve heater and method
DE102008059113A1 (en) 2008-11-26 2010-05-27 Eads Deutschland Gmbh Device for collecting strongly electron-affine particles
US9394608B2 (en) 2009-04-06 2016-07-19 Asm America, Inc. Semiconductor processing reactor and components thereof
US8999245B2 (en) 2009-07-07 2015-04-07 Tricorn Tech Corporation Cascaded gas chromatographs (CGCs) with individual temperature control and gas analysis systems using same
US8707760B2 (en) 2009-07-31 2014-04-29 Tricorntech Corporation Gas collection and analysis system with front-end and back-end pre-concentrators and moisture removal
US8802201B2 (en) * 2009-08-14 2014-08-12 Asm America, Inc. Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species
US20110116205A1 (en) * 2009-09-18 2011-05-19 Ventiva, Inc. Collector electrodes for an ion wind fan
KR101456284B1 (en) 2009-10-28 2014-11-04 (주)바이오니아 Sample preconcentrator
US8978444B2 (en) 2010-04-23 2015-03-17 Tricorn Tech Corporation Gas analyte spectrum sharpening and separation with multi-dimensional micro-GC for gas chromatography analysis
US8507844B2 (en) * 2010-08-31 2013-08-13 Waters Technologies Corporation Techniques for sample analysis
JP5505224B2 (en) * 2010-09-16 2014-05-28 株式会社島津製作所 Time-of-flight mass spectrometer
US9312155B2 (en) 2011-06-06 2016-04-12 Asm Japan K.K. High-throughput semiconductor-processing apparatus equipped with multiple dual-chamber modules
EP2721630A4 (en) * 2011-06-15 2015-05-27 Purdue Research Foundation Method and apparatus for dipolar dc collisional activation of ions transmitted through an electrodynamic multipole device
US10854498B2 (en) 2011-07-15 2020-12-01 Asm Ip Holding B.V. Wafer-supporting device and method for producing same
US20130023129A1 (en) 2011-07-20 2013-01-24 Asm America, Inc. Pressure transmitter for a semiconductor processing environment
US9017481B1 (en) 2011-10-28 2015-04-28 Asm America, Inc. Process feed management for semiconductor substrate processing
US10714315B2 (en) 2012-10-12 2020-07-14 Asm Ip Holdings B.V. Semiconductor reaction chamber showerhead
US9839756B2 (en) * 2012-11-27 2017-12-12 Resmed Limited Methods and apparatus for ionization therapy
US20160376700A1 (en) 2013-02-01 2016-12-29 Asm Ip Holding B.V. System for treatment of deposition reactor
GB201314252D0 (en) 2013-08-08 2013-09-25 Smiths Detection Watford Ltd Apparatus and method
US10683571B2 (en) 2014-02-25 2020-06-16 Asm Ip Holding B.V. Gas supply manifold and method of supplying gases to chamber using same
US10167557B2 (en) 2014-03-18 2019-01-01 Asm Ip Holding B.V. Gas distribution system, reactor including the system, and methods of using the same
US11015245B2 (en) 2014-03-19 2021-05-25 Asm Ip Holding B.V. Gas-phase reactor and system having exhaust plenum and components thereof
US10858737B2 (en) 2014-07-28 2020-12-08 Asm Ip Holding B.V. Showerhead assembly and components thereof
US9890456B2 (en) 2014-08-21 2018-02-13 Asm Ip Holding B.V. Method and system for in situ formation of gas-phase compounds
US10132934B2 (en) 2014-09-17 2018-11-20 Stmicroelectronics S.R.L. Integrated detection device, in particular detector of particles such as particulates or alpha particles
US9406489B2 (en) * 2014-09-25 2016-08-02 The Boeing Company Investigating chemical-based events that occur in vehicles
US10941490B2 (en) 2014-10-07 2021-03-09 Asm Ip Holding B.V. Multiple temperature range susceptor, assembly, reactor and system including the susceptor, and methods of using the same
US9657845B2 (en) 2014-10-07 2017-05-23 Asm Ip Holding B.V. Variable conductance gas distribution apparatus and method
US10276355B2 (en) 2015-03-12 2019-04-30 Asm Ip Holding B.V. Multi-zone reactor, system including the reactor, and method of using the same
US10458018B2 (en) 2015-06-26 2019-10-29 Asm Ip Holding B.V. Structures including metal carbide material, devices including the structures, and methods of forming same
US10600673B2 (en) 2015-07-07 2020-03-24 Asm Ip Holding B.V. Magnetic susceptor to baseplate seal
US10211308B2 (en) 2015-10-21 2019-02-19 Asm Ip Holding B.V. NbMC layers
US11139308B2 (en) 2015-12-29 2021-10-05 Asm Ip Holding B.V. Atomic layer deposition of III-V compounds to form V-NAND devices
US10529554B2 (en) 2016-02-19 2020-01-07 Asm Ip Holding B.V. Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches
US10865475B2 (en) 2016-04-21 2020-12-15 Asm Ip Holding B.V. Deposition of metal borides and silicides
US10190213B2 (en) 2016-04-21 2019-01-29 Asm Ip Holding B.V. Deposition of metal borides
US10367080B2 (en) 2016-05-02 2019-07-30 Asm Ip Holding B.V. Method of forming a germanium oxynitride film
US10032628B2 (en) 2016-05-02 2018-07-24 Asm Ip Holding B.V. Source/drain performance through conformal solid state doping
US11453943B2 (en) 2016-05-25 2022-09-27 Asm Ip Holding B.V. Method for forming carbon-containing silicon/metal oxide or nitride film by ALD using silicon precursor and hydrocarbon precursor
US9859151B1 (en) 2016-07-08 2018-01-02 Asm Ip Holding B.V. Selective film deposition method to form air gaps
US10612137B2 (en) 2016-07-08 2020-04-07 Asm Ip Holdings B.V. Organic reactants for atomic layer deposition
US10714385B2 (en) 2016-07-19 2020-07-14 Asm Ip Holding B.V. Selective deposition of tungsten
CN106057627B (en) * 2016-07-24 2018-07-10 中国科学院合肥物质科学研究院 A kind of circulation pattern High-Field asymmetric waveform ion mobility spectrometer
US9812320B1 (en) 2016-07-28 2017-11-07 Asm Ip Holding B.V. Method and apparatus for filling a gap
KR102532607B1 (en) 2016-07-28 2023-05-15 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus and method of operating the same
US9887082B1 (en) 2016-07-28 2018-02-06 Asm Ip Holding B.V. Method and apparatus for filling a gap
US10643826B2 (en) 2016-10-26 2020-05-05 Asm Ip Holdings B.V. Methods for thermally calibrating reaction chambers
US11532757B2 (en) 2016-10-27 2022-12-20 Asm Ip Holding B.V. Deposition of charge trapping layers
US10643904B2 (en) 2016-11-01 2020-05-05 Asm Ip Holdings B.V. Methods for forming a semiconductor device and related semiconductor device structures
US10229833B2 (en) 2016-11-01 2019-03-12 Asm Ip Holding B.V. Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures
US10714350B2 (en) 2016-11-01 2020-07-14 ASM IP Holdings, B.V. Methods for forming a transition metal niobium nitride film on a substrate by atomic layer deposition and related semiconductor device structures
US10134757B2 (en) 2016-11-07 2018-11-20 Asm Ip Holding B.V. Method of processing a substrate and a device manufactured by using the method
KR102546317B1 (en) 2016-11-15 2023-06-21 에이에스엠 아이피 홀딩 비.브이. Gas supply unit and substrate processing apparatus including the same
KR20180068582A (en) 2016-12-14 2018-06-22 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
US11581186B2 (en) 2016-12-15 2023-02-14 Asm Ip Holding B.V. Sequential infiltration synthesis apparatus
US11447861B2 (en) 2016-12-15 2022-09-20 Asm Ip Holding B.V. Sequential infiltration synthesis apparatus and a method of forming a patterned structure
KR20180070971A (en) 2016-12-19 2018-06-27 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
US10269558B2 (en) 2016-12-22 2019-04-23 Asm Ip Holding B.V. Method of forming a structure on a substrate
US10867788B2 (en) 2016-12-28 2020-12-15 Asm Ip Holding B.V. Method of forming a structure on a substrate
US11390950B2 (en) 2017-01-10 2022-07-19 Asm Ip Holding B.V. Reactor system and method to reduce residue buildup during a film deposition process
US10655221B2 (en) 2017-02-09 2020-05-19 Asm Ip Holding B.V. Method for depositing oxide film by thermal ALD and PEALD
US10468261B2 (en) 2017-02-15 2019-11-05 Asm Ip Holding B.V. Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures
US10529563B2 (en) 2017-03-29 2020-01-07 Asm Ip Holdings B.V. Method for forming doped metal oxide films on a substrate by cyclical deposition and related semiconductor device structures
USD876504S1 (en) 2017-04-03 2020-02-25 Asm Ip Holding B.V. Exhaust flow control ring for semiconductor deposition apparatus
KR102457289B1 (en) 2017-04-25 2022-10-21 에이에스엠 아이피 홀딩 비.브이. Method for depositing a thin film and manufacturing a semiconductor device
CN107038317A (en) * 2017-05-08 2017-08-11 常州大学 A kind of chaos circuit that asymmetric multi attractor coexists
US10770286B2 (en) 2017-05-08 2020-09-08 Asm Ip Holdings B.V. Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures
US10892156B2 (en) 2017-05-08 2021-01-12 Asm Ip Holding B.V. Methods for forming a silicon nitride film on a substrate and related semiconductor device structures
US11306395B2 (en) 2017-06-28 2022-04-19 Asm Ip Holding B.V. Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus
US10685834B2 (en) 2017-07-05 2020-06-16 Asm Ip Holdings B.V. Methods for forming a silicon germanium tin layer and related semiconductor device structures
KR20190009245A (en) 2017-07-18 2019-01-28 에이에스엠 아이피 홀딩 비.브이. Methods for forming a semiconductor device structure and related semiconductor device structures
US10541333B2 (en) 2017-07-19 2020-01-21 Asm Ip Holding B.V. Method for depositing a group IV semiconductor and related semiconductor device structures
US11374112B2 (en) 2017-07-19 2022-06-28 Asm Ip Holding B.V. Method for depositing a group IV semiconductor and related semiconductor device structures
US11018002B2 (en) 2017-07-19 2021-05-25 Asm Ip Holding B.V. Method for selectively depositing a Group IV semiconductor and related semiconductor device structures
US10590535B2 (en) 2017-07-26 2020-03-17 Asm Ip Holdings B.V. Chemical treatment, deposition and/or infiltration apparatus and method for using the same
US10692741B2 (en) 2017-08-08 2020-06-23 Asm Ip Holdings B.V. Radiation shield
US10770336B2 (en) 2017-08-08 2020-09-08 Asm Ip Holding B.V. Substrate lift mechanism and reactor including same
US11769682B2 (en) 2017-08-09 2023-09-26 Asm Ip Holding B.V. Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith
US10249524B2 (en) 2017-08-09 2019-04-02 Asm Ip Holding B.V. Cassette holder assembly for a substrate cassette and holding member for use in such assembly
US11139191B2 (en) 2017-08-09 2021-10-05 Asm Ip Holding B.V. Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith
USD900036S1 (en) 2017-08-24 2020-10-27 Asm Ip Holding B.V. Heater electrical connector and adapter
US11830730B2 (en) 2017-08-29 2023-11-28 Asm Ip Holding B.V. Layer forming method and apparatus
US11056344B2 (en) 2017-08-30 2021-07-06 Asm Ip Holding B.V. Layer forming method
US11295980B2 (en) 2017-08-30 2022-04-05 Asm Ip Holding B.V. Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
KR102491945B1 (en) 2017-08-30 2023-01-26 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
KR102630301B1 (en) 2017-09-21 2024-01-29 에이에스엠 아이피 홀딩 비.브이. Method of sequential infiltration synthesis treatment of infiltrateable material and structures and devices formed using same
US10844484B2 (en) 2017-09-22 2020-11-24 Asm Ip Holding B.V. Apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods
US10658205B2 (en) 2017-09-28 2020-05-19 Asm Ip Holdings B.V. Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber
US10403504B2 (en) 2017-10-05 2019-09-03 Asm Ip Holding B.V. Method for selectively depositing a metallic film on a substrate
US10319588B2 (en) 2017-10-10 2019-06-11 Asm Ip Holding B.V. Method for depositing a metal chalcogenide on a substrate by cyclical deposition
US10923344B2 (en) 2017-10-30 2021-02-16 Asm Ip Holding B.V. Methods for forming a semiconductor structure and related semiconductor structures
US10910262B2 (en) 2017-11-16 2021-02-02 Asm Ip Holding B.V. Method of selectively depositing a capping layer structure on a semiconductor device structure
KR102443047B1 (en) 2017-11-16 2022-09-14 에이에스엠 아이피 홀딩 비.브이. Method of processing a substrate and a device manufactured by the same
US11022879B2 (en) 2017-11-24 2021-06-01 Asm Ip Holding B.V. Method of forming an enhanced unexposed photoresist layer
CN111316417B (en) 2017-11-27 2023-12-22 阿斯莫Ip控股公司 Storage device for storing wafer cassettes for use with batch ovens
WO2019103610A1 (en) 2017-11-27 2019-05-31 Asm Ip Holding B.V. Apparatus including a clean mini environment
US10872771B2 (en) 2018-01-16 2020-12-22 Asm Ip Holding B. V. Method for depositing a material film on a substrate within a reaction chamber by a cyclical deposition process and related device structures
WO2019142055A2 (en) 2018-01-19 2019-07-25 Asm Ip Holding B.V. Method for depositing a gap-fill layer by plasma-assisted deposition
TW202325889A (en) 2018-01-19 2023-07-01 荷蘭商Asm 智慧財產控股公司 Deposition method
USD903477S1 (en) 2018-01-24 2020-12-01 Asm Ip Holdings B.V. Metal clamp
US11018047B2 (en) 2018-01-25 2021-05-25 Asm Ip Holding B.V. Hybrid lift pin
USD880437S1 (en) 2018-02-01 2020-04-07 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus
US11081345B2 (en) 2018-02-06 2021-08-03 Asm Ip Holding B.V. Method of post-deposition treatment for silicon oxide film
EP3737779A1 (en) 2018-02-14 2020-11-18 ASM IP Holding B.V. A method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process
US10896820B2 (en) 2018-02-14 2021-01-19 Asm Ip Holding B.V. Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process
US10731249B2 (en) 2018-02-15 2020-08-04 Asm Ip Holding B.V. Method of forming a transition metal containing film on a substrate by a cyclical deposition process, a method for supplying a transition metal halide compound to a reaction chamber, and related vapor deposition apparatus
KR102636427B1 (en) 2018-02-20 2024-02-13 에이에스엠 아이피 홀딩 비.브이. Substrate processing method and apparatus
US10658181B2 (en) 2018-02-20 2020-05-19 Asm Ip Holding B.V. Method of spacer-defined direct patterning in semiconductor fabrication
US10975470B2 (en) 2018-02-23 2021-04-13 Asm Ip Holding B.V. Apparatus for detecting or monitoring for a chemical precursor in a high temperature environment
US11473195B2 (en) 2018-03-01 2022-10-18 Asm Ip Holding B.V. Semiconductor processing apparatus and a method for processing a substrate
US11629406B2 (en) 2018-03-09 2023-04-18 Asm Ip Holding B.V. Semiconductor processing apparatus comprising one or more pyrometers for measuring a temperature of a substrate during transfer of the substrate
US11114283B2 (en) 2018-03-16 2021-09-07 Asm Ip Holding B.V. Reactor, system including the reactor, and methods of manufacturing and using same
KR102646467B1 (en) 2018-03-27 2024-03-11 에이에스엠 아이피 홀딩 비.브이. Method of forming an electrode on a substrate and a semiconductor device structure including an electrode
US11088002B2 (en) 2018-03-29 2021-08-10 Asm Ip Holding B.V. Substrate rack and a substrate processing system and method
US11230766B2 (en) 2018-03-29 2022-01-25 Asm Ip Holding B.V. Substrate processing apparatus and method
KR102501472B1 (en) 2018-03-30 2023-02-20 에이에스엠 아이피 홀딩 비.브이. Substrate processing method
TWI811348B (en) 2018-05-08 2023-08-11 荷蘭商Asm 智慧財產控股公司 Methods for depositing an oxide film on a substrate by a cyclical deposition process and related device structures
TW202349473A (en) 2018-05-11 2023-12-16 荷蘭商Asm Ip私人控股有限公司 Methods for forming a doped metal carbide film on a substrate and related semiconductor device structures
KR102596988B1 (en) 2018-05-28 2023-10-31 에이에스엠 아이피 홀딩 비.브이. Method of processing a substrate and a device manufactured by the same
US11718913B2 (en) 2018-06-04 2023-08-08 Asm Ip Holding B.V. Gas distribution system and reactor system including same
US11270899B2 (en) 2018-06-04 2022-03-08 Asm Ip Holding B.V. Wafer handling chamber with moisture reduction
US11286562B2 (en) 2018-06-08 2022-03-29 Asm Ip Holding B.V. Gas-phase chemical reactor and method of using same
KR102568797B1 (en) 2018-06-21 2023-08-21 에이에스엠 아이피 홀딩 비.브이. Substrate processing system
US10797133B2 (en) 2018-06-21 2020-10-06 Asm Ip Holding B.V. Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures
JP2021529254A (en) 2018-06-27 2021-10-28 エーエスエム・アイピー・ホールディング・ベー・フェー Periodic deposition methods for forming metal-containing materials and films and structures containing metal-containing materials
US11499222B2 (en) 2018-06-27 2022-11-15 Asm Ip Holding B.V. Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material
US10612136B2 (en) 2018-06-29 2020-04-07 ASM IP Holding, B.V. Temperature-controlled flange and reactor system including same
KR20200002519A (en) 2018-06-29 2020-01-08 에이에스엠 아이피 홀딩 비.브이. Method for depositing a thin film and manufacturing a semiconductor device
US10755922B2 (en) 2018-07-03 2020-08-25 Asm Ip Holding B.V. Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
US10388513B1 (en) 2018-07-03 2019-08-20 Asm Ip Holding B.V. Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
US10767789B2 (en) 2018-07-16 2020-09-08 Asm Ip Holding B.V. Diaphragm valves, valve components, and methods for forming valve components
US11053591B2 (en) 2018-08-06 2021-07-06 Asm Ip Holding B.V. Multi-port gas injection system and reactor system including same
US10883175B2 (en) 2018-08-09 2021-01-05 Asm Ip Holding B.V. Vertical furnace for processing substrates and a liner for use therein
US10829852B2 (en) 2018-08-16 2020-11-10 Asm Ip Holding B.V. Gas distribution device for a wafer processing apparatus
US11430674B2 (en) 2018-08-22 2022-08-30 Asm Ip Holding B.V. Sensor array, apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods
KR20200030162A (en) 2018-09-11 2020-03-20 에이에스엠 아이피 홀딩 비.브이. Method for deposition of a thin film
US11024523B2 (en) 2018-09-11 2021-06-01 Asm Ip Holding B.V. Substrate processing apparatus and method
US11049751B2 (en) 2018-09-14 2021-06-29 Asm Ip Holding B.V. Cassette supply system to store and handle cassettes and processing apparatus equipped therewith
CN110970344A (en) 2018-10-01 2020-04-07 Asm Ip控股有限公司 Substrate holding apparatus, system including the same, and method of using the same
US11232963B2 (en) 2018-10-03 2022-01-25 Asm Ip Holding B.V. Substrate processing apparatus and method
KR102592699B1 (en) 2018-10-08 2023-10-23 에이에스엠 아이피 홀딩 비.브이. Substrate support unit and apparatuses for depositing thin film and processing the substrate including the same
US10847365B2 (en) 2018-10-11 2020-11-24 Asm Ip Holding B.V. Method of forming conformal silicon carbide film by cyclic CVD
US10811256B2 (en) 2018-10-16 2020-10-20 Asm Ip Holding B.V. Method for etching a carbon-containing feature
KR102605121B1 (en) 2018-10-19 2023-11-23 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus and substrate processing method
KR102546322B1 (en) 2018-10-19 2023-06-21 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus and substrate processing method
USD948463S1 (en) 2018-10-24 2022-04-12 Asm Ip Holding B.V. Susceptor for semiconductor substrate supporting apparatus
US11087997B2 (en) 2018-10-31 2021-08-10 Asm Ip Holding B.V. Substrate processing apparatus for processing substrates
KR20200051105A (en) 2018-11-02 2020-05-13 에이에스엠 아이피 홀딩 비.브이. Substrate support unit and substrate processing apparatus including the same
US11572620B2 (en) 2018-11-06 2023-02-07 Asm Ip Holding B.V. Methods for selectively depositing an amorphous silicon film on a substrate
US11031242B2 (en) 2018-11-07 2021-06-08 Asm Ip Holding B.V. Methods for depositing a boron doped silicon germanium film
US10818758B2 (en) 2018-11-16 2020-10-27 Asm Ip Holding B.V. Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures
US10847366B2 (en) 2018-11-16 2020-11-24 Asm Ip Holding B.V. Methods for depositing a transition metal chalcogenide film on a substrate by a cyclical deposition process
US10559458B1 (en) 2018-11-26 2020-02-11 Asm Ip Holding B.V. Method of forming oxynitride film
US11217444B2 (en) 2018-11-30 2022-01-04 Asm Ip Holding B.V. Method for forming an ultraviolet radiation responsive metal oxide-containing film
KR102636428B1 (en) 2018-12-04 2024-02-13 에이에스엠 아이피 홀딩 비.브이. A method for cleaning a substrate processing apparatus
US11158513B2 (en) 2018-12-13 2021-10-26 Asm Ip Holding B.V. Methods for forming a rhenium-containing film on a substrate by a cyclical deposition process and related semiconductor device structures
JP2020096183A (en) 2018-12-14 2020-06-18 エーエスエム・アイピー・ホールディング・ベー・フェー Method of forming device structure using selective deposition of gallium nitride, and system for the same
TWI819180B (en) 2019-01-17 2023-10-21 荷蘭商Asm 智慧財產控股公司 Methods of forming a transition metal containing film on a substrate by a cyclical deposition process
KR20200091543A (en) 2019-01-22 2020-07-31 에이에스엠 아이피 홀딩 비.브이. Semiconductor processing device
CN111524788B (en) 2019-02-01 2023-11-24 Asm Ip私人控股有限公司 Method for topologically selective film formation of silicon oxide
KR102626263B1 (en) 2019-02-20 2024-01-16 에이에스엠 아이피 홀딩 비.브이. Cyclical deposition method including treatment step and apparatus for same
TW202104632A (en) 2019-02-20 2021-02-01 荷蘭商Asm Ip私人控股有限公司 Cyclical deposition method and apparatus for filling a recess formed within a substrate surface
US11482533B2 (en) 2019-02-20 2022-10-25 Asm Ip Holding B.V. Apparatus and methods for plug fill deposition in 3-D NAND applications
JP2020136678A (en) 2019-02-20 2020-08-31 エーエスエム・アイピー・ホールディング・ベー・フェー Method for filing concave part formed inside front surface of base material, and device
TW202100794A (en) 2019-02-22 2021-01-01 荷蘭商Asm Ip私人控股有限公司 Substrate processing apparatus and method for processing substrate
KR20200108242A (en) 2019-03-08 2020-09-17 에이에스엠 아이피 홀딩 비.브이. Method for Selective Deposition of Silicon Nitride Layer and Structure Including Selectively-Deposited Silicon Nitride Layer
KR20200108243A (en) 2019-03-08 2020-09-17 에이에스엠 아이피 홀딩 비.브이. Structure Including SiOC Layer and Method of Forming Same
US11742198B2 (en) 2019-03-08 2023-08-29 Asm Ip Holding B.V. Structure including SiOCN layer and method of forming same
JP2020167398A (en) 2019-03-28 2020-10-08 エーエスエム・アイピー・ホールディング・ベー・フェー Door opener and substrate processing apparatus provided therewith
KR20200116855A (en) 2019-04-01 2020-10-13 에이에스엠 아이피 홀딩 비.브이. Method of manufacturing semiconductor device
US11447864B2 (en) 2019-04-19 2022-09-20 Asm Ip Holding B.V. Layer forming method and apparatus
KR20200125453A (en) 2019-04-24 2020-11-04 에이에스엠 아이피 홀딩 비.브이. Gas-phase reactor system and method of using same
KR20200130121A (en) 2019-05-07 2020-11-18 에이에스엠 아이피 홀딩 비.브이. Chemical source vessel with dip tube
KR20200130118A (en) 2019-05-07 2020-11-18 에이에스엠 아이피 홀딩 비.브이. Method for Reforming Amorphous Carbon Polymer Film
KR20200130652A (en) 2019-05-10 2020-11-19 에이에스엠 아이피 홀딩 비.브이. Method of depositing material onto a surface and structure formed according to the method
JP2020188255A (en) 2019-05-16 2020-11-19 エーエスエム アイピー ホールディング ビー.ブイ. Wafer boat handling device, vertical batch furnace, and method
USD947913S1 (en) 2019-05-17 2022-04-05 Asm Ip Holding B.V. Susceptor shaft
USD975665S1 (en) 2019-05-17 2023-01-17 Asm Ip Holding B.V. Susceptor shaft
USD935572S1 (en) 2019-05-24 2021-11-09 Asm Ip Holding B.V. Gas channel plate
GB2584334B (en) * 2019-05-31 2022-02-16 Owlstone Med Ltd Sensor system
USD922229S1 (en) 2019-06-05 2021-06-15 Asm Ip Holding B.V. Device for controlling a temperature of a gas supply unit
KR20200141002A (en) 2019-06-06 2020-12-17 에이에스엠 아이피 홀딩 비.브이. Method of using a gas-phase reactor system including analyzing exhausted gas
KR20200143254A (en) 2019-06-11 2020-12-23 에이에스엠 아이피 홀딩 비.브이. Method of forming an electronic structure using an reforming gas, system for performing the method, and structure formed using the method
USD944946S1 (en) 2019-06-14 2022-03-01 Asm Ip Holding B.V. Shower plate
USD931978S1 (en) 2019-06-27 2021-09-28 Asm Ip Holding B.V. Showerhead vacuum transport
KR20210005515A (en) 2019-07-03 2021-01-14 에이에스엠 아이피 홀딩 비.브이. Temperature control assembly for substrate processing apparatus and method of using same
JP2021015791A (en) 2019-07-09 2021-02-12 エーエスエム アイピー ホールディング ビー.ブイ. Plasma device and substrate processing method using coaxial waveguide
CN112216646A (en) 2019-07-10 2021-01-12 Asm Ip私人控股有限公司 Substrate supporting assembly and substrate processing device comprising same
KR20210010307A (en) 2019-07-16 2021-01-27 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
KR20210010820A (en) 2019-07-17 2021-01-28 에이에스엠 아이피 홀딩 비.브이. Methods of forming silicon germanium structures
KR20210010816A (en) 2019-07-17 2021-01-28 에이에스엠 아이피 홀딩 비.브이. Radical assist ignition plasma system and method
US11643724B2 (en) 2019-07-18 2023-05-09 Asm Ip Holding B.V. Method of forming structures using a neutral beam
JP2021019198A (en) 2019-07-19 2021-02-15 エーエスエム・アイピー・ホールディング・ベー・フェー Method of forming topology-controlled amorphous carbon polymer film
CN112309843A (en) 2019-07-29 2021-02-02 Asm Ip私人控股有限公司 Selective deposition method for achieving high dopant doping
CN112309900A (en) 2019-07-30 2021-02-02 Asm Ip私人控股有限公司 Substrate processing apparatus
CN112309899A (en) 2019-07-30 2021-02-02 Asm Ip私人控股有限公司 Substrate processing apparatus
US11227782B2 (en) 2019-07-31 2022-01-18 Asm Ip Holding B.V. Vertical batch furnace assembly
US11587814B2 (en) 2019-07-31 2023-02-21 Asm Ip Holding B.V. Vertical batch furnace assembly
US11587815B2 (en) 2019-07-31 2023-02-21 Asm Ip Holding B.V. Vertical batch furnace assembly
KR20210018759A (en) 2019-08-05 2021-02-18 에이에스엠 아이피 홀딩 비.브이. Liquid level sensor for a chemical source vessel
USD965044S1 (en) 2019-08-19 2022-09-27 Asm Ip Holding B.V. Susceptor shaft
USD965524S1 (en) 2019-08-19 2022-10-04 Asm Ip Holding B.V. Susceptor support
JP2021031769A (en) 2019-08-21 2021-03-01 エーエスエム アイピー ホールディング ビー.ブイ. Production apparatus of mixed gas of film deposition raw material and film deposition apparatus
USD979506S1 (en) 2019-08-22 2023-02-28 Asm Ip Holding B.V. Insulator
USD940837S1 (en) 2019-08-22 2022-01-11 Asm Ip Holding B.V. Electrode
KR20210024423A (en) 2019-08-22 2021-03-05 에이에스엠 아이피 홀딩 비.브이. Method for forming a structure with a hole
USD949319S1 (en) 2019-08-22 2022-04-19 Asm Ip Holding B.V. Exhaust duct
USD930782S1 (en) 2019-08-22 2021-09-14 Asm Ip Holding B.V. Gas distributor
US11286558B2 (en) 2019-08-23 2022-03-29 Asm Ip Holding B.V. Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film
KR20210024420A (en) 2019-08-23 2021-03-05 에이에스엠 아이피 홀딩 비.브이. Method for depositing silicon oxide film having improved quality by peald using bis(diethylamino)silane
KR20210029090A (en) 2019-09-04 2021-03-15 에이에스엠 아이피 홀딩 비.브이. Methods for selective deposition using a sacrificial capping layer
KR20210029663A (en) 2019-09-05 2021-03-16 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
US11562901B2 (en) 2019-09-25 2023-01-24 Asm Ip Holding B.V. Substrate processing method
CN112593212B (en) 2019-10-02 2023-12-22 Asm Ip私人控股有限公司 Method for forming topologically selective silicon oxide film by cyclic plasma enhanced deposition process
TW202129060A (en) 2019-10-08 2021-08-01 荷蘭商Asm Ip控股公司 Substrate processing device, and substrate processing method
TW202115273A (en) 2019-10-10 2021-04-16 荷蘭商Asm Ip私人控股有限公司 Method of forming a photoresist underlayer and structure including same
KR20210045930A (en) 2019-10-16 2021-04-27 에이에스엠 아이피 홀딩 비.브이. Method of Topology-Selective Film Formation of Silicon Oxide
US11637014B2 (en) 2019-10-17 2023-04-25 Asm Ip Holding B.V. Methods for selective deposition of doped semiconductor material
KR20210047808A (en) 2019-10-21 2021-04-30 에이에스엠 아이피 홀딩 비.브이. Apparatus and methods for selectively etching films
US11646205B2 (en) 2019-10-29 2023-05-09 Asm Ip Holding B.V. Methods of selectively forming n-type doped material on a surface, systems for selectively forming n-type doped material, and structures formed using same
KR20210054983A (en) 2019-11-05 2021-05-14 에이에스엠 아이피 홀딩 비.브이. Structures with doped semiconductor layers and methods and systems for forming same
US11501968B2 (en) 2019-11-15 2022-11-15 Asm Ip Holding B.V. Method for providing a semiconductor device with silicon filled gaps
KR20210062561A (en) 2019-11-20 2021-05-31 에이에스엠 아이피 홀딩 비.브이. Method of depositing carbon-containing material on a surface of a substrate, structure formed using the method, and system for forming the structure
CN112951697A (en) 2019-11-26 2021-06-11 Asm Ip私人控股有限公司 Substrate processing apparatus
KR20210065848A (en) 2019-11-26 2021-06-04 에이에스엠 아이피 홀딩 비.브이. Methods for selectivley forming a target film on a substrate comprising a first dielectric surface and a second metallic surface
CN112885692A (en) 2019-11-29 2021-06-01 Asm Ip私人控股有限公司 Substrate processing apparatus
CN112885693A (en) 2019-11-29 2021-06-01 Asm Ip私人控股有限公司 Substrate processing apparatus
JP2021090042A (en) 2019-12-02 2021-06-10 エーエスエム アイピー ホールディング ビー.ブイ. Substrate processing apparatus and substrate processing method
KR20210070898A (en) 2019-12-04 2021-06-15 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
TW202125596A (en) 2019-12-17 2021-07-01 荷蘭商Asm Ip私人控股有限公司 Method of forming vanadium nitride layer and structure including the vanadium nitride layer
US11527403B2 (en) 2019-12-19 2022-12-13 Asm Ip Holding B.V. Methods for filling a gap feature on a substrate surface and related semiconductor structures
KR20210095050A (en) 2020-01-20 2021-07-30 에이에스엠 아이피 홀딩 비.브이. Method of forming thin film and method of modifying surface of thin film
TW202130846A (en) 2020-02-03 2021-08-16 荷蘭商Asm Ip私人控股有限公司 Method of forming structures including a vanadium or indium layer
KR20210100010A (en) 2020-02-04 2021-08-13 에이에스엠 아이피 홀딩 비.브이. Method and apparatus for transmittance measurements of large articles
US11776846B2 (en) 2020-02-07 2023-10-03 Asm Ip Holding B.V. Methods for depositing gap filling fluids and related systems and devices
US11781243B2 (en) 2020-02-17 2023-10-10 Asm Ip Holding B.V. Method for depositing low temperature phosphorous-doped silicon
KR20210116240A (en) 2020-03-11 2021-09-27 에이에스엠 아이피 홀딩 비.브이. Substrate handling device with adjustable joints
US11876356B2 (en) 2020-03-11 2024-01-16 Asm Ip Holding B.V. Lockout tagout assembly and system and method of using same
CN113394086A (en) 2020-03-12 2021-09-14 Asm Ip私人控股有限公司 Method for producing a layer structure having a target topological profile
KR20210124042A (en) 2020-04-02 2021-10-14 에이에스엠 아이피 홀딩 비.브이. Thin film forming method
TW202146689A (en) 2020-04-03 2021-12-16 荷蘭商Asm Ip控股公司 Method for forming barrier layer and method for manufacturing semiconductor device
TW202145344A (en) 2020-04-08 2021-12-01 荷蘭商Asm Ip私人控股有限公司 Apparatus and methods for selectively etching silcon oxide films
US11821078B2 (en) 2020-04-15 2023-11-21 Asm Ip Holding B.V. Method for forming precoat film and method for forming silicon-containing film
TW202140831A (en) 2020-04-24 2021-11-01 荷蘭商Asm Ip私人控股有限公司 Method of forming vanadium nitride–containing layer and structure comprising the same
KR20210132605A (en) 2020-04-24 2021-11-04 에이에스엠 아이피 홀딩 비.브이. Vertical batch furnace assembly comprising a cooling gas supply
KR20210132600A (en) 2020-04-24 2021-11-04 에이에스엠 아이피 홀딩 비.브이. Methods and systems for depositing a layer comprising vanadium, nitrogen, and a further element
KR20210134226A (en) 2020-04-29 2021-11-09 에이에스엠 아이피 홀딩 비.브이. Solid source precursor vessel
KR20210134869A (en) 2020-05-01 2021-11-11 에이에스엠 아이피 홀딩 비.브이. Fast FOUP swapping with a FOUP handler
KR20210141379A (en) 2020-05-13 2021-11-23 에이에스엠 아이피 홀딩 비.브이. Laser alignment fixture for a reactor system
KR20210143653A (en) 2020-05-19 2021-11-29 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
KR20210145078A (en) 2020-05-21 2021-12-01 에이에스엠 아이피 홀딩 비.브이. Structures including multiple carbon layers and methods of forming and using same
TW202201602A (en) 2020-05-29 2022-01-01 荷蘭商Asm Ip私人控股有限公司 Substrate processing device
TW202218133A (en) 2020-06-24 2022-05-01 荷蘭商Asm Ip私人控股有限公司 Method for forming a layer provided with silicon
TW202217953A (en) 2020-06-30 2022-05-01 荷蘭商Asm Ip私人控股有限公司 Substrate processing method
KR20220010438A (en) 2020-07-17 2022-01-25 에이에스엠 아이피 홀딩 비.브이. Structures and methods for use in photolithography
TW202204662A (en) 2020-07-20 2022-02-01 荷蘭商Asm Ip私人控股有限公司 Method and system for depositing molybdenum layers
KR20220027026A (en) 2020-08-26 2022-03-07 에이에스엠 아이피 홀딩 비.브이. Method and system for forming metal silicon oxide and metal silicon oxynitride
USD990534S1 (en) 2020-09-11 2023-06-27 Asm Ip Holding B.V. Weighted lift pin
USD1012873S1 (en) 2020-09-24 2024-01-30 Asm Ip Holding B.V. Electrode for semiconductor processing apparatus
TW202229613A (en) 2020-10-14 2022-08-01 荷蘭商Asm Ip私人控股有限公司 Method of depositing material on stepped structure
KR20220053482A (en) 2020-10-22 2022-04-29 에이에스엠 아이피 홀딩 비.브이. Method of depositing vanadium metal, structure, device and a deposition assembly
TW202223136A (en) 2020-10-28 2022-06-16 荷蘭商Asm Ip私人控股有限公司 Method for forming layer on substrate, and semiconductor processing system
KR20220076343A (en) 2020-11-30 2022-06-08 에이에스엠 아이피 홀딩 비.브이. an injector configured for arrangement within a reaction chamber of a substrate processing apparatus
US11946137B2 (en) 2020-12-16 2024-04-02 Asm Ip Holding B.V. Runout and wobble measurement fixtures
TW202231903A (en) 2020-12-22 2022-08-16 荷蘭商Asm Ip私人控股有限公司 Transition metal deposition method, transition metal layer, and deposition assembly for depositing transition metal on substrate
USD980814S1 (en) 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas distributor for substrate processing apparatus
USD981973S1 (en) 2021-05-11 2023-03-28 Asm Ip Holding B.V. Reactor wall for substrate processing apparatus
USD1023959S1 (en) 2021-05-11 2024-04-23 Asm Ip Holding B.V. Electrode for substrate processing apparatus
USD980813S1 (en) 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas flow control plate for substrate processing apparatus
USD990441S1 (en) 2021-09-07 2023-06-27 Asm Ip Holding B.V. Gas flow control plate

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4023398A (en) * 1975-03-03 1977-05-17 John Barry French Apparatus for analyzing trace components
US4070163A (en) * 1974-08-29 1978-01-24 Maxwell Laboratories, Inc. Method and apparatus for electrostatic precipitating particles from a gaseous effluent
WO2002017978A1 (en) * 2000-08-28 2002-03-07 Sharp Kabushiki Kaisha Air refining device and ion generator used for the device

Family Cites Families (57)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2615135A (en) * 1950-06-20 1952-10-21 Jr William E Glenn Mass analyzing apparatus
US2919348A (en) * 1956-07-05 1959-12-29 Bierman Aron Device for the separation of gas ions
US3328960A (en) * 1965-08-16 1967-07-04 Thomas W Martin Ion propulsion system employing lifecycle wastes as a source of ionizable gas
US3931589A (en) * 1974-03-21 1976-01-06 The United States Of America As Represented By The Secretary Of The Navy Perforated wall hollow-cathode ion laser
US4025818A (en) * 1976-04-20 1977-05-24 Hughes Aircraft Company Wire ion plasma electron gun
US4201921A (en) * 1978-07-24 1980-05-06 International Business Machines Corporation Electron beam-capillary plasma flash x-ray device
SU966583A1 (en) 1980-03-10 1982-10-15 Предприятие П/Я А-1342 Method of analysis of impurities in gases
JPS6044020B2 (en) * 1983-05-13 1985-10-01 株式会社ニチエレ air flow generator
JPS6020027A (en) * 1983-07-15 1985-02-01 Mitsubishi Heavy Ind Ltd Air heating and cooling device
JPS6025559A (en) * 1983-07-20 1985-02-08 Mitsubishi Heavy Ind Ltd Gas purifying apparatus
SE445403B (en) * 1986-03-26 1986-06-16 Bengt Kasemo DEVICE FOR INPUT OF SAMPLE MEDIUM TO A MASS SPECTROMETER
SU1337934A2 (en) 1986-04-09 1987-09-15 Предприятие П/Я А-1882 Method of analysis of impurities in gases
SU1412447A1 (en) 1986-11-03 1998-06-20 И.А. Буряков Drift spectrometer to detect microimpurities of substances in gases
SU1485808A1 (en) 1987-03-30 1998-06-10 И.А. Буряков Method of analyzing traces of substances in gases
SE458077B (en) * 1987-07-03 1989-02-20 Astra Vent Ab DEVICE FOR TRANSPORT AND EVEN CLEANING OF AIR
SU1627984A2 (en) 1988-07-20 1991-02-15 Предприятие П/Я А-1882 Method of gas analysis for impurities
US5536939A (en) * 1993-09-22 1996-07-16 Northrop Grumman Corporation Miniaturized mass filter
US5420424A (en) * 1994-04-29 1995-05-30 Mine Safety Appliances Company Ion mobility spectrometer
US5455417A (en) * 1994-05-05 1995-10-03 Sacristan; Emilio Ion mobility method and device for gas analysis
KR0156602B1 (en) * 1994-07-08 1998-12-01 황해웅 Ion mobility analyzer
JPH08293290A (en) * 1995-04-21 1996-11-05 Mitsubishi Denki Eng Kk Lighting system
US5654544A (en) * 1995-08-10 1997-08-05 Analytica Of Branford Mass resolution by angular alignment of the ion detector conversion surface in time-of-flight mass spectrometers with electrostatic steering deflectors
WO1997029508A2 (en) * 1996-02-08 1997-08-14 Perseptive Biosystems, Inc. Interface between liquid flow and mass spectrometer
US5801379A (en) * 1996-03-01 1998-09-01 Mine Safety Appliances Company High voltage waveform generator
US5763876A (en) * 1996-04-04 1998-06-09 Mine Safety Appliances Company Inlet heating device for ion mobility spectrometer
US5723861A (en) * 1996-04-04 1998-03-03 Mine Safety Appliances Company Recirculating filtration system for use with a transportable ion mobility spectrometer
US5838003A (en) * 1996-09-27 1998-11-17 Hewlett-Packard Company Ionization chamber and mass spectrometry system containing an asymmetric electrode
US6323482B1 (en) * 1997-06-02 2001-11-27 Advanced Research And Technology Institute, Inc. Ion mobility and mass spectrometer
US5965882A (en) * 1997-10-07 1999-10-12 Raytheon Company Miniaturized ion mobility spectrometer sensor cell
US5789745A (en) * 1997-10-28 1998-08-04 Sandia Corporation Ion mobility spectrometer using frequency-domain separation
US6124592A (en) * 1998-03-18 2000-09-26 Technispan Llc Ion mobility storage trap and method
US6066848A (en) * 1998-06-09 2000-05-23 Combichem, Inc. Parallel fluid electrospray mass spectrometer
US6713758B2 (en) * 1998-08-05 2004-03-30 National Research Council Of Canada Spherical side-to-side FAIMS
WO2000008457A1 (en) 1998-08-05 2000-02-17 National Research Council Canada Apparatus and method for atmospheric pressure 3-dimensional ion trapping
US6621077B1 (en) * 1998-08-05 2003-09-16 National Research Council Canada Apparatus and method for atmospheric pressure-3-dimensional ion trapping
US6504149B2 (en) * 1998-08-05 2003-01-07 National Research Council Canada Apparatus and method for desolvating and focussing ions for introduction into a mass spectrometer
DE19905680A1 (en) * 1998-10-22 2000-08-17 Heinz Hoelter Two-stage heat exchanger with integral denaturing ion-room air cleaning system, ion-room air flow generator has two combinations of spray electrode, precipitation electrode, heat exchanger
US6512224B1 (en) * 1999-07-21 2003-01-28 The Charles Stark Draper Laboratory, Inc. Longitudinal field driven field asymmetric ion mobility filter and detection system
US6690004B2 (en) * 1999-07-21 2004-02-10 The Charles Stark Draper Laboratory, Inc. Method and apparatus for electrospray-augmented high field asymmetric ion mobility spectrometry
US7005632B2 (en) * 2002-04-12 2006-02-28 Sionex Corporation Method and apparatus for control of mobility-based ion species identification
US7057168B2 (en) * 1999-07-21 2006-06-06 Sionex Corporation Systems for differential ion mobility analysis
US6495823B1 (en) 1999-07-21 2002-12-17 The Charles Stark Draper Laboratory, Inc. Micromachined field asymmetric ion mobility filter and detection system
US6806463B2 (en) * 1999-07-21 2004-10-19 The Charles Stark Draper Laboratory, Inc. Micromachined field asymmetric ion mobility filter and detection system
US6815668B2 (en) 1999-07-21 2004-11-09 The Charles Stark Draper Laboratory, Inc. Method and apparatus for chromatography-high field asymmetric waveform ion mobility spectrometry
WO2001022049A2 (en) 1999-09-24 2001-03-29 Haley Lawrence V A novel ion-mobility based device using an oscillatory high-field ion separator with a multi-channel array charge collector
JP2001155678A (en) * 1999-11-26 2001-06-08 Horiba Ltd Mass spectrometer
JP3509741B2 (en) * 1999-12-27 2004-03-22 株式会社セキュリティーシステム Non-discharge air purifier, non-discharge air cleaning method, and non-discharge air sterilizer
CA2402793C (en) * 2000-03-14 2009-06-16 National Research Council Of Canada Improved parallel plate geometry faims apparatus and method
US6825461B2 (en) 2000-03-14 2004-11-30 National Research Council Canada FAIMS apparatus and method with ion diverting device
US20030089847A1 (en) 2000-03-14 2003-05-15 Roger Guevremont Tandem high field asymmetric waveform ion mobility spectrometry ( faims)/ion mobility spectrometry
US6744043B2 (en) * 2000-12-08 2004-06-01 Mds Inc. Ion mobilty spectrometer incorporating an ion guide in combination with an MS device
CA2444257A1 (en) 2001-04-17 2002-10-24 The Charles Stark Draper Laboratory, Inc. Methods and apparatus for electrospray-augmented high field asymmetric ion mobility spectrometry
EP1405065B1 (en) 2001-06-30 2012-04-11 Dh Technologies Development Pte. Ltd. System for collection of data and identification of unknown ion species in an electric field
US7274015B2 (en) 2001-08-08 2007-09-25 Sionex Corporation Capacitive discharge plasma ion source
JP4353665B2 (en) * 2001-10-31 2009-10-28 三洋アクアテクノ株式会社 Filtration device
AU2003201232A1 (en) * 2002-02-08 2003-09-02 Ionalytics Corporation Faims with non-destructive detection of selectively transmitted ions
WO2005028973A2 (en) * 2003-09-17 2005-03-31 Sionex Corporation Solid-state flow generator and related systems, applications, and methods

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4070163A (en) * 1974-08-29 1978-01-24 Maxwell Laboratories, Inc. Method and apparatus for electrostatic precipitating particles from a gaseous effluent
US4023398A (en) * 1975-03-03 1977-05-17 John Barry French Apparatus for analyzing trace components
WO2002017978A1 (en) * 2000-08-28 2002-03-07 Sharp Kabushiki Kaisha Air refining device and ion generator used for the device
US20040007000A1 (en) * 2000-08-28 2004-01-15 Yasukata Takeda Air refining device and ion generator used for the device

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP1668298A4 *

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US7223970B2 (en) 2007-05-29
CA2539484A1 (en) 2005-03-31
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WO2005028973A2 (en) 2005-03-31
US20070187590A1 (en) 2007-08-16
US20050056780A1 (en) 2005-03-17
US7453060B2 (en) 2008-11-18
EP1668298A4 (en) 2010-04-14
US20090045331A1 (en) 2009-02-19

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