WO2005041276A1 - 露光装置、露光方法、デバイスの製造方法 - Google Patents
露光装置、露光方法、デバイスの製造方法 Download PDFInfo
- Publication number
- WO2005041276A1 WO2005041276A1 PCT/JP2004/015796 JP2004015796W WO2005041276A1 WO 2005041276 A1 WO2005041276 A1 WO 2005041276A1 JP 2004015796 W JP2004015796 W JP 2004015796W WO 2005041276 A1 WO2005041276 A1 WO 2005041276A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- liquid
- immersion area
- substrate
- exposure apparatus
- area
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
Claims
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005514993A JP4605014B2 (ja) | 2003-10-28 | 2004-10-25 | 露光装置、露光方法、デバイスの製造方法 |
EP04792927A EP1679738A4 (en) | 2003-10-28 | 2004-10-25 | EXPOSURE DEVICE, EXPOSURE METHOD AND COMPONENT MANUFACTURING METHOD |
KR1020067010221A KR101121260B1 (ko) | 2003-10-28 | 2004-10-25 | 노광 장치, 노광 방법, 및 디바이스의 제조 방법 |
US11/407,210 US7932996B2 (en) | 2003-10-28 | 2006-04-20 | Exposure apparatus, exposure method, and device fabrication method |
US13/064,361 US8272544B2 (en) | 2003-10-28 | 2011-03-21 | Exposure apparatus, exposure method, and device fabrication method |
US13/591,583 US8797506B2 (en) | 2003-10-28 | 2012-08-22 | Exposure apparatus, exposure method, and device fabrication method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003-366914 | 2003-10-28 | ||
JP2003366914 | 2003-10-28 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/407,210 Continuation US7932996B2 (en) | 2003-10-28 | 2006-04-20 | Exposure apparatus, exposure method, and device fabrication method |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2005041276A1 true WO2005041276A1 (ja) | 2005-05-06 |
Family
ID=34510271
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2004/015796 WO2005041276A1 (ja) | 2003-10-28 | 2004-10-25 | 露光装置、露光方法、デバイスの製造方法 |
Country Status (6)
Country | Link |
---|---|
US (3) | US7932996B2 (ja) |
EP (1) | EP1679738A4 (ja) |
JP (1) | JP4605014B2 (ja) |
KR (1) | KR101121260B1 (ja) |
TW (1) | TW200520052A (ja) |
WO (1) | WO2005041276A1 (ja) |
Cited By (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007515798A (ja) * | 2003-12-23 | 2007-06-14 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ装置及びデバイス製造方法 |
JP2008235620A (ja) * | 2007-03-22 | 2008-10-02 | Utsunomiya Univ | 液浸露光装置 |
JP2008244477A (ja) * | 2007-03-23 | 2008-10-09 | Nikon Corp | 液体回収システム、液浸露光装置、液浸露光方法、及びデバイス製造方法 |
KR100925834B1 (ko) | 2006-11-13 | 2009-11-06 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치에 대한 도관 시스템, 리소그래피 장치,펌프, 및 도관 시스템 내의 진동을 실질적으로 감소시키는방법 |
JP2011097107A (ja) * | 2006-12-07 | 2011-05-12 | Asml Netherlands Bv | リソグラフィ投影装置 |
CN102221788A (zh) * | 2010-04-15 | 2011-10-19 | Asml荷兰有限公司 | 流体处理结构、光刻设备和器件制造方法 |
JP2012191219A (ja) * | 2006-05-10 | 2012-10-04 | Nikon Corp | 露光装置及びデバイス製造方法 |
US8379187B2 (en) | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
US8446579B2 (en) | 2008-05-28 | 2013-05-21 | Nikon Corporation | Inspection device and inspecting method for spatial light modulator, illumination optical system, method for adjusting the illumination optical system, exposure apparatus, and device manufacturing method |
US8451427B2 (en) | 2007-09-14 | 2013-05-28 | Nikon Corporation | Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method |
US8462317B2 (en) | 2007-10-16 | 2013-06-11 | Nikon Corporation | Illumination optical system, exposure apparatus, and device manufacturing method |
US8520291B2 (en) | 2007-10-16 | 2013-08-27 | Nikon Corporation | Illumination optical system, exposure apparatus, and device manufacturing method |
US20130271945A1 (en) | 2004-02-06 | 2013-10-17 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
US8634053B2 (en) | 2006-12-07 | 2014-01-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8675177B2 (en) | 2003-04-09 | 2014-03-18 | Nikon Corporation | Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas |
US8767171B2 (en) | 2003-12-23 | 2014-07-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8854601B2 (en) | 2005-05-12 | 2014-10-07 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
US9097981B2 (en) | 2007-10-12 | 2015-08-04 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and device manufacturing method |
US9116346B2 (en) | 2007-11-06 | 2015-08-25 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
US9140992B2 (en) | 2003-10-28 | 2015-09-22 | Nikon Corporation | Illumination optical apparatus and projection exposure apparatus |
US9164209B2 (en) | 2003-11-20 | 2015-10-20 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power having different thicknesses to rotate linear polarization direction |
US10451973B2 (en) | 2005-05-03 | 2019-10-22 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US10495980B2 (en) | 2005-03-04 | 2019-12-03 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1660925B1 (en) * | 2003-09-03 | 2015-04-29 | Nikon Corporation | Apparatus and method for providing fluid for immersion lithography |
WO2005041276A1 (ja) | 2003-10-28 | 2005-05-06 | Nikon Corporation | 露光装置、露光方法、デバイスの製造方法 |
DE602004027162D1 (de) | 2004-01-05 | 2010-06-24 | Nippon Kogaku Kk | Belichtungsvorrichtung, belichtungsverfahren und bauelementeherstellungsverfahren |
US8564759B2 (en) * | 2006-06-29 | 2013-10-22 | Taiwan Semiconductor Manufacturing Company, Ltd. | Apparatus and method for immersion lithography |
NL2003333A (en) * | 2008-10-23 | 2010-04-26 | Asml Netherlands Bv | Fluid handling structure, lithographic apparatus and device manufacturing method. |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999049504A1 (fr) | 1998-03-26 | 1999-09-30 | Nikon Corporation | Procede et systeme d'exposition par projection |
WO2004055803A1 (en) | 2002-12-13 | 2004-07-01 | Koninklijke Philips Electronics N.V. | Liquid removal in a method and device for irradiating spots on a layer |
JP2004320016A (ja) * | 2003-04-11 | 2004-11-11 | Nikon Corp | 液浸リソグラフィシステム |
JP2005012228A (ja) * | 2003-06-19 | 2005-01-13 | Asml Holding Nv | 浸漬フォトリソグラフィシステム及びマイクロチャネルノズルを使用する方法 |
WO2005024517A2 (en) | 2003-09-03 | 2005-03-17 | Nikon Corporation | Apparatus and method for providing fluid for immersion lithography |
Family Cites Families (44)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4346164A (en) * | 1980-10-06 | 1982-08-24 | Werner Tabarelli | Photolithographic method for the manufacture of integrated circuits |
JPS57153433A (en) * | 1981-03-18 | 1982-09-22 | Hitachi Ltd | Manufacturing device for semiconductor |
JPS58202448A (ja) | 1982-05-21 | 1983-11-25 | Hitachi Ltd | 露光装置 |
JPS5919912A (ja) | 1982-07-26 | 1984-02-01 | Hitachi Ltd | 液浸距離保持装置 |
DD221563A1 (de) | 1983-09-14 | 1985-04-24 | Mikroelektronik Zt Forsch Tech | Immersionsobjektiv fuer die schrittweise projektionsabbildung einer maskenstruktur |
DD224448A1 (de) | 1984-03-01 | 1985-07-03 | Zeiss Jena Veb Carl | Einrichtung zur fotolithografischen strukturuebertragung |
JPS6265326A (ja) | 1985-09-18 | 1987-03-24 | Hitachi Ltd | 露光装置 |
JPS63157419A (ja) | 1986-12-22 | 1988-06-30 | Toshiba Corp | 微細パタ−ン転写装置 |
JPH04305915A (ja) | 1991-04-02 | 1992-10-28 | Nikon Corp | 密着型露光装置 |
JPH04305917A (ja) | 1991-04-02 | 1992-10-28 | Nikon Corp | 密着型露光装置 |
JPH0562877A (ja) | 1991-09-02 | 1993-03-12 | Yasuko Shinohara | 光によるlsi製造縮小投影露光装置の光学系 |
JPH06188169A (ja) | 1992-08-24 | 1994-07-08 | Canon Inc | 結像方法及び該方法を用いる露光装置及び該方法を用いるデバイス製造方法 |
JPH06124873A (ja) | 1992-10-09 | 1994-05-06 | Canon Inc | 液浸式投影露光装置 |
JP2753930B2 (ja) * | 1992-11-27 | 1998-05-20 | キヤノン株式会社 | 液浸式投影露光装置 |
JPH07220990A (ja) | 1994-01-28 | 1995-08-18 | Hitachi Ltd | パターン形成方法及びその露光装置 |
US5874820A (en) | 1995-04-04 | 1999-02-23 | Nikon Corporation | Window frame-guided stage mechanism |
US5528118A (en) * | 1994-04-01 | 1996-06-18 | Nikon Precision, Inc. | Guideless stage with isolated reaction stage |
JPH08316125A (ja) | 1995-05-19 | 1996-11-29 | Hitachi Ltd | 投影露光方法及び露光装置 |
JPH08316124A (ja) * | 1995-05-19 | 1996-11-29 | Hitachi Ltd | 投影露光方法及び露光装置 |
US5825043A (en) * | 1996-10-07 | 1998-10-20 | Nikon Precision Inc. | Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus |
JP4029183B2 (ja) | 1996-11-28 | 2008-01-09 | 株式会社ニコン | 投影露光装置及び投影露光方法 |
CN1244018C (zh) * | 1996-11-28 | 2006-03-01 | 株式会社尼康 | 曝光方法和曝光装置 |
JP4029182B2 (ja) | 1996-11-28 | 2008-01-09 | 株式会社ニコン | 露光方法 |
DE69717975T2 (de) * | 1996-12-24 | 2003-05-28 | Asml Netherlands Bv | In zwei richtungen ausgewogenes positioniergerät, sowie lithographisches gerät mit einem solchen positioniergerät |
JP3747566B2 (ja) | 1997-04-23 | 2006-02-22 | 株式会社ニコン | 液浸型露光装置 |
JP3817836B2 (ja) | 1997-06-10 | 2006-09-06 | 株式会社ニコン | 露光装置及びその製造方法並びに露光方法及びデバイス製造方法 |
JP4210871B2 (ja) | 1997-10-31 | 2009-01-21 | 株式会社ニコン | 露光装置 |
JPH11176727A (ja) | 1997-12-11 | 1999-07-02 | Nikon Corp | 投影露光装置 |
JP2000058436A (ja) | 1998-08-11 | 2000-02-25 | Nikon Corp | 投影露光装置及び露光方法 |
EP1532489A2 (en) | 2002-08-23 | 2005-05-25 | Nikon Corporation | Projection optical system and method for photolithography and exposure apparatus and method using same |
US6954993B1 (en) * | 2002-09-30 | 2005-10-18 | Lam Research Corporation | Concentric proximity processing head |
SG135052A1 (en) * | 2002-11-12 | 2007-09-28 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
CN101382738B (zh) * | 2002-11-12 | 2011-01-12 | Asml荷兰有限公司 | 光刻投射装置 |
US7399978B2 (en) | 2002-12-19 | 2008-07-15 | Koninklijke Philips Electronics N.V. | Method and device for irradiating spots on a layer |
USRE48515E1 (en) | 2002-12-19 | 2021-04-13 | Asml Netherlands B.V. | Method and device for irradiating spots on a layer |
JP4604452B2 (ja) * | 2003-02-26 | 2011-01-05 | 株式会社ニコン | 露光装置、露光方法、及びデバイス製造方法 |
KR101121655B1 (ko) | 2003-04-10 | 2012-03-09 | 가부시키가이샤 니콘 | 액침 리소그래피 장치용 진공 배출을 포함하는 환경 시스템 |
KR101238142B1 (ko) | 2003-04-10 | 2013-02-28 | 가부시키가이샤 니콘 | 액침 리소그래피 장치용 운반 영역을 포함하는 환경 시스템 |
TWI467634B (zh) * | 2003-06-13 | 2015-01-01 | 尼康股份有限公司 | An exposure method, a substrate stage, an exposure apparatus, and an element manufacturing method |
US6809794B1 (en) * | 2003-06-27 | 2004-10-26 | Asml Holding N.V. | Immersion photolithography system and method using inverted wafer-projection optics interface |
EP1494079B1 (en) * | 2003-06-27 | 2008-01-02 | ASML Netherlands B.V. | Lithographic Apparatus |
ATE489724T1 (de) * | 2003-07-09 | 2010-12-15 | Nikon Corp | Belichtungsvorrichtung und verfahren zur bauelementherstellung |
US7369217B2 (en) * | 2003-10-03 | 2008-05-06 | Micronic Laser Systems Ab | Method and device for immersion lithography |
WO2005041276A1 (ja) * | 2003-10-28 | 2005-05-06 | Nikon Corporation | 露光装置、露光方法、デバイスの製造方法 |
-
2004
- 2004-10-25 WO PCT/JP2004/015796 patent/WO2005041276A1/ja active Application Filing
- 2004-10-25 JP JP2005514993A patent/JP4605014B2/ja not_active Expired - Fee Related
- 2004-10-25 EP EP04792927A patent/EP1679738A4/en not_active Withdrawn
- 2004-10-25 KR KR1020067010221A patent/KR101121260B1/ko active IP Right Grant
- 2004-10-28 TW TW093132654A patent/TW200520052A/zh not_active IP Right Cessation
-
2006
- 2006-04-20 US US11/407,210 patent/US7932996B2/en not_active Expired - Fee Related
-
2011
- 2011-03-21 US US13/064,361 patent/US8272544B2/en not_active Expired - Fee Related
-
2012
- 2012-08-22 US US13/591,583 patent/US8797506B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999049504A1 (fr) | 1998-03-26 | 1999-09-30 | Nikon Corporation | Procede et systeme d'exposition par projection |
WO2004055803A1 (en) | 2002-12-13 | 2004-07-01 | Koninklijke Philips Electronics N.V. | Liquid removal in a method and device for irradiating spots on a layer |
JP2004320016A (ja) * | 2003-04-11 | 2004-11-11 | Nikon Corp | 液浸リソグラフィシステム |
JP2005012228A (ja) * | 2003-06-19 | 2005-01-13 | Asml Holding Nv | 浸漬フォトリソグラフィシステム及びマイクロチャネルノズルを使用する方法 |
WO2005024517A2 (en) | 2003-09-03 | 2005-03-17 | Nikon Corporation | Apparatus and method for providing fluid for immersion lithography |
Non-Patent Citations (1)
Title |
---|
See also references of EP1679738A4 * |
Cited By (62)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9678437B2 (en) | 2003-04-09 | 2017-06-13 | Nikon Corporation | Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction |
US9146474B2 (en) | 2003-04-09 | 2015-09-29 | Nikon Corporation | Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger and different linear polarization states in an on-axis area and a plurality of off-axis areas |
US9164393B2 (en) | 2003-04-09 | 2015-10-20 | Nikon Corporation | Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in four areas |
US9885959B2 (en) | 2003-04-09 | 2018-02-06 | Nikon Corporation | Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator |
US8675177B2 (en) | 2003-04-09 | 2014-03-18 | Nikon Corporation | Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas |
US9423698B2 (en) | 2003-10-28 | 2016-08-23 | Nikon Corporation | Illumination optical apparatus and projection exposure apparatus |
US9760014B2 (en) | 2003-10-28 | 2017-09-12 | Nikon Corporation | Illumination optical apparatus and projection exposure apparatus |
US9423697B2 (en) | 2003-10-28 | 2016-08-23 | Nikon Corporation | Illumination optical apparatus and projection exposure apparatus |
US9244359B2 (en) | 2003-10-28 | 2016-01-26 | Nikon Corporation | Illumination optical apparatus and projection exposure apparatus |
US9146476B2 (en) | 2003-10-28 | 2015-09-29 | Nikon Corporation | Illumination optical apparatus and projection exposure apparatus |
US9140993B2 (en) | 2003-10-28 | 2015-09-22 | Nikon Corporation | Illumination optical apparatus and projection exposure apparatus |
US9140992B2 (en) | 2003-10-28 | 2015-09-22 | Nikon Corporation | Illumination optical apparatus and projection exposure apparatus |
US9164209B2 (en) | 2003-11-20 | 2015-10-20 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power having different thicknesses to rotate linear polarization direction |
US9885872B2 (en) | 2003-11-20 | 2018-02-06 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light |
US10281632B2 (en) | 2003-11-20 | 2019-05-07 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction |
US9817321B2 (en) | 2003-12-23 | 2017-11-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP2007515798A (ja) * | 2003-12-23 | 2007-06-14 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ装置及びデバイス製造方法 |
US9465301B2 (en) | 2003-12-23 | 2016-10-11 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8767171B2 (en) | 2003-12-23 | 2014-07-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US10613447B2 (en) | 2003-12-23 | 2020-04-07 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9429848B2 (en) | 2004-02-06 | 2016-08-30 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
US10234770B2 (en) | 2004-02-06 | 2019-03-19 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
US10007194B2 (en) | 2004-02-06 | 2018-06-26 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
US10241417B2 (en) | 2004-02-06 | 2019-03-26 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
US20130271945A1 (en) | 2004-02-06 | 2013-10-17 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
US9423694B2 (en) | 2004-02-06 | 2016-08-23 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
US9140990B2 (en) | 2004-02-06 | 2015-09-22 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
US10495980B2 (en) | 2005-03-04 | 2019-12-03 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US10495981B2 (en) | 2005-03-04 | 2019-12-03 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US10451973B2 (en) | 2005-05-03 | 2019-10-22 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US10488759B2 (en) | 2005-05-03 | 2019-11-26 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9360763B2 (en) | 2005-05-12 | 2016-06-07 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
US9310696B2 (en) | 2005-05-12 | 2016-04-12 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
US9891539B2 (en) | 2005-05-12 | 2018-02-13 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
US8854601B2 (en) | 2005-05-12 | 2014-10-07 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
US9429851B2 (en) | 2005-05-12 | 2016-08-30 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
JP2012191219A (ja) * | 2006-05-10 | 2012-10-04 | Nikon Corp | 露光装置及びデバイス製造方法 |
KR100925834B1 (ko) | 2006-11-13 | 2009-11-06 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치에 대한 도관 시스템, 리소그래피 장치,펌프, 및 도관 시스템 내의 진동을 실질적으로 감소시키는방법 |
JP2011097107A (ja) * | 2006-12-07 | 2011-05-12 | Asml Netherlands Bv | リソグラフィ投影装置 |
US10268127B2 (en) | 2006-12-07 | 2019-04-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8634053B2 (en) | 2006-12-07 | 2014-01-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9645506B2 (en) | 2006-12-07 | 2017-05-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP2008235620A (ja) * | 2007-03-22 | 2008-10-02 | Utsunomiya Univ | 液浸露光装置 |
JP2008244477A (ja) * | 2007-03-23 | 2008-10-09 | Nikon Corp | 液体回収システム、液浸露光装置、液浸露光方法、及びデバイス製造方法 |
US9366970B2 (en) | 2007-09-14 | 2016-06-14 | Nikon Corporation | Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method |
US9057963B2 (en) | 2007-09-14 | 2015-06-16 | Nikon Corporation | Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method |
US8451427B2 (en) | 2007-09-14 | 2013-05-28 | Nikon Corporation | Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method |
US10101666B2 (en) | 2007-10-12 | 2018-10-16 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and device manufacturing method |
US9097981B2 (en) | 2007-10-12 | 2015-08-04 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and device manufacturing method |
US8462317B2 (en) | 2007-10-16 | 2013-06-11 | Nikon Corporation | Illumination optical system, exposure apparatus, and device manufacturing method |
US8508717B2 (en) | 2007-10-16 | 2013-08-13 | Nikon Corporation | Illumination optical system, exposure apparatus, and device manufacturing method |
US8520291B2 (en) | 2007-10-16 | 2013-08-27 | Nikon Corporation | Illumination optical system, exposure apparatus, and device manufacturing method |
US9057877B2 (en) | 2007-10-24 | 2015-06-16 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
US9341954B2 (en) | 2007-10-24 | 2016-05-17 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
US9857599B2 (en) | 2007-10-24 | 2018-01-02 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
US8379187B2 (en) | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
US9116346B2 (en) | 2007-11-06 | 2015-08-25 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
US9678332B2 (en) | 2007-11-06 | 2017-06-13 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
US8446579B2 (en) | 2008-05-28 | 2013-05-21 | Nikon Corporation | Inspection device and inspecting method for spatial light modulator, illumination optical system, method for adjusting the illumination optical system, exposure apparatus, and device manufacturing method |
US8456624B2 (en) | 2008-05-28 | 2013-06-04 | Nikon Corporation | Inspection device and inspecting method for spatial light modulator, illumination optical system, method for adjusting the illumination optical system, exposure apparatus, and device manufacturing method |
US8638417B2 (en) | 2010-04-15 | 2014-01-28 | Asml Netherlands B.V. | Fluid handling structure, lithographic apparatus and a device manufacturing method |
CN102221788A (zh) * | 2010-04-15 | 2011-10-19 | Asml荷兰有限公司 | 流体处理结构、光刻设备和器件制造方法 |
Also Published As
Publication number | Publication date |
---|---|
TW200520052A (en) | 2005-06-16 |
JPWO2005041276A1 (ja) | 2007-04-26 |
TWI373063B (ja) | 2012-09-21 |
JP4605014B2 (ja) | 2011-01-05 |
US7932996B2 (en) | 2011-04-26 |
KR20060128877A (ko) | 2006-12-14 |
KR101121260B1 (ko) | 2012-03-23 |
EP1679738A4 (en) | 2008-08-06 |
US20120320350A1 (en) | 2012-12-20 |
EP1679738A1 (en) | 2006-07-12 |
US20110189613A1 (en) | 2011-08-04 |
US20070002299A1 (en) | 2007-01-04 |
US8272544B2 (en) | 2012-09-25 |
US8797506B2 (en) | 2014-08-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4605014B2 (ja) | 露光装置、露光方法、デバイスの製造方法 | |
JP6319410B2 (ja) | 露光装置及びデバイス製造方法 | |
US9500959B2 (en) | Exposure apparatus and device manufacturing method | |
KR101643112B1 (ko) | 노광 장치, 노광 방법 및 디바이스 제조 방법 | |
JP4595320B2 (ja) | 露光装置、及びデバイス製造方法 | |
JP4596076B2 (ja) | 露光装置、露光方法、及びデバイス製造方法 | |
JP4655763B2 (ja) | 露光装置、露光方法及びデバイス製造方法 | |
US20080018866A1 (en) | Exposure Apparatus and Device Producing Method | |
JP2010118714A (ja) | 露光装置、露光方法及びデバイス製造方法 | |
JP2011049607A (ja) | 露光装置、露光方法、並びにデバイス製造方法 | |
JP2009105472A (ja) | 真空システム、液浸露光装置及び露光方法、デバイス製造方法 | |
TW201403259A (zh) | 曝光裝置、曝光方法及元件製造方法 | |
JP2005101488A (ja) | 露光装置及び露光方法、デバイス製造方法 | |
JP2005109426A (ja) | 露光装置、露光方法及びデバイス製造方法 | |
WO2005038888A1 (ja) | 露光装置、露光方法、デバイスの製造方法 | |
JP4701606B2 (ja) | 露光方法及び露光装置、デバイス製造方法 | |
JP2005045232A (ja) | 露光装置、露光方法、並びにデバイス製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): BW GH GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2005514993 Country of ref document: JP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 11407210 Country of ref document: US |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2004792927 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1020067010221 Country of ref document: KR |
|
WWP | Wipo information: published in national office |
Ref document number: 2004792927 Country of ref document: EP |
|
WWP | Wipo information: published in national office |
Ref document number: 1020067010221 Country of ref document: KR |
|
WWP | Wipo information: published in national office |
Ref document number: 11407210 Country of ref document: US |