WO2005064405A3 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method Download PDF

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Publication number
WO2005064405A3
WO2005064405A3 PCT/EP2004/014282 EP2004014282W WO2005064405A3 WO 2005064405 A3 WO2005064405 A3 WO 2005064405A3 EP 2004014282 W EP2004014282 W EP 2004014282W WO 2005064405 A3 WO2005064405 A3 WO 2005064405A3
Authority
WO
WIPO (PCT)
Prior art keywords
device manufacturing
lithographic apparatus
barrier member
substrate
space
Prior art date
Application number
PCT/EP2004/014282
Other languages
French (fr)
Other versions
WO2005064405A2 (en
Inventor
Santen Helmar Van
Aleksey Yurievic Kolesnychenko
Original Assignee
Asml Netherlands Bv
Santen Helmar Van
Aleksey Yurievic Kolesnychenko
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv, Santen Helmar Van, Aleksey Yurievic Kolesnychenko filed Critical Asml Netherlands Bv
Priority to JP2006545996A priority Critical patent/JP4157146B2/en
Priority to EP17181223.3A priority patent/EP3287848B1/en
Priority to EP04803901A priority patent/EP1697799A2/en
Publication of WO2005064405A2 publication Critical patent/WO2005064405A2/en
Publication of WO2005064405A3 publication Critical patent/WO2005064405A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Abstract

A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system (PL), a barrier member (10) and a substrate. The barrier member (10) is not sealed such that, during use, immersion liquid (5) is allowed to flow out the space and between the barrier member (10) and the substrate (W).
PCT/EP2004/014282 2003-12-23 2004-12-15 Lithographic apparatus and device manufacturing method WO2005064405A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2006545996A JP4157146B2 (en) 2003-12-23 2004-12-15 Lithographic apparatus and device manufacturing method
EP17181223.3A EP3287848B1 (en) 2003-12-23 2004-12-15 Lithographic apparatus
EP04803901A EP1697799A2 (en) 2003-12-23 2004-12-15 Lithographic apparatus and device manufacturing method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/743,271 2003-12-23
US10/743,271 US7394521B2 (en) 2003-12-23 2003-12-23 Lithographic apparatus and device manufacturing method

Publications (2)

Publication Number Publication Date
WO2005064405A2 WO2005064405A2 (en) 2005-07-14
WO2005064405A3 true WO2005064405A3 (en) 2006-03-09

Family

ID=34678626

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2004/014282 WO2005064405A2 (en) 2003-12-23 2004-12-15 Lithographic apparatus and device manufacturing method

Country Status (7)

Country Link
US (2) US7394521B2 (en)
EP (3) EP1697799A2 (en)
JP (2) JP4157146B2 (en)
KR (1) KR100855337B1 (en)
CN (2) CN101872129B (en)
TW (1) TWI261151B (en)
WO (1) WO2005064405A2 (en)

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US20050134815A1 (en) 2005-06-23
EP3287848B1 (en) 2018-11-07
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EP2259139B1 (en) 2017-08-23
JP4526572B2 (en) 2010-08-18
US7710541B2 (en) 2010-05-04
CN101872129A (en) 2010-10-27
EP2259139A1 (en) 2010-12-08
CN101872129B (en) 2013-01-23
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US7394521B2 (en) 2008-07-01
US20080186459A1 (en) 2008-08-07
KR100855337B1 (en) 2008-09-04
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EP3287848A1 (en) 2018-02-28
EP1697799A2 (en) 2006-09-06
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TWI261151B (en) 2006-09-01
JP4157146B2 (en) 2008-09-24

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