WO2006041542A3 - Method and system for dynamically controlling metrology work in progress - Google Patents

Method and system for dynamically controlling metrology work in progress Download PDF

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Publication number
WO2006041542A3
WO2006041542A3 PCT/US2005/022191 US2005022191W WO2006041542A3 WO 2006041542 A3 WO2006041542 A3 WO 2006041542A3 US 2005022191 W US2005022191 W US 2005022191W WO 2006041542 A3 WO2006041542 A3 WO 2006041542A3
Authority
WO
WIPO (PCT)
Prior art keywords
metrology
progress
dynamically controlling
tool
wafer lots
Prior art date
Application number
PCT/US2005/022191
Other languages
French (fr)
Other versions
WO2006041542A2 (en
Inventor
Matthew A Purdy
Cabe W Nicksic
Original Assignee
Advanced Micro Devices Inc
Matthew A Purdy
Cabe W Nicksic
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Micro Devices Inc, Matthew A Purdy, Cabe W Nicksic filed Critical Advanced Micro Devices Inc
Priority to KR1020077008345A priority Critical patent/KR101129715B1/en
Priority to CN2005800340498A priority patent/CN101036092B/en
Priority to EP05771492A priority patent/EP1797486A2/en
Priority to JP2007535668A priority patent/JP2008523458A/en
Publication of WO2006041542A2 publication Critical patent/WO2006041542A2/en
Publication of WO2006041542A3 publication Critical patent/WO2006041542A3/en

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Programme-control systems
    • G05B19/02—Programme-control systems electric
    • G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM]
    • G05B19/41865—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM] characterised by job scheduling, process planning, material flow
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Programme-control systems
    • G05B19/02—Programme-control systems electric
    • G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM]
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/32—Operator till task planning
    • G05B2219/32247—Real time scheduler
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/32—Operator till task planning
    • G05B2219/32306—Rules to make scheduling decisions
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/45—Nc applications
    • G05B2219/45031—Manufacturing semiconductor wafers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/80—Management or planning

Abstract

The present invention is generally directed to various methods and systems for dynamically controlling metrology work in progress. In one illustrative embodiment, the method comprises providing a metrology control unit (12) that is adapted to control metrology work flow to at least one metrology tool (14), identifying a plurality of wafer lots (23) that are in a metrology queue wherein the wafer lots (23) are intended to be processed in at least one metrology tool (14), and wherein the metrology control unit (12) selects at least one of the wafer lots (23) for metrology processing in the at least one metrology tool (14) and selects at least one other of the plurality of wafer lots (23) to be removed from the metrology queue based upon the metrology processing of the selected at least one wafer lot (23) in the at least one metrology tool (14).
PCT/US2005/022191 2004-10-05 2005-06-23 Method and system for dynamically controlling metrology work in progress WO2006041542A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020077008345A KR101129715B1 (en) 2004-10-05 2005-06-23 Method and system for dynamically controlling metrology work in progress
CN2005800340498A CN101036092B (en) 2004-10-05 2005-06-23 Method and system for dynamically controlling metrology work in progress
EP05771492A EP1797486A2 (en) 2004-10-05 2005-06-23 Method and system for dynamically controlling metrology work in progress
JP2007535668A JP2008523458A (en) 2004-10-05 2005-06-23 Method and system for dynamically controlling in-process metrology work

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/958,834 US7296103B1 (en) 2004-10-05 2004-10-05 Method and system for dynamically selecting wafer lots for metrology processing
US10/958,834 2004-10-05

Publications (2)

Publication Number Publication Date
WO2006041542A2 WO2006041542A2 (en) 2006-04-20
WO2006041542A3 true WO2006041542A3 (en) 2006-06-01

Family

ID=35311834

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2005/022191 WO2006041542A2 (en) 2004-10-05 2005-06-23 Method and system for dynamically controlling metrology work in progress

Country Status (7)

Country Link
US (1) US7296103B1 (en)
EP (1) EP1797486A2 (en)
JP (1) JP2008523458A (en)
KR (1) KR101129715B1 (en)
CN (1) CN101036092B (en)
TW (1) TWI374345B (en)
WO (1) WO2006041542A2 (en)

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US7668615B2 (en) * 2007-10-02 2010-02-23 GlobalFoundries, Inc. Method and apparatus for randomizing dispatch order for single wafer processing
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Also Published As

Publication number Publication date
CN101036092B (en) 2010-11-03
KR20070051939A (en) 2007-05-18
EP1797486A2 (en) 2007-06-20
CN101036092A (en) 2007-09-12
JP2008523458A (en) 2008-07-03
US7296103B1 (en) 2007-11-13
TW200627105A (en) 2006-08-01
TWI374345B (en) 2012-10-11
WO2006041542A2 (en) 2006-04-20
KR101129715B1 (en) 2012-03-28

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