WO2006062930A3 - Method and system for fast filling of templates for imprint lithography using on template dispense - Google Patents

Method and system for fast filling of templates for imprint lithography using on template dispense Download PDF

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Publication number
WO2006062930A3
WO2006062930A3 PCT/US2005/044030 US2005044030W WO2006062930A3 WO 2006062930 A3 WO2006062930 A3 WO 2006062930A3 US 2005044030 W US2005044030 W US 2005044030W WO 2006062930 A3 WO2006062930 A3 WO 2006062930A3
Authority
WO
WIPO (PCT)
Prior art keywords
liquid
substrate
templates
dispense
template
Prior art date
Application number
PCT/US2005/044030
Other languages
French (fr)
Other versions
WO2006062930A2 (en
Inventor
Ian M Mcmackin
Pankaj B Lad
Van N Truskett
Original Assignee
Molecular Imprints Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Molecular Imprints Inc filed Critical Molecular Imprints Inc
Publication of WO2006062930A2 publication Critical patent/WO2006062930A2/en
Publication of WO2006062930A3 publication Critical patent/WO2006062930A3/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/887—Nanoimprint lithography, i.e. nanostamp

Abstract

A method and system of depositing material upon a substrate features filling recesses of a substrate with liquid and removing material present on the substrate, outside of the recesses using fluid, i.e., apply a vacuum of a jet of fluid. To that end, one method of the present invention includes depositing a measure of liquid upon a surface of a substrate having a recess formed therein to ingress into a volume of the recess with a portion of the liquid. A quantity of the liquid is disposed upon regions of the surface proximate to the recess. Thereafter, the quantity of liquid is removed while maintaining the portion within the volume. In this manner, the portion may be transferred onto an additional substrate. More specifically, the portion may be placed in contact with a layer of flowable material and cross-linking therewith by exposing the liquid and the flowable material to actinic radiation.
PCT/US2005/044030 2004-12-07 2005-12-02 Method and system for fast filling of templates for imprint lithography using on template dispense WO2006062930A2 (en)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
US574204A 2004-12-07 2004-12-07
US636304A 2004-12-07 2004-12-07
US11/005,742 2004-12-07
US11/006,363 2004-12-07
US11/101,140 US7811505B2 (en) 2004-12-07 2005-04-07 Method for fast filling of templates for imprint lithography using on template dispense
US11/101,139 US7281919B2 (en) 2004-12-07 2005-04-07 System for controlling a volume of material on a mold
US11/101,139 2005-04-07
US11/101,140 2005-04-07

Publications (2)

Publication Number Publication Date
WO2006062930A2 WO2006062930A2 (en) 2006-06-15
WO2006062930A3 true WO2006062930A3 (en) 2006-11-02

Family

ID=36578467

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2005/044030 WO2006062930A2 (en) 2004-12-07 2005-12-02 Method and system for fast filling of templates for imprint lithography using on template dispense

Country Status (2)

Country Link
US (2) US7811505B2 (en)
WO (1) WO2006062930A2 (en)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7162035B1 (en) 2000-05-24 2007-01-09 Tracer Detection Technology Corp. Authentication method and system
EP2270592B1 (en) 2000-07-17 2015-09-02 Board of Regents, The University of Texas System Method of forming a pattern on a substrate
US20080160129A1 (en) 2006-05-11 2008-07-03 Molecular Imprints, Inc. Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template
US7077992B2 (en) * 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US7442336B2 (en) * 2003-08-21 2008-10-28 Molecular Imprints, Inc. Capillary imprinting technique
US7019819B2 (en) 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US8211214B2 (en) 2003-10-02 2012-07-03 Molecular Imprints, Inc. Single phase fluid imprint lithography method
KR101193918B1 (en) * 2004-06-03 2012-10-29 몰레큘러 임프린츠 인코퍼레이티드 Fluid dispensing and drop-on-demand dispensing for nano-scale menufacturing
US20070228593A1 (en) * 2006-04-03 2007-10-04 Molecular Imprints, Inc. Residual Layer Thickness Measurement and Correction
US20060062922A1 (en) 2004-09-23 2006-03-23 Molecular Imprints, Inc. Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor
US7811505B2 (en) * 2004-12-07 2010-10-12 Molecular Imprints, Inc. Method for fast filling of templates for imprint lithography using on template dispense
US7906058B2 (en) 2005-12-01 2011-03-15 Molecular Imprints, Inc. Bifurcated contact printing technique
US7670530B2 (en) 2006-01-20 2010-03-02 Molecular Imprints, Inc. Patterning substrates employing multiple chucks
MY144847A (en) 2005-12-08 2011-11-30 Molecular Imprints Inc Method and system for double-sided patterning of substrates
US8142850B2 (en) * 2006-04-03 2012-03-27 Molecular Imprints, Inc. Patterning a plurality of fields on a substrate to compensate for differing evaporation times
US8215946B2 (en) 2006-05-18 2012-07-10 Molecular Imprints, Inc. Imprint lithography system and method
WO2008082650A1 (en) * 2006-12-29 2008-07-10 Molecular Imprints, Inc. Imprint fluid control
US20090014917A1 (en) * 2007-07-10 2009-01-15 Molecular Imprints, Inc. Drop Pattern Generation for Imprint Lithography
US8119052B2 (en) * 2007-11-02 2012-02-21 Molecular Imprints, Inc. Drop pattern generation for imprint lithography
US8361371B2 (en) * 2008-02-08 2013-01-29 Molecular Imprints, Inc. Extrusion reduction in imprint lithography
US7995196B1 (en) 2008-04-23 2011-08-09 Tracer Detection Technology Corp. Authentication method and system
JP2012501084A (en) * 2008-08-27 2012-01-12 エーエムオー ゲーエムベーハー Improved nanoimprint method
US20100096764A1 (en) * 2008-10-20 2010-04-22 Molecular Imprints, Inc. Gas Environment for Imprint Lithography
US8512797B2 (en) * 2008-10-21 2013-08-20 Molecular Imprints, Inc. Drop pattern generation with edge weighting
US8586126B2 (en) 2008-10-21 2013-11-19 Molecular Imprints, Inc. Robust optimization to generate drop patterns in imprint lithography which are tolerant of variations in drop volume and drop placement
US20100112220A1 (en) * 2008-11-03 2010-05-06 Molecular Imprints, Inc. Dispense system set-up and characterization
CN102438841A (en) * 2009-03-23 2012-05-02 因特瓦克公司 A process for optimization of island to trench ratio in patterned media
JP5443103B2 (en) * 2009-09-10 2014-03-19 株式会社東芝 Pattern formation method
JP2011134856A (en) * 2009-12-24 2011-07-07 Toshiba Corp Pattern forming method
US9168679B2 (en) * 2010-07-16 2015-10-27 Northwestern University Programmable soft lithography: solvent-assisted nanoscale embossing
DE102013113241B4 (en) 2013-11-29 2019-02-21 Ev Group E. Thallner Gmbh Method for embossing structures
JP6384537B2 (en) * 2016-10-18 2018-09-05 大日本印刷株式会社 Nanoimprint template

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6089853A (en) * 1997-12-24 2000-07-18 International Business Machines Corporation Patterning device for patterning a substrate with patterning cavities fed by service cavities
US20020094496A1 (en) * 2000-07-17 2002-07-18 Choi Byung J. Method and system of automatic fluid dispensing for imprint lithography processes

Family Cites Families (129)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2212863A (en) 1940-03-02 1940-08-27 Eric C Hughes Evacuator
US3044396A (en) * 1959-01-02 1962-07-17 Carl Allers Ets Inking mechanism for intaglio printing machines
US3151196A (en) * 1960-08-08 1964-09-29 Eagle Rubber Co Inc Method of making balls
US3176653A (en) * 1963-02-20 1965-04-06 Rca Corp Fluid applicator apparatus
US4614300A (en) 1982-04-19 1986-09-30 E. I. Du Pont De Nemours And Company Computerized spray machine
US4451507A (en) 1982-10-29 1984-05-29 Rca Corporation Automatic liquid dispensing apparatus for spinning surface of uniform thickness
US4512848A (en) 1984-02-06 1985-04-23 Exxon Research And Engineering Co. Procedure for fabrication of microstructures over large areas using physical replication
KR900004269B1 (en) 1986-06-11 1990-06-18 가부시기가이샤 도시바 Method and device for positioing 1st body and 2nd body
FR2604553A1 (en) 1986-09-29 1988-04-01 Rhone Poulenc Chimie RIGID POLYMER SUBSTRATE FOR OPTICAL DISC AND OPTICAL DISCS OBTAINED FROM THE SUBSTRATE
US4731155A (en) 1987-04-15 1988-03-15 General Electric Company Process for forming a lithographic mask
US5028366A (en) 1988-01-12 1991-07-02 Air Products And Chemicals, Inc. Water based mold release compositions for making molded polyurethane foam
JPH0224848A (en) 1988-07-14 1990-01-26 Canon Inc Production of substrate for optical recording medium
JP2546350B2 (en) 1988-09-09 1996-10-23 キヤノン株式会社 Alignment device
JPH0292603A (en) 1988-09-30 1990-04-03 Hoya Corp Manufacture of data recording board with guide groove
JP2570402B2 (en) 1988-09-30 1997-01-08 日本ビクター株式会社 Optical information recording medium molding device
US4999280A (en) 1989-03-17 1991-03-12 International Business Machines Corporation Spray silylation of photoresist images
US5110514A (en) 1989-05-01 1992-05-05 Soane Technologies, Inc. Controlled casting of a shrinkable material
US5151754A (en) 1989-10-06 1992-09-29 Kabushiki Kaisha Toshiba Method and an apparatus for measuring a displacement between two objects and a method and an apparatus for measuring a gap distance between two objects
US5505349A (en) 1990-02-09 1996-04-09 Berg Company, A Division Of Dec International, Inc. Electronic dispensing heads
DE4029912A1 (en) 1990-09-21 1992-03-26 Philips Patentverwaltung METHOD FOR FORMING AT LEAST ONE TRENCH IN A SUBSTRATE LAYER
US5362940A (en) 1990-11-09 1994-11-08 Litel Instruments Use of Fresnel zone plates for material processing
JPH0580530A (en) 1991-09-24 1993-04-02 Hitachi Ltd Production of thin film pattern
US5545367A (en) 1992-04-15 1996-08-13 Soane Technologies, Inc. Rapid prototype three dimensional stereolithography
US5731981A (en) 1992-06-08 1998-03-24 Azbar, Inc. Beverage dispensing system for bar
US5371822A (en) 1992-06-09 1994-12-06 Digital Equipment Corporation Method of packaging and assembling opto-electronic integrated circuits
US5601641A (en) 1992-07-21 1997-02-11 Tse Industries, Inc. Mold release composition with polybutadiene and method of coating a mold core
DE4305688C2 (en) 1993-02-25 1994-04-21 Voith Gmbh J M Device and method for changing the flow resistance of a throttle device for fluid flows
DE69405451T2 (en) 1993-03-16 1998-03-12 Koninkl Philips Electronics Nv Method and device for producing a structured relief image from cross-linked photoresist on a flat substrate surface
JP2837063B2 (en) 1993-06-04 1998-12-14 シャープ株式会社 Method of forming resist pattern
US6279474B1 (en) 1993-08-13 2001-08-28 Heidelberger Druckmaschinen Ag Method and device for transferring ink in a printing unit of an offset printing press
US5776748A (en) 1993-10-04 1998-07-07 President And Fellows Of Harvard College Method of formation of microstamped patterns on plates for adhesion of cells and other biological materials, devices and uses therefor
US6776094B1 (en) 1993-10-04 2004-08-17 President & Fellows Of Harvard College Kit For Microcontact Printing
US5512131A (en) 1993-10-04 1996-04-30 President And Fellows Of Harvard College Formation of microstamped patterns on surfaces and derivative articles
US5534101A (en) 1994-03-02 1996-07-09 Telecommunication Research Laboratories Method and apparatus for making optical components by direct dispensing of curable liquid
JPH08187927A (en) * 1994-11-09 1996-07-23 Nippon Oil Co Ltd Transfer method by printing
US5849209A (en) 1995-03-31 1998-12-15 Johnson & Johnson Vision Products, Inc. Mold material made with additives
US6342389B1 (en) 1995-04-10 2002-01-29 Roger S. Cubicciotti Modified phycobilisomes and uses therefore
US5562951A (en) * 1995-05-01 1996-10-08 Revlon Consumer Products Corporation Method for printing articles with multiple radiation curable compositions
GB9509487D0 (en) 1995-05-10 1995-07-05 Ici Plc Micro relief element & preparation thereof
US5820769A (en) 1995-05-24 1998-10-13 Regents Of The University Of Minnesota Method for making magnetic storage having discrete elements with quantized magnetic moments
US5849222A (en) 1995-09-29 1998-12-15 Johnson & Johnson Vision Products, Inc. Method for reducing lens hole defects in production of contact lens blanks
US6482742B1 (en) 2000-07-18 2002-11-19 Stephen Y. Chou Fluid pressure imprint lithography
US6309580B1 (en) 1995-11-15 2001-10-30 Regents Of The University Of Minnesota Release surfaces, particularly for use in nanoimprint lithography
US20040137734A1 (en) 1995-11-15 2004-07-15 Princeton University Compositions and processes for nanoimprinting
US7758794B2 (en) 2001-10-29 2010-07-20 Princeton University Method of making an article comprising nanoscale patterns with reduced edge roughness
US6518189B1 (en) 1995-11-15 2003-02-11 Regents Of The University Of Minnesota Method and apparatus for high density nanostructures
US20040036201A1 (en) 2000-07-18 2004-02-26 Princeton University Methods and apparatus of field-induced pressure imprint lithography
US5772905A (en) 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
US5747102A (en) 1995-11-16 1998-05-05 Nordson Corporation Method and apparatus for dispensing small amounts of liquid material
US5669303A (en) 1996-03-04 1997-09-23 Motorola Apparatus and method for stamping a surface
US6355198B1 (en) 1996-03-15 2002-03-12 President And Fellows Of Harvard College Method of forming articles including waveguides via capillary micromolding and microtransfer molding
US5942443A (en) 1996-06-28 1999-08-24 Caliper Technologies Corporation High throughput screening assay systems in microscale fluidic devices
DE69714251T2 (en) 1996-04-23 2003-03-27 Xaar Technology Ltd DROPLETS STORAGE APPARATUS
US5888650A (en) 1996-06-03 1999-03-30 Minnesota Mining And Manufacturing Company Temperature-responsive adhesive article
US6074827A (en) 1996-07-30 2000-06-13 Aclara Biosciences, Inc. Microfluidic method for nucleic acid purification and processing
US6228539B1 (en) 1996-09-18 2001-05-08 Numerical Technologies, Inc. Phase shifting circuit manufacture method and apparatus
US5858580A (en) 1997-09-17 1999-01-12 Numerical Technologies, Inc. Phase shifting circuit manufacture method and apparatus
TW353762B (en) * 1996-10-21 1999-03-01 Dainippon Printing Co Ltd Transfer sheet, and pattern-forming method
US5837892A (en) 1996-10-25 1998-11-17 Camelot Systems, Inc. Method and apparatus for measuring the size of drops of a viscous material dispensed from a dispensing system
US6112588A (en) 1996-10-25 2000-09-05 Speedline Technologies, Inc. Method and apparatus for measuring the size of drops of a viscous material dispensed from a dispensing system
FR2756400B1 (en) 1996-11-28 1999-12-03 Bornes De Distribution Sofabod MEMORY CARD AUTHORIZATION AND CONTROL METHOD AND DEVICE FOR THE DISTRIBUTION AND COUNTING OF CONSUMPTION OF AT LEAST ONE FLUID OR ENERGY
US5938080A (en) 1997-02-21 1999-08-17 The Geon Company System and apparatus for dispensing high-viscosity pigments
US5948470A (en) 1997-04-28 1999-09-07 Harrison; Christopher Method of nanoscale patterning and products made thereby
US5812629A (en) 1997-04-30 1998-09-22 Clauser; John F. Ultrahigh resolution interferometric x-ray imaging
US5988859A (en) 1997-07-30 1999-11-23 Kirk; Lester C. Apparatus for dispensing valuable bulk commodities and method therefor
US5912049A (en) 1997-08-12 1999-06-15 Micron Technology, Inc. Process liquid dispense method and apparatus
US5974150A (en) 1997-09-30 1999-10-26 Tracer Detection Technology Corp. System and method for authentication of goods
JP3780700B2 (en) 1998-05-26 2006-05-31 セイコーエプソン株式会社 Pattern forming method, pattern forming apparatus, pattern forming plate, pattern forming plate manufacturing method, color filter manufacturing method, conductive film manufacturing method, and liquid crystal panel manufacturing method
US6027595A (en) 1998-07-02 2000-02-22 Samsung Electronics Co., Ltd. Method of making optical replicas by stamping in photoresist and replicas formed thereby
US6713238B1 (en) 1998-10-09 2004-03-30 Stephen Y. Chou Microscale patterning and articles formed thereby
US6218316B1 (en) 1998-10-22 2001-04-17 Micron Technology, Inc. Planarization of non-planar surfaces in device fabrication
US6274294B1 (en) 1999-02-03 2001-08-14 Electroformed Stents, Inc. Cylindrical photolithography exposure process and apparatus
JP2000235986A (en) 1999-02-15 2000-08-29 Toshiba Microelectronics Corp Resin-sealing equipment and manufacture of semiconductor device
US6334960B1 (en) 1999-03-11 2002-01-01 Board Of Regents, The University Of Texas System Step and flash imprint lithography
DE19913076A1 (en) 1999-03-23 2000-10-19 Hahn Schickard Ges Device and method for applying microdroplets to a substrate
JP4151151B2 (en) 1999-04-06 2008-09-17 松下電器産業株式会社 Paste coating apparatus and paste coating method for die bonding
MXPA01011763A (en) 1999-05-20 2002-04-24 Lancer Partnership Ltd A beverage dispenser including an improved electronic control system.
US6517995B1 (en) 1999-09-14 2003-02-11 Massachusetts Institute Of Technology Fabrication of finely featured devices by liquid embossing
US6377868B1 (en) 1999-10-28 2002-04-23 Ecolab Inc. Data processing system for managing chemical product usage
US6873087B1 (en) 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
CA2395760A1 (en) 1999-12-23 2001-06-28 University Of Massachusetts Methods and apparatus for forming submicron patterns on films
US6498640B1 (en) 1999-12-30 2002-12-24 Koninklijke Philips Electronics N.V. Method to measure alignment using latent image grating structures
US6234379B1 (en) 2000-02-28 2001-05-22 Nordson Corporation No-flow flux and underfill dispensing methods
US7859519B2 (en) 2000-05-01 2010-12-28 Tulbert David J Human-machine interface
EP1303792B1 (en) 2000-07-16 2012-10-03 Board Of Regents, The University Of Texas System High-resolution overlay alignement methods and systems for imprint lithography
US20050160011A1 (en) 2004-01-20 2005-07-21 Molecular Imprints, Inc. Method for concurrently employing differing materials to form a layer on a substrate
US7211214B2 (en) 2000-07-18 2007-05-01 Princeton University Laser assisted direct imprint lithography
US7635262B2 (en) 2000-07-18 2009-12-22 Princeton University Lithographic apparatus for fluid pressure imprint lithography
US20050037143A1 (en) 2000-07-18 2005-02-17 Chou Stephen Y. Imprint lithography with improved monitoring and control and apparatus therefor
US6326627B1 (en) 2000-08-02 2001-12-04 Archimedes Technology Group, Inc. Mass filtering sputtered ion source
JP2004523906A (en) 2000-10-12 2004-08-05 ボード・オブ・リージエンツ，ザ・ユニバーシテイ・オブ・テキサス・システム Templates for room-temperature and low-pressure micro and nano-transfer lithography
US6783719B2 (en) 2001-01-19 2004-08-31 Korry Electronics, Co. Mold with metal oxide surface compatible with ionic release agents
US6387787B1 (en) 2001-03-02 2002-05-14 Motorola, Inc. Lithographic template and method of formation and use
US6955767B2 (en) 2001-03-22 2005-10-18 Hewlett-Packard Development Company, Lp. Scanning probe based lithographic alignment
US6517977B2 (en) 2001-03-28 2003-02-11 Motorola, Inc. Lithographic template and method of formation and use
US6510356B2 (en) 2001-04-02 2003-01-21 Hewlett-Packard Company Method and apparatus for programming a paste dispensing machine
US6964793B2 (en) 2002-05-16 2005-11-15 Board Of Regents, The University Of Texas System Method for fabricating nanoscale patterns in light curable compositions using an electric field
US6847433B2 (en) 2001-06-01 2005-01-25 Agere Systems, Inc. Holder, system, and process for improving overlay in lithography
US7049049B2 (en) 2001-06-27 2006-05-23 University Of South Florida Maskless photolithography for using photoreactive agents
JP2003084123A (en) 2001-06-29 2003-03-19 Seiko Epson Corp Color filter substrate, method for manufacturing color filter substrate, liquid crystal display device, electrooptical device, method for manufacturing electrooptical device and electronic apparatus
CA2454570C (en) 2001-07-25 2016-12-20 The Trustees Of Princeton University Nanochannel arrays and their preparation and use for high throughput macromolecular analysis
US6678038B2 (en) 2001-08-03 2004-01-13 Nikon Corporation Apparatus and methods for detecting tool-induced shift in microlithography apparatus
CN100347608C (en) 2001-09-25 2007-11-07 米卢塔技术株式会社 Method for forming a micro-pattern on a substrate by using capillary force
US20030080472A1 (en) 2001-10-29 2003-05-01 Chou Stephen Y. Lithographic method with bonded release layer for molding small patterns
US6588632B1 (en) 2001-11-20 2003-07-08 Gorham Nicol Programmable beverage dispensing apparatus
US6621960B2 (en) 2002-01-24 2003-09-16 Oplink Communications, Inc. Method of fabricating multiple superimposed fiber Bragg gratings
US7455955B2 (en) 2002-02-27 2008-11-25 Brewer Science Inc. Planarization method for multi-layer lithography processing
US7117583B2 (en) 2002-03-18 2006-10-10 International Business Machines Corporation Method and apparatus using a pre-patterned seed layer for providing an aligned coil for an inductive head structure
US6849558B2 (en) 2002-05-22 2005-02-01 The Board Of Trustees Of The Leland Stanford Junior University Replication and transfer of microstructures and nanostructures
US6926929B2 (en) 2002-07-09 2005-08-09 Molecular Imprints, Inc. System and method for dispensing liquids
US6908861B2 (en) 2002-07-11 2005-06-21 Molecular Imprints, Inc. Method for imprint lithography using an electric field
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6932934B2 (en) 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US6900881B2 (en) 2002-07-11 2005-05-31 Molecular Imprints, Inc. Step and repeat imprint lithography systems
US6916584B2 (en) 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
US7070405B2 (en) * 2002-08-01 2006-07-04 Molecular Imprints, Inc. Alignment systems for imprint lithography
US6820677B2 (en) 2002-08-20 2004-11-23 Ford Motor Company Method of making a spray formed article
US7029529B2 (en) 2002-09-19 2006-04-18 Applied Materials, Inc. Method and apparatus for metallization of large area substrates
US8349241B2 (en) 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
US7750059B2 (en) 2002-12-04 2010-07-06 Hewlett-Packard Development Company, L.P. Polymer solution for nanoimprint lithography to reduce imprint temperature and pressure
EP1606834B1 (en) 2003-03-27 2013-06-05 Korea Institute Of Machinery & Materials Uv nanoimprint lithography process using elementwise embossed stamp
US6860956B2 (en) 2003-05-23 2005-03-01 Agency For Science, Technology & Research Methods of creating patterns on substrates and articles of manufacture resulting therefrom
TWI228638B (en) 2003-06-10 2005-03-01 Ind Tech Res Inst Method for and apparatus for bonding patterned imprint to a substrate by adhering means
US7157036B2 (en) 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
US7790231B2 (en) 2003-07-10 2010-09-07 Brewer Science Inc. Automated process and apparatus for planarization of topographical surfaces
US20050106321A1 (en) 2003-11-14 2005-05-19 Molecular Imprints, Inc. Dispense geometery to achieve high-speed filling and throughput
US20050189676A1 (en) 2004-02-27 2005-09-01 Molecular Imprints, Inc. Full-wafer or large area imprinting with multiple separated sub-fields for high throughput lithography
KR101193918B1 (en) 2004-06-03 2012-10-29 몰레큘러 임프린츠 인코퍼레이티드 Fluid dispensing and drop-on-demand dispensing for nano-scale menufacturing
US7811505B2 (en) 2004-12-07 2010-10-12 Molecular Imprints, Inc. Method for fast filling of templates for imprint lithography using on template dispense

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6089853A (en) * 1997-12-24 2000-07-18 International Business Machines Corporation Patterning device for patterning a substrate with patterning cavities fed by service cavities
US20020094496A1 (en) * 2000-07-17 2002-07-18 Choi Byung J. Method and system of automatic fluid dispensing for imprint lithography processes

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