WO2006080902A3 - Method and apparatus for determining line characteristics, e.g., line roughness, of microfeature components - Google Patents

Method and apparatus for determining line characteristics, e.g., line roughness, of microfeature components Download PDF

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Publication number
WO2006080902A3
WO2006080902A3 PCT/US2004/029102 US2004029102W WO2006080902A3 WO 2006080902 A3 WO2006080902 A3 WO 2006080902A3 US 2004029102 W US2004029102 W US 2004029102W WO 2006080902 A3 WO2006080902 A3 WO 2006080902A3
Authority
WO
WIPO (PCT)
Prior art keywords
radiation
line
microfeature
components
workpiece
Prior art date
Application number
PCT/US2004/029102
Other languages
French (fr)
Other versions
WO2006080902A2 (en
Inventor
Christopher Raymond
Original Assignee
Accent Optical Tech Inc
Christopher Raymond
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Accent Optical Tech Inc, Christopher Raymond filed Critical Accent Optical Tech Inc
Priority to PCT/US2004/029102 priority Critical patent/WO2006080902A2/en
Publication of WO2006080902A2 publication Critical patent/WO2006080902A2/en
Publication of WO2006080902A3 publication Critical patent/WO2006080902A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/303—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces using photoelectric detection means

Abstract

A system (10) is provided to measure line edge roughness by directing incident radiation (I) through a lens (28) onto a line grating (G) on a workpiece (W) on a support (20) and detecting reflected radiation (R) from the grating (G). The support (20) and workpiece (W) is rotated (24) by a motor (23). The radiation system (25) includes a radiation source (30) with a radiation element (32) such as a laser on an LED to provide the incident radiation (I) and a polarizing element (34). The radiation detector (50) includes a beam splitter (56) and a pair of detector elements (52a, 52b) with polarizing filters (54a, 54b) which are oriented at 90 degrees relative to each other. A controller (70) with a programmable processor (72) controls the various elements of the system.
PCT/US2004/029102 2004-09-08 2004-09-08 Method and apparatus for determining line characteristics, e.g., line roughness, of microfeature components WO2006080902A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/US2004/029102 WO2006080902A2 (en) 2004-09-08 2004-09-08 Method and apparatus for determining line characteristics, e.g., line roughness, of microfeature components

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2004/029102 WO2006080902A2 (en) 2004-09-08 2004-09-08 Method and apparatus for determining line characteristics, e.g., line roughness, of microfeature components

Publications (2)

Publication Number Publication Date
WO2006080902A2 WO2006080902A2 (en) 2006-08-03
WO2006080902A3 true WO2006080902A3 (en) 2007-03-08

Family

ID=36740913

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2004/029102 WO2006080902A2 (en) 2004-09-08 2004-09-08 Method and apparatus for determining line characteristics, e.g., line roughness, of microfeature components

Country Status (1)

Country Link
WO (1) WO2006080902A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013220006A1 (en) * 2013-10-02 2015-04-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method for quality control of a microstructuring and device therefor

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4408884A (en) * 1981-06-29 1983-10-11 Rca Corporation Optical measurements of fine line parameters in integrated circuit processes
US5867276A (en) * 1997-03-07 1999-02-02 Bio-Rad Laboratories, Inc. Method for broad wavelength scatterometry
US6429943B1 (en) * 2000-03-29 2002-08-06 Therma-Wave, Inc. Critical dimension analysis with simultaneous multiple angle of incidence measurements

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4408884A (en) * 1981-06-29 1983-10-11 Rca Corporation Optical measurements of fine line parameters in integrated circuit processes
US5867276A (en) * 1997-03-07 1999-02-02 Bio-Rad Laboratories, Inc. Method for broad wavelength scatterometry
US6429943B1 (en) * 2000-03-29 2002-08-06 Therma-Wave, Inc. Critical dimension analysis with simultaneous multiple angle of incidence measurements

Also Published As

Publication number Publication date
WO2006080902A2 (en) 2006-08-03

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Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application
DPE1 Request for preliminary examination filed after expiration of 19th month from priority date (pct application filed from 20040101)
DPE1 Request for preliminary examination filed after expiration of 19th month from priority date (pct application filed from 20040101)
NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase