WO2006114764A3 - Position measuring system - Google Patents

Position measuring system Download PDF

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Publication number
WO2006114764A3
WO2006114764A3 PCT/IB2006/051283 IB2006051283W WO2006114764A3 WO 2006114764 A3 WO2006114764 A3 WO 2006114764A3 IB 2006051283 W IB2006051283 W IB 2006051283W WO 2006114764 A3 WO2006114764 A3 WO 2006114764A3
Authority
WO
WIPO (PCT)
Prior art keywords
radiation
emitting element
position measuring
emitting
measuring system
Prior art date
Application number
PCT/IB2006/051283
Other languages
French (fr)
Other versions
WO2006114764A2 (en
Inventor
Cristian Presura
Original Assignee
Koninkl Philips Electronics Nv
Cristian Presura
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv, Cristian Presura filed Critical Koninkl Philips Electronics Nv
Publication of WO2006114764A2 publication Critical patent/WO2006114764A2/en
Publication of WO2006114764A3 publication Critical patent/WO2006114764A3/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
    • G02B27/4255—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application for alignment or positioning purposes

Abstract

Known position measuring systems must be well aligned to provide the necessary resolution for applications such as lithography. The proposed position measuring system (1) comprises a radiation emitting element (2) emitting a radiation beam (3). The radiation beam (3) is diffracted by a diffraction grating (7). First and second diffracted beams (10, 11) having symmetric diffraction orders are reflected back to the radiation-emitting element (2). Meanwhile, the actual frequency of the radiation beam (3) emitting from the radiation-emitting element (2) has been changed so that a beat pattern is produced in the radiation-emitting element (2). By means of a measuring beam (23) this beat pattern is detected in a detector (25).
PCT/IB2006/051283 2005-04-27 2006-04-25 Position measuring system WO2006114764A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP05103425.4 2005-04-27
EP05103425 2005-04-27

Publications (2)

Publication Number Publication Date
WO2006114764A2 WO2006114764A2 (en) 2006-11-02
WO2006114764A3 true WO2006114764A3 (en) 2007-03-08

Family

ID=37215141

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2006/051283 WO2006114764A2 (en) 2005-04-27 2006-04-25 Position measuring system

Country Status (2)

Country Link
TW (1) TW200643369A (en)
WO (1) WO2006114764A2 (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5164789A (en) * 1990-11-09 1992-11-17 Hitachi, Ltd. Method and apparatus for measuring minute displacement by subject light diffracted and reflected from a grating to heterodyne interference
US5214489A (en) * 1990-04-25 1993-05-25 Nikon Corporation Aligning device for exposure apparatus
US5500734A (en) * 1993-05-21 1996-03-19 Dr. Johannes Heidenhain Gmbh Photoelectric position measuring system with integral optical circuit having phase shifted interference gratings
US5506684A (en) * 1991-04-04 1996-04-09 Nikon Corporation Projection scanning exposure apparatus with synchronous mask/wafer alignment system
EP0947833A1 (en) * 1998-03-09 1999-10-06 OTM Technologies, Ltd. Optical translation measurement

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5214489A (en) * 1990-04-25 1993-05-25 Nikon Corporation Aligning device for exposure apparatus
US5164789A (en) * 1990-11-09 1992-11-17 Hitachi, Ltd. Method and apparatus for measuring minute displacement by subject light diffracted and reflected from a grating to heterodyne interference
US5506684A (en) * 1991-04-04 1996-04-09 Nikon Corporation Projection scanning exposure apparatus with synchronous mask/wafer alignment system
US5500734A (en) * 1993-05-21 1996-03-19 Dr. Johannes Heidenhain Gmbh Photoelectric position measuring system with integral optical circuit having phase shifted interference gratings
EP0947833A1 (en) * 1998-03-09 1999-10-06 OTM Technologies, Ltd. Optical translation measurement

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
SUHURA T ET AL: "MONOLITHIC INTEGRATED-OPTIC POSITION/DISPLACEMENT SENSOR USING WAVEGUIDE GRATINGS AND QW-DFB LASER", IEEE PHOTONICS TECHNOLOGY LETTERS, IEEE SERVICE CENTER, PISCATAWAY, NJ, US, vol. 7, no. 10, 1 October 1995 (1995-10-01), pages 1195 - 1197, XP000537235, ISSN: 1041-1135 *

Also Published As

Publication number Publication date
WO2006114764A2 (en) 2006-11-02
TW200643369A (en) 2006-12-16

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