WO2007005340A3 - Beam delivery system for laser dark-field illumination in a catadioptric optical system - Google Patents

Beam delivery system for laser dark-field illumination in a catadioptric optical system Download PDF

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Publication number
WO2007005340A3
WO2007005340A3 PCT/US2006/024609 US2006024609W WO2007005340A3 WO 2007005340 A3 WO2007005340 A3 WO 2007005340A3 US 2006024609 W US2006024609 W US 2006024609W WO 2007005340 A3 WO2007005340 A3 WO 2007005340A3
Authority
WO
WIPO (PCT)
Prior art keywords
illumination source
specimen
illuminating
beam delivery
field illumination
Prior art date
Application number
PCT/US2006/024609
Other languages
French (fr)
Other versions
WO2007005340A2 (en
Inventor
Yung-Ho Chuang
J Joseph Armstrong
Original Assignee
Kla Tencor Tech Corp
Yung-Ho Chuang
J Joseph Armstrong
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kla Tencor Tech Corp, Yung-Ho Chuang, J Joseph Armstrong filed Critical Kla Tencor Tech Corp
Priority to EP06785497A priority Critical patent/EP1896829A4/en
Priority to JP2008519430A priority patent/JP4937255B2/en
Publication of WO2007005340A2 publication Critical patent/WO2007005340A2/en
Publication of WO2007005340A3 publication Critical patent/WO2007005340A3/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens
    • G02B21/08—Condensers
    • G02B21/10—Condensers affording dark-field illumination
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0856—Catadioptric systems comprising a refractive element with a reflective surface, the reflection taking place inside the element, e.g. Mangin mirrors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Lenses (AREA)
  • Microscoopes, Condenser (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

A method and apparatus for inspecting a specimen are provided. The apparatus comprises a primary illumination source, a catadioptric objective exhibiting central obscuration that directs light energy received from the primary illumination source at a substantially normal angle toward the specimen, and an optical device, such as a prism or reflective surface, positioned within the central obscuration resulting from the catadioptric objective for receiving further illumination from a secondary illumination source and diverting the further illumination to the specimen. The method comprises illuminating a surface of the specimen at a variety of angles using a primary illumination source, illuminating the surface using a secondary illumination source, the illuminating by the secondary illumination source occurring at a substantially normal angle of incidence; and imaging all reflected, scattered, and diffracted lig
PCT/US2006/024609 2005-06-30 2006-06-22 Beam delivery system for laser dark-field illumination in a catadioptric optical system WO2007005340A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP06785497A EP1896829A4 (en) 2005-06-30 2006-06-22 Beam delivery system for laser dark-field illumination in a catadioptric optical system
JP2008519430A JP4937255B2 (en) 2005-06-30 2006-06-22 Beam delivery system for laser dark field illumination in catadioptric optics

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/171,079 2005-06-30
US11/171,079 US7345825B2 (en) 2005-06-30 2005-06-30 Beam delivery system for laser dark-field illumination in a catadioptric optical system

Publications (2)

Publication Number Publication Date
WO2007005340A2 WO2007005340A2 (en) 2007-01-11
WO2007005340A3 true WO2007005340A3 (en) 2007-07-12

Family

ID=37589180

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/024609 WO2007005340A2 (en) 2005-06-30 2006-06-22 Beam delivery system for laser dark-field illumination in a catadioptric optical system

Country Status (4)

Country Link
US (2) US7345825B2 (en)
EP (1) EP1896829A4 (en)
JP (1) JP4937255B2 (en)
WO (1) WO2007005340A2 (en)

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US7567344B2 (en) * 2006-05-12 2009-07-28 Corning Incorporated Apparatus and method for characterizing defects in a transparent substrate
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WO2010009852A2 (en) * 2008-07-23 2010-01-28 Carl Zeiss Laser Optics Gmbh Microscope comprising a lens and a dark field illumination device and method for the production thereof
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US9115987B2 (en) * 2013-12-04 2015-08-25 Nanometrics Incorporated Optical metrology with multiple angles of incidence and/or azimuth angles
US9347890B2 (en) 2013-12-19 2016-05-24 Kla-Tencor Corporation Low-noise sensor and an inspection system using a low-noise sensor
US9748294B2 (en) 2014-01-10 2017-08-29 Hamamatsu Photonics K.K. Anti-reflection layer for back-illuminated sensor
US10948638B2 (en) 2014-03-04 2021-03-16 Stryker European Operations Limited Spatial and spectral filtering apertures and optical imaging systems including the same
US9410901B2 (en) 2014-03-17 2016-08-09 Kla-Tencor Corporation Image sensor, an inspection system and a method of inspecting an article
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US9860466B2 (en) 2015-05-14 2018-01-02 Kla-Tencor Corporation Sensor with electrically controllable aperture for inspection and metrology systems
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US10462391B2 (en) 2015-08-14 2019-10-29 Kla-Tencor Corporation Dark-field inspection using a low-noise sensor
WO2017035646A1 (en) 2015-08-31 2017-03-09 Novadaq Technologies Inc. Polarization dependent filter, system using the same, and associated kits and methods
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US9865447B2 (en) 2016-03-28 2018-01-09 Kla-Tencor Corporation High brightness laser-sustained plasma broadband source
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US10175555B2 (en) 2017-01-03 2019-01-08 KLA—Tencor Corporation 183 nm CW laser and inspection system
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US11662646B2 (en) 2017-02-05 2023-05-30 Kla Corporation Inspection and metrology using broadband infrared radiation
US9928632B1 (en) 2017-06-14 2018-03-27 Capital One Services, Llc Systems and methods for generating and reading intrinsic matrixed bar codes
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US10527557B2 (en) * 2017-12-29 2020-01-07 Radiant Vision Systems, LLC Adaptive diffuse illumination systems and methods
US11067389B2 (en) 2018-03-13 2021-07-20 Kla Corporation Overlay metrology system and method
US10714327B2 (en) 2018-03-19 2020-07-14 Kla-Tencor Corporation System and method for pumping laser sustained plasma and enhancing selected wavelengths of output illumination
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US11156817B2 (en) * 2018-08-08 2021-10-26 Kessler Optics and Photonics Solutions Ltd. Scanning microscope with enhanced FOV and NA
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US11567391B1 (en) 2021-11-24 2023-01-31 Kla Corporation Frequency conversion using interdigitated nonlinear crystal gratings
US11899338B2 (en) 2021-12-11 2024-02-13 Kla Corporation Deep ultraviolet laser using strontium tetraborate for frequency conversion
US11637008B1 (en) 2022-05-20 2023-04-25 Kla Corporation Conical pocket laser-sustained plasma lamp
CN114878583B (en) * 2022-07-08 2022-09-20 四川大学 Image processing method and system for dark field imaging of distorted spot lighting defects

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5177559A (en) * 1991-05-17 1993-01-05 International Business Machines Corporation Dark field imaging defect inspection system for repetitive pattern integrated circuits
US5790251A (en) * 1995-04-19 1998-08-04 Nikon Corporation Defect inspecting apparatus
US20010000679A1 (en) * 1997-09-19 2001-05-03 Mehdi Vaez-Iravani Sample inspection system
US20050052643A1 (en) * 2003-09-04 2005-03-10 Lange Steve R. Methods and systems for inspection of a specimen using different inspection parameters

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4639587A (en) 1984-02-22 1987-01-27 Kla Instruments Corporation Automatic focusing system for a microscope
DE3601217A1 (en) * 1986-01-17 1987-07-23 Basf Ag METHOD FOR PRODUCING HYDROXYLAMINE-0-SULPHONIC ACID
JPS62167210U (en) * 1986-04-11 1987-10-23
US5058982A (en) 1989-06-21 1991-10-22 Orbot Systems Ltd. Illumination system and inspection apparatus including same
JPH04407A (en) * 1990-04-18 1992-01-06 Hitachi Ltd Reflection type microscope objective lens, projecting and vertical illuminating device for reflection type microscope having this objective lens and reflection type microscope system having this objective lens
IL94368A (en) 1990-05-11 1993-07-08 Orbot Systems Ltd Optic inspection apparatus and illumination system particularly useful therein
DE4243144B4 (en) * 1992-12-19 2008-08-21 BRUKER OPTICS, Inc., Billerica Lens for a FT Raman microscope
US5428442A (en) 1993-09-30 1995-06-27 Optical Specialties, Inc. Inspection system with in-lens, off-axis illuminator
WO1996039619A1 (en) * 1995-06-06 1996-12-12 Kla Instruments Corporation Optical inspection of a specimen using multi-channel responses from the specimen
US6512631B2 (en) 1996-07-22 2003-01-28 Kla-Tencor Corporation Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system
US6288780B1 (en) 1995-06-06 2001-09-11 Kla-Tencor Technologies Corp. High throughput brightfield/darkfield wafer inspection system using advanced optical techniques
US5999310A (en) * 1996-07-22 1999-12-07 Shafer; David Ross Ultra-broadband UV microscope imaging system with wide range zoom capability
US6483638B1 (en) 1996-07-22 2002-11-19 Kla-Tencor Corporation Ultra-broadband UV microscope imaging system with wide range zoom capability
US5717518A (en) 1996-07-22 1998-02-10 Kla Instruments Corporation Broad spectrum ultraviolet catadioptric imaging system
US6064517A (en) * 1996-07-22 2000-05-16 Kla-Tencor Corporation High NA system for multiple mode imaging
US6020957A (en) 1998-04-30 2000-02-01 Kla-Tencor Corporation System and method for inspecting semiconductor wafers
US6862142B2 (en) * 2000-03-10 2005-03-01 Kla-Tencor Technologies Corporation Multi-detector microscopic inspection system
US6661580B1 (en) * 2000-03-10 2003-12-09 Kla-Tencor Technologies Corporation High transmission optical inspection tools
US6693930B1 (en) 2000-12-12 2004-02-17 Kla-Tencor Technologies Corporation Peak power and speckle contrast reduction for a single laser pulse

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5177559A (en) * 1991-05-17 1993-01-05 International Business Machines Corporation Dark field imaging defect inspection system for repetitive pattern integrated circuits
US5790251A (en) * 1995-04-19 1998-08-04 Nikon Corporation Defect inspecting apparatus
US20010000679A1 (en) * 1997-09-19 2001-05-03 Mehdi Vaez-Iravani Sample inspection system
US20050052643A1 (en) * 2003-09-04 2005-03-10 Lange Steve R. Methods and systems for inspection of a specimen using different inspection parameters

Also Published As

Publication number Publication date
EP1896829A4 (en) 2010-10-20
JP2008545165A (en) 2008-12-11
US7817260B2 (en) 2010-10-19
JP4937255B2 (en) 2012-05-23
US7345825B2 (en) 2008-03-18
WO2007005340A2 (en) 2007-01-11
US20080225282A1 (en) 2008-09-18
US20070002465A1 (en) 2007-01-04
EP1896829A2 (en) 2008-03-12

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